JPS5864385A - Barrel polishing method using chemical polishing in combination - Google Patents

Barrel polishing method using chemical polishing in combination

Info

Publication number
JPS5864385A
JPS5864385A JP16176181A JP16176181A JPS5864385A JP S5864385 A JPS5864385 A JP S5864385A JP 16176181 A JP16176181 A JP 16176181A JP 16176181 A JP16176181 A JP 16176181A JP S5864385 A JPS5864385 A JP S5864385A
Authority
JP
Japan
Prior art keywords
polishing
hydrogen peroxide
acid
barrel
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16176181A
Other languages
Japanese (ja)
Other versions
JPS6047909B2 (en
Inventor
Hisamine Kobayashi
久峰 小林
Ryuichi Kato
隆一 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tipton Manufacturing Corp
SHIKISHIMA CHIPTON KK
Original Assignee
Tipton Manufacturing Corp
SHIKISHIMA CHIPTON KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tipton Manufacturing Corp, SHIKISHIMA CHIPTON KK filed Critical Tipton Manufacturing Corp
Priority to JP16176181A priority Critical patent/JPS6047909B2/en
Publication of JPS5864385A publication Critical patent/JPS5864385A/en
Publication of JPS6047909B2 publication Critical patent/JPS6047909B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To polish the work of copper or a copper alloy uniformly, readily in a short time by subjecting the work to barrel polishing, by using a chemical polishing agent of a liquid mixture of monocarboxylic acid and hydrogen peroxide or the mixture added further with nitric acid. CONSTITUTION:A chemical polishing agent contg. 200-2g/l acetic acid as monocarboxylic acid and 150-1g/l hydrogen peroxide or contg. 200-1g/l formic acid and 250-2g/l hydrogen peroxide is suitable as a compd. for barrel polishing of the work of copper and a copper alloy. Further the speed of polishing can be increased by adding a small amt. of nitric acid. In the case of adding the nitric acid, it is adequate to contain the same at <=1.2mol ratio between the nitric acid and the acetic acid to the hydrogen peroxide within a 0.7-1.0 range of molar ratio between the acetic acid and the hydrogen peroxide, or at <=0.7mol ratio between the nitric acid and the formic acid to the hydrogen peroxide in a 0.3-0.5 range of molar ratio between the formic acid and the hydrogen perioxide.

Description

【発明の詳細な説明】 本発明は、従来バレル研磨時に添加していた水、コンパ
ウンドの代りに化学研磨剤を添加することにより、バレ
ル研磨に化学研磨を併用すること−を目的としたバレル
研磨法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention is a barrel polishing method that aims to use chemical polishing in combination with barrel polishing by adding a chemical polishing agent instead of water and compound that were conventionally added during barrel polishing. It is about law.

従来各種金属工作物の表面仕上を行なうのに有効な手段
の一つとして、工作物とともに研磨材および水、コンパ
ウンド(以下マスと総称する)を装入した研磨槽に回転
、遠心旋回、揺動又は振動等の運動を与えて工作物と研
磨材との間に生じる相対運動によって工作物の研磨を行
なうバレル研磨法が知られていた。例えば、じ転式、遠
心旋回式、揺動式、振動式、レシプロ式及びジャイロ式
など各種のバレル研磨法が開発され、実用となっている
Conventionally, as one of the effective means for finishing the surface of various metal workpieces, rotation, centrifugal rotation, and rocking are used in a polishing tank filled with abrasive material, water, and compound (hereinafter collectively referred to as "mass") along with the workpiece. Alternatively, a barrel polishing method has been known in which a workpiece is polished by applying motion such as vibration to generate a relative motion between the workpiece and an abrasive material. For example, various barrel polishing methods such as the rotary type, centrifugal rotation type, rocking type, vibration type, reciprocating type, and gyro type have been developed and are now in practical use.

このバレル研磨法はマス・フイニツシングと呼ばれ、そ
の加工能率の高いことで著しい廃屋をみたが、さらに加
工能率の向上及び研磨材の当たりに(い凹部、穴部の研
磨向上が望まれている。
This barrel polishing method is called mass finishing, and its high processing efficiency has led to many abandoned buildings, but it is desired to further improve processing efficiency and improve the polishing of recesses and holes that are difficult to contact with abrasive materials. .

