JPS59149091A - Both-side printed circuit board and method of producing same - Google Patents
Both-side printed circuit board and method of producing sameInfo
- Publication number
- JPS59149091A JPS59149091A JP58022948A JP2294883A JPS59149091A JP S59149091 A JPS59149091 A JP S59149091A JP 58022948 A JP58022948 A JP 58022948A JP 2294883 A JP2294883 A JP 2294883A JP S59149091 A JPS59149091 A JP S59149091A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- double
- electrolytic
- holes
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は金属箔を絶縁基板に張り合せだ、いわゆる銅張
積層板のスルーホール構造に係り、エツチング等により
導体・ぐターンを精度よく、シかも微細に形成した両面
プリント配線基板とその製造方法に関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a through-hole structure of a so-called copper-clad laminate in which metal foil is laminated to an insulating substrate. The present invention relates to a finely formed double-sided printed wiring board and a manufacturing method thereof.
(従来例の構成とその問題点)
近年、民生用機器を中心として、その小型、軽量、薄型
化の傾向が益々強まっている。これら機器を構成する数
多くの部品は上記傾向に沿った開発がなされ、各種機器
への貢献も多大なものがあるといえる。とりわけ抵抗器
やコンデンサーはチップ化がなされより小型化へ拍車が
かかった。一方、プリント配線基板もこれら傾向に沿っ
て微細化への改良がなされているものの充分な満足が得
られるには至っていない。(Conventional configuration and its problems) In recent years, there has been a growing trend toward smaller, lighter, and thinner consumer devices. Many of the parts that make up these devices have been developed in line with the above trends, and it can be said that they have made significant contributions to various devices. In particular, resistors and capacitors were made into chips, spurring further miniaturization. On the other hand, although improvements have been made to miniaturize printed wiring boards in line with these trends, full satisfaction has not yet been achieved.
一般に、両面プリント配線基板は絶縁基板の両面に金属
箔(銅箔)を張り合せた基板にスルーホールとなる孔を
ドリルなどによりあけ、無電解メ(2)
ツキによシ孔の内壁にメッキ導体を付けた後、電解メッ
キにより内壁導体の信頼性をより完全なものとするため
厚くメッキする。内壁に必要量のメッキ膜を付けた後、
先の銅箔全面にエツチングレジストを設ける。このとき
孔内壁にメッキした導体がエツチングされないように合
成樹脂を孔に充てんするか、寸だけドライフィルムのご
とき膜によってテンティングと呼ばれる方法により孔内
壁のメッキ膜を保護してやる必要がある。次に所望のノ
eターンにエラチンブレ・シストをスクリーン印刷法で
印刷するか、またはあらかじめ感光性レジストをラミネ
ートした基板に所望・Qターンの写真フィルムを密着さ
せ、露光、現像を行なった後、通常のエツチング方法で
不要部分を除去するものである。しかしながら、この方
法によれば前述のような微細・ぐターン、例えば線幅と
して100ミクロン前後のものが得られにくい。それは
孔内壁にメッキするだめの電解メッキによって、孔内壁
にメッキ膜が形成されると同時に先の両面の銅箔にも孔
内壁と同じ厚みだけメッキが形成される。In general, double-sided printed wiring boards are made by using a drill or the like to drill through holes in an insulating board with metal foil (copper foil) pasted on both sides of the board. After attaching the conductor, electrolytic plating is applied to ensure the reliability of the inner wall conductor. After applying the required amount of plating film to the inner wall,
Etching resist is provided on the entire surface of the copper foil. At this time, in order to prevent the conductor plated on the inner wall of the hole from being etched, it is necessary to fill the hole with synthetic resin or to protect the plating film on the inner wall of the hole by a method called tenting with a film such as a dry film. Next, either an elachinbre cyst is printed on the desired E-turn using a screen printing method, or a photographic film of the desired Q-turn is brought into close contact with a substrate laminated with a photosensitive resist in advance, and then exposed and developed. The unnecessary parts are removed using the etching method. However, according to this method, it is difficult to obtain the aforementioned fine patterns, for example, a line width of around 100 microns. By electrolytic plating, a plating film is formed on the inner wall of the hole, and at the same time, the copper foil on both sides is plated to the same thickness as the inner wall of the hole.
