JPS5778414A - Production of urethane acrylate oligomer or urethane methacrylate oligomer and photopolymer composition therefrom - Google Patents

Production of urethane acrylate oligomer or urethane methacrylate oligomer and photopolymer composition therefrom

Info

Publication number
JPS5778414A
JPS5778414A JP55154056A JP15405680A JPS5778414A JP S5778414 A JPS5778414 A JP S5778414A JP 55154056 A JP55154056 A JP 55154056A JP 15405680 A JP15405680 A JP 15405680A JP S5778414 A JPS5778414 A JP S5778414A
Authority
JP
Japan
Prior art keywords
oligomer
urethane
glycol
acrylate
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55154056A
Other languages
Japanese (ja)
Inventor
Shigeru Koibuchi
Asao Isobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP55154056A priority Critical patent/JPS5778414A/en
Publication of JPS5778414A publication Critical patent/JPS5778414A/en
Pending legal-status Critical Current

Links

Landscapes

  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

PURPOSE: To produce a urethane (meth)acrylate oligomer suitable of form protective films resistant to cold shock, by reacting, in turn, a polyisocyanate and an OH- containing (meth)acrylate, with a glycol.
CONSTITUTION: A glycol, polyethylene glycol, polybutadiene glycol or a glycol/ acrylonitrile copolymer is reacted with a polyisocyanate, e.g., isophorone diisocyanate, and then reacted with an OH-containing (meth)acrylate, e.g., 2-hydroxyethyl acrylate. Each reaction is carried out in an organic solvent such as toluene at about 5W150°C for about 30minW6hr. The produced oligomer is formed into a photopolymer composition by adding about 1W10pts.wt. sensitizer, e.g., benzoquinone, to 100pts.wt. oligomer.
COPYRIGHT: (C)1982,JPO&Japio
JP55154056A 1980-10-31 1980-10-31 Production of urethane acrylate oligomer or urethane methacrylate oligomer and photopolymer composition therefrom Pending JPS5778414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55154056A JPS5778414A (en) 1980-10-31 1980-10-31 Production of urethane acrylate oligomer or urethane methacrylate oligomer and photopolymer composition therefrom

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55154056A JPS5778414A (en) 1980-10-31 1980-10-31 Production of urethane acrylate oligomer or urethane methacrylate oligomer and photopolymer composition therefrom

Publications (1)

Publication Number Publication Date
JPS5778414A true JPS5778414A (en) 1982-05-17

Family

ID=15575939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55154056A Pending JPS5778414A (en) 1980-10-31 1980-10-31 Production of urethane acrylate oligomer or urethane methacrylate oligomer and photopolymer composition therefrom

Country Status (1)

Country Link
JP (1) JPS5778414A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60101532A (en) * 1983-11-09 1985-06-05 Nippon Soda Co Ltd Resist resin composition for use in plating
JPS627714A (en) * 1985-03-29 1987-01-14 Japan Synthetic Rubber Co Ltd Ultraviolet-curable resin composition and coated optical fiber
JPH0222320A (en) * 1988-07-11 1990-01-25 Toagosei Chem Ind Co Ltd Photo-setting composition
CN102516486A (en) * 2011-10-19 2012-06-27 常州市宝丽胶粘剂有限公司 Preparation method of acrylate oligomer and polyurethane copolymerization emulsion pressure-sensitive adhesive for liquid crystal protection film
JP2015108083A (en) * 2013-12-05 2015-06-11 日本化薬株式会社 Resin composition
JPWO2015190560A1 (en) * 2014-06-11 2017-04-20 日本化薬株式会社 UV curable adhesive composition for touch panel and article
CN113583211A (en) * 2021-07-30 2021-11-02 浙江大学 Polyurea acrylate oligomer and preparation method and application method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60101532A (en) * 1983-11-09 1985-06-05 Nippon Soda Co Ltd Resist resin composition for use in plating
JPS627714A (en) * 1985-03-29 1987-01-14 Japan Synthetic Rubber Co Ltd Ultraviolet-curable resin composition and coated optical fiber
JPH0222320A (en) * 1988-07-11 1990-01-25 Toagosei Chem Ind Co Ltd Photo-setting composition
CN102516486A (en) * 2011-10-19 2012-06-27 常州市宝丽胶粘剂有限公司 Preparation method of acrylate oligomer and polyurethane copolymerization emulsion pressure-sensitive adhesive for liquid crystal protection film
JP2015108083A (en) * 2013-12-05 2015-06-11 日本化薬株式会社 Resin composition
WO2015083795A1 (en) * 2013-12-05 2015-06-11 日本化薬株式会社 Polyurethane compound, photosensitive resin composition, method for producing photosensitive resin composition, and cured product
JPWO2015190560A1 (en) * 2014-06-11 2017-04-20 日本化薬株式会社 UV curable adhesive composition for touch panel and article
CN113583211A (en) * 2021-07-30 2021-11-02 浙江大学 Polyurea acrylate oligomer and preparation method and application method thereof

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