また工作物を特定の酸、アルカリおよびこれら塩類を用
いた浴に浸漬して平滑化する化学研磨は特別°の設備な
要することな(比較的簡易に複雑な形状の工作物も均一
に短時間に研磨できる利点がある。銅および銅合金に対
する化学研磨剤としては、硫酸又は硝酸−過酸化水素混
合溶液に浸漬する平滑処理方法、例えば特公昭jq−6
03J、特公昭ダ3−274/、特公昭3J−32JJ
tなどが公知であり、市販品としてCPB (三菱瓦斯
化学株式会社袈)、ハイプライト(日本パーオキサイド
株式会社1!l)などが実用化されているが、工作物の
表面状態、面粗度の程度、工作物の処理能力に制限があ
り、金属の溶解反応を支配する研磨液の組成、濃度およ
び温度管理、排水処理などに難点があるほか、バレル研
磨と比較すると大きなパリが除去できないという問題点
があった。また板状工作物は密層して研磨が困難であり
、表面が粗化されるなどの欠点があった。
In addition, chemical polishing, in which workpieces are immersed in a bath containing specific acids, alkalis, or these salts to smooth them, does not require special equipment (it is relatively easy to polish workpieces with complex shapes evenly and in a short time). As a chemical polishing agent for copper and copper alloys, a smoothing method of immersion in sulfuric acid or a mixed solution of nitric acid and hydrogen peroxide, such as Japanese Patent Publication Shojiq-6
03J, Special Public Shoda 3-274/, Special Public Sho 3J-32JJ
Although commercially available products such as CPB (Mitsubishi Gas Chemical Co., Ltd.) and Hyprite (Nippon Peroxide Co., Ltd. 1!L) are well-known, the surface condition and surface roughness of the workpiece There are limitations in the processing capacity of workpieces, the composition, concentration and temperature control of the polishing liquid that governs the metal dissolution reaction, and drainage treatment.In addition, compared to barrel polishing, large particles cannot be removed. There was a problem. In addition, the plate-shaped workpiece has such drawbacks that it is difficult to polish because it is densely layered, and the surface becomes rough.

しかるに本発明はモノカルボン酸と過酸化水素の混合液
又はそれに硝酸を加えた化学研磨剤をバレル研磨用のコ
ンパウンドとして使用することによって従来のバレル研
磨および化学研磨の欠点を夫々是正し、バレル研磨の能
率を飛躍的に向上させたもので、その利点を列挙すれば
次の通りである。
However, the present invention corrects the drawbacks of conventional barrel polishing and chemical polishing by using a mixture of monocarboxylic acid and hydrogen peroxide or a chemical polishing agent with nitric acid added thereto as a compound for barrel polishing. The efficiency of the system has been dramatically improved, and its advantages are listed below.