しかも、この場合、電解メッキの周辺効果(沿面効果)
によって、基板の中心部はメッキ膜が薄く、周辺に近ず
くほどメッキ膜が厚く付くという現象がある。そのため
、エツチングするときエツチングレートはどの部分も同
じであるから、中心部が早く下の絶縁基板に達するが、
周辺のメッキ膜が厚い部分は銅箔がまだ残っているとい
った現象が起こる。そのだめ周辺が完全にエツチングさ
れるまでエツチング液中に基板を入れておけば中心部に
サイドエッチという現象が起こり、必要な線幅が確保で
き力いぼかりか、場合によれば線(導体)がなくなるこ
とさえある。このだめ、基板全体への均一なメッキ方法
の開発が活発であるが、寸だ充分なものと方法は見出さ
れていない。従って現在では、高精度で微細・ぐターン
が要求されるものは必要基板面積の2倍〜4倍の基板に
電解メッキし、例えばその中心部のみを製品とすること
や、電解メッキ機を薄くしたり、壕だ絶縁基板に張シ合
せる銅箔に薄いものを使用したりしている。このように
することはスルーホールの特性を極度に悪化させること
になる。また、先に孔内壁にメッキしたメッキ膜をエツ
チング時に保護してやる必要があり、孔に合成樹脂を充
てんしたり、感光性エツチングレジストフィルムによシ
テンティングしたシして保護する方法が採られている。Moreover, in this case, the peripheral effect (creepage effect) of electrolytic plating
Due to this, there is a phenomenon in which the plating film is thinner at the center of the substrate and becomes thicker as it approaches the periphery. Therefore, when etching, the etching rate is the same for all parts, so the center reaches the underlying insulating substrate faster, but
A phenomenon occurs in which copper foil still remains in areas where the surrounding plating film is thick. However, if you leave the board in the etching solution until the periphery is completely etched, a phenomenon called side etch will occur in the center, ensuring the necessary line width, or in some cases causing lines (conductors). may even disappear. To solve this problem, efforts are being made to develop a method for uniformly plating the entire substrate, but no method or method that is completely satisfactory has yet been found. Therefore, at present, for products that require high precision and fine patterning, it is possible to electrolytically plate a board that is two to four times the required board area, and use only the center part as a product, for example, or use an electrolytic plating machine to make the plate thinner. Or, a thin copper foil is used to cover the insulating substrate. Doing this will extremely deteriorate the characteristics of the through hole. In addition, it is necessary to protect the plating film that was previously plated on the inner wall of the hole during etching, and methods of protecting the hole by filling it with synthetic resin or tenting it with a photosensitive etching resist film are adopted. .
この方法で前者の場合は基板全面にあけられた孔に完全
に充てんし々ければならず一つの孔でも不完全なものが
あれば不良となり製品歩ど寸りを極度に悪化させる。後
者の場合はレジストをフィルム状としているため基板全
面を覆うような形となり不完全なものの数や欠かんは減
少するが、このフィルムを露光、現像する工程において
熱が加わったりするため、銅箔に密着している部分と孔
を覆っている部分でフィルムの収縮が異なり、孔の周辺
にクラックが入ることがある。そのだめ孔内壁のメッキ
膜がエツチングされてしまうという現象もある。In the former case, with this method, the holes drilled on the entire surface of the substrate must be completely filled, and if even one hole is incomplete, it will be defective and the product yield will be extremely degraded. In the latter case, since the resist is in the form of a film, it covers the entire surface of the board, reducing the number of imperfections and defects, but heat is added during the process of exposing and developing this film, so copper foil The shrinkage of the film differs between the part that is in close contact with the hole and the part that covers the hole, which may cause cracks to form around the hole. There is also a phenomenon in which the plating film on the inner wall of the reservoir hole is etched away.
