JPS5871396A - Anode-current carrying structure in horizontal electroplating equipment - Google Patents
Anode-current carrying structure in horizontal electroplating equipmentInfo
- Publication number
- JPS5871396A JPS5871396A JP16884381A JP16884381A JPS5871396A JP S5871396 A JPS5871396 A JP S5871396A JP 16884381 A JP16884381 A JP 16884381A JP 16884381 A JP16884381 A JP 16884381A JP S5871396 A JPS5871396 A JP S5871396A
- Authority
- JP
- Japan
- Prior art keywords
- anode
- current
- current carrying
- carrying body
- carrying structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
この発明Fi横型電気メッキ装置くおける陽極−通電体
構造に関し、4IKスライド式陽極−通電体構造に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an anode-conductor structure in a Fi horizontal electroplating apparatus, and relates to a 4IK sliding anode-conductor structure.
構製電気メッキ装置において自溶性の陽極を用いる場合
は通常定置方式で操業されるが、ハロゲンタイプのスズ
メツキライン等においては陽極をスライドさせて操業が
行われる。When a self-fusing anode is used in a structural electroplating device, it is usually operated in a stationary manner, but in a halogen type Suzmetuki line, etc., the operation is carried out with the anode sliding.
このようなスライド方式の陽極を用いる場合、陽極をス
ライド中に陽極と通電体とが1ikML不良を起し、こ
れらの間で・スパークが発生する問題があった・また陽
極を平行にスライドさせることが難しく、ジグザグ状に
なる欠点があった。When using such a sliding type anode, there was a problem that the anode and the current-carrying body caused a 1ikML failure while sliding the anode, and sparks were generated between them. Also, it was difficult to slide the anode in parallel. It was difficult and had the disadvantage of creating a zigzag pattern.
本発明はこれらの欠点を改善するためになされたもので
、陽極のスライドガイド機*ft設けることKよル陽v
iihO接触不良を防止すると共に陽極の平行なスライ
ドを可能にしたものである。The present invention has been made to improve these drawbacks, and is to provide an anode slide guide device *ft.
iihO This prevents poor contact and allows the anode to slide in parallel.
以下本発明の実施例を図面に基づいて説明する。Embodiments of the present invention will be described below based on the drawings.
3111図におI/−m−C(7)はメッキ槽、αpは
シールロール、(4)は被メツキ鋼板であ1(1)は陽
極、(2)線通電体である。この実施例においては・陽
1i (1)の前後に顕画カギ蓋のガイド(3バ3)が
設けられている・このガイド(3) (3)はメッキ槽
韓の幅方向に伸びてお)、陽極(1)はこのガイド(3
バ3JK沿ってスライドする・
このような構成によれば、陽極(l]はガイド(3バ3
)に導かれて平行にかつ規則的に移動するから陽極(1
)、と通電体(2)との関に接触不良等が生ずることな
く、スパークも生じない。また陽極(1)の配列がジグ
ザグになることもない。In Figure 3111, I/-m-C (7) is a plating tank, αp is a seal roll, (4) is a steel plate to be plated, 1 (1) is an anode, and (2) is a wire current carrying body. In this embodiment, - Guides (3 bars 3) for the development key lid are provided before and after the positive 1i (1). - This guide (3) (3) extends in the width direction of the plating tank. ), the anode (1) is attached to this guide (3
According to such a configuration, the anode (l) slides along the guide (bar 3JK).
) is guided by the anode (1
), and the current-carrying body (2), there is no contact failure or the like, and no sparks are generated. Further, the arrangement of the anodes (1) does not become zigzag.
第2図は本発明の他の実施例を示すもので、この実施例
では陽極(1)に断面長方形の溝(4)をメッキ槽幅方
向に形成し、と?−に円形状の通電体(25を嵌合し次
構成としている。該溝(4)によQ1陽極(1)は通電
体(2)K沿ってスライドする。従ってこの実施例では
該溝(4)と通電体(2)とがガイド機構を兼ねている
。FIG. 2 shows another embodiment of the present invention, in which a groove (4) with a rectangular cross section is formed in the anode (1) in the width direction of the plating bath. A circular current carrying body (25) is fitted into the groove (4), and the Q1 anode (1) slides along the current carrying body (2) K. Therefore, in this embodiment, the groove ( 4) and the current-carrying body (2) also serve as a guide mechanism.
