JPS5732368A - Vacuum treating apparatus - Google Patents

Vacuum treating apparatus

Info

Publication number
JPS5732368A
JPS5732368A JP10677180A JP10677180A JPS5732368A JP S5732368 A JPS5732368 A JP S5732368A JP 10677180 A JP10677180 A JP 10677180A JP 10677180 A JP10677180 A JP 10677180A JP S5732368 A JPS5732368 A JP S5732368A
Authority
JP
Japan
Prior art keywords
tank
frame
treating apparatus
working
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10677180A
Other languages
Japanese (ja)
Other versions
JPS5917192B2 (en
Inventor
Seiji Miyagawa
Kunihiko Matsumori
Hirosane Takei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP10677180A priority Critical patent/JPS5917192B2/en
Publication of JPS5732368A publication Critical patent/JPS5732368A/en
Publication of JPS5917192B2 publication Critical patent/JPS5917192B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To support the working member of a treating apparatus stably and firmly without increasing the size of the apparatus by making the front and the bottom of the vacuum tank openable and forming a frame interlocking with the tank by using a front plate and a bottom plate. CONSTITUTION:As a vacuum tank 1 caseing type tank with the front 3 and the bottom 4 opened is used. A frame 7 composed of a front plate 5 and a bottom plate 6 is prepared in front of the tank 1, and by joining the tank 1 and the frame 7 together, the interior of the tank 1 is sealed airtightly. Since a working member 2 is supported on the frame 7, the member 2 is stabilized to prevent vibration or other trouble. The tank 1 is connected to a carriage 9 through links 13, and by working a cylinder 14, the tank 1 is pushed forward the downward to ensure the shutting between the tank 1 and the frame 7.
JP10677180A 1980-08-05 1980-08-05 Vacuum processing equipment Expired JPS5917192B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10677180A JPS5917192B2 (en) 1980-08-05 1980-08-05 Vacuum processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10677180A JPS5917192B2 (en) 1980-08-05 1980-08-05 Vacuum processing equipment

Publications (2)

Publication Number Publication Date
JPS5732368A true JPS5732368A (en) 1982-02-22
JPS5917192B2 JPS5917192B2 (en) 1984-04-19

Family

ID=14442163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10677180A Expired JPS5917192B2 (en) 1980-08-05 1980-08-05 Vacuum processing equipment

Country Status (1)

Country Link
JP (1) JPS5917192B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5991360U (en) * 1982-12-12 1984-06-21 シロキ工業株式会社 Reactive vapor deposition film forming equipment
JPS59107071A (en) * 1982-12-12 1984-06-21 Nitto Kohki Co Ltd Device for forming reactive vapor deposited film on outside surface of object to be treated
JPS5991361U (en) * 1982-12-12 1984-06-21 日東工器株式会社 Film deposition equipment
JPS6016755U (en) * 1982-12-12 1985-02-04 白木金属工業株式会社 Film deposition equipment

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06240443A (en) * 1992-12-26 1994-08-30 Sony Corp Device for producing thin film in vacuum and production of magnetic recording medium using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5991360U (en) * 1982-12-12 1984-06-21 シロキ工業株式会社 Reactive vapor deposition film forming equipment
JPS59107071A (en) * 1982-12-12 1984-06-21 Nitto Kohki Co Ltd Device for forming reactive vapor deposited film on outside surface of object to be treated
JPS5991361U (en) * 1982-12-12 1984-06-21 日東工器株式会社 Film deposition equipment
JPS6016755U (en) * 1982-12-12 1985-02-04 白木金属工業株式会社 Film deposition equipment

Also Published As

Publication number Publication date
JPS5917192B2 (en) 1984-04-19

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