上記の方法による両面プリント配線基板は一般に銅スル
ーホール基板とも呼ばれておシ、電解銅メッキの厚みむ
らによるエツチング精度の悪化と、(5)
孔内壁のメッキ膜保護の不完全さによる製品歩ど1りの
悪化と作業工数の増大々どの問題を持っている。Double-sided printed wiring boards made by the above method are generally called copper through-hole boards, and they suffer from poor etching accuracy due to uneven thickness of electrolytic copper plating, and (5) poor product quality due to incomplete protection of the plating film on the inner walls of the holes. There are problems such as deterioration of the temperature and increase in the number of man-hours required.
これらの欠点を除く方法として一般に半田スルーホール
基板というものがある。これは前述の電解銅メッキまで
の工程は同じである。エツチングレジストとして半田メ
ッキを用いる。この場合、銅箔全面に所望の・ぐターン
の逆パターンを印刷し、これをメツキレシストとして、
レジストのない部分に半田メッキを行ない、レジストを
剥離した後、先の半田をレジストとして銅をエツチング
する方法である。この方法も基本的には先の方法と問題
点は同じであるが、ただ孔内壁を保護する必要がない。A common method to eliminate these drawbacks is to use a solder through-hole board. This is the same process up to electrolytic copper plating as described above. Solder plating is used as an etching resist. In this case, a reverse pattern of the desired pattern is printed on the entire surface of the copper foil, and this is used as a mesh resist.
In this method, solder plating is applied to areas where there is no resist, the resist is peeled off, and then the copper is etched using the previous solder as a resist. This method basically has the same problems as the previous method, but it is not necessary to protect the inner wall of the hole.
(発明の目的)
本発明は、上記プリント配線基板の製造方法の欠点を除
去したまったく新しい微細・母ターンのプリント配線基
板とその製造方法を提供することを目的とするものであ
る。(Objective of the Invention) It is an object of the present invention to provide a completely new fine patterned printed wiring board and a method for manufacturing the same, which eliminates the drawbacks of the above-mentioned printed wiring board manufacturing method.
(発明の構成)
(6)
本発明の両面プリント配線基板とその製造方法は、積層
板の両面に形成された回路導体を貫通孔により電気的接
続した両面プリント配線基板において、貫通孔内壁のみ
が無電解銅メッキ被膜、電解銅メッキ被膜、電解ハンダ
メッキ被膜の3層からなるスルーホールである両面プリ
ント配線基板と、さらに両面銅張積層板の両面に合成樹
脂フェスを全面コーティングしてメツキレシストとする
工程と、所定の位置に貫通孔をあける工程と、貫通孔内
壁を活性化処理し無電解銅メッキ、電解銅メッキ、電解
ハンダメッキを順次行なう工程と、前記メツキレシスト
を剥離する工程と、該銅箔両面にエラチンブレ・シスト
を形成、エツチングする工程と、エツチングレジストを
剥離する工程とからなる両面プリント配線基板の製造方
法である。(Structure of the Invention) (6) The double-sided printed wiring board and the manufacturing method thereof of the present invention provide a double-sided printed wiring board in which circuit conductors formed on both sides of a laminate are electrically connected by through-holes, in which only the inner wall of the through-hole is A double-sided printed wiring board, which is a through-hole consisting of three layers: electroless copper plating, electrolytic copper plating, and electrolytic solder plating, and a double-sided copper-clad laminate that is completely coated with a synthetic resin face on both sides to form a metsukiresist. a step of drilling a through hole at a predetermined position; a step of activating the inner wall of the through hole and sequentially performing electroless copper plating, electrolytic copper plating, and electrolytic solder plating; a step of peeling off the metal resist; This method of manufacturing a double-sided printed wiring board includes the steps of forming and etching an elastomer cyst on both sides of the foil, and peeling off the etching resist.
本発明の最も特徴とするところはスルーホールを形成す
る前に銅箔全面にメツキレシストを設け、電解銅メッキ
による銅箔面のメッキ厚みのむらをなくシ、精度が良好
で微細なパターンを得ることにある。The most distinctive feature of the present invention is that a metal resist is provided on the entire surface of the copper foil before forming the through holes, eliminating unevenness in the plating thickness on the copper foil surface by electrolytic copper plating, and obtaining a fine pattern with good accuracy. be.