■研磨処理時間の短縮化ができること @研磨材の摩耗量が減少すること @粗仕上、中仕上、光沢仕上などの研磨工程の一部省力
化ができること ■工作物の変形、歪などの防止ができること′■研磨石
による研磨が不可能な微細部分、凹部、穴部の均一な研
磨ができること ■優れた平滑性および光沢性カーあること■メッキ後の
平滑性およびメッキ密看性を向上すること など数多くの利点があり、理想的な銅お工び銅合金バレ
ル研磨用の化学研磨剤を得て、化学研磨併用のバレル研
磨法を成功にみちびいたものであへいま本発明の詳細な
説明すれば仄のとおりである。バレル研磨機として回転
式、遠心旋回式、揺動式、振動式、レシプロ式、ジャイ
ロ式のいずれにも使用可能であるが、研磨沖に過酸化水
素の自動分解により発生する微量酸素、並びに反応熱に
よる内部蓄圧があるので、密閉式バレルでは脱ガス装置
の設置が望ましい。化学研磨剤の消耗に伴い新液の追添
加、反応熱の分散除去、率いは工作物の装入、排出など
の連続全自動化、また工作物の打痕が皆無で優れた光沢
仕上が可能な諸点においても開口型振動バレルが最も好
適である。研磨材の種類としては粗仕上、中仕上、光沢
仕上用のいずれも使用可能であり、工作物の表面状態、
研磨目的に応じて選択される。化学研磨剤は上記した市
販品をバレル研磨に使用するときは、多量に含有する過
酸化水素の自動分解酸素が極めて多(、従って反応熱も
太き(マスの温度制御は困難となり、研磨速度は大きい
が工作物は粗面化し、側底工作物の量産研磨、光沢研磨
は不可能であり、且つ化学研磨剤が高価であるため実用
化は困難であった。
■The polishing processing time can be shortened @The amount of wear of the abrasive material is reduced @The labor can be saved in part of the polishing process such as rough finishing, medium finishing, gloss finishing ■Prevention of deformation and distortion of the workpiece Able to achieve uniform polishing of fine parts, recesses, and holes that cannot be polished with a polishing stone ■ Has excellent smoothness and gloss ■ Improves smoothness and plating tightness after plating We have obtained a chemical polishing agent for ideal copper milling and copper alloy barrel polishing, which has led to the success of the barrel polishing method combined with chemical polishing. The explanation is as follows. As a barrel polishing machine, it can be used in any of the rotating, centrifugal rotating, rocking, vibrating, reciprocating, and gyroscopic types; Due to internal pressure build-up due to heat, it is desirable to install a degassing device in closed barrels. Addition of new liquid as the chemical polishing agent wears out, dispersion and removal of reaction heat, continuous and fully automatic loading and unloading of workpieces, and excellent glossy finish with no dents on workpieces. The open type vibrating barrel is the most suitable in various respects. The type of abrasive can be used for rough finishing, medium finishing, or gloss finishing, and it can be used for rough finishing, medium finishing, and gloss finishing.
Selected according to the purpose of polishing. When using the above-mentioned commercially available chemical polishing agents for barrel polishing, the large amount of hydrogen peroxide that contains a large amount of autolytic decomposition oxygen is extremely high (therefore, the reaction heat is also large (it becomes difficult to control the temperature of the mass, and the polishing speed decreases). Although the surface of the workpiece is large, the surface of the workpiece becomes rough, mass-produced polishing and gloss polishing of side bottom workpieces are impossible, and the chemical polishing agent is expensive, making it difficult to put it into practical use.

本発明者らは各種・無機酸、有機酸と過酸化物との組合
せを検討した結果、特にモノカルボン酸と過酸化水素の
混合系が研磨速度および表面精度の向上に有効であるこ
とを見出し本発明に到達した。
The present inventors investigated combinations of various inorganic acids, organic acids, and peroxides, and found that a mixed system of monocarboxylic acid and hydrogen peroxide is particularly effective in improving polishing speed and surface precision. We have arrived at the present invention.

モノカルボン酸対過酸化水素の濃度にはバレル研磨に適
当な範囲があって、酢酸対過酸化水素ではモル比で0.
2〜/、6、蟻酸対過酸化水素ではモル比がO0/〜0
.この範囲が有効である。即ち、酢酸−過酸化水素系研
磨剤では酢酸の含有量が20017を以下、過酸化水素
が/301/L以下が、また蟻酸−過酸化水素では蟻酸
が2 o o t/L以下、過酸化水素が2soVt以
下とするのが適当である。前記したモル比の範囲未満で
は研磨速度(研磨能率)が低下し、またこの範囲を超え
ると銅亜鉛合金ではいわゆる脱亜鉛現象を呈し、銅費工
び銅合金は粗面化して、平滑性、光沢性が阻害された。
There is a range of monocarboxylic acid to hydrogen peroxide concentrations suitable for barrel polishing, with a molar ratio of acetic acid to hydrogen peroxide of 0.
2~/, 6, for formic acid to hydrogen peroxide, the molar ratio is O0/~0
.. This range is valid. That is, for acetic acid-hydrogen peroxide based polishing agent, the acetic acid content is 20017 or less and hydrogen peroxide is /301/L or less, and for formic acid-hydrogen peroxide, formic acid is 2 o t/L or less and peroxide is It is appropriate that hydrogen is 2 soVt or less. If the molar ratio is less than the above range, the polishing rate (polishing efficiency) will decrease, and if it exceeds this range, the copper-zinc alloy will exhibit a so-called dezincing phenomenon, and the surface of the copper-processed copper alloy will become rough, resulting in poor smoothness and Glossiness was inhibited.

