JPS5790941A - Swing type vertical washer - Google Patents

Swing type vertical washer

Info

Publication number
JPS5790941A
JPS5790941A JP55166927A JP16692780A JPS5790941A JP S5790941 A JPS5790941 A JP S5790941A JP 55166927 A JP55166927 A JP 55166927A JP 16692780 A JP16692780 A JP 16692780A JP S5790941 A JPS5790941 A JP S5790941A
Authority
JP
Japan
Prior art keywords
brush
wafer
washed
rotatory
backing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55166927A
Other languages
Japanese (ja)
Inventor
Noriaki Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55166927A priority Critical patent/JPS5790941A/en
Publication of JPS5790941A publication Critical patent/JPS5790941A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/36—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis orthogonal to the surface

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To uniformalize washing while shortening treating time by composing the device of a rotatory means turning a material to be washed, a rotatory brush vertically contacting with a washing surface, a motor rotating the brush and a driving mechanism advancing and backing the brush in the diameterial direction of the material to be washed. CONSTITUTION:An adsorbing chuck 11, a nose section thereof is opened in a trumpet-shaped form, is fitted to a shaft 10, a semiconductor wafer 12 as the material to be washed is placed on the chuck 11, a hollow inside of the shaft 10 is brought to a decompression conditin, and the wafer 12 is fixed. The rotatory brush 13 is disposed onto the surface of the wafer 12, a brush 13a attached to the nose section is vertically contacted with the surface of the wafer 12, and the brush 13 is turned by means of the motor 14. Oscillating motion is generated at the brush 13 by using the driving mechanism 15, and the brush 13a is advanced and backed on the surface of the wafer 12. The oscillating action of the brush 13 is controlled so that the speed of advance and backing is maximum at a central section of the wafer 12 and ais minimum in an outer circumferential section at that time.
JP55166927A 1980-11-27 1980-11-27 Swing type vertical washer Pending JPS5790941A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55166927A JPS5790941A (en) 1980-11-27 1980-11-27 Swing type vertical washer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55166927A JPS5790941A (en) 1980-11-27 1980-11-27 Swing type vertical washer

Publications (1)

Publication Number Publication Date
JPS5790941A true JPS5790941A (en) 1982-06-05

Family

ID=15840232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55166927A Pending JPS5790941A (en) 1980-11-27 1980-11-27 Swing type vertical washer

Country Status (1)

Country Link
JP (1) JPS5790941A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131460A (en) * 1984-11-30 1986-06-19 Canon Inc Wafer cleaning device
JPH02109333A (en) * 1988-10-18 1990-04-23 Tokyo Electron Ltd Cleaning device
US4935981A (en) * 1988-01-06 1990-06-26 Dainippon Screen Mfg. Co., Ltd. Cleaning apparatus having a contact buffer apparatus
JPH0641131U (en) * 1993-10-01 1994-05-31 大日本スクリーン製造株式会社 Substrate cleaning equipment
JPH0774134A (en) * 1994-07-19 1995-03-17 Dainippon Screen Mfg Co Ltd Substrate washing method and substrate washer
JPH07169725A (en) * 1994-07-21 1995-07-04 Dainippon Screen Mfg Co Ltd Substrate cleaning equipment
US5518542A (en) * 1993-11-05 1996-05-21 Tokyo Electron Limited Double-sided substrate cleaning apparatus
JP2006189151A (en) * 2004-12-06 2006-07-20 Kobayashi Seisakusho:Kk Damper
CN103028560A (en) * 2011-10-10 2013-04-10 光达光电设备科技（嘉兴）有限公司 Spray head washing device
GB2496306B (en) * 2011-10-31 2018-08-08 Karsten Mfg Corp Adjustable length golf clubs and methods of manufacturing adjustable length golf clubs

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216163A (en) * 1975-07-30 1977-02-07 Hitachi Ltd Waste removal method
JPS5371565A (en) * 1976-12-08 1978-06-26 Hitachi Ltd Reticule washing equipment
JPS5487168A (en) * 1977-12-23 1979-07-11 Hitachi Ltd Manufacture for semiconductor device and its unit
JPS54125981A (en) * 1978-03-23 1979-09-29 Nec Corp Semiconductor washing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216163A (en) * 1975-07-30 1977-02-07 Hitachi Ltd Waste removal method
JPS5371565A (en) * 1976-12-08 1978-06-26 Hitachi Ltd Reticule washing equipment
JPS5487168A (en) * 1977-12-23 1979-07-11 Hitachi Ltd Manufacture for semiconductor device and its unit
JPS54125981A (en) * 1978-03-23 1979-09-29 Nec Corp Semiconductor washing device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131460A (en) * 1984-11-30 1986-06-19 Canon Inc Wafer cleaning device
US4935981A (en) * 1988-01-06 1990-06-26 Dainippon Screen Mfg. Co., Ltd. Cleaning apparatus having a contact buffer apparatus
JPH02109333A (en) * 1988-10-18 1990-04-23 Tokyo Electron Ltd Cleaning device
JPH0641131U (en) * 1993-10-01 1994-05-31 大日本スクリーン製造株式会社 Substrate cleaning equipment
US5518542A (en) * 1993-11-05 1996-05-21 Tokyo Electron Limited Double-sided substrate cleaning apparatus
JPH0774134A (en) * 1994-07-19 1995-03-17 Dainippon Screen Mfg Co Ltd Substrate washing method and substrate washer
JPH07169725A (en) * 1994-07-21 1995-07-04 Dainippon Screen Mfg Co Ltd Substrate cleaning equipment
JP2006189151A (en) * 2004-12-06 2006-07-20 Kobayashi Seisakusho:Kk Damper
CN103028560A (en) * 2011-10-10 2013-04-10 光达光电设备科技（嘉兴）有限公司 Spray head washing device
GB2496306B (en) * 2011-10-31 2018-08-08 Karsten Mfg Corp Adjustable length golf clubs and methods of manufacturing adjustable length golf clubs

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