(実施例の説明)
図は本発明による両面プリント配線基板の製造方法を示
すものである。(A)は通常の積層板1の両面に銅箔2
が形成されているものであシ、これに合成樹脂を全面に
コーティングを施し、メツキレシスト3を設ける(B)
。この合成樹脂は耐アルカリ性に重点をおいだ合成樹脂
である必要がある。(Description of Examples) The figure shows a method for manufacturing a double-sided printed wiring board according to the present invention. (A) shows copper foil 2 on both sides of a normal laminate 1.
is formed, the entire surface is coated with synthetic resin, and a mesh resist 3 is provided (B)
. This synthetic resin needs to be a synthetic resin with emphasis on alkali resistance.
何故ならば無電解鋼メッキの場合はPH11〜125の
アルカリ性を示すが、とのメッキは両面の銅箔を電気的
に導通させるだけで良く、短時間の耐アルカリ性を有す
るものであれば良いが、電解銅メッキはPHl l〜1
3の酸性を呈し、その被膜も電気的信頼性を充分保つも
のでなければならずメッキ被膜は10〜30ミクロンが
必要である。そのだめメッキ時間も無電解メッキよりも
長く要するためである。一方ハンダメッキはpH1〜2
であるが、短時間であるため耐酸性を必要としない。ま
だこのメツキレシスト被膜はコーティングする方法でも
良く、マた、フィルム状のものをラミネートする方法で
も良い。(C)は貫通孔4をあけたものである。次に(
D)のように無電解銅メッキ被膜6、電解銅メッキ被膜
7、電解ハンダメッキ被膜8を順次行ない、メツキレシ
ストを剥離する(E)。This is because electroless steel plating exhibits alkalinity with a pH of 11 to 125, but plating with steel only requires electrical conduction between the copper foils on both sides, so long as it has short-term alkali resistance. , electrolytic copper plating is PHL l~1
The plating film must have a thickness of 10 to 30 microns and must maintain sufficient electrical reliability. This is because the plating time is longer than that of electroless plating. On the other hand, solder plating has a pH of 1 to 2.
However, since it lasts for a short time, acid resistance is not required. However, the method of forming the metskiresist film may be a coating method, or a method of laminating a film-like material may be used. (C) shows the through hole 4 drilled. next(
As shown in D), electroless copper plating film 6, electrolytic copper plating film 7, and electrolytic solder plating film 8 are applied in this order, and the metal resist is removed (E).
次にエラチンブレ・シスト5をスクリーン印刷で形成す
る(F)。エツチングレジスト5のiRパターン貫通孔
4の直径よりも小さくしておき、下の銅箔が完全に覆わ
れるようにする必要がある。次に所定のエツチング液(
例えば塩化第二鉄または塩化第二銅)でエツチングし回
路パターンを形成する(G)。Next, an elachinbre cyst 5 is formed by screen printing (F). It is necessary to make the diameter smaller than the diameter of the iR pattern through hole 4 in the etching resist 5 so that the copper foil underneath is completely covered. Next, apply the specified etching solution (
For example, a circuit pattern is formed by etching with ferric chloride or cupric chloride (G).
両面銅張積層板としてガラスエポキシを基材としたもの
に35ミクロン銅箔を張り合せた厚み1.6胡のものを
使用し、合成樹脂フェスとしてフェノキシ樹脂をMEK
に溶解し60チ濃度としだも(7)ラリバースロールコ
ータ−で厚みが25ミクロンになるよう塗布した。乾燥
後、さらに片面に同様の厚みに塗布し乾燥させた後、直
径0.8咽の超硬ドリルで所定の位置に貫通孔を設けた
。この基板を塩化第二スズの12%水溶液に全体を2分
間(9)
浸漬し取り出し、すぐに塩化バラジュウム4係水溶液中
に浸漬し貫通孔内壁を活性化した。次に表1に示す無電
解銅メッキ浴に10分間浸漬し無電解銅メッキ層を形成
した。A double-sided copper-clad laminate with a thickness of 1.6mm made by laminating 35 micron copper foil on a glass epoxy base material was used, and a phenoxy resin was used as the synthetic resin face using MEK.