第3図に示す実施例では第18に示す実施例と同様に陽
極(1)の前後に断面カギ屋のガイド(3)を設けてお
り、更にとのガイド(3)K通電体の機能を持たせ通電
体とガイドとを兼用する構成としている◎
尚、上記した各実施例のスライドガイドを用いても陽極
のスライドピッチが2時間以上になると陽極と通電体と
の間で溶着等の現象が発生し、とれKよシスライド中に
スパークが発生する。この溶着現象と操業時間との関係
を第4図に示す。このグラフはZnSO4: 50Gf
/L t PH=4 e電流密度60 A/dm” O
メッキ条件で得たものである・
との溶着現象は通電面積の減少や接触圧の低下によシ引
起されるもので、またこの通電面積の減少は陽極と通電
体との接触部の間隙部への酸化膜の生処、或−はアニオ
ンの錯体を形成するような合金メッキ浴については復極
現象による金属酸化物の析出に起因している。In the embodiment shown in FIG. 3, similar to the embodiment shown in FIG. The structure is such that it serves both as a holding current carrying body and a guide ◎ Even if the slide guides of the above-mentioned embodiments are used, phenomena such as welding between the anode and the current carrying body may occur if the slide pitch of the anode exceeds 2 hours. occurs, and a spark is generated during the slide. FIG. 4 shows the relationship between this welding phenomenon and operating time. This graph shows ZnSO4: 50Gf
/L t PH=4 eCurrent density 60 A/dm” O
The welding phenomenon obtained under the plating conditions is caused by a decrease in the current-carrying area and a decrease in contact pressure, and this decrease in the current-carrying area also occurs in the gap between the contact area between the anode and the current-carrying body. For alloy plating baths that form an oxide film or an anion complex, this is due to the precipitation of metal oxides due to depolarization.
とのようなスライドピッチ−fi2時間を超える場合に
スパーク0IjA因となる陽極と通電体O溶着を防止す
る危めKは、ガイド機構の構造を陽極と通電体とが高接
触圧、高接触面で接触し得る構造とすることが必要であ
る◎@@図はこのような溶着防止を目的とした実施例を
示すもので、陽極(1)に断面3角形状の溝(4)をメ
ッキ槽幅方向に形成し・この溝(4ンに通電体(4t−
嵌合させた構成としている・通電体4も断面3角形状の
突部■を有し、この央部410を陳溝(45K嵌合させ
ている。このような構成によれば突部(イ)の頂点と、
壽(4)とが高圧力で接触し、しかも接触面積も大きく
なるため、その接触面の間隙部の酸化膜の生成や7ニオ
ンの錯体を形成するような合金メッキ浴においては復極
現象による金属酸化物の析出を防止できる。そのため、
とれらのぶ因によって生じるスパークも抑制することが
可能となる。この実施例では更に陽極(1)の通電体(
2ンの接触部近傍にノズル(5)を設け、このノズル(
5ンから該接触部にメッキ液噴流を与え、これにより前
記した復極現象を更に防止し得るようKしている。The risk of preventing welding between the anode and the current-carrying body, which can cause sparks if the slide pitch exceeds 2 hours, is to ensure that the structure of the guide mechanism is such that the anode and the current-carrying body have a high contact pressure and a high contact surface. ◎@@The figure shows an example for the purpose of preventing such welding, in which a groove (4) with a triangular cross section is formed in the anode (1) in the plating bath. Form this groove in the width direction.
- The current carrying body 4 also has a protrusion (3) with a triangular cross section, and this central part 410 is fitted with a groove (45K). ) and
(4) contacts under high pressure and the contact area becomes large, so in alloy plating baths where oxide films are formed in the gaps between the contact surfaces and complexes of 7 ions are formed, depolarization occurs. Precipitation of metal oxides can be prevented. Therefore,
It is also possible to suppress sparks caused by sloshing. In this embodiment, the current-carrying body (
A nozzle (5) is provided near the contact part of the
A jet of plating solution is applied to the contact portion from the contact point 5, thereby further preventing the depolarization phenomenon described above.
以上述べたように1本発VSO陽極−通電体構造では陽
極をスライドさせる際に陽極をガイドする機構を設けて
いるため、陽極のスライドが円滑にかつ平行に行われる
。そのため陽極と通電体との藺の接触手鼻−を防止し、
これらの間に生ずるスパークを防止することができる・
を次スライドが平行に行われるから陽極の配列が乱れる
ことがなi等の効果がある。As described above, in the single VSO anode-conductor structure, since a mechanism is provided to guide the anode when sliding the anode, the anode slides smoothly and in parallel. This prevents accidental contact between the anode and the current-carrying body.
Sparks that occur between these can be prevented.
Since the next slide is performed in parallel, the arrangement of the anodes is not disturbed, which has the following effects.