さらにモノカルボン酸−過酸化水素混合液系に少量の硝
−[+’添加すると工作物の平滑性、光沢aを阻害せず
に研磨速度を増大する効果があろうこの場合添加する硝
酸の量は酢酸対過酸化水素のモル比がo、7が1.−以
下、また蟻酸対過酸化水素のモル比が。。3〜O,Sの
範囲で硝酸と蟻酸対過酸化水素のモル比が0.7以下の
研磨剤が有効であり、この範囲以外では工作物の表面が
粗化された。
Furthermore, adding a small amount of nitric acid to the monocarboxylic acid-hydrogen peroxide mixture system will have the effect of increasing the polishing rate without impairing the smoothness and gloss of the workpiece. The molar ratio of acetic acid to hydrogen peroxide is o, 7 is 1. - Below is also the molar ratio of formic acid to hydrogen peroxide. . An abrasive with a molar ratio of nitric acid and formic acid to hydrogen peroxide of 0.7 or less in the range of 3 to O,S is effective, and outside this range the surface of the workpiece is roughened.

なお、上記ではモノカルボン酸として酢酸と蟻酸の例を
述べたが、例えばプロピオン酸、アクリル酸、酪酸など
のような易水溶性のモノカルボン酸も本発明のバレル研
磨法に使用しうる。また以上のバレル研磨後の工作物の
表面は黄褐色を呈するが、0.l−コチの稀釈硝酸溶液
等で洗浄すれば金属光沢を出現し、さらに通常のバレル
研磨で光沢仕上を短時間性なえばより優れた光沢性、平
滑性を得ることができる。
In addition, although acetic acid and formic acid were mentioned as examples of monocarboxylic acids above, easily water-soluble monocarboxylic acids such as propionic acid, acrylic acid, butyric acid, etc. can also be used in the barrel polishing method of the present invention. Furthermore, the surface of the workpiece after barrel polishing has a yellowish brown color, but 0. If it is washed with a diluted nitric acid solution of l-flat, a metallic luster will appear, and if the gloss finish is achieved in a short time by ordinary barrel polishing, better gloss and smoothness can be obtained.

以下、本発明tさらに実施例によって説明するが1本発
明はこの実施例によって限定されるものではない。
Hereinafter, the present invention will be further explained with reference to Examples, but the present invention is not limited to these Examples.

実施例1 真鍮製試験Je (BIB )と株式会社敷島チップト
ン製研磨石3P−ざと共に株式会社敷島チップトン製各
種バレル研磨機(装入して化学研磨剤による研磨状況を
観察した。
Example 1 Brass test Je (BIB) and polishing stone 3P-za manufactured by Shikishima Tipton Co., Ltd. and various barrel polishing machines manufactured by Shikishima Tipton Co., Ltd. were loaded and the polishing conditions with chemical abrasives were observed.

化学研磨剤は下記成分を配合し、水に希釈溶解して上記
化学研磨剤量にして夫々のバレル研磨機種別に装入した
。対照例くバレルのみ〉では株式会社敷島チップトン製
コンパウンドQCPy xyt/Lの割合で装入し、く
浸漬めみ〉では化学研磨剤it中に攪拌下で試験片を懸
帛してテストヲ行なっち実施例1においてバレル研磨の
み凄比較すると回転バレルで約ttro 倍、 振動バ
レルで約90倍、遠心旋回バレルで約5倍の著しく大き
な研磨量を得た。
The chemical polishing agent was prepared by blending the following ingredients, diluting and dissolving it in water, and charging the chemical polishing agent in the above amount into each barrel polishing machine. For the control example, a compound QCPy manufactured by Shikishima Chipton Co., Ltd. was charged at a ratio of Comparing only barrel polishing in Example 1, a significantly larger amount of polishing was obtained with the rotating barrel, approximately 90 times with the vibrating barrel, and approximately 5 times with the centrifugal rotating barrel.