The solution was dissolved in a 60% solution and coated to a thickness of 25 microns using a Shimodo (7) rubber roll coater. After drying, it was further coated on one side to the same thickness, and after drying, a through hole was made at a predetermined position using a carbide drill with a diameter of 0.8 mm. The entire substrate was immersed in a 12% aqueous solution of stannic chloride for 2 minutes (9), taken out, and immediately immersed in an aqueous solution of baradium chloride 4 to activate the inner walls of the through holes. Next, it was immersed in an electroless copper plating bath shown in Table 1 for 10 minutes to form an electroless copper plating layer.
表 メッキ浴組成
水洗後、表に示す電解銅メッキ浴により銅メッキしスル
ーホールをより完全なものとし、さらに電解ハンダメッ
キ浴でハンダメッキし、エツチングレジストとした。次
にMEKとトリクロルエチレン(10)
の等景況合液を30℃に加熱した容器に先の基板を浸漬
しメツキレシストを剥離し、塩酸3%水溶液で洗浄し水
洗薫煙させた。次に250メツシユのステンレススクリ
ーンに所望のノやターンを形成し、高酸価マレイン酸樹
脂を主成分としたエツチングレノストインキを印刷し、
90℃5分の乾燥を行なった。さらに片面にも同様に印
刷し、塩化第二鉄の水溶液で不要部分の銅箔を除去し回
路板とした。これによシ基板内のエツチングむらがなく
々り全面にわたりエツチングされていることを確認する
とともにスルーホールは何ら保護することなく、ハンダ
メッキ被膜によって下の銅メッキ被膜の損傷はなく完全
なスルーホールの機能を有していることも確認した。Table Plating bath composition After washing with water, copper plating was performed using the electrolytic copper plating bath shown in the table to make the through holes more complete, and further solder plating was performed using an electrolytic solder plating bath to obtain an etching resist. Next, the substrate was immersed in a container heated to 30°C in an isostatic mixture of MEK and trichlorethylene (10) to peel off the Metsukiresist, and washed with a 3% aqueous solution of hydrochloric acid and smoked with water. Next, the desired grooves and turns are formed on a 250-mesh stainless steel screen, and an etching lens ink containing high acid value maleic acid resin as the main component is printed.
Drying was performed at 90°C for 5 minutes. Furthermore, one side was printed in the same manner, and unnecessary portions of the copper foil were removed using an aqueous solution of ferric chloride to form a circuit board. This confirms that the entire surface of the board is etched without any uneven etching, and the through-holes are completely etched without any protection, with no damage to the underlying copper plating due to the solder plating. It was also confirmed that it has the following functions.
(発明の効果)
以上、実施例で詳述のごとく本発明によれば、従来の両
面プリント配線基板の製造工程における最大の問題点で
あったエツチング時間のむら、すなわちスルーホールの
だめの銅メッキによる銅箔上のメッキ厚むらによる微細
パターン形成が困難とされていたことを解決するもので
ある。本発明によれば35ミクロン銅箔の場合は線間線
幅のピッチ寸法で300ミクロン、18ミクロンの銅箔
であれば250ミクロンが得られ、スクリーン印刷とは
別に写真法にすれば200ミクロンができることも確認
している。これは前述のととく銅箔面に銅メッキが付か
ず初期の銅箔厚みのみであるだめ全面にわたり均一でエ
ツチング時間が全面一定にできるためで太い線、細い線
にかかわらず精度良く形成できるものである。さらに本
発明によるスルーホールの構造から内壁にハンダメッキ
を施してあり、ハンダは通常のエツチング液には安定で
溶解、腐食されることはない。そのため従来の製造方法
のように合成樹脂を貫通孔に充てんしたり、レノストフ
ィルムでテンティングする必要もない。(Effects of the Invention) As described above in detail in the examples, the present invention solves the problem of uneven etching time, which was the biggest problem in the conventional manufacturing process of double-sided printed wiring boards, that is, the copper plating caused by the copper plating of the holes in the through holes. This solves the difficulty in forming fine patterns due to uneven plating thickness on foil. According to the present invention, in the case of a 35 micron copper foil, a pitch of 300 microns can be obtained, and in the case of an 18 micron copper foil, a pitch of 250 microns can be obtained, and if a photographic method is used in addition to screen printing, a pitch of 200 microns can be obtained. We have also confirmed that it is possible. This is because, as mentioned above, there is no copper plating on the copper foil surface and only the initial thickness of the copper foil, so it is uniform over the entire surface and the etching time can be made constant over the entire surface, so it can be formed with high accuracy regardless of whether the wire is thick or thin. It is. Further, due to the structure of the through-hole according to the present invention, the inner wall is plated with solder, and the solder is stable in ordinary etching solutions and will not be dissolved or corroded. Therefore, unlike conventional manufacturing methods, there is no need to fill the through holes with synthetic resin or tent with Renost film.
