JPS5814100A - Method of cleaning structure adhered with alkali metal - Google Patents
Method of cleaning structure adhered with alkali metalInfo
- Publication number
- JPS5814100A JPS5814100A JP11310381A JP11310381A JPS5814100A JP S5814100 A JPS5814100 A JP S5814100A JP 11310381 A JP11310381 A JP 11310381A JP 11310381 A JP11310381 A JP 11310381A JP S5814100 A JPS5814100 A JP S5814100A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- tank
- sodium
- carbon dioxide
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims description 30
- 238000000034 method Methods 0.000 title claims description 12
- 229910052783 alkali metal Inorganic materials 0.000 title description 2
- 150000001340 alkali metals Chemical class 0.000 title description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 239000001569 carbon dioxide Substances 0.000 claims description 12
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 12
- 239000003513 alkali Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 239000002699 waste material Substances 0.000 claims 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 30
- 239000007864 aqueous solution Substances 0.000 description 11
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 8
- 229910052708 sodium Inorganic materials 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 229910000029 sodium carbonate Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- SFKTYEXKZXBQRQ-UHFFFAOYSA-J thorium(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Th+4] SFKTYEXKZXBQRQ-UHFFFAOYSA-J 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 210000003437 trachea Anatomy 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 230000008651 alkaline stress Effects 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- WABPQHHGFIMREM-BKFZFHPZSA-N lead-212 Chemical compound [212Pb] WABPQHHGFIMREM-BKFZFHPZSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- UTLZBWAGLRNNAY-UHFFFAOYSA-J thorium(4+);dicarbonate Chemical compound [Th+4].[O-]C([O-])=O.[O-]C([O-])=O UTLZBWAGLRNNAY-UHFFFAOYSA-J 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
冷却材として使用されるナトリウムの付着した機器を洗
浄する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for cleaning sodium-contaminated equipment used as a coolant.
約98°0で溶融するナトリウムU 、 約30]〜5
50’0の範囲で高速増殖炉の冷却材として使用され。Sodium U melts at about 98°0, about 30]~5
Used as a coolant in fast breeder reactors in the range of 50'0.
原子炉容器,ポンプ,熱交換器又は蒸気発生器等の中を
流通する。Flows through reactor vessels, pumps, heat exchangers, steam generators, etc.
前述のポンプや熱交換器等の機器は,かなり長い期間使
用されるものであるが,その間に定期的若しくは必要に
応じ点検し修理する場合がある。そしてその後該機器は
再使用するのが好ましい。Equipment such as the pumps and heat exchangers mentioned above are used for quite a long time, and during that time they may be inspected and repaired periodically or as necessary. Preferably, the device is then reused.
前記点検,修理は大気中で行なうのが一般的であるから
,それに先立ち液体ナトリウムは排出されるが,ナトリ
ウムに触れていた部分には。Since the above-mentioned inspections and repairs are generally carried out in the atmosphere, the liquid sodium is discharged beforehand, but the parts that have been in contact with the sodium are discharged.
なおナトリウムが付着している。外表面にナトリウムが
付着したま一の前記機器の内部構造物たり,水酸化ナト
リウムが表面に残存したりして前記点検,修理上好まし
くない。Note that sodium is attached. The internal structure of the device may have sodium adhering to its outer surface, or sodium hydroxide may remain on the surface, which is undesirable for inspection and repair.
このため、ナトリウム付着内部構造物を大気に曝す前に
洗浄(付着す) リウムの除去)が行なわれているが,
水蒸気,加湿ガス又はアルコール等を用いて粗洗浄(一
次洗浄)を行ない。For this reason, cleaning (removal of adhering lium) is performed before exposing internal structures with sodium adhesion to the atmosphere.
Perform rough cleaning (primary cleaning) using water vapor, humidified gas, alcohol, etc.
その後二次洗浄として構造物を純水中に浸漬してすすぎ
洗いを行なうのが従来の一般的洗浄ブロセスであった。The conventional general cleaning process has been to immerse the structure in pure water and rinse it as a secondary cleaning.
