JPS5896871A - Vacuum deposition furnace - Google Patents
Vacuum deposition furnaceInfo
- Publication number
- JPS5896871A JPS5896871A JP19368281A JP19368281A JPS5896871A JP S5896871 A JPS5896871 A JP S5896871A JP 19368281 A JP19368281 A JP 19368281A JP 19368281 A JP19368281 A JP 19368281A JP S5896871 A JPS5896871 A JP S5896871A
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- zinc
- heater
- rate
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 11
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 22
- 239000011701 zinc Substances 0.000 abstract description 22
- 229910052725 zinc Inorganic materials 0.000 abstract description 22
- 238000007740 vapor deposition Methods 0.000 abstract description 13
- 229910000831 Steel Inorganic materials 0.000 abstract description 7
- 239000007788 liquid Substances 0.000 abstract description 7
- 239000010959 steel Substances 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 4
- 230000008020 evaporation Effects 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000002344 surface layer Substances 0.000 abstract description 2
- 230000004043 responsiveness Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000007747 plating Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、例えば銅帯に亜鉛メッキを施すだめの連続真
空蒸着装置において、蒸着速度の応答性が早く、メッキ
性能の良い蒸着炉に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vapor deposition furnace that has quick response in vapor deposition rate and good plating performance in a continuous vacuum vapor deposition apparatus for, for example, galvanizing copper strips.
銅帯に連続的に亜鉛メッキ皮膜を形成する方法として、
従来の溶融亜鉛浴法や電気メツキ法の外に、片面のみの
メッキに対する有利性から真空蒸着メッキ法が注目され
ている。従来の蒸着炉の形式は第1図に示すように炉の
下部から加熱する形式のものである。As a method of continuously forming a galvanized film on a copper strip,
In addition to the conventional molten zinc bath method and electroplating method, the vacuum evaporation plating method is attracting attention because of its advantage over plating on only one side. A conventional vapor deposition furnace is one in which heating is performed from the bottom of the furnace, as shown in FIG.
第1図において、1は真空雰囲気中に収容した炉体でこ
の内部に溶融亜鉛7が保持されている。天井5の一部に
開口部6があり、ヒンジ5の回りに回転駆動されるシャ
ッター4で覆われている。炉の下方に加熱源のヒータ8
が設置され、炉体1とヒータ8は共に保温材9で覆われ
ている。In FIG. 1, numeral 1 denotes a furnace body housed in a vacuum atmosphere, and molten zinc 7 is held inside the furnace body. There is an opening 6 in a part of the ceiling 5, which is covered with a shutter 4 that is rotated around a hinge 5. Heater 8 as a heating source below the furnace
is installed, and both the furnace body 1 and the heater 8 are covered with a heat insulating material 9.
蒸着時にはシャッター4が開いており、溶融亜鉛7はヒ
ータ8によって炉体1の底板を通して加熱され、蒸発し
て開口部6を通って蒸着炉の上方を走行する銅帯10に
メッキされる。溶融亜鉛は、供給ダクト2から蒸発量と
同じ量が連続的に供給される。During deposition, the shutter 4 is open, and the molten zinc 7 is heated through the bottom plate of the furnace body 1 by the heater 8, vaporized and plated onto the copper strip 10 running through the opening 6 above the deposition furnace. Molten zinc is continuously supplied from the supply duct 2 in an amount equal to the amount of evaporation.
このような従来の蒸着炉では下記のような欠点があった
。Such conventional vapor deposition furnaces have the following drawbacks.