今後、機器の小型化、薄慣化、軽量化に対し、プリント
配線基板は必要不可欠なものであるだけに微細パターン
化はさけて通ることのできない要素である。本発明はこ
のような背景にあるプリント配線基板において、容易に
微細パターンが得られ、しかも従来の製造方法よりも簡
素化されたものであり企業的な貢献に大なるものがある
。In the future, printed wiring boards will be indispensable for devices to become smaller, thinner, and lighter, so fine patterning is an element that cannot be ignored. The present invention makes it possible to easily obtain fine patterns in printed wiring boards based on this background, and is simpler than conventional manufacturing methods, making a great contribution to the industry.
図は本発明による両面プリント配線基板の製造方法を示
す図である。
1・・・積層板、2・・・銅箔、3・・・メツキレシス
ト被膜、4・・・貫通孔、5・・・エツチングレジスト
、6・・・無電解銅メッキ被膜、7・・・電解銅メッキ
被膜、8・・・電解ハンダメッキ被膜。
(13)
手続補正書C方式)
収入印紙金額
円
昭和58年6月13日
特許庁長官 若 杉 和 夫 殿
】、事件の表示 特願昭58−22948号2、発
明 の名称
両面プリント配線基板およびその製造方法3、補正をす
る者
事件との関係 出願人
住所 大阪府門真市太字門真1006番地名称
(582)松下電器産業株式会社代表者
山 下 俊 彦電話03 (431) 811
1番(代表)5、手続補正指令書の日付
昭和58年 5月 11日(発送日昭和58年5月31
日)6、補正により増加する発明の数 08、補正の
内容
(1)明細書第8頁第3行「(4)」を「第1図」と訂
正する。
(2) 同第6行r (B) Jをて第2図)」と訂
正する。
(3) 同第20行r (C) Jを「第3図」と訂
正する。
(4)同第9頁第1行「の)」を「第4図」と訂正する
。
(5) 同第3行r (E) Jを「(第5図)」と
訂正する。
(6) 同第5行「軸)」を「(第6図)」と訂正す
る。
(7) 同第10行r (G) Jを「(第7図)」
と訂正する。
(8) 同第13頁第5行「図は・・・・・・・・・
」を「第1図〜第7図は・・・・・・・・・」と訂正す
る。
(9) 図面を別紙の通り訂正する。
以 上
一2=
第1図
第7図
−
トThe figure is a diagram showing a method for manufacturing a double-sided printed wiring board according to the present invention. DESCRIPTION OF SYMBOLS 1... Laminate board, 2... Copper foil, 3... Metsukiresist coating, 4... Through hole, 5... Etching resist, 6... Electroless copper plating coating, 7... Electrolytic Copper plating film, 8... Electrolytic solder plating film. (13) Procedural Amendment Form C) Revenue Stamp Amount Yen June 13, 1980 Mr. Kazuo Wakasugi, Commissioner of the Patent Office], Indication of Case Patent Application No. 1982-22948 2, Issued
Name of Double-Sided Printed Wiring Board and Its Manufacturing Method 3, Relationship with the Amendment Case Applicant Address 1006 Kadoma, Kadoma City, Osaka Prefecture Name
(582) Representative of Matsushita Electric Industrial Co., Ltd.