しかるに、内部構造物は複雑な構造をしており、その表
面に20071772程度のせまい巾の入口をもち、内
部で若干広くなった室空間(以下クレビスという。)が
存在するのが普通である。このようなりレビスがあると
、前述の洗浄後においてもその奥にナトリウムが残存し
、入口部に水酸化ナトリウムの水溶液が残存しやすい。However, the internal structure has a complicated structure, and usually has a narrow entrance of about 20071772 mm on its surface and a slightly wider chamber space (hereinafter referred to as a clevis) inside. If there is such a leak, sodium will remain deep inside it even after the above-mentioned cleaning, and an aqueous solution of sodium hydroxide will likely remain at the inlet.
内部構造物を大気中で点検、修理するに際し。When inspecting and repairing internal structures in the atmosphere.
クレビス入口部の水酸化ナトリウム水溶液は炭酸ガスと
反応して炭酸ナトリウムになるのであるが、炭酸ナトリ
ウムが封栓として作用し、内部に未反応の水酸化す)
IJウム水溶液が残存する。The aqueous sodium hydroxide solution at the clevis inlet reacts with carbon dioxide gas to become sodium carbonate, but the sodium carbonate acts as a seal, leaving unreacted hydroxide inside.
An IJum aqueous solution remains.
前述のように、内部構造物の表面のクレビスに水酸化す
トリウムの水溶液が残存していると。As mentioned above, an aqueous solution of thorium hydroxide remains in the crevices on the surface of internal structures.
再°使用時の予熱の際に、アルカリ応力腐食割れが発生
するという不具合が生ずる。During preheating for reuse, a problem arises in that alkaline stress corrosion cracking occurs.
本発明は、前記した再使用時のアルカリ応力腐食割れを
防止するためになさねたものであり。The present invention was made in order to prevent the above-mentioned alkali stress corrosion cracking during reuse.
最終洗浄である二次洗浄として、減圧による沸騰気泡の
物理的排除と炭酸ガスとの反応による無害な炭酸化物へ
の化学的転換とを併用することによりクレビス内の水酸
化すトリウムを完全に除去しうる洗浄方法を提供するこ
とを目的とする。As the final cleaning, secondary cleaning, thorium hydroxide inside the crevice is completely removed by using a combination of physical removal of boiling bubbles by reduced pressure and chemical conversion to harmless carbonate by reaction with carbon dioxide gas. The purpose of this invention is to provide a cleaning method that can be used.
以下、具体例について本発明方法を説明する。The method of the present invention will be explained below with reference to specific examples.
第1図は1本発明の方法を実施する装置の系統図である
。FIG. 1 is a system diagram of an apparatus for implementing the method of the present invention.
第1図において、ボット状の洗浄槽10の下部には2機
器の内部構造物すなわち被洗浄物1を載せる多孔支持板
11が架設さね、その外周にはヒータ13が添設されて
いる。In FIG. 1, a porous support plate 11 on which the internal structures of two devices, that is, objects to be cleaned 1 are mounted, is installed at the bottom of a bot-shaped cleaning tank 10, and a heater 13 is attached to the outer periphery of the support plate 11.
被洗浄物1が挿入されて置かれた後、洗浄槽10の上部
開口は蓋15で閉じらねるが、蓋15には弁21を備え
た排気管22が連結している。弁24を絡
具えた排水管25が洗浄槽10の底部に連軸し、他方真
空ポンプ27と弁28を具えた真空tJI気管29がそ
の上部に連絡している。After the object 1 to be cleaned is inserted and placed, the upper opening of the cleaning tank 10 is not closed with a lid 15, but an exhaust pipe 22 equipped with a valve 21 is connected to the lid 15. A drain pipe 25 with a valve 24 is connected to the bottom of the washing tank 10, while a vacuum tJI trachea 29 with a vacuum pump 27 and a valve 28 is connected to its top.
又、水蒸気や純水等の洗浄剤を導入する供給管31 、
33が図示のように連結され、夫々に弁35゜36が設
けられている。Also, a supply pipe 31 for introducing a cleaning agent such as steam or pure water;
33 are connected as shown, and valves 35 and 36 are provided respectively.
図示した装置において、被洗浄物1を洗浄す第一次洗浄
として1ず弁28を開け、真空ポンプ27を起動して洗
浄槽10内の空気を真空排気管29を通して排出し1次
いで弁28を閉としてからヒータ13により洗浄槽10
内を予熱する。しかる抜弁35 、36を開放し、供給
管31 、33から水蒸気等を注入する。排気管22か
らは連続的に水素ガスを含む水蒸気の排気を行なう。操
作終了後。In the illustrated apparatus, for the first cleaning of the object 1 to be cleaned, the valve 28 is first opened, the vacuum pump 27 is started, the air in the cleaning tank 10 is discharged through the vacuum exhaust pipe 29, and then the valve 28 is opened. After closing, the cleaning tank 10 is heated by the heater 13.
