JPS5840837U - Wafer cleaning and drying equipment - Google Patents

Wafer cleaning and drying equipment

Info

Publication number
JPS5840837U
JPS5840837U JP13568581U JP13568581U JPS5840837U JP S5840837 U JPS5840837 U JP S5840837U JP 13568581 U JP13568581 U JP 13568581U JP 13568581 U JP13568581 U JP 13568581U JP S5840837 U JPS5840837 U JP S5840837U
Authority
JP
Japan
Prior art keywords
lid
mounting rod
nozzle mounting
wafer cleaning
rotating frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13568581U
Other languages
Japanese (ja)
Inventor
山崎 雅敏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13568581U priority Critical patent/JPS5840837U/en
Publication of JPS5840837U publication Critical patent/JPS5840837U/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のウェーハ洗浄装置の縦断面図、第2図は
この考案の一実施例によるウェーハ洗浄装置の要部を示
す縦断面図である。 1・・・洗浄装置、1a・・・側板、3・・・電動機、
6・・・ターンテーブル、8・・・回転わく、9・・・
収納容器、10・・・ウェーハ、21・・・ふた、23
・・・ノズル取付棒、24・・・ノズル、25・・・上
下移動手段、26・・・支持部材、27・・・レバー。 なお、図中同一符号は同−又は相当部分を示す。
FIG. 1 is a longitudinal sectional view of a conventional wafer cleaning apparatus, and FIG. 2 is a longitudinal sectional view showing essential parts of a wafer cleaning apparatus according to an embodiment of this invention. 1...Cleaning device, 1a...Side plate, 3...Electric motor,
6... Turntable, 8... Rotating frame, 9...
Storage container, 10... Wafer, 21... Lid, 23
... Nozzle mounting rod, 24 ... Nozzle, 25 ... Vertical movement means, 26 ... Support member, 27 ... Lever. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 筒状をなし開口した上部にふたがかぶせられた洗浄容器
と、この洗浄容器内の下方に配設され回゛転されるター
ンテーブル上に固着された回転わくと、この回転わくに
円周方向に対し等間隔に保持され、それぞれ多数枚のウ
ェーハを上下のすき間をあけて収容した複数の収納用具
と、上記ふたの下面中央に取付けられ側部に複数のノズ
ルが設けられ、上記回転わくの軸中心に位置しており、
上記各ノズルから洗浄液を噴射させ、後、乾燥ガスを噴
出させるためのノズル取付棒とを備えたウェーハ洗浄乾
燥装置において、上記ノズル取付棒を上記ふたに上下動
可能に支持し、上下移動手段によりノズル取付棒を所要
範囲の上下移動運動をさせるようにしたことを特徴とす
るウェーハ洗浄乾燥装置。
A cleaning container having a cylindrical shape and an open top covered with a lid, a rotating frame fixed to a turntable disposed below the cleaning container and rotated, and a rotating frame having a circumferential direction. A plurality of storage utensils are held at equal intervals between each other, each holding a large number of wafers with vertical gaps, and a plurality of nozzles are attached to the center of the lower surface of the lid, and a plurality of nozzles are provided on the sides of the rotating frame. Located at the center of the axis,
In the wafer cleaning and drying apparatus, the nozzle mounting rod is supported on the lid so as to be movable up and down, and the nozzle mounting rod is vertically movably supported by the lid, and the nozzle mounting rod is vertically movable. A wafer cleaning/drying device characterized in that a nozzle mounting rod can be moved up and down within a required range.
JP13568581U 1981-09-12 1981-09-12 Wafer cleaning and drying equipment Pending JPS5840837U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13568581U JPS5840837U (en) 1981-09-12 1981-09-12 Wafer cleaning and drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13568581U JPS5840837U (en) 1981-09-12 1981-09-12 Wafer cleaning and drying equipment

Publications (1)

Publication Number Publication Date
JPS5840837U true JPS5840837U (en) 1983-03-17

Family

ID=29929039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13568581U Pending JPS5840837U (en) 1981-09-12 1981-09-12 Wafer cleaning and drying equipment

Country Status (1)

Country Link
JP (1) JPS5840837U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11766456B2 (en) 2014-11-26 2023-09-26 GC Cell Corporation Method for culturing natural killer cells using T cells
US12203065B2 (en) 2017-05-26 2025-01-21 GC Cell Corporation Method for culturing natural killer cell, using transformed T cell

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11766456B2 (en) 2014-11-26 2023-09-26 GC Cell Corporation Method for culturing natural killer cells using T cells
US12203065B2 (en) 2017-05-26 2025-01-21 GC Cell Corporation Method for culturing natural killer cell, using transformed T cell

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