JPS5812385A - Emitting light wave length sweep system of wave length variable laser - Google Patents

Emitting light wave length sweep system of wave length variable laser

Info

Publication number
JPS5812385A
JPS5812385A JP10033681A JP10033681A JPS5812385A JP S5812385 A JPS5812385 A JP S5812385A JP 10033681 A JP10033681 A JP 10033681A JP 10033681 A JP10033681 A JP 10033681A JP S5812385 A JPS5812385 A JP S5812385A
Authority
JP
Japan
Prior art keywords
laser
wave length
light
wavelength
spectroscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10033681A
Other languages
Japanese (ja)
Other versions
JPS6342865B2 (en
Inventor
Shoji Doi
土肥 正二
Isao Tofuku
東福 勲
Hiroyuki Ishizaki
石崎 洋之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10033681A priority Critical patent/JPS5812385A/en
Publication of JPS5812385A publication Critical patent/JPS5812385A/en
Publication of JPS6342865B2 publication Critical patent/JPS6342865B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/0622Controlling the frequency of the radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To make a wave length variable laser to enable to cope with secular change of the laser characteristic, and moreover to make the laser to enable to sweep the broad range of wave length in a short time by a method wherein a laser driving current is made to vary being made to vibrate, while the temperature of a heat sink equipped with a laser element is made to vary monotonously. CONSTITUTION:Ejected light from the semiconductor laser assembled in the refrigerator 1 is injected in a spectroscope 10 to be condensed by a concave mirror 2 inside of the spectroscope 10, and enters in a grating 3 to be diffracted by the grating 3. Light having the desired wave length out of diffracted light is injected in a concave mirror 4, and light condensed by the concave mirror thereof is made to be ejected outside of the spectroscope 10 to constitute the spectroscope. By sweeping the driving current and the cooling temperature of the element, and by rotating the angle of grating following after wave length of emitting light of the laser, light corresponding to the angle of grating can be selected to be ejected outside of the spectroscope although it is discrete (owing to mode hop).

Description

【発明の詳細な説明】 本発明は赤外線によるガス分析装置尋に用いる波長可変
形半導体レーザの発光波長を広範囲に掃引する発光波長
の掃引方式に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an emission wavelength sweeping method for sweeping the emission wavelength of a wavelength tunable semiconductor laser used in an infrared gas analyzer over a wide range.

大気汚染の原因となる有害ガスたとえば二酸化硫黄(S
Os)や−酸化炭素(CO)等を赤外線吸収によって分
析する方法はすでに周知である。従来このような分析す
なわち赤外分光分析に用いる赤外線の光源として波長可
変形半導体レーザを用いている。この半導体レーザの発
光波長を変化する手段として、該レーザ素子の動作電流
また社レーザ素子の冷却温度を変化する方法をとって艷
た。以下第1図を用いて上記従来の波長掃引方式を用い
た場合の波長変化範囲について説明する。第1図におい
て、縦軸は発光波長λを、横軸はレーザの駆動電流工を
示す。領域(I)、α)はレーザの非発光領域を示す。
Harmful gases that cause air pollution, such as sulfur dioxide (S
A method of analyzing carbon oxide (Os), -carbon oxide (CO), etc. by infrared absorption is already well known. Conventionally, a wavelength tunable semiconductor laser has been used as an infrared light source for such analysis, that is, infrared spectroscopic analysis. As a means of changing the emission wavelength of this semiconductor laser, we used a method of changing the operating current of the laser element or the cooling temperature of the laser element. The wavelength change range when the conventional wavelength sweeping method is used will be described below with reference to FIG. In FIG. 1, the vertical axis shows the emission wavelength λ, and the horizontal axis shows the driving current of the laser. Region (I), α) indicates a non-emission region of the laser.

