JPS59189123A - Production of polyimide resin solution - Google Patents
Production of polyimide resin solutionInfo
- Publication number
- JPS59189123A JPS59189123A JP6323983A JP6323983A JPS59189123A JP S59189123 A JPS59189123 A JP S59189123A JP 6323983 A JP6323983 A JP 6323983A JP 6323983 A JP6323983 A JP 6323983A JP S59189123 A JPS59189123 A JP S59189123A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide resin
- water
- polyimide
- reaction
- bis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 39
- 239000009719 polyimide resin Substances 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000002253 acid Substances 0.000 claims abstract description 14
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 10
- 229910021536 Zeolite Inorganic materials 0.000 claims abstract description 9
- 239000010457 zeolite Substances 0.000 claims abstract description 9
- 150000007513 acids Chemical class 0.000 claims abstract description 6
- 150000002989 phenols Chemical class 0.000 claims abstract description 4
- 150000000000 tetracarboxylic acids Chemical class 0.000 claims abstract description 3
- 238000006243 chemical reaction Methods 0.000 claims description 30
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 20
- 239000004642 Polyimide Substances 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 5
- 241000219094 Vitaceae Species 0.000 claims description 2
- 230000018044 dehydration Effects 0.000 claims description 2
- 238000006297 dehydration reaction Methods 0.000 claims description 2
- 235000021021 grapes Nutrition 0.000 claims description 2
- 230000035935 pregnancy Effects 0.000 claims 1
- 230000001568 sexual effect Effects 0.000 claims 1
- -1 halogenated phenol compound Chemical class 0.000 abstract description 17
- 238000003860 storage Methods 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 5
- 238000010992 reflux Methods 0.000 abstract description 4
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 abstract description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 28
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 238000000034 method Methods 0.000 description 11
- 239000007788 liquid Substances 0.000 description 8
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 238000003287 bathing Methods 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 2
- HORNXRXVQWOLPJ-UHFFFAOYSA-N 3-chlorophenol Chemical compound OC1=CC=CC(Cl)=C1 HORNXRXVQWOLPJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000009940 knitting Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- RLLPVAHGXHCWKJ-IEBWSBKVSA-N (3-phenoxyphenyl)methyl (1s,3s)-3-(2,2-dichloroethenyl)-2,2-dimethylcyclopropane-1-carboxylate Chemical compound CC1(C)[C@H](C=C(Cl)Cl)[C@@H]1C(=O)OCC1=CC=CC(OC=2C=CC=CC=2)=C1 RLLPVAHGXHCWKJ-IEBWSBKVSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- LXYCQDKBNBRJQK-UHFFFAOYSA-N 1-chloro-6-methylcyclohexa-2,4-dien-1-ol Chemical compound CC1C=CC=CC1(O)Cl LXYCQDKBNBRJQK-UHFFFAOYSA-N 0.000 description 1
- UMPSXRYVXUPCOS-UHFFFAOYSA-N 2,3-dichlorophenol Chemical compound OC1=CC=CC(Cl)=C1Cl UMPSXRYVXUPCOS-UHFFFAOYSA-N 0.000 description 1
- JBCUKQQIWSWEOK-UHFFFAOYSA-N 2-(benzenesulfonyl)aniline Chemical compound NC1=CC=CC=C1S(=O)(=O)C1=CC=CC=C1 JBCUKQQIWSWEOK-UHFFFAOYSA-N 0.000 description 1
- VADKRMSMGWJZCF-UHFFFAOYSA-N 2-bromophenol Chemical compound OC1=CC=CC=C1Br VADKRMSMGWJZCF-UHFFFAOYSA-N 0.000 description 1
