JPS5763861A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5763861A JPS5763861A JP55139592A JP13959280A JPS5763861A JP S5763861 A JPS5763861 A JP S5763861A JP 55139592 A JP55139592 A JP 55139592A JP 13959280 A JP13959280 A JP 13959280A JP S5763861 A JPS5763861 A JP S5763861A
- Authority
- JP
- Japan
- Prior art keywords
- output terminal
- drain region
- drain
- voltage
- resistors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
Landscapes
- Amplifiers (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Protection Of Static Devices (AREA)
Abstract
PURPOSE:To obtain a CMOS-IC provided with an output terminal having a large rupture-resistance strength against surge by forming a drain region serving as the output terminal in extension and thereby giving a resisting component to the drain region. CONSTITUTION:P-N channel MOS transistors Tr1 and Tr2 are connected in series between power sources, with a gate made to be an input terminal. A resistor is formed by forming the drain region of the MOS transistors Tr1 and Tr2 slenderly and connection to the output terminal 1 is made through the intermediary of resistors R1 amd R2. PN junction formed between the drain and a substrate is made to be protection diodes D1 and D2. When surge voltage is impressed, the diodes D1 and D2 turn conductive and the voltage is also applied to the resistors R1 and R2. However, a time constant circuit is formed by a capacity component formed with the substrate and the voltage made gentle is thus applied to the drain, whereby the breakdown of the transistors is prevented.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55139592A JPS5763861A (en) | 1980-10-06 | 1980-10-06 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55139592A JPS5763861A (en) | 1980-10-06 | 1980-10-06 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5763861A true JPS5763861A (en) | 1982-04-17 |
Family
ID=15248854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55139592A Pending JPS5763861A (en) | 1980-10-06 | 1980-10-06 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5763861A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159363A (en) * | 1982-03-17 | 1983-09-21 | Nec Corp | Input/output protecting device for semiconductor integrated circuit |
| JPS60224259A (en) * | 1984-04-20 | 1985-11-08 | Hitachi Micro Comput Eng Ltd | Semiconductor integrated circuit device |
| JPS61156854A (en) * | 1984-12-28 | 1986-07-16 | Mitsubishi Electric Corp | Input protection circuit for cmos semiconductor device |
| JPS61176146A (en) * | 1985-01-31 | 1986-08-07 | Toshiba Corp | Semiconductor integrated circuit device |
| JPS63119251A (en) * | 1987-10-12 | 1988-05-23 | Nec Corp | C-MOS field effect transistor |
| US4825102A (en) * | 1986-09-11 | 1989-04-25 | Matsushita Electric Industrial Co., Ltd. | MOS FET drive circuit providing protection against transient voltage breakdown |
| US4845536A (en) * | 1983-12-22 | 1989-07-04 | Texas Instruments Incorporated | Transistor structure |
| JPH02256268A (en) * | 1989-03-29 | 1990-10-17 | Nec Corp | Cmos output buffer for semiconductor integrated circuit |
| US4990802A (en) * | 1988-11-22 | 1991-02-05 | At&T Bell Laboratories | ESD protection for output buffers |
-
1980
- 1980-10-06 JP JP55139592A patent/JPS5763861A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159363A (en) * | 1982-03-17 | 1983-09-21 | Nec Corp | Input/output protecting device for semiconductor integrated circuit |
| US4845536A (en) * | 1983-12-22 | 1989-07-04 | Texas Instruments Incorporated | Transistor structure |
| JPS60224259A (en) * | 1984-04-20 | 1985-11-08 | Hitachi Micro Comput Eng Ltd | Semiconductor integrated circuit device |
| JPS61156854A (en) * | 1984-12-28 | 1986-07-16 | Mitsubishi Electric Corp | Input protection circuit for cmos semiconductor device |
| JPS61176146A (en) * | 1985-01-31 | 1986-08-07 | Toshiba Corp | Semiconductor integrated circuit device |
| US4825102A (en) * | 1986-09-11 | 1989-04-25 | Matsushita Electric Industrial Co., Ltd. | MOS FET drive circuit providing protection against transient voltage breakdown |
| JPS63119251A (en) * | 1987-10-12 | 1988-05-23 | Nec Corp | C-MOS field effect transistor |
| US4990802A (en) * | 1988-11-22 | 1991-02-05 | At&T Bell Laboratories | ESD protection for output buffers |
| JPH02256268A (en) * | 1989-03-29 | 1990-10-17 | Nec Corp | Cmos output buffer for semiconductor integrated circuit |
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