Preheat the inside. The corresponding vent valves 35 and 36 are opened, and steam or the like is injected from the supply pipes 31 and 33. Water vapor containing hydrogen gas is continuously exhausted from the exhaust pipe 22. After the operation is completed.
弁24を開いて除去されたす) IJウム(化合物)を
含む水蒸気の凝縮水を排水管25を通じて図示しない廃
水タンクへ排出する。The condensed water containing IJum (compound) is discharged through the drain pipe 25 to a waste water tank (not shown).
なお、水蒸気の代りに、加湿ガス、アルコール等を使用
して第一次洗浄を行なってもよい。Note that the primary cleaning may be performed using humidified gas, alcohol, or the like instead of water vapor.
次に、被洗浄物1のクレビス内の状態を示した第2図を
参照して、第二次洗浄を説明する。Next, the secondary cleaning will be explained with reference to FIG. 2 showing the state inside the clevis of the object 1 to be cleaned.
第1次洗浄後、供給管31は1図示しない弁により切換
えて炭酸ガスの供給源に接続する。After the first cleaning, the supply pipe 31 is connected to a carbon dioxide supply source by being switched by a valve (not shown).
しかる後に
(イ) 弁21 、24 、35 、36を閉じ、弁2
8を開は真空ポンプ27を起動して洗浄槽10内を真空
引し、目標値まで減圧する。After that, (a) close valves 21, 24, 35, and 36, and close valve 2.
8 starts the vacuum pump 27 to evacuate the inside of the cleaning tank 10 and reduce the pressure to the target value.
第2図(イ)は、ステップ(イ)により減圧の状態にお
かれたときの被洗浄物1のクレビス3の内部を拡大して
極式的に示したものである。すなわち、減圧されたため
に、いわゆる減圧沸騰が起り、水酸化すトリウム水溶液
A内に水魚気泡りが生じて、これはクレビス6外へ離脱
していく。同時に水溶液Aの一部も押し出される。FIG. 2(a) is an enlarged polar diagram showing the inside of the clevis 3 of the object to be cleaned 1 when the pressure is reduced in step (a). That is, due to the reduced pressure, so-called reduced pressure boiling occurs, and bubbles are generated in the aqueous solution A of thorium hydroxide, which escapes to the outside of the clevis 6. At the same time, part of the aqueous solution A is also pushed out.
(ロ) 減圧後、弁28を閉じ弁36を開けて供給管3
3から純水を洗浄槽10の中に注入し、洗浄シ丈
物1をその中に〜したま1適当時間保持する。(b) After reducing the pressure, close the valve 28 and open the valve 36 to connect the supply pipe 3.
3, pure water is poured into the cleaning tank 10, and the cleaning product 1 is held therein for a suitable period of time.
減圧下で水が充填されつつあるときは。When water is being filled under reduced pressure.
クレビス3の外部からの水の供給によって残存すトリウ
ムBも水と反応して、水素ガスと水酸化ナトリウムに変
化する。Due to the supply of water from the outside of the clevis 3, the remaining thorium B also reacts with the water and changes into hydrogen gas and sodium hydroxide.
水素ガスは、水魚気泡りと同様に外部へ脱出していく。Hydrogen gas escapes to the outside in the same way as water bubbles.
このようにしてステップ(ロ)の終了時には第2図(ロ
)のように相当に稀釈された低濃度の水酸化ナトリウム
水溶液Aのみがクレビス乙の中に残る。しかし、クレビ
ス3の外部に対しての濃度拡散は低速でしか行なわれな
いので、長時間かけても水酸化ナトリウム濃度は殆んど
低減されない。In this manner, at the end of step (B), only the considerably diluted low concentration sodium hydroxide aqueous solution A remains in the clevis B, as shown in FIG. 2(B). However, since the concentration diffusion to the outside of the clevis 3 is performed only at a low speed, the sodium hydroxide concentration is hardly reduced even if it takes a long time.