- VQZRLBWPEHFGCD-UHFFFAOYSA-N 3-chloro-4-methylphenol Chemical compound CC1=CC=C(O)C=C1Cl VQZRLBWPEHFGCD-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- HWKHQQCBFMYAJZ-UHFFFAOYSA-N 4-amino-n-(3-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1C(=O)NC1=CC=CC(N)=C1 HWKHQQCBFMYAJZ-UHFFFAOYSA-N 0.000 description 1
- GPOQODYGMUTOQL-UHFFFAOYSA-N 4-bromo-3-methylphenol Chemical compound CC1=CC(O)=CC=C1Br GPOQODYGMUTOQL-UHFFFAOYSA-N 0.000 description 1
- CFKMVGJGLGKFKI-UHFFFAOYSA-N 4-chloro-m-cresol Chemical compound CC1=CC(O)=CC=C1Cl CFKMVGJGLGKFKI-UHFFFAOYSA-N 0.000 description 1
- 241000512259 Ascophyllum nodosum Species 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 244000273256 Phragmites communis Species 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 244000082204 Phyllostachys viridis Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 244000088401 Pyrus pyrifolia Species 0.000 description 1
- 235000001630 Pyrus pyrifolia var culta Nutrition 0.000 description 1
- 241000272171 Scolopacidae Species 0.000 description 1
- RDYSDCWZHHUGIB-UHFFFAOYSA-N Siamine Natural products OC1=CC(O)=C2C(=O)NC(C)=CC2=C1 RDYSDCWZHHUGIB-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- NAJAZZSIKSSBGH-UHFFFAOYSA-N butane-1,1,1,2-tetracarboxylic acid Chemical class CCC(C(O)=O)C(C(O)=O)(C(O)=O)C(O)=O NAJAZZSIKSSBGH-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005837 enolization reaction Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- GBASTSRAHRGUAB-UHFFFAOYSA-N ethylenetetracarboxylic dianhydride Chemical compound O=C1OC(=O)C2=C1C(=O)OC2=O GBASTSRAHRGUAB-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002550 fecal effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006264 polyurethane film Polymers 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
本発明に、ハロゲン化フェノール化せ物vこ川沿lポリ
イミド樹脂浴aC/)製造方法に関了ゐく)のでろゐ〇
この発明に、装這佼、粘度変化の小爆い株存安矩性にを
nたポリイミドイuq I+は浴数り製造方法に徒供す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a halogenated phenolic compound, a polyimide resin bath, and a method for producing a polyimide resin bath. The polyimide uq I+, which has a high stability and stability, is suitable for the manufacturing method of baths.
従来ホリイミド側崩忙製輩丁ゐ方法としてテトラカルボ
ン酸2無水吻と芳:f!j族シアミン〒南憬極性浴痢申
で60′C以干にあ・いて竹刀1皮応させポリアミド酸
葡製造し、成型体、脱水卸jや熱によジイミド化する方
法が採らnていたL丑公陥36−10999号公’f、
t (tJsP 、5.179,614月lた。ホリイ
ミド側鹿浴欣鉗直按侍ゐ方法として、特開昭55−65
227+−y公♀枕に、3.5’。Traditionally, the polyimide side was produced using tetracarboxylic acid dianhydride and aroma:f! Group siamin: Due to polar bathing in southern China, a method was adopted in which polyamide acid was produced by heating it to temperatures above 60'C and reacting with a bamboo sword, and converting it into a molded product, dehydrating it, and diimidizing it by heat. L ox public failure number 36-10999 public 'f,
t (tJsP, 5.179, 614).As a method for horiimide-side shikayoku shin-giri direct-up samurai, Japanese Patent Application Laid-Open No. 55-65
227+-y public♀ pillow, 3.5'.
4.4′−ビフェニルテトラカルボンb=w王に分と丁
ゐテト27フルボン敞成分と4.4′−ジアミノジンエ
ニルエーテルに主成分と丁ゐ芳香族ジアミン紮ジアミン
成分とを大略等モル、有機極性溶剤中、高温下で縮合水
を除去しながら1段で。4. 4'-biphenyltetracarboxylic acid b=w, 27 fulvone component, 4.4'-diaminodienyl ether, main component, and aromatic diamine diamine component in approximately equal moles; In one stage in an organic polar solvent at high temperature while removing condensed water.
