JPS5792832A - Data process system of electron beam exposing device - Google Patents

Data process system of electron beam exposing device

Info

Publication number
JPS5792832A
JPS5792832A JP55169293A JP16929380A JPS5792832A JP S5792832 A JPS5792832 A JP S5792832A JP 55169293 A JP55169293 A JP 55169293A JP 16929380 A JP16929380 A JP 16929380A JP S5792832 A JPS5792832 A JP S5792832A
Authority
JP
Japan
Prior art keywords
data
circuits
circuit
exposure
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55169293A
Other languages
Japanese (ja)
Other versions
JPS632139B2 (en
Inventor
Akinori Shibayama
Tsuneo Okubo
Akihira Fujinami
Haruo Yoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP55169293A priority Critical patent/JPS5792832A/en
Publication of JPS5792832A publication Critical patent/JPS5792832A/en
Publication of JPS632139B2 publication Critical patent/JPS632139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable to make a data process system of electron beam exposing device to have the sufficient faculty to check digital circuits without help of manufal work by a method wherein check of the data process circuits is enabled to be performed at any time by a computer for control of exposure. CONSTITUTION:Data for control of exposure or data for test of circuit is sent out from the computor 2 for control of exposure. When the data is a data for test of circuit, outputs resulted from process of data thereof in respective digital circuits 3A-3C are stored in respective memory circuits 10A-10C. Because the computor 2 stores previously the results obtained by process of data for test of circuit by the respective digital circuits, memories related to the circuits 10A- 10C are read out at any time to compare both, and normality of operation of the respective digital circuits can be checked from the results thereof. When both do not coincide, by judging from which circuit out of the circuits 10A-10C is non- coinciding data read out, the matter of which digital circuit is abnormal can be checked.
JP55169293A 1980-12-01 1980-12-01 Data process system of electron beam exposing device Granted JPS5792832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55169293A JPS5792832A (en) 1980-12-01 1980-12-01 Data process system of electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55169293A JPS5792832A (en) 1980-12-01 1980-12-01 Data process system of electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS5792832A true JPS5792832A (en) 1982-06-09
JPS632139B2 JPS632139B2 (en) 1988-01-18

Family

ID=15883824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55169293A Granted JPS5792832A (en) 1980-12-01 1980-12-01 Data process system of electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS5792832A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113220A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Apparatus for electron beam exposure
JPS60107832A (en) * 1983-11-17 1985-06-13 Hitachi Ltd Electron-ray drawing device
JP2010034378A (en) * 2008-07-30 2010-02-12 Nuflare Technology Inc Charged particle beam drawing device, and method of diagnosing dac amplifier unit of charged particle beam drawing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017739A (en) * 1973-05-11 1975-02-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017739A (en) * 1973-05-11 1975-02-25

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113220A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Apparatus for electron beam exposure
JPS60107832A (en) * 1983-11-17 1985-06-13 Hitachi Ltd Electron-ray drawing device
JP2010034378A (en) * 2008-07-30 2010-02-12 Nuflare Technology Inc Charged particle beam drawing device, and method of diagnosing dac amplifier unit of charged particle beam drawing device

Also Published As

Publication number Publication date
JPS632139B2 (en) 1988-01-18

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