JPS5741374A - Sample mounting and dismounting device in plasma etching device or resembling device - Google Patents

Sample mounting and dismounting device in plasma etching device or resembling device

Info

Publication number
JPS5741374A
JPS5741374A JP11599780A JP11599780A JPS5741374A JP S5741374 A JPS5741374 A JP S5741374A JP 11599780 A JP11599780 A JP 11599780A JP 11599780 A JP11599780 A JP 11599780A JP S5741374 A JPS5741374 A JP S5741374A
Authority
JP
Japan
Prior art keywords
sample
chamber
etching
dismounting
arm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11599780A
Other languages
Japanese (ja)
Inventor
Yoshimasa Unno
Yukichi Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11599780A priority Critical patent/JPS5741374A/en
Publication of JPS5741374A publication Critical patent/JPS5741374A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To mount and dismount samples in a short time by providing a sample conveying arm between an etching chamber and a spare chamber for exchanging samples, making it rotatable 180° and performing mounting and dismounting of the sample simultaneously in a plasma etching device.
CONSTITUTION: A conveying arm 8 is provided between an etching chamber 1 in which a reaction tube 6a provided with a microwave generator 6 projects and a spare chamber 2 for sample exchanging adjacent thereto, and support members 9 containing a sample 18 to be etched are mounted to both ends thereof. A gate valve 3 is provided between the etching chamber 1 and the spare chamber 2 to provide such width at which the arm 8 can pass freely when the valve is opened. The arm 8 receiving the sample 18 from a load cassette 15a in the chamber 2 rotates 180°, and places the sample on the sample rotary table 4 in the chamber 1 by the supporting member 9 on the opposite side. The sample is plasma etched under the reaction tube 6a. The mounting and dismounting operations of the sample can be 1/2 that in the prior art and the etching operation is carried out in a short time.
COPYRIGHT: (C)1982,JPO&Japio
JP11599780A 1980-08-25 1980-08-25 Sample mounting and dismounting device in plasma etching device or resembling device Pending JPS5741374A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11599780A JPS5741374A (en) 1980-08-25 1980-08-25 Sample mounting and dismounting device in plasma etching device or resembling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11599780A JPS5741374A (en) 1980-08-25 1980-08-25 Sample mounting and dismounting device in plasma etching device or resembling device

Publications (1)

Publication Number Publication Date
JPS5741374A true JPS5741374A (en) 1982-03-08

Family

ID=14676288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11599780A Pending JPS5741374A (en) 1980-08-25 1980-08-25 Sample mounting and dismounting device in plasma etching device or resembling device

Country Status (1)

Country Link
JP (1) JPS5741374A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61195048U (en) * 1985-05-24 1986-12-04
JPS62149891A (en) * 1985-12-24 1987-07-03 Tokuda Seisakusho Ltd Dry etching device
US4876724A (en) * 1988-04-29 1989-10-24 Toshiba America, Inc. Personal sound system
JPH10223606A (en) * 1997-01-31 1998-08-21 Shibaura Eng Works Co Ltd Resist ashing device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61195048U (en) * 1985-05-24 1986-12-04
JPS62149891A (en) * 1985-12-24 1987-07-03 Tokuda Seisakusho Ltd Dry etching device
US4876724A (en) * 1988-04-29 1989-10-24 Toshiba America, Inc. Personal sound system
JPH10223606A (en) * 1997-01-31 1998-08-21 Shibaura Eng Works Co Ltd Resist ashing device

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