また化学研磨剤への浸漬めみと比較すると回転バレルの
同じ組成の場合で研磨量は約1.3倍、表面アラサは/
、? IE&からOoSIlmに著しく向上したOまた
化学研磨剤混合組成の範囲を超えた場合は表面粗度が悪
化し、範囲未満の場合は研磨量が少な(実用に至らなか
った。
Also, compared to immersion in chemical abrasives, the amount of polishing is approximately 1.3 times with the same composition of rotating barrel, and the surface roughness is /
,? O was significantly improved from IE& to OoSIlm. Also, when the chemical polishing agent mixture composition exceeds the range, the surface roughness deteriorates, and when it falls below the range, the amount of polishing is small (it has not been put to practical use).

実施例2 真鍮製給水栓袋ナツト(寸法29yIX/−一、重量x
t)の切削成形後のパリ取りとメッキ前処理としての光
沢仕上を株式会社敷島チップトン製振動バレルCL−t
ooおよび下記研磨石で行なった。
Example 2 Brass faucet bag nut (dimensions 29yIX/-1, weight x
The vibrating barrel CL-t manufactured by Shikishima Tipton Co., Ltd. was used to remove deburrs after cutting and form t) and to give a glossy finish as a pre-plating treatment.
oo and the following polishing stone.

(1)粗仕上(バレル研磨のみ) (2)中仕上(化学研磨剤併用のバレル研磨)−間 分 ↓ + /  IqN 上記の研磨条件で粗仕上、中仕上を行なった後マスを水
洗し、0.3%硝酸溶液で洗浄、再び水洗後、光沢仕上
を行なった結果得られた工作物は金属光沢に富み1表面
ア2す0.3μmで打痕もな(、ニッケルクロムメッキ
を施した製品は極めて平滑度、光沢性に優れ、メッキ密
着性は良好でネジ山(P8−j)により3時間の研磨時
間を要しており、ネジ山の変形およびメッキ密着性に問
題点があった。
(1) Rough finishing (barrel polishing only) (2) Semi-finishing (barrel polishing with chemical polishing agent) - Min.↓ + / IqN After performing rough finishing and semi-finishing under the above polishing conditions, wash the mass with water, After washing with 0.3% nitric acid solution and water again, the resulting workpiece was given a glossy finish.The resulting workpiece was rich in metallic luster and had no dents measuring 0.3 μm in diameter on each surface (1 surface was coated with nickel chrome plating). The product had excellent smoothness and gloss, and good plating adhesion, but it required 3 hours of polishing time due to the threads (P8-j), which caused problems with deformation of the threads and plating adhesion. .

以上述べたよ5に本発明によれば、モノカルボン酸−過
酸化水素系の銅および銅合金用化学研磨剤をバレル研磨
のコンパウンドとして使用することにより、研磨能率に
著しい向上を計ることができ、従来のバレル研磨および
化学研磨の問題点をことごと(解決することができた。
As stated above, according to the present invention, by using a monocarboxylic acid-hydrogen peroxide based chemical polishing agent for copper and copper alloys as a compound for barrel polishing, polishing efficiency can be significantly improved. We were able to solve all the problems with conventional barrel polishing and chemical polishing.

またモノカルボン酸−過酸化水素系に安価な硝#1.ヲ
添加して、さらに研磨能率を向上できるばかりでなく、
コストの低減l計るこζ、ができたものである。
In addition, inexpensive nitric acid #1 is used for monocarboxylic acid-hydrogen peroxide systems. Not only can the polishing efficiency be further improved by adding
This allows for cost reduction.

