JPS58105542A - 電子ビ−ム露光装置のマ−ク検出装置 - Google Patents

電子ビ−ム露光装置のマ−ク検出装置

Info

Publication number
JPS58105542A
JPS58105542A JP56203444A JP20344481A JPS58105542A JP S58105542 A JPS58105542 A JP S58105542A JP 56203444 A JP56203444 A JP 56203444A JP 20344481 A JP20344481 A JP 20344481A JP S58105542 A JPS58105542 A JP S58105542A
Authority
JP
Japan
Prior art keywords
mark
data
gain
signal
waveform signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56203444A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6316900B2 (th
Inventor
Hisatake Yokouchi
久猛 横内
Masahide Okumura
正秀 奥村
Susumu Ozasa
小笹　進
Korehito Matsuda
松田　維人
Tsuneo Okubo
恒夫 大久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP56203444A priority Critical patent/JPS58105542A/ja
Publication of JPS58105542A publication Critical patent/JPS58105542A/ja
Publication of JPS6316900B2 publication Critical patent/JPS6316900B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP56203444A 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置 Granted JPS58105542A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56203444A JPS58105542A (ja) 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56203444A JPS58105542A (ja) 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置

Publications (2)

Publication Number Publication Date
JPS58105542A true JPS58105542A (ja) 1983-06-23
JPS6316900B2 JPS6316900B2 (th) 1988-04-11

Family

ID=16474207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56203444A Granted JPS58105542A (ja) 1981-12-18 1981-12-18 電子ビ−ム露光装置のマ−ク検出装置

Country Status (1)

Country Link
JP (1) JPS58105542A (th)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125623A (ja) * 1982-12-27 1984-07-20 Fujitsu Ltd 電子ビ−ム露光装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0387190U (th) * 1989-12-22 1991-09-04

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125623A (ja) * 1982-12-27 1984-07-20 Fujitsu Ltd 電子ビ−ム露光装置

Also Published As

Publication number Publication date
JPS6316900B2 (th) 1988-04-11

Similar Documents

Publication Publication Date Title
US4724481A (en) Flaw detector for detecting flaws in a sheet
US4859814A (en) Noise cancellation in digitizing system and method
JPH0646550B2 (ja) 電子ビ−ム定位置照射制御方法および電子ビ−ム定位置照射制御装置
EP1031812A3 (en) Measurement apparatus
EP0927993A3 (en) Track loss signal generating apparatus used in optical disc drive and optical disc drive equipped wih the apparatus, as well as optical disc drive equipped with amplitude adjusting apparatus for tracking error signal
JPS5585028A (en) Mark detecting signal amplifier
EP0908846A3 (en) Moving object detection apparatus and method
MXPA03011520A (es) Detector de movimiento, sistema de procesamiento de imagen, metodos de deteccion de movimiento, programa y medio de registro.
EP0751644A3 (en) Control signal detection method with calibration error and subscriber unit therewith
US4880307A (en) Method of detecting the position of an object
JPS58105542A (ja) 電子ビ−ム露光装置のマ−ク検出装置
JPS60168149A (ja) 位置合わせ信号処理装置
US6326606B2 (en) Method and apparatus for checking shape
JPS5620382A (en) Information input system using facsimile transmitter
JPH06309434A (ja) 画像処理方法及び装置
JPS6132130A (ja) 座標読取装置
JPS5795628A (en) Electron beam exposure device
JPS61213613A (ja) 形状測定装置
JPH04127416A (ja) マーク位置検出方法
JPH06275487A (ja) 位置検出装置
JPS57122517A (en) Alignment mark detector for electron beam exposure
JP2003269927A (ja) 形状測定装置
JPS6039552A (ja) 渦流探傷装置
JPH05244515A (ja) ビデオ信号処理装置
JPH052111B2 (th)