JPS5772387A - Junction type field-effect semiconductor device - Google Patents
Junction type field-effect semiconductor deviceInfo
- Publication number
- JPS5772387A JPS5772387A JP55148311A JP14831180A JPS5772387A JP S5772387 A JPS5772387 A JP S5772387A JP 55148311 A JP55148311 A JP 55148311A JP 14831180 A JP14831180 A JP 14831180A JP S5772387 A JPS5772387 A JP S5772387A
- Authority
- JP
- Japan
- Prior art keywords
- region
- drain region
- section
- type
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/83—FETs having PN junction gate electrodes
Landscapes
- Formation Of Insulating Films (AREA)
- Bipolar Integrated Circuits (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To prevent the formation of an inversion layer on the surface of a drain region by dividing a wiring material layer formed on the surface of an insulating layer of a gate region and electrically floating a section which overlaps on the drain region. CONSTITUTION:A P<+> type source region 2 and the drain region 3 are shaped to an N type semiconductor layer 1, a P type channel region 4 is buried between both regions, and the N type first gate region 5 is formed on the channel region. Here, the wiring material layer 10 is shaped on the surface of a gate oxide film 9 in a two divided form, and the section 10b overlapping on the drain region 3 is used under an electrically floated condition. According to such constitution, there happens no potential difference under the section overlapping on the drain region 3, and the surface of the drain region is not inverted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55148311A JPS5772387A (en) | 1980-10-24 | 1980-10-24 | Junction type field-effect semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55148311A JPS5772387A (en) | 1980-10-24 | 1980-10-24 | Junction type field-effect semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5772387A true JPS5772387A (en) | 1982-05-06 |
| JPH0116028B2 JPH0116028B2 (en) | 1989-03-22 |
Family
ID=15449945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55148311A Granted JPS5772387A (en) | 1980-10-24 | 1980-10-24 | Junction type field-effect semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5772387A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5147371A (en) * | 1974-10-21 | 1976-04-22 | Fujitsu Ltd | Handotaisochi |
-
1980
- 1980-10-24 JP JP55148311A patent/JPS5772387A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5147371A (en) * | 1974-10-21 | 1976-04-22 | Fujitsu Ltd | Handotaisochi |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0116028B2 (en) | 1989-03-22 |
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