第1図は本発明の陽極−通電体構造の一実施例を示す正
断面図、llX2mは他の実施例を示す正断面図、第3
図は更に他の実施例を示す正断面図、第4図は操業時間
と溶着発生との関係を示すグ27、第5図は更に他の実
施例を示す正断面図である。
(1)・・・陽極、(2)<2J<I>・・・通電体、
(3バか・・ガイド% (4)(4)・・・溝、(5)
・・・ノズル、■・・・突部。
特許出願人 日本鋼管株式会社Fig. 1 is a front sectional view showing one embodiment of the anode-current carrying body structure of the present invention, 11X2m is a front sectional view showing another embodiment, and Fig. 3
The figure is a front sectional view showing still another embodiment, FIG. 4 is a diagram 27 showing the relationship between operating time and occurrence of welding, and FIG. 5 is a front sectional view showing still another embodiment. (1)...anode, (2)<2J<I>...current carrying body,
(3 bars...Guide% (4) (4)...Groove, (5)
...Nozzle, ■...Protrusion. Patent applicant Nippon Kokan Co., Ltd.
Claims (1)
機構を有すること1−特徴とする横溢電気メッキ装置に
おける陽極−通電体゛構造。1. An anode-current carrying body structure in an overflow electroplating apparatus characterized by having a guide mechanism for sliding the anode when sliding the anode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16884381A JPS5871396A (en) | 1981-10-23 | 1981-10-23 | Anode-current carrying structure in horizontal electroplating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16884381A JPS5871396A (en) | 1981-10-23 | 1981-10-23 | Anode-current carrying structure in horizontal electroplating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5871396A true JPS5871396A (en) | 1983-04-28 |
Family
ID=15875555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16884381A Pending JPS5871396A (en) | 1981-10-23 | 1981-10-23 | Anode-current carrying structure in horizontal electroplating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5871396A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6174417B1 (en) | 1998-05-20 | 2001-01-16 | Process Automation International Ltd. | Electroplating machine |
| US6261425B1 (en) | 1998-08-28 | 2001-07-17 | Process Automation International, Ltd. | Electroplating machine |
-
1981
- 1981-10-23 JP JP16884381A patent/JPS5871396A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6174417B1 (en) | 1998-05-20 | 2001-01-16 | Process Automation International Ltd. | Electroplating machine |
| US6241860B1 (en) | 1998-05-20 | 2001-06-05 | Process Automation International, Ltd. | Electroplating machine |
| US6251234B1 (en) | 1998-05-20 | 2001-06-26 | Process Automation International, Ltd. | Electroplating machine |
| US6261425B1 (en) | 1998-08-28 | 2001-07-17 | Process Automation International, Ltd. | Electroplating machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102387496B1 (en) | How to electroplate an uncoated steel strip with a plated layer | |
| US1970804A (en) | Electrode for electrolytic baths | |
| JPS5871396A (en) | Anode-current carrying structure in horizontal electroplating equipment | |
| ES419035A1 (en) | Zinc electroplating process and electrolyte therefor | |
| FR2402015A1 (en) | NEW PROCESS OF ELECTROLYTIC SILVER COATING | |
| US3236708A (en) | Etching of metals | |
| EP0461271A1 (en) | Process for continuously applying electro-deposited manganese or manganese alloy coating to steel plate | |
| JPH0111733Y2 (en) | ||
| US2291592A (en) | Electrical rectifier | |
| JPH10237685A (en) | Method of preventing dissolution of steel strip in tin plating bath | |
| US4545864A (en) | Selective plating | |
| US2368749A (en) | Electrolytic method of preparing electrical rectifiers | |
| JPH0342044Y2 (en) | ||
| JPS62274098A (en) | Uniform electroplating method | |
| JPS6244592A (en) | High-speed electrolytic sliver plating method | |
| JPS60106972A (en) | Metsuki method | |
| JP3288272B2 (en) | Electroplating equipment | |
| JP3408411B2 (en) | Continuous electroplating equipment | |
| JPS6096797A (en) | Method for preventing adhesion of plating metal to electroplating current supply roll | |
| JPH10110291A (en) | Electroplating tank with tree tin prevention function | |
| JPS59170299A (en) | Method for reducing fe3+ in iron electroplating bath | |
| JPS6032121Y2 (en) | Horizontal electric mesh cell made of strip metal plate | |
| JPH10204699A (en) | Direct current electrolytic etching equipment | |
| JPS5629661A (en) | Manufacture of one-side zinc-plated steel-plate | |
| JPS61186498A (en) | Operating method of plating in horizontal type electroplating installation |