JPS5792023A - Electron radiation curing composition - Google Patents
Electron radiation curing compositionInfo
- Publication number
- JPS5792023A JPS5792023A JP16871880A JP16871880A JPS5792023A JP S5792023 A JPS5792023 A JP S5792023A JP 16871880 A JP16871880 A JP 16871880A JP 16871880 A JP16871880 A JP 16871880A JP S5792023 A JPS5792023 A JP S5792023A
- Authority
- JP
- Japan
- Prior art keywords
- lewis acid
- group
- aromatic
- formula
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003847 radiation curing Methods 0.000 title 1
- 239000002841 Lewis acid Substances 0.000 abstract 4
- 125000003118 aryl group Chemical group 0.000 abstract 4
- 150000007517 lewis acids Chemical class 0.000 abstract 4
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 150000002367 halogens Chemical class 0.000 abstract 3
- 239000004593 Epoxy Substances 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 125000003545 alkoxy group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 125000003700 epoxy group Chemical group 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 150000001282 organosilanes Chemical class 0.000 abstract 2
- 239000002243 precursor Substances 0.000 abstract 2
- -1 γ-glycidoxypropyl Chemical group 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 125000004423 acyloxy group Chemical group 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 230000001588 bifunctional effect Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- OTGHWLKHGCENJV-UHFFFAOYSA-N glycidic acid Chemical compound OC(=O)C1CO1 OTGHWLKHGCENJV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 239000000976 ink Substances 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 229910052723 transition metal Inorganic materials 0.000 abstract 1
- 150000003624 transition metals Chemical class 0.000 abstract 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: The titled composition, consisting of an epoxy compound, an organosilane having an epoxy group and a hydrolyzable group and a precursor for a Lewis acid capable of generating the Lewis acid by the irradiation with electron rays, and having improved adhesive property to a base material, e.g. a paper, plastic, wooden board, etc.
CONSTITUTION: 100pts.wt. epoxy compound, e.g. glycidic acid (ester) of formulaI(R1, R2, R3 and R4 are alkyl, aryl, alkoxyl or alkenyl groups or hydrogen), is kneaded with 0.1W10pts.wt. organosilane, e.g. (γ-glycidoxypropyl) trimethoxysilane, having an epoxy group and one or more halogens directly linked to the silicon atom and hydrolyzable group, e.g. alkoxyl or acyloxy groups, and 0.1W15pts.wt., preferably 3W5pts.wt. in the case of formula II, precursor for a Lewis acid, e.g. an aromatic halonium salt of formula II (R is monofunctional aromatic group; R1 is a bifunctional aromatic group; X and X1 are halogens; M is a transition metal; a is 0 or 2; b is 0 or 1; c=d-e; e<d≤ 8; e is 2W7) or aromatic diazonium compound of formula III (X1, d, e and M are the same as described above; Y is nitro, halogen, etc.), capable of generating the Lewis acid by the irradiation with electron rays, and adjusted to a viscosity of 0.01W100 poises to give the aimed composition.
USE: A coating material, adhesive, ink, etc.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16871880A JPS5792023A (en) | 1980-11-29 | 1980-11-29 | Electron radiation curing composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16871880A JPS5792023A (en) | 1980-11-29 | 1980-11-29 | Electron radiation curing composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5792023A true JPS5792023A (en) | 1982-06-08 |
Family
ID=15873150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16871880A Pending JPS5792023A (en) | 1980-11-29 | 1980-11-29 | Electron radiation curing composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5792023A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998039390A1 (en) * | 1997-03-07 | 1998-09-11 | The Walman Optical Company | Uv-curable abrasion-resistant coating composition |
-
1980
- 1980-11-29 JP JP16871880A patent/JPS5792023A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998039390A1 (en) * | 1997-03-07 | 1998-09-11 | The Walman Optical Company | Uv-curable abrasion-resistant coating composition |
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