重@、イミド化させ、ポリイミド樹脂溶液孕製造する、
方法が記載さtている。Heavy@, imidize and produce polyimide resin solution.
A method is described.
また、ポリイミド樹脂溶液を製造する際に水の存在下で
製造する方法として特公昭47−79907、特開昭5
6−58524号公報〃Sある。In addition, as a method for producing polyimide resin solution in the presence of water, Japanese Patent Publication No. 47-79907;
No. 6-58524 S.
前記特公昭47−19907号公報には、ブタンテトラ
カルボン酸類を酸成分とし芳香族ジアミンとを大略等モ
ル、有惚溶剤申で反応δせるのに肖り、還流系において
水分の存在下で反応させるポリイシド樹脂m液の製造方
法が記載ざ【ている。The above-mentioned Japanese Patent Publication No. 19907/1987 describes the reaction of butanetetracarboxylic acids as an acid component and an aromatic diamine in approximately equimolar amounts in a solvent, and in the presence of water in a reflux system. There is no description of the method for producing the polyicide resin m-liquid.
また特開昭56−58524号公報には5.5’。5.5' in Japanese Unexamined Patent Publication No. 56-58524.
4.4′−ビ2工ニルテトラカルボン酸類に酸成分、4
.4′−ジアミノジフェニルエーテルを芳香族ジアミン
成分とし、フェノール化合物中で初期反応に行lっfC
俊更に密閉状態にして水分の存在下で反応させるポリイ
ミド樹脂溶液の製造方法が記載さfている。4. Acid component in 4'-bi2-enyltetracarboxylic acids, 4
.. 4'-diaminodiphenyl ether was used as the aromatic diamine component, and the initial reaction was carried out in a phenol compound.
A method for producing a polyimide resin solution is described in which the reaction is carried out in the presence of moisture in a sealed state.
上記2つの公知文献の装造方法rJ1を扛7ζ製造方法
でrJ、あ6が、製造後の#j数の保存安定性がまだ元
方満足したものでrJなη・っ1こ0不発明省らに、保
存安定性0)石しに復往たポリイミド樹脂溶液の製造方
法について様々検討した粕未こ−の発明に至っfこ〇
不発’94r[6,5’、4.4’−ベンゾンエノンテ
トラカルボン酸類ン主成分とするテトラカルボ:/’L
H,Hと4.47−ジアミツジ2エニルエーテルを主成
分とする芳香族ジアミン成分とに、両成分のモル叡が大
略等しくなるようn?、1台で便用し、ハロゲン化フェ
ノール化8物km媒とし、100〜200℃の反応温度
で還元比粘度が0.1以上になるまで縮台水忙除去しな
がら初期皮工6さぜた後、大気圧下で水に還流さぜlが
ら俊慮台させ。The packaging method rJ1 of the above two known documents is converted to rJ by the manufacturing method of 7ζ, and A6 is the one that still satisfies the storage stability of #j number after manufacturing, and rJ is η・t1ko0 Not invented. Kasumi conducted various studies on the manufacturing method of a polyimide resin solution with low storage stability (0), and came up with this invention. Tetracarbo mainly composed of benzoneenonetetracarboxylic acids: /'L
H, H and the aromatic diamine component whose main component is 4,47-diamid-2-enyl ether, n? It is convenient to use one unit, and the initial coating is carried out using a halogenated phenol compound as a 8 km medium, and the initial coating is carried out with water removal from the reduction stand at a reaction temperature of 100 to 200°C until the reduced specific viscosity becomes 0.1 or more. After that, the water was refluxed under atmospheric pressure.