なお曲線イ1ロ、へけそれぞれレーザ素子が同一冷却温
度の場合に電流工を変化した場合の発光波長ムの変化を
示す。曲線イは素子の冷却温度を200に一定(Con
st) K保ち、素子ノ駆動電流工をエムから工1へ変
化した場合の素子の発光特性を示す。また曲線−は素子
の冷却温度を86’に一定に保ち、素子の駆動電流工を
工aからよりへ変化した場合の素子の発光特性を示す、
同様に曲線ハについては素子冷却温度60°にの場合に
索子の駆動電流工を1宜から工1へ変化した場合の素子
の発光波長特性を示す。なお素子の冷却温度が’RO”
Kの場合の曲線イを例にとると波長λaとl’bとの間
隙部および11)とλCとの間隙部等は非発光波長領域
で、素子が発光モードを有しない毫−ドホップ領域であ
る。一般に、このモードホップを生じる波長範囲は数オ
ングストローム(6)程度で赤外線吸収を利用した分光
分析には支障をき九−I5ない。
Curves A1 and B respectively show the change in the emission wavelength when the current is changed when the laser element is cooled at the same temperature. Curve A shows the cooling temperature of the element constant at 200 (Con
st) The light emitting characteristics of the device are shown when K is maintained and the device drive current is changed from Em to Step 1. In addition, the curve - shows the light emitting characteristics of the device when the cooling temperature of the device is kept constant at 86' and the driving current of the device is changed from A to T.
Similarly, curve C shows the emission wavelength characteristics of the device when the driving current of the cable is changed from 1 to 1 when the device cooling temperature is 60°. Note that the cooling temperature of the element is 'RO'
Taking curve A in the case of K as an example, the gap between wavelengths λa and l'b and the gap between wavelengths 11) and λC are in the non-emission wavelength region, and are in the hop region where the device does not have an emission mode. be. Generally, the wavelength range in which this mode hop occurs is about several angstroms (6), which poses no problem for spectroscopic analysis using infrared absorption.

上記した第1図の例について素子の発光波長をXムから
λνまで波長を掃引して分光分析をする必要が生じた場
合、従来は素子の冷却温度Tを200KK保ちかつ素子
の駆動電流なΔ工だけ振動させながらエムから工IIt
で変化して波長ムAからλ1まで掃引する。その後素子
の冷却温度を60’Kに上昇し、さらに素子駆動電流を
Δ工だけ振動しながら工Gからニジまで変化して発光波
長をλ1からλ1tで掃引するという方式をとっていた
。このような灸レーザの波長掃引方式をとった場合、素
子の冷却温度を20@Kから50@Ktで変化するのに
数分を要し、発光波長の掃引速度を高速度に行うことが
困難であった。また素子冷却温度を一定に保ち駆動電流
を変化した場合および駆動電流を一定に保ち冷却温度を
変化させる場合にはレーザゐ発光波長の掃引幅が狭いと
いう欠点があった。
Regarding the example shown in Fig. 1 above, when it becomes necessary to perform spectroscopic analysis by sweeping the emission wavelength of the device from While only vibrating the work, from M to the work IIt
, and sweeps from wavelength A to λ1. Thereafter, the cooling temperature of the device was raised to 60'K, and the device drive current was changed from 10G to 200% while oscillating by .DELTA., thereby sweeping the emission wavelength from λ1 to λ1t. When using such a wavelength sweeping method for a moxibustion laser, it takes several minutes to change the cooling temperature of the element from 20@K to 50@Kt, making it difficult to sweep the emission wavelength at a high speed. Met. Another disadvantage is that the sweep width of the laser emission wavelength is narrow when the device cooling temperature is kept constant and the drive current is varied, and when the drive current is kept constant and the cooling temperature is varied.

本発明は上記欠点を除去するもので、レーザの駆動電流
に対する応答速度の早さと素子冷却温度制御の応答速度
の遅さに注目してレーザ駆動電流を振動させながら変化
させると共に、L/−ザ素子を取付けたヒートシンク温
度を単調に変化させることによシレーザ特性の経年変化
にも対応でき、かつ広い波長範囲を短時間に掃引するこ
とができる波長可変レーザの発光波長掃引方式を提供す
るもので、その要旨とするところは波長可変半導体レー
ザを駆動する電流源および該半導体レーザを冷却する冷
凍機を有する波長可変レーザの発光波長掃引方式におい
て、前記冷凍機による冷却温度を単調上昇または単調下
降させると共に前記半導体レーザ駆動電流を振動させな
がら単調増加または単調減少させることによって、前記
半導体v −ザの発光波長を広範囲に掃引するようにし
たことを特徴とすゐものである。
The present invention aims to eliminate the above-mentioned drawbacks, and focuses on the fast response speed to the laser drive current and the slow response speed of element cooling temperature control, and changes the laser drive current while oscillating. The present invention provides an emission wavelength sweeping method for a tunable laser that can respond to changes in laser characteristics over time by monotonically changing the temperature of the heat sink on which the device is attached, and that can sweep a wide wavelength range in a short time. , the gist of which is to monotonically increase or decrease the cooling temperature by the refrigerator in an emission wavelength sweeping method for a wavelength tunable laser having a current source that drives the wavelength tunable semiconductor laser and a refrigerator that cools the semiconductor laser. At the same time, the semiconductor laser driving current is monotonically increased or decreased while being oscillated, thereby sweeping the emission wavelength of the semiconductor v-laser over a wide range.

