JPS5771132A - Exposure controlling system - Google Patents
Exposure controlling systemInfo
- Publication number
- JPS5771132A JPS5771132A JP55147090A JP14709080A JPS5771132A JP S5771132 A JPS5771132 A JP S5771132A JP 55147090 A JP55147090 A JP 55147090A JP 14709080 A JP14709080 A JP 14709080A JP S5771132 A JPS5771132 A JP S5771132A
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- output
- delay time
- counter
- action delay
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B7/00—Control of exposure by setting shutters, diaphragms or filters, separately or conjointly
- G03B7/08—Control effected solely on the basis of the response, to the intensity of the light received by the camera, of a built-in light-sensitive device
- G03B7/081—Analogue circuits
- G03B7/083—Analogue circuits for control of exposure time
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Exposure In Printing And Copying (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To control the quantity of expresure regardless of subject reflection or light source luminance by a method wherein the time for shutter closing signal generation is corrected by a certain number of pulses corresponding to the shutter action delay time. CONSTITUTION:A correcting timer 13 responding to a V/F converter 7 yields only the action delay time interval t2-t3 of a sutter 4. The timer 13 output and the converter 7 output are put into an AND circuit 15 and the number of pulses corresponding to the action delay time t2-t3 is determined in a counter 14. A total counter 8 output and the correcting counter 14 output are added at a point 16. The sum obtained at the point 16 is compared in a comparator 9 with a proper exposure value from an exposure setter 10. The output of the comparator 9 is transmitted through a shutter on/off director 11 and shutter driving circuit 12, resulting in a proper control of the shutter 4. This ensures that shutter closing signals t2 and t4 result in optimum exposure time periods t1-t2 and t1-t6 even when luminance is the maximum or half the maximum, causing no underexposure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55147090A JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55147090A JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62146377A Division JPS6323316A (en) | 1987-06-12 | 1987-06-12 | Exposure control method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5771132A true JPS5771132A (en) | 1982-05-01 |
| JPS6134252B2 JPS6134252B2 (en) | 1986-08-06 |
Family
ID=15422241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55147090A Granted JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5771132A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4512657A (en) * | 1982-09-20 | 1985-04-23 | Nippon Kogaku K.K. | Exposure control system |
| JPS60198726A (en) * | 1984-03-23 | 1985-10-08 | Hitachi Ltd | Method and apparatus for adjusting quantity of exposure of x-ray exposure device |
| JPS61154128A (en) * | 1984-12-27 | 1986-07-12 | Canon Inc | exposure equipment |
| JPH01132124A (en) * | 1987-08-28 | 1989-05-24 | Teru Kyushu Kk | Exposure method and apparatus thereof |
| JPH02125420A (en) * | 1988-11-04 | 1990-05-14 | Ushio Inc | Exposure amount control system for wafer periphery exposure |
| US8223317B2 (en) | 2006-12-15 | 2012-07-17 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method controlling shutter based on intensity of reflected light |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5100088B2 (en) * | 2006-11-07 | 2012-12-19 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
| JP5173650B2 (en) | 2008-07-29 | 2013-04-03 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3200723A (en) * | 1963-03-29 | 1965-08-17 | Polaroid Corp | Shutter timing apparatus |
| US4021822A (en) * | 1972-12-30 | 1977-05-03 | Minolta Camera Kabushiki Kaisha | Electrically controlled shutter |
-
1980
- 1980-10-21 JP JP55147090A patent/JPS5771132A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3200723A (en) * | 1963-03-29 | 1965-08-17 | Polaroid Corp | Shutter timing apparatus |
| US4021822A (en) * | 1972-12-30 | 1977-05-03 | Minolta Camera Kabushiki Kaisha | Electrically controlled shutter |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4512657A (en) * | 1982-09-20 | 1985-04-23 | Nippon Kogaku K.K. | Exposure control system |
| JPS60198726A (en) * | 1984-03-23 | 1985-10-08 | Hitachi Ltd | Method and apparatus for adjusting quantity of exposure of x-ray exposure device |
| JPS61154128A (en) * | 1984-12-27 | 1986-07-12 | Canon Inc | exposure equipment |
| JPH01132124A (en) * | 1987-08-28 | 1989-05-24 | Teru Kyushu Kk | Exposure method and apparatus thereof |
| JPH02125420A (en) * | 1988-11-04 | 1990-05-14 | Ushio Inc | Exposure amount control system for wafer periphery exposure |
| US8223317B2 (en) | 2006-12-15 | 2012-07-17 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method controlling shutter based on intensity of reflected light |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6134252B2 (en) | 1986-08-06 |
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