JPS5724540B2 - - Google Patents

Info

Publication number
JPS5724540B2
JPS5724540B2 JP12835879A JP12835879A JPS5724540B2 JP S5724540 B2 JPS5724540 B2 JP S5724540B2 JP 12835879 A JP12835879 A JP 12835879A JP 12835879 A JP12835879 A JP 12835879A JP S5724540 B2 JPS5724540 B2 JP S5724540B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12835879A
Other languages
Japanese (ja)
Other versions
JPS5651744A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12835879A priority Critical patent/JPS5651744A/ja
Publication of JPS5651744A publication Critical patent/JPS5651744A/ja
Publication of JPS5724540B2 publication Critical patent/JPS5724540B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Brushes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12835879A 1979-10-03 1979-10-03 Brush for washing off photosensitive resin and its manufacture Granted JPS5651744A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12835879A JPS5651744A (en) 1979-10-03 1979-10-03 Brush for washing off photosensitive resin and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12835879A JPS5651744A (en) 1979-10-03 1979-10-03 Brush for washing off photosensitive resin and its manufacture

Publications (2)

Publication Number Publication Date
JPS5651744A JPS5651744A (en) 1981-05-09
JPS5724540B2 true JPS5724540B2 (da) 1982-05-25

Family

ID=14982838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12835879A Granted JPS5651744A (en) 1979-10-03 1979-10-03 Brush for washing off photosensitive resin and its manufacture

Country Status (1)

Country Link
JP (1) JPS5651744A (da)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58159533A (ja) * 1982-02-01 1983-09-21 Toray Ind Inc 異形断面捲縮糸を植毛した現像用ブラシ
DE3221257A1 (de) * 1982-06-04 1983-12-08 Basf Ag, 6700 Ludwigshafen Vorrichtung zum behandeln von nach photochemischen verfahren hergestellten druckplatten
CN1042293C (zh) * 1992-06-22 1999-03-03 狮王株式会社 牙刷
FR2917276B1 (fr) * 2007-06-15 2012-07-27 Cinqpats Dispositif et conditionnement de brossage et de peignage de precision, ainsi que procede et outillage d'obtention

Also Published As

Publication number Publication date
JPS5651744A (en) 1981-05-09

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