JPS5768023A - Mask alignment device - Google Patents
Mask alignment deviceInfo
- Publication number
- JPS5768023A JPS5768023A JP55142891A JP14289180A JPS5768023A JP S5768023 A JPS5768023 A JP S5768023A JP 55142891 A JP55142891 A JP 55142891A JP 14289180 A JP14289180 A JP 14289180A JP S5768023 A JPS5768023 A JP S5768023A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- lens
- mask
- light
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain a pattern image having high resolution by superposing a light transmission photomask and a wafer coated with a photoresist and providing a device for detecting the light interference fringe produced between the mask and the wafer when the resist is photosensitized through the mask while controlling the relative position of the mask and the wafer. CONSTITUTION:A light condensing lens 1 and a focusing lens 2 are so disposed that the optical axes of the lenses cross perpendicularly, and a half mirror 3 inclined at 45 deg. with respect to the optical axis at the respective main surfaces are arranged at the crossing point of both the optical axes. Au exposure lamp 4 is disposed on the optical axis at the rear of the lens 1, and a film 5 is arranged at the rear of the lens 2. A wafer 7 placing a photomask 6 is disposed at the side where the light passes through the mirror 3. In this manner, the light from the lamp 4 is formed in a parallel beam via the lens 1, and is reflected on the mirror 3, and is exposed with the wafer 7 through the mask 6. At this time the interference fringe produced between the mask 6 and the wafer 7 is projected through the mirror 3 and the lens 2 on the film 5, and the intimate state can be known according to this state.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55142891A JPS5768023A (en) | 1980-10-15 | 1980-10-15 | Mask alignment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55142891A JPS5768023A (en) | 1980-10-15 | 1980-10-15 | Mask alignment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5768023A true JPS5768023A (en) | 1982-04-26 |
Family
ID=15325989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55142891A Pending JPS5768023A (en) | 1980-10-15 | 1980-10-15 | Mask alignment device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5768023A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0538193A (en) * | 1991-07-26 | 1993-02-12 | Tokyo Electric Co Ltd | Drive device for stepping motor |
-
1980
- 1980-10-15 JP JP55142891A patent/JPS5768023A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0538193A (en) * | 1991-07-26 | 1993-02-12 | Tokyo Electric Co Ltd | Drive device for stepping motor |
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