JPS5773178A - Production of oxide - Google Patents

Production of oxide

Info

Publication number
JPS5773178A
JPS5773178A JP55147542A JP14754280A JPS5773178A JP S5773178 A JPS5773178 A JP S5773178A JP 55147542 A JP55147542 A JP 55147542A JP 14754280 A JP14754280 A JP 14754280A JP S5773178 A JPS5773178 A JP S5773178A
Authority
JP
Japan
Prior art keywords
high frequency
gaseous
al2o3
vessel
electric power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55147542A
Other languages
Japanese (ja)
Inventor
Takanori Kaizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55147542A priority Critical patent/JPS5773178A/en
Publication of JPS5773178A publication Critical patent/JPS5773178A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To obtain oxide films efficiently without degradation in film quality by mixing gaseous ozone in an oxidizing atmosphere in producing oxide by a vapor phase thin film production techinque. CONSTITUTION:In the case of producing, for example, Al2O3 by a kind of high frequency ion plating method of a chemical vapor deposition method, a gas consisting of mixing ozone with gaseous oxygen are introduded through piping 2 into the vessel of its device 1. A substrate 3 is supported on the support table 4 in the vessel, and a crucible 9 evaporates Al with an electric power source 7 for evaporation. Said gaseous O2+O3 are excited by a high frequency coil 5 applied with high frequency electric power, by which they are turned to plasma. This is ionized and reacts with Al, by which Al2O3 is produced and deposits on the surface of the substrate 3. The growth rate of this time is improved considerably on account of the active effect of the O3.
JP55147542A 1980-10-23 1980-10-23 Production of oxide Pending JPS5773178A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55147542A JPS5773178A (en) 1980-10-23 1980-10-23 Production of oxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55147542A JPS5773178A (en) 1980-10-23 1980-10-23 Production of oxide

Publications (1)

Publication Number Publication Date
JPS5773178A true JPS5773178A (en) 1982-05-07

Family

ID=15432669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55147542A Pending JPS5773178A (en) 1980-10-23 1980-10-23 Production of oxide

Country Status (1)

Country Link
JP (1) JPS5773178A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01189135A (en) * 1988-01-25 1989-07-28 Fujitsu Ltd Vapor growth method
US4965244A (en) * 1988-09-19 1990-10-23 Regents Of The University Of Minnesota CaF2 passivation layers for high temperature superconductors
US5032568A (en) * 1989-09-01 1991-07-16 Regents Of The University Of Minnesota Deposition of superconducting thick films by spray inductively coupled plasma method
US5039657A (en) * 1988-08-19 1991-08-13 Regents Of The University Of Minnesota Preparation of superconducting oxide films by reactive evaporation using ozone
US5158931A (en) * 1988-03-16 1992-10-27 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
US5196379A (en) * 1988-09-19 1993-03-23 Regents Of The University Of Minneapolis Method of depositing oxide passivation layers on high temperature superconductors
US5879823A (en) * 1995-12-12 1999-03-09 Kennametal Inc. Coated cutting tool
JP2009526873A (en) * 2006-02-14 2009-07-23 エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツング Dark metal effect pigments produced by the PVD process

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01189135A (en) * 1988-01-25 1989-07-28 Fujitsu Ltd Vapor growth method
US5158931A (en) * 1988-03-16 1992-10-27 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
US5284824A (en) * 1988-03-16 1994-02-08 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
US5039657A (en) * 1988-08-19 1991-08-13 Regents Of The University Of Minnesota Preparation of superconducting oxide films by reactive evaporation using ozone
US4965244A (en) * 1988-09-19 1990-10-23 Regents Of The University Of Minnesota CaF2 passivation layers for high temperature superconductors
US5196379A (en) * 1988-09-19 1993-03-23 Regents Of The University Of Minneapolis Method of depositing oxide passivation layers on high temperature superconductors
US5032568A (en) * 1989-09-01 1991-07-16 Regents Of The University Of Minnesota Deposition of superconducting thick films by spray inductively coupled plasma method
US5879823A (en) * 1995-12-12 1999-03-09 Kennametal Inc. Coated cutting tool
JP2009526873A (en) * 2006-02-14 2009-07-23 エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツング Dark metal effect pigments produced by the PVD process
US9127169B2 (en) 2006-02-14 2015-09-08 Eckart Gmbh Dark metal effect pigments produced by means of a physical vapour deposition (PVD) method

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