JPS5745237A - Rotary processing device - Google Patents
Rotary processing deviceInfo
- Publication number
- JPS5745237A JPS5745237A JP55120762A JP12076280A JPS5745237A JP S5745237 A JPS5745237 A JP S5745237A JP 55120762 A JP55120762 A JP 55120762A JP 12076280 A JP12076280 A JP 12076280A JP S5745237 A JPS5745237 A JP S5745237A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processed
- side wall
- vessel
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To prevent the splashing back of the waste fluid used for processing on the substrate to be processed by a method wherein a flowing-water curtain, which flows down the whole surface of the side wall surrounding the circumference of a rotary stage. CONSTITUTION:The substrate 3 to be processed is retained on the rotary stage 4 having the vacuum attracting mechanism fixed on a rotating shaft, a cover plate 8 whereon a shower nozzle, which showers an etching solution 6 on the desired region of the substrate 3 to be processed at a desired angle, is located at the upper section of a cylindrical vessel 1 which is surrounding the substrate, a water container 12, having slits 11 on the whole circumference of the vessel 1, is provided on inside of the side wall of the vessel 1 and the junction part 9, pure water 14 is feeded from a water feeding tube 13 and a flowing-water curtain 15 is formed on the whole circumference of the side wall of the vessel 1 by jetting out the pure water from the slits 11. With the existence of the flowing-water curtain, the contamination of the substrate to be processed by the waste fluid of processing which was flung away by the substrate to be processed and aplashed back from the side wall can be prevented.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55120762A JPS5745237A (en) | 1980-09-01 | 1980-09-01 | Rotary processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55120762A JPS5745237A (en) | 1980-09-01 | 1980-09-01 | Rotary processing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5745237A true JPS5745237A (en) | 1982-03-15 |
Family
ID=14794356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55120762A Pending JPS5745237A (en) | 1980-09-01 | 1980-09-01 | Rotary processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5745237A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61183528U (en) * | 1985-05-09 | 1986-11-15 | ||
| JPS63187630A (en) * | 1987-01-30 | 1988-08-03 | Toshiba Corp | Liquid processor for semiconductor wafer |
| JPS645437U (en) * | 1987-06-26 | 1989-01-12 | ||
| JPH01156776U (en) * | 1988-04-20 | 1989-10-27 | ||
| CN117181692A (en) * | 2023-11-02 | 2023-12-08 | 泉州市锦溪九号光伏农业科技有限公司 | A device for treating surface dirt in park landscapes |
-
1980
- 1980-09-01 JP JP55120762A patent/JPS5745237A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61183528U (en) * | 1985-05-09 | 1986-11-15 | ||
| JPS63187630A (en) * | 1987-01-30 | 1988-08-03 | Toshiba Corp | Liquid processor for semiconductor wafer |
| JPS645437U (en) * | 1987-06-26 | 1989-01-12 | ||
| JPH01156776U (en) * | 1988-04-20 | 1989-10-27 | ||
| CN117181692A (en) * | 2023-11-02 | 2023-12-08 | 泉州市锦溪九号光伏农业科技有限公司 | A device for treating surface dirt in park landscapes |
| CN117181692B (en) * | 2023-11-02 | 2024-05-07 | 宁波恒凯科创股份有限公司 | Park view surface dirt processing apparatus |
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