七の俊脱水丁ゐこと耐性αと丁ゐO
本発明ttW%定成分の俊″Jx付孕竹なう除、水分の
存在下で行な+、/1俊思台終了佼ホリイミド樹脂溶液
中に含まnる水分を、彼XL付時に存在する水分よシ、
減少させることにより保存安定性に優nfcポリイミド
樹脂溶液が倚らnる。Resistance α and Ding O This invention's ttW% constant component of Jx is removed in the presence of moisture. The water contained in the XL is the same as the water present when the
By reducing the amount of water, the NFC polyimide resin solution has excellent storage stability.
前述の初期反応における縮合水の除去方法に不活性ガス
による追い出し、トルエン等の溶媒耐用いて共沸混曾物
として除去する方法、ゼオライトによる除去等があるが
、不活性ガスおよびゼオライトによる方法が比較的低い
反応温度で行なえるため好ましい。Methods for removing condensed water in the initial reaction mentioned above include expulsion using an inert gas, removal as an azeotropic mixture using a solvent such as toluene, and removal using zeolite, but the methods using inert gas and zeolite are the most effective. This is preferable because it can be carried out at a relatively low reaction temperature.
本発明によnは、イミド化率90%以上、物に95%以
上、さらに98%以上のポリイミド樹脂が得らnる。According to the present invention, a polyimide resin having an imidization rate of 90% or more, particularly 95% or more, and even 98% or more can be obtained.
また不発明によるポリイミド樹脂溶液の濃度に50厘童
%まで釉々の濃度で均一で透明なポリイミド佃脂溶液葡
直接得ることができる。またハロゲン化フェノール化付
物によジ希釈、マた棟々の方法でハロゲン化フェノール
化合*’に除去し濃縮することが可能である。Moreover, according to the present invention, it is possible to directly obtain a uniform and transparent polyimide resin solution with a glaze concentration of up to 50%. In addition, it is possible to remove and concentrate the compound into a halogenated phenol compound*' by diluting it with a halogenated phenol adduct or using a variety of methods.
この発明によって製造式nるポリイミド償■旨浴液に、
樹脂溶液の薄膜全形成し、その候博腺から溶媒紮除去す
ることによシ特性Q)優n′fcボリイ5ドフィルムを
容易に裏道できゐQまたエナメル用絶縁ワニスとしても
有用である0以下率発明についてさらに具体的に祝明す
る。According to this invention, the polyimide liquid bath liquid manufactured by the formula:
By completely forming a thin film of resin solution and removing the solvent from the resin solution, it is possible to easily create a superior n'fc polyurethane film.Q It is also useful as an insulating varnish for enamel. We would like to congratulate you more specifically on the following inventions.
本発明において便用するテトラカルボンば成1;J、
3.3’、4.4’−ベンゾンエノンテトラカルボン酸
類を主成分とするものであり、好葦しくに。Tetracarboxylic compound 1; J, conveniently used in the present invention
It is mainly composed of 3.3', 4.4'-benzoneenonetetracarboxylic acids, and is preferred.
5.5’、4.4’−ベンゾ2工/ンテトラカルボン酸
類がテトラカルボ/酸成分の約50モル%以上。5.5',4.4'-benzo dicarboxylic/tetracarboxylic acids account for about 50 mol% or more of the tetracarbo/acid component.
好ましくは65モル%以上、史に好ましくに70モル%
以上で6nばよい。Preferably 65 mol% or more, more preferably 70 mol%
All you need is 6n.
