JPS57501906A - - Google Patents
Info
- Publication number
- JPS57501906A JPS57501906A JP57500142A JP50014282A JPS57501906A JP S57501906 A JPS57501906 A JP S57501906A JP 57500142 A JP57500142 A JP 57500142A JP 50014282 A JP50014282 A JP 50014282A JP S57501906 A JPS57501906 A JP S57501906A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
- H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/214,171 US4346125A (en) | 1980-12-08 | 1980-12-08 | Removing hardened organic materials during fabrication of integrated circuits using anhydrous hydrazine solvent |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57501906A true JPS57501906A (de) | 1982-10-21 |
Family
ID=22798048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57500142A Pending JPS57501906A (de) | 1980-12-08 | 1981-11-20 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US4346125A (de) |
| EP (1) | EP0065977A4 (de) |
| JP (1) | JPS57501906A (de) |
| BE (1) | BE891335A (de) |
| CA (1) | CA1159577A (de) |
| GB (1) | GB2089125B (de) |
| IE (1) | IE52978B1 (de) |
| IT (1) | IT1139928B (de) |
| WO (1) | WO1982002116A1 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4514893A (en) * | 1983-04-29 | 1985-05-07 | At&T Bell Laboratories | Fabrication of FETs |
| US4606931A (en) * | 1983-06-27 | 1986-08-19 | International Business Machines Corporation | Lift-off masking method |
| US4639290A (en) * | 1985-12-09 | 1987-01-27 | Hughes Aircraft Company | Methods for selectively removing adhesives from polyimide substrates |
| DE69219998T2 (de) * | 1991-10-31 | 1997-12-18 | Sgs Thomson Microelectronics | Verfahren zur Entfernung von Polymeren aus Sacklöchern in Halbleitervorrichtungen |
| US6326130B1 (en) | 1993-10-07 | 2001-12-04 | Mallinckrodt Baker, Inc. | Photoresist strippers containing reducing agents to reduce metal corrosion |
| US5597983A (en) * | 1994-02-03 | 1997-01-28 | Sgs-Thomson Microelectronics, Inc. | Process of removing polymers in semiconductor vias |
| US5472539A (en) * | 1994-06-06 | 1995-12-05 | General Electric Company | Methods for forming and positioning moldable permanent magnets on electromagnetically actuated microfabricated components |
| US6103680A (en) * | 1998-12-31 | 2000-08-15 | Arch Specialty Chemicals, Inc. | Non-corrosive cleaning composition and method for removing photoresist and/or plasma etching residues |
| CN103842428B (zh) * | 2011-09-30 | 2016-06-08 | 陶氏环球技术有限责任公司 | 将聚氯乙烯与基于生物质的增塑剂混合的方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE627626A (de) * | 1962-01-26 | 1900-01-01 | ||
| FR2072172A5 (de) * | 1969-12-23 | 1971-09-24 | Ibm | |
| US3873361A (en) * | 1973-11-29 | 1975-03-25 | Ibm | Method of depositing thin film utilizing a lift-off mask |
| US4218283A (en) * | 1974-08-23 | 1980-08-19 | Hitachi, Ltd. | Method for fabricating semiconductor device and etchant for polymer resin |
| US4171240A (en) * | 1978-04-26 | 1979-10-16 | Western Electric Company, Inc. | Method of removing a cured epoxy from a metal surface |
| US4238528A (en) * | 1978-06-26 | 1980-12-09 | International Business Machines Corporation | Polyimide coating process and material |
| US4304681A (en) * | 1980-09-15 | 1981-12-08 | Shipley Company, Inc. | Novel stripping composition for positive photoresists and method of using same |
-
1980
- 1980-12-08 US US06/214,171 patent/US4346125A/en not_active Expired - Lifetime
-
1981
- 1981-11-20 EP EP19820900172 patent/EP0065977A4/de not_active Withdrawn
- 1981-11-20 WO PCT/US1981/001542 patent/WO1982002116A1/en not_active Ceased
- 1981-11-20 JP JP57500142A patent/JPS57501906A/ja active Pending
- 1981-11-24 CA CA000390813A patent/CA1159577A/en not_active Expired
- 1981-12-03 GB GB8136513A patent/GB2089125B/en not_active Expired
- 1981-12-03 BE BE0/206725A patent/BE891335A/fr not_active IP Right Cessation
- 1981-12-04 IT IT25474/81A patent/IT1139928B/it active
- 1981-12-07 IE IE2868/81A patent/IE52978B1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BE891335A (fr) | 1982-03-31 |
| IE812868L (en) | 1982-06-08 |
| IT1139928B (it) | 1986-09-24 |
| EP0065977A4 (de) | 1986-02-13 |
| GB2089125B (en) | 1984-11-28 |
| IT8125474A0 (it) | 1981-12-04 |
| GB2089125A (en) | 1982-06-16 |
| IE52978B1 (en) | 1988-04-27 |
| US4346125A (en) | 1982-08-24 |
| CA1159577A (en) | 1983-12-27 |
| WO1982002116A1 (en) | 1982-06-24 |
| EP0065977A1 (de) | 1982-12-08 |