(1) メッキプロセスラインでは、例えば供給され
る銅帯の厚みが変わった場合、鋼帯にメッキすべき量、
すなわち単位面積あたりの目付量を瞬間的に変化させた
いことがあるが、従来の形式の蒸着炉では、蒸着炉内の
溶融亜鉛及び炉体自身の熱容量が大きいために、加熱源
の加熱量を瞬間的に変化させても、亜鉛の蒸発速度の応
答が遅く整定するまでに規格外の目付量をもった製品が
大量にできてしまうという欠点がある、例えばライン速
度50 Vmin目付量70 g/m2 のラインで
計画している蒸着炉では整定するまでに6分間程度かか
ると予想され、この間に180mの製品が規格外となっ
てしまう。(1) In the plating process line, for example, if the thickness of the supplied copper strip changes, the amount to be plated on the steel strip,
In other words, there are times when it is desired to instantaneously change the amount of basis weight per unit area, but in conventional vapor deposition furnaces, the heat capacity of the molten zinc in the vapor deposition furnace and the furnace body itself is large, so it is difficult to change the heating amount of the heating source. Even if the change is made instantaneously, there is a drawback that the response of the zinc evaporation rate is slow and a large amount of products with a non-standard basis weight are produced before it stabilizes.For example, when the line speed is 50 Vmin and the basis weight is 70 g/ It is expected that the vapor deposition furnace planned for the 2 m2 line will take about 6 minutes to settle, and during this time a 180 m product will be out of specification.
(2)下部から加熱されるため亜鉛浴の下部で沸騰によ
って気泡が生じ、それが液中を上方へ昇って液面から出
ていき、この時、液が飛散するいわゆるスプラッシュが
起こる。又、液面には酸化皮膜が形成されやすく、膜が
できていると、その下方に気泡がたまり、ある程度以上
の大きさになると膜を瞬間的に破壊するためスプラッシ
ュが犬きくなる。スプラッシュが起こると銅帯に液滴が
ついて製品不良となる恐れがある。(2) Since the zinc bath is heated from the bottom, bubbles are generated by boiling at the bottom of the zinc bath, which rise upward in the liquid and exit from the liquid surface. At this time, a so-called splash occurs in which the liquid scatters. In addition, an oxide film is likely to form on the liquid surface, and if a film is formed, air bubbles will accumulate under the film, and if they grow to a certain size, the film will be instantly destroyed, making the splash harsh. If splash occurs, there is a risk that droplets will stick to the copper strip, resulting in product defects.
本発明は前記欠点を解決し、応答速度の早い加熱方法を
実現するために為されたもので、その要旨とするところ
は加熱源のヒータを炉内の溶融亜鉛の上方に設置し、か
つ底板から、カーボンのフィンを亜鉛浴面上方まで突出
させたことを特徴とする蒸着炉であり、応答性が早く、
かつスプラッシュを防止した蒸着炉を実現することがで
きるものである。The present invention has been made to solve the above-mentioned drawbacks and realize a heating method with a fast response speed. It is a vapor deposition furnace characterized by carbon fins that protrude above the zinc bath surface, and has a quick response.
Moreover, it is possible to realize a vapor deposition furnace that prevents splashing.
以下、本発゛明の一実施態様につき第2図を参照しなが
ら詳述する。Hereinafter, one embodiment of the present invention will be described in detail with reference to FIG.
第2図において、加熱源のヒータ8は炉内の溶融亜鉛7
の上方に設置され底板からカーボンのフィン11が適当
な間隔を置いて多数亜鉛浴面上方まで突出している。そ
の他は第1図に示した従来の構造と同一であるので説明
を省略する。In FIG. 2, a heater 8 as a heating source is a molten zinc 7 in a furnace.
A large number of carbon fins 11 protrude from the bottom plate at appropriate intervals to above the zinc bath surface. The rest of the structure is the same as the conventional structure shown in FIG. 1, so a description thereof will be omitted.
第2図において、シャッター4が開で、蒸着炉上方に鋼
帯10が例えば図中右方に走行している状態のとき、溶
融亜鉛7は上方のヒータ8から直接加熱され、あるいは
カーボンフィン11を介して加熱され蒸発して開口部6
を通して銅帯10にメッキされる。In FIG. 2, when the shutter 4 is open and the steel strip 10 is running above the vapor deposition furnace, for example to the right in the figure, the molten zinc 7 is directly heated by the heater 8 above, or the carbon fin 11 is heated and evaporated through the opening 6
The copper strip 10 is plated through it.
このような構成であるので、以下の効果が奏される。With such a configuration, the following effects are achieved.
