JPS5873317U - gas absorption device - Google Patents

gas absorption device

Info

Publication number
JPS5873317U
JPS5873317U JP16664181U JP16664181U JPS5873317U JP S5873317 U JPS5873317 U JP S5873317U JP 16664181 U JP16664181 U JP 16664181U JP 16664181 U JP16664181 U JP 16664181U JP S5873317 U JPS5873317 U JP S5873317U
Authority
JP
Japan
Prior art keywords
spray
gas
pipe
liquid reservoir
circulation pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16664181U
Other languages
Japanese (ja)
Inventor
杉田 泰
小栗 晴夫
池野 栄勝
田丸 忠義
利浩 阿部
文彦 山口
Original Assignee
石川島播磨重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 石川島播磨重工業株式会社 filed Critical 石川島播磨重工業株式会社
Priority to JP16664181U priority Critical patent/JPS5873317U/en
Publication of JPS5873317U publication Critical patent/JPS5873317U/en
Pending legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

図は本考案の一実施例を示した一部切欠立面図である。 a・・・・・・ガス吸収塔、1・・・・・・スプレー液
溜め、2・・・・・・ガス入口、3・・・・・・ガス出
口、4・・・・・・充てん層、5・・・・・・上部スプ
レー管、6・・・・・・下部スプレー管、7・・・・・
・上部スプレー用循環管、8・・・・・・上部スプレー
用循環ポンプ、9・・・・・・上部スプレー用流量調整
弁、10・・・・・・下部スプレニ用循環管、11・・
・・・・下部反プレー用循環ポンプ、12・・・・・・
下部スプレー用流量調整弁。
The figure is a partially cutaway elevational view showing an embodiment of the present invention. a...Gas absorption tower, 1...Spray liquid reservoir, 2...Gas inlet, 3...Gas outlet, 4...Filling Layer, 5... Upper spray pipe, 6... Lower spray pipe, 7...
・Circulation pipe for upper spray, 8...Circulation pump for upper spray, 9...Flow rate adjustment valve for upper spray, 10...Circulation pipe for lower spray, 11...
...lower anti-play circulation pump, 12...
Flow control valve for lower spray.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 底部に設けられたスプレー液溜めと、このスプレー液溜
めの上部側方に設けられて硫黄酸化物を含むガスを導入
するガス入口と、最上部に設けられて処理されたガスを
排出するガス出口と、前記ガス入口とガス出口の間に設
けられた充てん層と、この充てん層と前記ガス出口の間
に設けられた上部スプレー管と、前記光てん層とガス入
口の間に設けられた下部スプレー管とを有するガス吸収
部を備え、かつ、前記スプレー液溜めと上部スプレー管
とを連結している上部スプレー用循環管を有するととも
に、この上部スプレー用循環管の途中に設けられた上部
スプレー用循環ポンプと上部用、弁とを備え、しかも、
前記スプレー液溜めと下部スプレー管とを連結している
下部スプレー用循環管を有するとともに、この下部スプ
レー用循環管の途中に設けられた下部スプレー珀循環ポ
ンプと下部用弁とを備えていることを特徴とする、ガス
吸収装置。
A spray liquid reservoir provided at the bottom, a gas inlet provided at the upper side of the spray liquid reservoir for introducing gas containing sulfur oxide, and a gas outlet provided at the top for discharging the treated gas. a filling layer provided between the gas inlet and the gas outlet; an upper spray tube provided between the filling layer and the gas outlet; and a lower part provided between the photoreceptor layer and the gas inlet. and an upper spray circulation pipe that connects the spray liquid reservoir and the upper spray pipe, and an upper spray circulation pipe provided in the middle of the upper spray circulation pipe. It is equipped with a circulation pump for the upper part and a valve for the upper part.
It has a lower spray circulation pipe connecting the spray liquid reservoir and the lower spray pipe, and also includes a lower spray pipe circulation pump and a lower valve provided in the middle of the lower spray circulation pipe. A gas absorption device featuring:
JP16664181U 1981-11-10 1981-11-10 gas absorption device Pending JPS5873317U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16664181U JPS5873317U (en) 1981-11-10 1981-11-10 gas absorption device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16664181U JPS5873317U (en) 1981-11-10 1981-11-10 gas absorption device

Publications (1)

Publication Number Publication Date
JPS5873317U true JPS5873317U (en) 1983-05-18

Family

ID=29958792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16664181U Pending JPS5873317U (en) 1981-11-10 1981-11-10 gas absorption device

Country Status (1)

Country Link
JP (1) JPS5873317U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004313893A (en) * 2003-04-15 2004-11-11 Esupo Kk Packing material for cleaning gas and system for cleaning contaminated gas

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004313893A (en) * 2003-04-15 2004-11-11 Esupo Kk Packing material for cleaning gas and system for cleaning contaminated gas

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