以下本発明の実施例について第2図および第8図を用い
て説明すみ。
Embodiments of the present invention will be described below with reference to FIGS. 2 and 8.

1@2図は波長可変半導体レーザとして鉛・錫・テfi
/N (PbSnT*)、鉛・硫黄・セレン(PbS8
e)等からなる半導体レーザを光源として用いたもので
、いずれも動作温度、駆動電流の最適値を選べば、7〜
8μ屑の波長を有する発光を得ることができる。
Figure 1@2 shows lead/tin/tefi as a wavelength tunable semiconductor laser.
/N (PbSnT*), lead/sulfur/selenium (PbS8
e) etc. is used as a light source, and if the optimum values of operating temperature and drive current are selected,
It is possible to obtain light emission having a wavelength of 8 μm.

今、赤外線の吸収ピーク波長7.9μ解を有するメタン
(OH4)と吸収ピーク波長7μm近傍を有する二酸化
窒素(NOx)の検出をする場合、一般に7μ譚から8
IIIIIIの波長範囲にわたって、一つの素子を同一
温度に冷却した状態で駆動電流を変化してもそれだけの
波長変化を得ることができないため、上記した従来の駆
動法を用いるか、発光波長領域の異なる2−)のレーザ
素子を用いねばならなかった。従って本発明ではレーザ
素子の冷却温度Tを20°に近傍に設定し、かつ駆動電
流エムを200〜800 Mk近傍の発光波長8μ調が
得られる動作条件に設定する。次Kl/−ザ素子の冷却
温度を徐々に上昇し、これと同時に駆動電流工を徐々に
増加しながら、この電流工に振動電流Δ工を数mA重畳
し、レーザ素子の冷却温度Tを約5OK近傍まで上外し
、駆動電流工が500〜600mAになるまで上昇する
ことによって発光波長が7μ鱒の発光が得られ本ように
素子を駆動すれば、1個のV−ザ素子で広い波長範囲の
発光を容易に、かつ、簡単に得ることができる。
Now, when detecting methane (OH4), which has an infrared absorption peak wavelength of 7.9μm, and nitrogen dioxide (NOx), which has an absorption peak wavelength of around 7μm, generally the infrared absorption peak wavelength is 7.9μm to 8μm.
Even if you change the driving current with one element cooled to the same temperature over the wavelength range of 3.35 nm, it is not possible to obtain the same amount of wavelength change. 2-) had to be used. Therefore, in the present invention, the cooling temperature T of the laser element is set to around 20 DEG, and the driving current Em is set to an operating condition that allows an emission wavelength of 8 microns tuning around 200 to 800 Mk to be obtained. Next, gradually increase the cooling temperature of the laser element (Kl/-), and at the same time gradually increase the drive current, superimpose several mA of oscillating current Δ on this current, and lower the cooling temperature T of the laser element to about By increasing the drive current to around 500mA and increasing the drive current to 500-600mA, light emission with a wavelength of 7μ can be obtained.If you drive the device in this way, a single V-the device can cover a wide wavelength range. luminescence can be obtained easily and simply.

次に本発明の広範囲の波長可変レーザの発光波長掃引方
式を用いたガス分析装置の実施例を第8図を用いて簡単
に説明する。
Next, an embodiment of a gas analyzer using the emission wavelength sweeping method of a wide wavelength tunable laser according to the present invention will be briefly described with reference to FIG.

冷凍機1には半導体レーザが組込まれておシ、そこから
の出射光は分光器10に入射し、分光器10の内部の凹
面鏡2で集光されグレーティング8に入シ、グレーティ
ング8で回折され、回折された光のうち所望波長の光が
凹面鏡4に入射し、該凹面鏡で集光された光が分光器1
0外に出射するよう構成されている。グV−ティングは
所望の波長が分光器外圧取出せるようあらかじめ設定し
ておけばよいが、このグレーティング8の角度設定手段
としては図示しないがステッピングモータを用いており
、グレーティング80分解能が半導体レーザのモードホ
ップ程度以下になるように設定する必要がある。なおこ
の装置では半導体レーザ素子の駆動電源は図示していな
いが冷凍tsl内に設けても、外部に設けてもよい。
A semiconductor laser is built into the refrigerator 1, and the emitted light from the laser enters the spectroscope 10, is focused by the concave mirror 2 inside the spectrometer 10, enters the grating 8, and is diffracted by the grating 8. Among the diffracted lights, light with a desired wavelength enters the concave mirror 4, and the light collected by the concave mirror is sent to the spectroscope 1.
It is configured to emit light outside of zero. The grating V-ting can be set in advance so that a desired wavelength can be extracted from the spectrometer external pressure, but a stepping motor (not shown) is used as the angle setting means for this grating 8, and the resolution of the grating 8 is higher than that of a semiconductor laser. It is necessary to set it so that it is less than the mode hop. Note that in this apparatus, although a power source for driving the semiconductor laser element is not shown, it may be provided within the refrigeration tsl or may be provided externally.