Toshihiko Yamashita Phone 03 (431) 811
No. 1 (representative) 5. Date of procedural amendment order: May 11, 1982 (Shipping date: May 31, 1982)
6. Number of inventions increased by amendment 08. Contents of amendment (1) "(4)" in the third line of page 8 of the specification is corrected to read "Figure 1." (2) Same line 6 r (B) J in Figure 2)” is corrected. (3) Same line 20 r (C) Correct J to "Figure 3". (4) On page 9, line 1, ``no'' is corrected to read ``Figure 4''. (5) Same line 3 r (E) Correct J to "(Figure 5)". (6) Correct “Axis” in line 5 of the same to “(Figure 6)”. (7) Same line 10 r (G) J as “(Figure 7)”
I am corrected. (8) Page 13, line 5 “The diagram is...
" is corrected to "Figures 1 to 7 are...". (9) Correct the drawing as shown in the attached sheet. Above 12 = Figure 1 Figure 7-
Claims (2)
り電気的接続した両面プリント配線基板において、貫通
孔内壁のみが無電解銅メッキ被膜、電解銅メッキ被膜、
電解ハンダメッキ被膜の3層からなるスルーホールであ
ることを特徴とする両面プリント配線基板。(1) In a double-sided printed wiring board in which circuit conductors formed on both sides of a laminate are electrically connected through through holes, only the inner walls of the through holes are coated with electroless copper plating, electrolytic copper plating, etc.
A double-sided printed wiring board characterized by a through hole made of three layers of electrolytic solder plating.
コーティングしてメツキレシストとする工程と、所定の
位置に貫通孔をあける工程と、貫通孔内壁を活性化し無
電解銅メッキ、電解銅メッキ、電解ハンタゝメッキを順
次行なう工程と、前記、メツキレシストを剥離する工程
と、該銅箔両面にエツチングレジストを形成、エツチン
グする工程と、エツチングレノストを剥離する工程から
なることを特徴とする両面プリント配線基板の製造方法
。 C1)(2) The process of coating the entire surface of a double-sided copper-clad laminate with a synthetic resin face to form a metal sheet, the process of drilling through holes at predetermined positions, and the process of activating the inner walls of the through holes to perform electroless copper plating and electrolytic copper plating. The method is characterized by comprising a step of sequentially performing plating and electrolytic hunter plating, a step of peeling off the etch resist, a step of forming and etching an etching resist on both sides of the copper foil, and a step of peeling off the etching resist. A method for manufacturing a double-sided printed wiring board. C1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58022948A JPS59149091A (en) | 1983-02-16 | 1983-02-16 | Both-side printed circuit board and method of producing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58022948A JPS59149091A (en) | 1983-02-16 | 1983-02-16 | Both-side printed circuit board and method of producing same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59149091A true JPS59149091A (en) | 1984-08-25 |
Family
ID=12096839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58022948A Pending JPS59149091A (en) | 1983-02-16 | 1983-02-16 | Both-side printed circuit board and method of producing same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59149091A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6043893A (en) * | 1983-08-19 | 1985-03-08 | 日立化成工業株式会社 | Method of producing printed circuit board |
| JPH03104189A (en) * | 1989-09-18 | 1991-05-01 | Matsushita Electric Works Ltd | Manufacture of printed wiring board |
| JPH03108793A (en) * | 1989-09-22 | 1991-05-08 | Matsushita Electric Works Ltd | Manufacture of printed wiring board |
-
1983
- 1983-02-16 JP JP58022948A patent/JPS59149091A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6043893A (en) * | 1983-08-19 | 1985-03-08 | 日立化成工業株式会社 | Method of producing printed circuit board |
| JPH03104189A (en) * | 1989-09-18 | 1991-05-01 | Matsushita Electric Works Ltd | Manufacture of printed wiring board |
| JPH03108793A (en) * | 1989-09-22 | 1991-05-08 | Matsushita Electric Works Ltd | Manufacture of printed wiring board |
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