JPS5786830A - Pattern forming material - Google Patents

Pattern forming material

Info

Publication number
JPS5786830A
JPS5786830A JP16360280A JP16360280A JPS5786830A JP S5786830 A JPS5786830 A JP S5786830A JP 16360280 A JP16360280 A JP 16360280A JP 16360280 A JP16360280 A JP 16360280A JP S5786830 A JPS5786830 A JP S5786830A
Authority
JP
Japan
Prior art keywords
average molecular
molecular weight
superior
resolution
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16360280A
Other languages
Japanese (ja)
Other versions
JPH0145610B2 (en
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16360280A priority Critical patent/JPS5786830A/en
Publication of JPS5786830A publication Critical patent/JPS5786830A/en
Publication of JPH0145610B2 publication Critical patent/JPH0145610B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain a negative resist for use in ionizing radiation superior in dry etching resistance, resolution, and photosensitivity, by using an azide compound for a novolak type phenol resin having a weight average molecular weight not below a specified value and a dispersion digree not above a specified value. CONSTITUTION:An azide compound, such as p-azidebenzaldehyde is added to s novolak resin having >=1.5X10<4> weight average molecular weight (Mw) and <=3 dispersion degree, that is, Mw/number average molecular weight (Mn) and represented by the formula, R being H, 1-5C alkyl, or phenyl, in 2-20wt% based on the novolak resin. A solution of this mixture is coated on a silicon wafer or the like, dried, prebaked, patternwise irradiated with electron beams or the like, and developed with a mixture of butyl acetate and monochlorobenzene, or the like to form a resist pattern. The obtained resist pattern is superior in resolution and dry etching resistance, and suitable for use in IC, LSI, etc..
JP16360280A 1980-11-20 1980-11-20 Pattern forming material Granted JPS5786830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16360280A JPS5786830A (en) 1980-11-20 1980-11-20 Pattern forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16360280A JPS5786830A (en) 1980-11-20 1980-11-20 Pattern forming material

Publications (2)

Publication Number Publication Date
JPS5786830A true JPS5786830A (en) 1982-05-31
JPH0145610B2 JPH0145610B2 (en) 1989-10-04

Family

ID=15777038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16360280A Granted JPS5786830A (en) 1980-11-20 1980-11-20 Pattern forming material

Country Status (1)

Country Link
JP (1) JPS5786830A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189739A (en) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPH03200251A (en) * 1989-12-28 1991-09-02 Nippon Zeon Co Ltd Positive resist composition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5074427A (en) * 1973-10-23 1975-06-19
JPS53130747A (en) * 1977-04-20 1978-11-15 Oji Paper Co Photosensitine composition
JPS53145702A (en) * 1977-05-23 1978-12-19 Oji Paper Co Photosensitive lithographic printing plate material
JPS54155826A (en) * 1978-05-23 1979-12-08 Western Electric Co Method of producing radiation sensitive resist and product therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5074427A (en) * 1973-10-23 1975-06-19
JPS53130747A (en) * 1977-04-20 1978-11-15 Oji Paper Co Photosensitine composition
JPS53145702A (en) * 1977-05-23 1978-12-19 Oji Paper Co Photosensitive lithographic printing plate material
JPS54155826A (en) * 1978-05-23 1979-12-08 Western Electric Co Method of producing radiation sensitive resist and product therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189739A (en) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPH03200251A (en) * 1989-12-28 1991-09-02 Nippon Zeon Co Ltd Positive resist composition

Also Published As

Publication number Publication date
JPH0145610B2 (en) 1989-10-04

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