JPS5739048B2 - - Google Patents
Info
- Publication number
- JPS5739048B2 JPS5739048B2 JP7190179A JP7190179A JPS5739048B2 JP S5739048 B2 JPS5739048 B2 JP S5739048B2 JP 7190179 A JP7190179 A JP 7190179A JP 7190179 A JP7190179 A JP 7190179A JP S5739048 B2 JPS5739048 B2 JP S5739048B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7190179A JPS55163841A (en) | 1979-06-08 | 1979-06-08 | Method for electron beam exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7190179A JPS55163841A (en) | 1979-06-08 | 1979-06-08 | Method for electron beam exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55163841A JPS55163841A (en) | 1980-12-20 |
| JPS5739048B2 true JPS5739048B2 (fr) | 1982-08-19 |
Family
ID=13473898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7190179A Granted JPS55163841A (en) | 1979-06-08 | 1979-06-08 | Method for electron beam exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55163841A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62275768A (ja) * | 1986-05-24 | 1987-11-30 | Sony Corp | プリント装置 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100685861B1 (ko) | 2005-11-14 | 2007-02-22 | 재단법인서울대학교산학협력재단 | 전자빔 레지스트 패턴 형성방법 |
| KR100763227B1 (ko) | 2006-04-04 | 2007-10-04 | 삼성전자주식회사 | 분리 노광 방법을 이용한 포토마스크와 그 제조 방법 및 제조 장치 |
-
1979
- 1979-06-08 JP JP7190179A patent/JPS55163841A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62275768A (ja) * | 1986-05-24 | 1987-11-30 | Sony Corp | プリント装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55163841A (en) | 1980-12-20 |