こO第8図の装置を用いて、第2図で説明したレーザ素
子の駆動方式、すなわち、駆動電流および素子の冷却温
度を掃引し、グレーティングの角度をレーザの発光波長
に追従して回転していけば離散的(4−ド中ツデによる
)ではあるが、グレーティングの角度に対応した光を選
択し、分光器外部へ出射することができる。
Using the apparatus shown in Fig. 8, the laser element driving method explained in Fig. 2 is used, that is, the driving current and element cooling temperature are swept, and the grating angle is rotated to follow the laser emission wavelength. Although the light may be discrete (due to the 4-dimensional structure), it is possible to select light corresponding to the angle of the grating and emit it to the outside of the spectrometer.

以上説明したレーザ素子の駆動方式を用いれば第鵞図に
示したV−ザ素子の冷却温度が低温のA点の発光oys
波長域から高温のF点の発光の短波長斌までの広い波長
範囲を冷凍機の1回の温度変化で掃引でき掃引速度が従
来例に比し早くなると共に、安定な温度制御が困難な安
値な冷凍機を用いても容易に本発明の目的である広範囲
の発光波長掃引が可能である。
If the driving method of the laser element explained above is used, the light emission at point A where the cooling temperature of the V laser element is low as shown in Fig.
It is possible to sweep a wide wavelength range from the wavelength range to the short wavelength interval of the emission from the high-temperature F point with a single temperature change of the refrigerator.The sweep speed is faster than conventional models, and it is also possible to sweep a wide wavelength range from the wavelength range to the short wavelength interval of the emission from the high-temperature F point. Even if a conventional refrigerator is used, it is possible to easily sweep the emission wavelength over a wide range, which is the object of the present invention.

以上の説明とは逆にレーザ素子の冷却温度を高温側から
低温側に変化し、併せて駆動電流を大きい方から小さい
方へ減少するように制御しても同様に広範囲の発光波長
の掃引を実現することができる。
Contrary to the above explanation, even if the cooling temperature of the laser element is changed from a high temperature side to a low temperature side, and the driving current is also controlled to decrease from a large side to a small side, it is possible to sweep a wide range of emission wavelengths in the same way. It can be realized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は半導体レーザ素子の冷却温度をパラメータにし
た場合の駆動電流と発光波長の関係を示した図、第2図
は半導体レーザ素子の冷却温度を徐々に変化し、かつ駆
動電流を冷却温度に追従して変化した場合の本発明Kか
かわる発光波長特性を示す。第8図は本発明のV−ザの
駆動方式を用いたガス分析装置に用いる発光波長掃引装
置の一実施例を示す。 1:冷凍機、2:凹面鏡、8:グレーティング。 4:凹面鏡、10:分光器、゛λ:発光波長、工:駆動
電流、Δ工:駆動電流の振動分、T:レーザ素子の冷却
温度。 第3図
Figure 1 shows the relationship between the driving current and the emission wavelength when the cooling temperature of the semiconductor laser element is used as a parameter. Figure 2 shows the relationship between the driving current and the emission wavelength when the cooling temperature of the semiconductor laser element is gradually changed and the driving current is changed to the cooling temperature. The emission wavelength characteristics according to the present invention K are shown when changing according to the following. FIG. 8 shows an embodiment of an emission wavelength sweeping device used in a gas analyzer using the V-za driving method of the present invention. 1: Freezer, 2: Concave mirror, 8: Grating. 4: concave mirror, 10: spectrometer, ゛λ: emission wavelength, f: drive current, Δf: vibration component of drive current, T: cooling temperature of the laser element. Figure 3

Claims (1)

