JPS5738434A - Manufacture of photomask - Google Patents

Manufacture of photomask

Info

Publication number
JPS5738434A
JPS5738434A JP11395380A JP11395380A JPS5738434A JP S5738434 A JPS5738434 A JP S5738434A JP 11395380 A JP11395380 A JP 11395380A JP 11395380 A JP11395380 A JP 11395380A JP S5738434 A JPS5738434 A JP S5738434A
Authority
JP
Japan
Prior art keywords
pattern
film
diagram
photosensitive
red
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11395380A
Other languages
Japanese (ja)
Inventor
Isao Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11395380A priority Critical patent/JPS5738434A/en
Publication of JPS5738434A publication Critical patent/JPS5738434A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To easily and exactly form 2 wiring pattern diagrams corresponding to each color from an original wiring pattern diagram expressed in 2 colors, by using 2 kinds of photosensitive films having different photosensitive wavelength regions. CONSTITUTION:Two kinds of patterns are separated from a wiring pattern diagram expressed in 2 colors (diagram A) having a lateral red pattern (diagram B) and a longitudinal blue pattern (diagram C) drawn on the same paper, and lateral and longitudinal thin continuous lines are graph paper lines. (i) An orthochromatic photosensitive film 1 having a 350-600nm photosensitive wavelength region is placed under the diagram A, and white light is projected in the arrow direction to react a part of the film 1 except that corresponding to the red pattern R and the black pattern BL (hatched parts, and a signal B expresses the blue pattern), and then, the film 1 is reversely printed on a positive film 2 to form a red and black pattern. A blue and black pattern is formed by using a panchromatic photosensitive film 3 having a 350-650nm photosensitive wavelength region, and a light filtered through a red film 4.
JP11395380A 1980-08-21 1980-08-21 Manufacture of photomask Pending JPS5738434A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11395380A JPS5738434A (en) 1980-08-21 1980-08-21 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11395380A JPS5738434A (en) 1980-08-21 1980-08-21 Manufacture of photomask

Publications (1)

Publication Number Publication Date
JPS5738434A true JPS5738434A (en) 1982-03-03

Family

ID=14625338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11395380A Pending JPS5738434A (en) 1980-08-21 1980-08-21 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS5738434A (en)

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