■ 上方から単に加熱すると、溶融亜鉛の表面の熱吸収
率は約0.1と非常に小さいため直接上方から輻射加熱
する方法はヒータの温度が高温になりすぎるので、なり
た\ないが、カーボンのフィンを亜鉛浴面上方に突き出
させるとカーボンの表面の吸収率は約1,0と大きいた
め全体的な吸収率を向上させることができるので上方か
ら加熱する方法が実現できる。■ If simply heated from above, the heat absorption coefficient of the surface of molten zinc is very small, approximately 0.1, so direct radiant heating from above would result in the heater temperature being too high, so carbon If the fins are made to protrude above the surface of the zinc bath, the absorption rate of the carbon surface is as large as about 1.0, so the overall absorption rate can be improved and a method of heating from above can be realized.
■ 本発明によれば、亜鉛は上方から加熱されるために
、表面層から蒸発してゆくので、加熱源からの加熱量の
変化に速やかに応答する。(2) According to the present invention, since zinc is heated from above, it evaporates from the surface layer, so it quickly responds to changes in the amount of heat from the heating source.
例えばライン速度30 m/min 、目付量70−g
/m2のラインで整定時間は30秒〜1分程度である。For example, line speed 30 m/min, basis weight 70-g
/m2 line, the settling time is about 30 seconds to 1 minute.
すなわち整定するまでの時間が非常に短くなるため規格
外の製品の発生が少くなる。In other words, the time required for stabilization becomes extremely short, and the occurrence of non-standard products is reduced.
■ 同時に、カーボンは還元力があるため、亜鉛液面の
酸化膜′の形成を抑えるので、スプラッシュがおこりに
くくなり、製品への液滴の付着が防止される。At the same time, since carbon has a reducing power, it suppresses the formation of an oxide film on the surface of the zinc liquid, making splash less likely to occur and preventing droplets from adhering to the product.
■ 従来の方法では亜鉛浴面550℃、炉底板600℃
程度になるため炉底に鋼板を使用した場合は腐食速度が
非常に犬きく、工業的に利用するためには鋼板ではなく
セラミックにする必要があったが、本発明によれば亜鉛
浴面も炉底もほぼ同温の550℃になるため鋼板が使用
できるので廉価ですむ。■ In the conventional method, the zinc bath surface is 550℃ and the furnace bottom plate is 600℃.
Therefore, if a steel plate was used for the bottom of the furnace, the corrosion rate would be extremely high, and for industrial use it would have been necessary to use ceramic instead of steel plate. However, according to the present invention, the zinc bath surface can also be Since the temperature at the bottom of the furnace is almost the same at 550°C, steel plates can be used, which is inexpensive.
■ カーボンフィンと亜鉛との接触面積が大きいので、
熱伝達が向上する。■ Since the contact area between carbon fins and zinc is large,
Improves heat transfer.
第1図は従来の真空蒸着炉の構成を、第2図は本発明の
真空蒸着炉の一実施態様゛の構成を示す図である。
復代理人 内 1) 明
復代理人 萩 原 亮 −FIG. 1 shows the configuration of a conventional vacuum deposition furnace, and FIG. 2 shows the configuration of an embodiment of the vacuum deposition furnace of the present invention. Sub-agents 1) Meifuku agent Ryo Hagiwara -
Claims (1)
、炉底板からカーボンのフィンを浴面上方まで突出させ
てなることを特徴とする真空蒸着炉。A vacuum evaporation furnace characterized in that a heating source heater is installed in the upper part of the furnace, and carbon fins are made to protrude from the furnace bottom plate to above the bath surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19368281A JPS5896871A (en) | 1981-12-03 | 1981-12-03 | Vacuum deposition furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19368281A JPS5896871A (en) | 1981-12-03 | 1981-12-03 | Vacuum deposition furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5896871A true JPS5896871A (en) | 1983-06-09 |
| JPH029106B2 JPH029106B2 (en) | 1990-02-28 |
Family
ID=16312027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19368281A Granted JPS5896871A (en) | 1981-12-03 | 1981-12-03 | Vacuum deposition furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5896871A (en) |
-
1981
- 1981-12-03 JP JP19368281A patent/JPS5896871A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH029106B2 (en) | 1990-02-28 |
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