JPS5773938A - Correcting apparatus for electron beam rotation on electro optical mirror - Google Patents
Correcting apparatus for electron beam rotation on electro optical mirrorInfo
- Publication number
- JPS5773938A JPS5773938A JP55150982A JP15098280A JPS5773938A JP S5773938 A JPS5773938 A JP S5773938A JP 55150982 A JP55150982 A JP 55150982A JP 15098280 A JP15098280 A JP 15098280A JP S5773938 A JPS5773938 A JP S5773938A
- Authority
- JP
- Japan
- Prior art keywords
- rotation
- angle
- electric current
- rotation angle
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To detect and correct the directions of rotation against an axis of deflection of a beam in short time by detecting, memorizing and calculating the deviations in electric current values of form shaped beam crossing a cross-wire caused by the deflecting distances of the beam and rotation angles. CONSTITUTION:A cross-wire 2 is arranged to match with the axis of deflection of beam and a form shaped beam 1 is deflected and made to scan in the direction (x). Electric current reaching at a Farady cup 3 is detected as a signal. This signal is amplified and passed through differentiators 5 and 6 to obtain deviation characteristic of elctric current density distribution at beam scanning. A peak value IP6 of the obtained deviation characteristics is sent to a differntiator 8 as well as angle information from a rotation correction circyit 9, and is differentiated to the rotation angle. The above process is repeated by changing the rotation angle of the beam 1 little by little, and a correlation curve expressing degree of deviation of IP6 against roation angle theta is put into a memory 7. An electric current value (Error in angle is zero) of a coil 10 when this curve shows the maximum value or the minimum value is detected, and rotation angle is corrected. By this method, detection and correction can be done highly sensitively even if the beam edge is irregular.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55150982A JPS5773938A (en) | 1980-10-28 | 1980-10-28 | Correcting apparatus for electron beam rotation on electro optical mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55150982A JPS5773938A (en) | 1980-10-28 | 1980-10-28 | Correcting apparatus for electron beam rotation on electro optical mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5773938A true JPS5773938A (en) | 1982-05-08 |
Family
ID=15508694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55150982A Pending JPS5773938A (en) | 1980-10-28 | 1980-10-28 | Correcting apparatus for electron beam rotation on electro optical mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5773938A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5922326A (en) * | 1982-07-28 | 1984-02-04 | Hitachi Ltd | Electron beam exposure device |
| JPS59181019A (en) * | 1983-03-30 | 1984-10-15 | Fujitsu Ltd | Electron beam exposure device |
-
1980
- 1980-10-28 JP JP55150982A patent/JPS5773938A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5922326A (en) * | 1982-07-28 | 1984-02-04 | Hitachi Ltd | Electron beam exposure device |
| JPS59181019A (en) * | 1983-03-30 | 1984-10-15 | Fujitsu Ltd | Electron beam exposure device |
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