(ハ) 茨に弁24を開き、純水を洗浄槽10から排出
すると同時に弁35を開いて供給管31から炭酸ガス(
炭酸ガスと不活性ガスの混合気でもよい。)を洗浄槽1
0内に導入し、炭酸ガスで満した1〜保持する。(c) Open the valve 24 to discharge pure water from the cleaning tank 10, and at the same time open the valve 35 to discharge carbon dioxide (
A mixture of carbon dioxide and inert gas may be used. ) to cleaning tank 1
0 and held at 1 filled with carbon dioxide gas.
ステ7ブ(ハ)の操作を行なった後は、大むね第2図(
ハ)の状況、すなわち人口1部には炭酸す) IJウム
Cが生成するが、奥の方では依然水酸化す) IJウム
水靜液Aが残る。After performing the operation in step 7b (c), the procedure is generally as shown in Figure 2 (
In the situation of c), carbonic acid (IJum C) is produced in one part of the population, but IJum water solution A (which is still hydroxylated) remains in the deeper part.
更に再びステップ(イ)の操作を行なうと。If you perform step (a) again.
第2図に)のように水魚気泡りが発生し離脱するため、
水酸化すトリウム水溶液Aおよび炭酸ナトリウムCの大
部分も押し出されることになり、ステップ(ロ)の状態
では第2図(ホ)のように小量の炭酸す1 リウムCと
−゛層稀薄になった水酸化ナトリウム水溶液Aとが残存
する。ここで更にステップ(ハ)の操作を行なうと、第
2図(へ)のように炭酸ナトリウムCは入[1部で粗に
生成されかつ奥でもかなり底部近く1で生成さ第1る。As shown in Figure 2), water bubbles are generated and separated.
Most of the thorium hydroxide aqueous solution A and sodium carbonate C are also extruded, and in the state of step (b), a small amount of thorium carbonate C and a -゛ layer are diluted as shown in Figure 2 (e). The resulting sodium hydroxide aqueous solution A remains. When step (c) is further performed here, as shown in FIG.
これは。this is.
第2図(ホ)にて既に水腔液Aの濃度が稀薄なために、
ステップ(Nの操作において水酸化ナトリウムと炭酸ガ
スとの反応よりも、水の炭酸ガス雰囲気への蒸発が先行
するためである。乙のため、奥に残存する水酸化ナトリ
ウム水溶液Aは僅小化する。このように、ステップ(イ
)〜(ハ)の操作を反復すると。In Fig. 2 (e), the concentration of aqueous fluid A is already dilute, so
This is because the evaporation of water into the carbon dioxide atmosphere precedes the reaction between sodium hydroxide and carbon dioxide gas in the operation of step (N). In this way, repeating steps (a) to (c).
最終的には第2図□(へ)のようにクレビス乙の中には
小量の炭酸ナトリウムCだけが残るのみで、水酸化す)
IJウム水溶液Aは皆無となり、再使用時に予熱を行
なってもアルテップ(イ)、(ロ)、(ハ)を少くとも
に回繰返せば、第2図(へ)の状態になることが確認さ
れた。In the end, only a small amount of sodium carbonate C remains in the clevis B, as shown in Figure 2 □ (f), and it is hydroxylated.)
It has been confirmed that there is no IJum aqueous solution A, and even if preheating is performed before reuse, if Altep (a), (b), and (c) are repeated at least once, the state shown in Figure 2 (f) will be reached. Ta.
なお前記具体例のステップ(ハ)において、炭酸ガスを
導入後上の″!−保持したが、排水完了後真空ポンプ2
7により炭酸ガスを吸引排出して洗浄槽10内を一旦減
圧し、しかる後に再度炭酸ガI
スを供給管」より導入して保持すると、第2図(ロ)の
状態で減圧佛謄が生じ、迅速に水酸化ナトリウム水溶液
Aをなくし・て第2図(へ)の状態にすることもできる
。In step (c) of the above specific example, after introducing carbon dioxide gas, the above ``!-'' was held, but after the completion of draining, the vacuum pump 2
7, the pressure inside the cleaning tank 10 is once reduced by suctioning and discharging the carbon dioxide gas, and then carbon dioxide gas is introduced again from the supply pipe and maintained, resulting in a depressurized Buddha in the state shown in Figure 2 (b). It is also possible to quickly eliminate the sodium hydroxide aqueous solution A to achieve the state shown in FIG.