特許庁長官  若 杉 和 夫    殿1. 事件の
表示 昭和56年特 許 願第14176/号事件との関係 
特許出願人 4、代 理 人 (郵便番号160) 住所 末京都新宿区信濃町29番、地徳明ビル電話 東
 京 (353)  3407 (代)Z 補正の内容 (1)  明細書グ頁g行目に「硝酸−過酸化水素」と
あるを「硝酸−過酸化水素」と訂正する。
Kazuo Wakasugi, Commissioner of the Patent Office1. Indication of the incident Relationship to the 1980 Patent Application No. 14176/case
Patent applicant 4, agent (zip code 160) Address Chitokumei Building, 29 Shinanomachi, Shinjuku-ku, Tokyo Telephone: Tokyo (353) 3407 (actor) Z Contents of the amendment (1) Specification page G, line g ``Nitric acid-hydrogen peroxide'' is corrected to ``nitric acid-hydrogen peroxide.''

(,2)明細書g頁iq行目に「(BSB)と」とある
を「(BsB)を」と訂正する。
(, 2) In the iqth line of page g of the specification, the phrase "(BSB)" is corrected to "(BsB)".

(3)明細書13頁5行目に「下記研磨石」とある乞「
下記株式会社敷島チツプト/製研磨石及びコンパウンド
」と訂正する。
(3) On page 13, line 5 of the specification, there is a statement that says ``the following polishing stone''.
The following has been corrected to read "Abrasive stones and compounds made by Shikishima Chip Co., Ltd."

(弘)明細書/1頁/2行目〜13行目に「モノカル?
縁−過酸化水素」とあるン「モノカル御飯−過酸化水素
」と訂正する。
(Hiroshi) Specification/Page 1/Line 2-13: “Monocal?
The text that says "rim - hydrogen peroxide" has been corrected to "monocal rice - hydrogen peroxide."

Claims (1)

