JPS5723058A - Formation of thin film - Google Patents

Formation of thin film

Info

Publication number
JPS5723058A
JPS5723058A JP9558980A JP9558980A JPS5723058A JP S5723058 A JPS5723058 A JP S5723058A JP 9558980 A JP9558980 A JP 9558980A JP 9558980 A JP9558980 A JP 9558980A JP S5723058 A JPS5723058 A JP S5723058A
Authority
JP
Japan
Prior art keywords
mask
step part
thin film
flange
glaze
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9558980A
Other languages
Japanese (ja)
Inventor
Toshiaki Naka
Minoru Terajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9558980A priority Critical patent/JPS5723058A/en
Publication of JPS5723058A publication Critical patent/JPS5723058A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent a thin film from being turned into an underside of a mask, in forming the thin film on a substrate having a step part by sputtering in such a manner that said step part is covered by a mask, by using the mask having a flange higher than said step part formed on a mask end part of a lower side of said step part. CONSTITUTION:In a thermal head, an Au thick film conductor 2 and a thick glaze 3 are formed on the substrate and plural resistant heaters 4 is formed thereon and, further, a protective layer 5 comprising SiO2-Ta2O5 protecting said resistant heaters on a part of the glaze 3. Then, the resultant formed step part is covered by a mask 10. On a mask end part 10b of a lower side of the step part, the mask 10 has a flange 11 present along a total length of said end part in an elongated manner as well as downwardly protruded at almost right angles. Said flange 11 is formed by plating or the like and the height A of the flange 11 is made higher than the height B of the glaze 3 from a surface of the substrate 1. Thereby, a phenomenon such that the thin film is turned into an underside of the mask 10 by sputtering is prevented.
JP9558980A 1980-07-15 1980-07-15 Formation of thin film Pending JPS5723058A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9558980A JPS5723058A (en) 1980-07-15 1980-07-15 Formation of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9558980A JPS5723058A (en) 1980-07-15 1980-07-15 Formation of thin film

Publications (1)

Publication Number Publication Date
JPS5723058A true JPS5723058A (en) 1982-02-06

Family

ID=14141761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9558980A Pending JPS5723058A (en) 1980-07-15 1980-07-15 Formation of thin film

Country Status (1)

Country Link
JP (1) JPS5723058A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62213906A (en) * 1986-03-14 1987-09-19 Kitagawa Tekkosho:Kk Structure of operating body in wedge chuck
JPS62187118U (en) * 1986-05-17 1987-11-28

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62213906A (en) * 1986-03-14 1987-09-19 Kitagawa Tekkosho:Kk Structure of operating body in wedge chuck
JPS62187118U (en) * 1986-05-17 1987-11-28

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