【特許請求の範囲】[Claims] 波長可変半導体レーザを駆動する電流源および皺半導体
レーザを冷却する冷凍機を有する波長可変レーザO発光
波長掃引方式において、前記冷凍機による冷却温度を単
調上昇または単調下降させると共に前記半導体レーザを
駆動する電流源を変化させ、半導体レーザ駆動電流を振
動させながら単調増加または単調減少させるととKよっ
て、前記半導体レーザの発光波長を広範囲に掃引するよ
うにしたことを特徴とする波畏可変V−ザの発光波長掃
引方式。
In a wavelength tunable laser O emission wavelength sweeping method having a current source that drives a wavelength tunable semiconductor laser and a refrigerator that cools the wrinkled semiconductor laser, the semiconductor laser is driven while the cooling temperature by the refrigerator is monotonically increased or decreased. A variable wave V-laser characterized in that the semiconductor laser drive current is monotonically increased or decreased while being oscillated by changing a current source, thereby sweeping the emission wavelength of the semiconductor laser over a wide range. emission wavelength sweep method.
JP10033681A 1981-06-26 1981-06-26 Emitting light wave length sweep system of wave length variable laser Granted JPS5812385A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10033681A JPS5812385A (en) 1981-06-26 1981-06-26 Emitting light wave length sweep system of wave length variable laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10033681A JPS5812385A (en) 1981-06-26 1981-06-26 Emitting light wave length sweep system of wave length variable laser

Publications (2)

Publication Number Publication Date
JPS5812385A true JPS5812385A (en) 1983-01-24
JPS6342865B2 JPS6342865B2 (en) 1988-08-25

Family

ID=14271290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10033681A Granted JPS5812385A (en) 1981-06-26 1981-06-26 Emitting light wave length sweep system of wave length variable laser

Country Status (1)

Country Link
JP (1) JPS5812385A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985004530A1 (en) * 1984-03-30 1985-10-10 Boh Optical Ab Frequency and output regulation in laser diodes
JPS61252681A (en) * 1985-05-02 1986-11-10 Agency Of Ind Science & Technol Waveform sweeping semiconductor laser device
JPS63290947A (en) * 1987-05-25 1988-11-28 Natl Res Inst For Metals Instrument for measuring air pollution
JPH0197261A (en) * 1987-10-07 1989-04-14 Hisaka Works Ltd Sliver processing method and equipment used therein
JPH0319933U (en) * 1989-03-30 1991-02-27
JP2010507250A (en) * 2006-10-16 2010-03-04 コーニング インコーポレイテッド Wavelength control in semiconductor laser wavelength selection, phase and gain regions
RU2477914C2 (en) * 2011-03-24 2013-03-20 Государственное образовательное учреждение высшего профессионального образования "Российский университет дружбы народов" (РУДН) Laser radiation modulator
CN104568790A (en) * 2014-12-29 2015-04-29 南京大学 Method for eliminating error caused by wavelength drift of laser during gas sensing
JP2017135314A (en) * 2016-01-29 2017-08-03 浜松ホトニクス株式会社 Wavelength variable light source and driving method thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985004530A1 (en) * 1984-03-30 1985-10-10 Boh Optical Ab Frequency and output regulation in laser diodes
GB2168838A (en) * 1984-03-30 1986-06-25 Boh Optical Ab Frequency and output regulation in laser diodes
JPS61252681A (en) * 1985-05-02 1986-11-10 Agency Of Ind Science & Technol Waveform sweeping semiconductor laser device
JPS63290947A (en) * 1987-05-25 1988-11-28 Natl Res Inst For Metals Instrument for measuring air pollution
JPH0197261A (en) * 1987-10-07 1989-04-14 Hisaka Works Ltd Sliver processing method and equipment used therein
JPH0319933U (en) * 1989-03-30 1991-02-27
JP2010507250A (en) * 2006-10-16 2010-03-04 コーニング インコーポレイテッド Wavelength control in semiconductor laser wavelength selection, phase and gain regions
RU2477914C2 (en) * 2011-03-24 2013-03-20 Государственное образовательное учреждение высшего профессионального образования "Российский университет дружбы народов" (РУДН) Laser radiation modulator
CN104568790A (en) * 2014-12-29 2015-04-29 南京大学 Method for eliminating error caused by wavelength drift of laser during gas sensing
CN104568790B (en) * 2014-12-29 2017-03-08 南京大学 A kind of method that during elimination gas sensing, laser wavelength drift leads to error
JP2017135314A (en) * 2016-01-29 2017-08-03 浜松ホトニクス株式会社 Wavelength variable light source and driving method thereof

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