【特許請求の範囲】 ! 研磨槽内へ研磨材、モノカルボン酸−・過酸化水素
系化学研磨剤と銅又は銅合金の工作物とを装入してバレ
ル研磨することを特徴とする化学研磨併用のバレル研磨
法 ユ モノカールボン酸が酢酸であり酢酸−過酸化水素系
化学研磨剤中の酢酸の含有量が2ooVL〜29−/l
、過酸化水素の含有量が/ 30f//L−/ t/L
であることを特徴とする特許請求の範囲第1項記載の化
学研磨併用のバレル研磨法 j モノカルボン酸が蟻酸であり蟻酸−過酸化水素系化
学研磨剤中の蟻酸の含有量が一〇0f/l〜714、過
酸化水素の含有量が2!;Oiμ〜コtAであることを
特徴とする特許請求の範囲第1項記載の化学研磨併用の
バレル研磨法 り 研磨槽内へ研磨材、モノカル艙ン酸−過酸化水素系
化学研磨剤および硝酸と銅又は銅合金の工作物とを装入
してバレル研磨することを特徴とする化学研磨併用のバ
レル研磨法 工 添加する硝酸は酢酸対過酸化水素のモル比が0.7
〜i、oの範囲で、且つ硝酸と酢酸対過酸化水素のモル
比が1.二以下であることを特徴とする特許請求の範囲
第事項記載の化学研磨併用のバレル研磨法 6、添加する硝酸は蟻酸対過酸化水素のモル比がO,S
〜O0Sの範囲で、且つ硝酸と蟻酸対過酸化水素のモル
比が0.7以下であることを特徴とする特許請求の範囲
第ダ項記載の化学研磨併用のバレル研磨法 7、研磨槽内へ研磨材、モノカルボン酸−過酸化水素系
化学研磨剤と銅又は銅合金の工作物とを装入してバレル
研磨した後、前記工作物を稀薄な酸溶液で洗浄し、つい
で通常のバレル研磨により光沢仕上げすること′lf:
特徴とした化学研磨併用のバレル研磨法 ξ 研磨槽内へ研磨材、モノカルボン酸−過酸化水素系
化学研磨剤および硝酸と銅又は銅合金の工作物とを装入
してバレル研磨した後、前記工作物を稀薄な酸溶液で洗
浄し、ついで通常のバレル研磨により光沢仕上げするこ
とを特徴とした化学研磨併用のバレル研磨法
[Claims]! Barrel polishing method combined with chemical polishing characterized by charging a polishing material, a monocarboxylic acid/hydrogen peroxide type chemical polishing agent, and a copper or copper alloy workpiece into a polishing tank and performing barrel polishing. The carboxylic acid is acetic acid, and the content of acetic acid in the acetic acid-hydrogen peroxide chemical polishing agent is 2ooVL ~ 29-/l.
, the content of hydrogen peroxide is /30f//L-/t/L
Barrel polishing method combined with chemical polishing according to claim 1, characterized in that the monocarboxylic acid is formic acid, and the content of formic acid in the formic acid-hydrogen peroxide chemical polishing agent is 100 f. /l~714, hydrogen peroxide content is 2! Barrel polishing method combined with chemical polishing according to claim 1, characterized in that the abrasive material, monocarboxylic acid-hydrogen peroxide based chemical polishing agent, and nitric acid are introduced into the polishing tank. Barrel polishing method combined with chemical polishing characterized by barrel polishing by charging copper or copper alloy workpiece.The nitric acid added has a molar ratio of acetic acid to hydrogen peroxide of 0.7.
~i, o, and the molar ratio of nitric acid and acetic acid to hydrogen peroxide is 1. Barrel polishing method combined with chemical polishing according to the item No. 2 of the claims, characterized in that the molar ratio of nitric acid to hydrogen peroxide to formic acid is O, S
~OOS, and the molar ratio of nitric acid and formic acid to hydrogen peroxide is 0.7 or less, Barrel polishing method 7 combined with chemical polishing according to claim d, in a polishing tank After barrel polishing is performed by charging an abrasive material, a monocarboxylic acid-hydrogen peroxide based chemical polishing agent, and a copper or copper alloy workpiece, the workpiece is cleaned with a dilute acid solution, and then a regular barrel polishing is performed. To achieve a glossy finish by polishing:
Featured barrel polishing method with chemical polishing A barrel polishing method combined with chemical polishing, characterized in that the workpiece is cleaned with a dilute acid solution and then polished to a glossy finish by ordinary barrel polishing.
JP16176181A 1981-10-09 1981-10-09 Barrel polishing method combined with chemical polishing Expired JPS6047909B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16176181A JPS6047909B2 (en) 1981-10-09 1981-10-09 Barrel polishing method combined with chemical polishing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16176181A JPS6047909B2 (en) 1981-10-09 1981-10-09 Barrel polishing method combined with chemical polishing

Publications (2)

Publication Number Publication Date
JPS5864385A true JPS5864385A (en) 1983-04-16
JPS6047909B2 JPS6047909B2 (en) 1985-10-24

Family

ID=15741386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16176181A Expired JPS6047909B2 (en) 1981-10-09 1981-10-09 Barrel polishing method combined with chemical polishing

Country Status (1)

Country Link
JP (1) JPS6047909B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0747939A3 (en) * 1995-06-08 1998-10-14 Kabushiki Kaisha Toshiba Copper-based metal polishing solution and method for manufacturing a semiconductor device
US6270688B1 (en) * 1994-04-07 2001-08-07 Raytheon Company Chemical polishing of barium strontium titanate
WO2004085707A1 (en) * 2003-03-21 2004-10-07 Swagelok Company Aqueous metal finishing solution, methods for finishing metal components, system for cleaning metal components and finished brass products

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62156609U (en) * 1986-03-26 1987-10-05

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6270688B1 (en) * 1994-04-07 2001-08-07 Raytheon Company Chemical polishing of barium strontium titanate
EP0747939A3 (en) * 1995-06-08 1998-10-14 Kabushiki Kaisha Toshiba Copper-based metal polishing solution and method for manufacturing a semiconductor device
WO2004085707A1 (en) * 2003-03-21 2004-10-07 Swagelok Company Aqueous metal finishing solution, methods for finishing metal components, system for cleaning metal components and finished brass products

Also Published As

Publication number Publication date
JPS6047909B2 (en) 1985-10-24

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