JPS5790988A - Semiconductor light emitting element - Google Patents
Semiconductor light emitting elementInfo
- Publication number
- JPS5790988A JPS5790988A JP16766980A JP16766980A JPS5790988A JP S5790988 A JPS5790988 A JP S5790988A JP 16766980 A JP16766980 A JP 16766980A JP 16766980 A JP16766980 A JP 16766980A JP S5790988 A JPS5790988 A JP S5790988A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- current
- connection
- light emitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
Landscapes
- Led Devices (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To converge the current efficiently in a semiconductor light emitting element to achieve its low threshold current of oscillation by a method wherein an inner fringe is built in a clad layer at a connection layer side of a light emitting element of a double hetero-structure and thereon a large width of a connection use fringe is superimposed. CONSTITUTION:A P type Ga0.65Al0.35As2, GaAs active layer 3, an N type Ga0.65 Al0.35As 4 and an N type GaAs 5 are laminated on a P type GaAs layer 1. SiO2 mask 7 is applied on the layer 5 and a Zn diffusion layer 6 is formed to form a P type current converging area 8 is provided, and thereby a difference of the Zn diffusion rate occurs according to the difference Al mixed crystal ratio in layers 3 and 4, so that the inner fringe 8 appears in the layer 3, and a connecting section 9 of the large width is constituted inside the layer 5. The SiO2 mask 7 is removed, and metal electrodes 10 and 11 are deposited. Thus, the electrode 10 is sufficiently adhered to the N type connection layer 4, and also the connection of low resistance is gained. With this construction, current can be efficiently converged with the help of a simple fabrication, and a laser which can oscillate at a low threshold current.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16766980A JPS5790988A (en) | 1980-11-27 | 1980-11-27 | Semiconductor light emitting element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16766980A JPS5790988A (en) | 1980-11-27 | 1980-11-27 | Semiconductor light emitting element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5790988A true JPS5790988A (en) | 1982-06-05 |
Family
ID=15854020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16766980A Pending JPS5790988A (en) | 1980-11-27 | 1980-11-27 | Semiconductor light emitting element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5790988A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS599991A (en) * | 1982-07-07 | 1984-01-19 | Mitsubishi Electric Corp | Semiconductor laser device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50151486A (en) * | 1974-05-27 | 1975-12-05 | ||
| JPS5373089A (en) * | 1976-12-13 | 1978-06-29 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser device |
-
1980
- 1980-11-27 JP JP16766980A patent/JPS5790988A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50151486A (en) * | 1974-05-27 | 1975-12-05 | ||
| JPS5373089A (en) * | 1976-12-13 | 1978-06-29 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS599991A (en) * | 1982-07-07 | 1984-01-19 | Mitsubishi Electric Corp | Semiconductor laser device |
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