JPS57212151A - Photosensitive substance - Google Patents
Photosensitive substanceInfo
- Publication number
- JPS57212151A JPS57212151A JP9648981A JP9648981A JPS57212151A JP S57212151 A JPS57212151 A JP S57212151A JP 9648981 A JP9648981 A JP 9648981A JP 9648981 A JP9648981 A JP 9648981A JP S57212151 A JPS57212151 A JP S57212151A
- Authority
- JP
- Japan
- Prior art keywords
- para
- solvent
- acid
- azidocinnamic
- formulai
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 title abstract 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 abstract 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 239000002904 solvent Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 abstract 2
- -1 2-(N,N-dimethylamino)ethyl Chemical group 0.000 abstract 1
- BKIMDUISGXTAPJ-UHFFFAOYSA-N 3-(4-azidophenyl)-n-[2-[bis(ethylamino)amino]ethyl]prop-2-enamide Chemical compound CCNN(NCC)CCNC(=O)C=CC1=CC=C(N=[N+]=[N-])C=C1 BKIMDUISGXTAPJ-UHFFFAOYSA-N 0.000 abstract 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 239000000839 emulsion Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- BWNPPPLRJQXQCO-UHFFFAOYSA-N n',n'-bis(ethylamino)ethane-1,2-diamine Chemical compound CCNN(CCN)NCC BWNPPPLRJQXQCO-UHFFFAOYSA-N 0.000 abstract 1
- 239000012044 organic layer Substances 0.000 abstract 1
- 238000010992 reflux Methods 0.000 abstract 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
NEW MATERIAL:A compound selected from N,N-diethylamino-N'-(para-azidobenzylideneacetyl)ethylenediamine shown by the formulaI, para-azidocinnamic acid 2-(N,N-diethylamino)ethyl shown by the formula II and para-azido 2-cyanocinnamc acid 2-(N,N-dimethylamino)ethyl shown by the formula III.
USE: A photosensitive substance for positive having a high photosensitive sensitiveness capable of using soda glass or an emulsion covered photomask.
PROCESS: For example, para-azidocinnamic acid is reacted with thionyl chloride, etc. by heating under reflux, to give para-azidocinnamic acid chloride. This is dissolved in a solvent such as chloroform, etc., and reacted with N,N-diethylaminoethylenediamine. After the reaction is over, the solvent is distilled off, an aqueous solution of sodium hydroxide is added to the reaction product, which is extracted with chloroform, etc., the organic layer is separated, and the solvent is distilled off, to give a compound shown by the formulaI.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9648981A JPS57212151A (en) | 1981-06-24 | 1981-06-24 | Photosensitive substance |
| KR1019810004998A KR860000070B1 (en) | 1980-12-17 | 1981-12-16 | Light or radiation sensitive polymer composition |
| GB8137851A GB2092164B (en) | 1980-12-17 | 1981-12-16 | Loght or radiation-sensitive polymer composition |
| DE3150054A DE3150054C2 (en) | 1980-12-17 | 1981-12-17 | Light or radiation sensitive polymer compositions and their use |
| US06/331,875 US4451551A (en) | 1980-12-17 | 1981-12-17 | Radiation-sensitive poly(amic acid) polymer composition |
| FR8123637A FR2496111B1 (en) | 1980-12-17 | 1981-12-17 | POLYMER COMPOSITION SENSITIVE TO LIGHT OR RADIATION, ITS USE FOR FORMING RELIEF DRAWINGS, AND COMPOUNDS INCLUDING IN THIS COMPOSITION |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9648981A JPS57212151A (en) | 1981-06-24 | 1981-06-24 | Photosensitive substance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57212151A true JPS57212151A (en) | 1982-12-27 |
| JPH0136610B2 JPH0136610B2 (en) | 1989-08-01 |
Family
ID=14166482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9648981A Granted JPS57212151A (en) | 1980-12-17 | 1981-06-24 | Photosensitive substance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57212151A (en) |
-
1981
- 1981-06-24 JP JP9648981A patent/JPS57212151A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0136610B2 (en) | 1989-08-01 |
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