第1図は2本発明の方法を実施する装着の系統図、第2
図(イ)〜(へ)は本発明方法の各ステップにおける状
態説明図である。
1・・・被洗浄物、10・・・洗浄槽、15・・蓋、
2+、24゜28、35.36・・・弁、22・・・t
J14気管、25・・・fJI水管、27・・・真空ポ
ンプ、29・・・真空υ1気管、 31.33・・・供
給管。
A・・・水酸化ナトリウム水溶液、 +1・・・残存ナ
トリウム、0・・・炭酸ナトリウム、D・・・水蒸気泡
代理人 坂 間 暁
手続補正書(方式)
事件の表示
昭和56年 特 許 願第 113103
号発明の名称
アルカリ金属付着構造物の洗浄方法
補正をする者
事件との関係 特許出願人
住 所 東京都千代田区丸の内二丁目5番1号
名 称(62(1)三菱重工業株式会社代 理 人
住 所 東京都千代田区丸の内二丁目5番4号
三菱重工業株式会社内(電2+2−3111)昭和56
年11月24日
明細書第10頁第3行の[第2図(イ)〜(・→」を「
第2図(・)〜(ト)」と訂正する。
(2)Figure 1 is a system diagram of installation for carrying out the method of the present invention;
Figures (A) to (F) are state explanatory diagrams at each step of the method of the present invention. 1...Object to be cleaned, 10...Cleaning tank, 15...Lid,
2+, 24°28, 35.36...valve, 22...t
J14 trachea, 25...fJI water tube, 27...vacuum pump, 29...vacuum υ1 trachea, 31.33...supply pipe. A...Sodium hydroxide aqueous solution, +1...Residual sodium, 0...Sodium carbonate, D...Water vapor foam agent Akira Sakama procedural amendment (method) Indication of case 1982 Patent Application No. 113103
Name of the No. Invention Relationship to the Case of Person Amending the Method of Cleaning Structures Adhered to Alkali Metals Patent Applicant Address 2-5-1 Marunouchi, Chiyoda-ku, Tokyo Name (62(1) Agent of Mitsubishi Heavy Industries, Ltd.) Address: Mitsubishi Heavy Industries, Ltd., 2-5-4 Marunouchi, Chiyoda-ku, Tokyo (Den 2+2-3111) 1982
November 24th, 2017, page 10, line 3 of the specification [Figure 2 (a) ~ (・→])
Figure 2 (・)~(g)” is corrected. (2)
Claims (1)
液を排出し、前記槽内を減圧し、しかる後に前記槽内に
注入した純水内に前記被洗浄物を没して保持し、更に前
記槽内の純水を炭酸ガスで置換して保持することを特徴
とするアルカリ金属付着構造物の洗浄方法。After the object to be cleaned stored in the cleaning tank is primarily cleaned, the cleaning waste liquid is discharged, the pressure inside the tank is reduced, and the object to be cleaned is then submerged and held in pure water injected into the tank. . A method for cleaning an alkali metal-adhered structure, further comprising replacing and retaining the pure water in the tank with carbon dioxide gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11310381A JPS5814100A (en) | 1981-07-20 | 1981-07-20 | Method of cleaning structure adhered with alkali metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11310381A JPS5814100A (en) | 1981-07-20 | 1981-07-20 | Method of cleaning structure adhered with alkali metal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5814100A true JPS5814100A (en) | 1983-01-26 |
| JPS636839B2 JPS636839B2 (en) | 1988-02-12 |
Family
ID=14603553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11310381A Granted JPS5814100A (en) | 1981-07-20 | 1981-07-20 | Method of cleaning structure adhered with alkali metal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5814100A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011525979A (en) * | 2008-06-25 | 2011-09-29 | コミッサリア タ レネルジー アトミク エ オ エネルジー オルタネイティヴ | Method for treating a structure containing sodium and radioactive material |
| JP2018113362A (en) * | 2017-01-12 | 2018-07-19 | 株式会社デンソー | Wet-etching device |
-
1981
- 1981-07-20 JP JP11310381A patent/JPS5814100A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011525979A (en) * | 2008-06-25 | 2011-09-29 | コミッサリア タ レネルジー アトミク エ オ エネルジー オルタネイティヴ | Method for treating a structure containing sodium and radioactive material |
| JP2018113362A (en) * | 2017-01-12 | 2018-07-19 | 株式会社デンソー | Wet-etching device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS636839B2 (en) | 1988-02-12 |
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