1m He 5.514.4’−ベンシアエノンテトラ
カルホン酸類とF;1.5’、4.4’−ベンゾ21ノ
ンテトラカルボン酸、その酸無水v+、エステル化物で
めシ% K 5 、5’、 4.4’−ベンゾンエノン
テトラカルポン酸二無水物(以下BTDA、l!:略丁
)が好適であ(
途中ニハロゲン化フェノール化付物に不溶なポリマーが
生成したり1反応液忙耐却丁ゐと液が白濁した9する几
め好ましくlI/′IC前記5.5’、4.4’−ペン
ツ°フエノンテトンカルボン酸類と共に使用でさるナト
2カルボン酸知とじてはピロメリット酸二無水物、
2,3.6.7−す2タレンテトラカルボン酸二無水物
、 5.5’、4.4’−ジフエニルテトラカルボン
酸二無水物、 1,2゜5.6−ナフタレンテトラカ
ルボン酸二無水物、2.2’、5.6’−ジンエニルテ
トラヵルボン酸二無水’f’/J、 2.2−ビス(
3,4,−ジカルボキシフェニル)グロバンニ無水物、
ビス(6,4−ジカルボキシ2エニル)スルホンニ無水
物、 5.4.9.10 −ペリレンテトラカルボン酸
二無水物、ビス(6,4−ジカルボキシ2エニル)エー
テルニ無水物。1m He 5.514.4'-Benzyaenonetetracarboxylic acids and F; 1.5', 4.4'-benzo21nonetetracarboxylic acid, its acid anhydride v+, esterified product, % K5, 5', 4,4'-benzoneenonetetracarboxylic acid dianhydride (hereinafter referred to as BTDA) is suitable (hereinafter referred to as BTDA) (due to the formation of a polymer insoluble in the dihalogenated phenolic adduct during the course of the reaction). If the liquid becomes cloudy and the liquid becomes cloudy, it is preferable to use the above-mentioned 5.5', 4.4'-benzenetone carboxylic acid. pyromellitic dianhydride,
2,3.6.7-2talenetetracarboxylic dianhydride, 5.5',4.4'-diphenyltetracarboxylic dianhydride, 1,2゜5.6-naphthalenetetracarboxylic dianhydride Anhydride, 2.2', 5.6'-dinenyltetracarboxylic dianhydride 'f'/J, 2.2-bis(
3,4,-dicarboxyphenyl)globanni anhydride,
Bis(6,4-dicarboxy 2-enyl) sulfone dianhydride, 5.4.9.10-perylenetetracarboxylic dianhydride, bis(6,4-dicarboxy 2-enyl) ether dianhydride.
ナフタレン−1+2.4.5−テトラカルボン散二無水
物、ナフタレン−1,4,5,8−テトラカルボン酸二
無水物、2.6−ジクロルナフタレン−1,4゜5.8
−テトラカルボン酸二無水物、2.7−シクロペンタン
ー1.4,5.8−テトラカルボン酸二無水物、 2
.6.6.7−テトラクロルナ2タレン−1,4,5,
8−テトラカルボン酸二無水物、ンエナンスレン−1,
s、9.10−テトラカルボン酸二無水物、 2.2
−ビス(2,3−ジカルボキシ2工: ル) フロパン
二m水9m、 1.1−ビス(2,5−ジカルボキシ
フェニル)エタンニ無水物11.1−ビス(6,4−ジ
ヵルボキシフェニルンエタン二無水物、ビス(2,5−
ジ刀ルボキシ2エニノリメタンニ無水物、ビス(6,4
−ジカルボキシ2エニル)メタンニ無水物、ビス(3,
4−ジカルボキシフェニル)スルホンニ無水9a *ベ
ンゼンー 1.2.3.4−テトラカルボン酸二無水物
、2,6゜2−3−ベンゾフェノンテトラカルボン酸二
#c水物、 2.6.5’、4’−ベンゾンエノンテト
ラカルボン酸二無水物、ピラジン−2,5,5,6−テ
トラカルボン酸二無水物、チオンエン−2,5,4,5
−テトラカルボン酸二無水物、エチレンテトラカルボン
酸二無水物、デカヒドロナフタレン−1,4,5゜8−
テトラカルボン酸二無水物、4.8−ジメチル−1,2
,5,5,6,7−へキサヒドロf2タレンー1.2.
5.6−テトラカルボン酸二無水物、シクロペンタン−
1,2,,5,4−テトラカルボン酸二無水物、ピロリ
ジン−2,5,4,5−テトラカルボン酸二無水物、
1.2.3.4−ブタンテトラカルボン酸二無水物、
ビシクロ−(2,2,2)−オタト(7)−エン−2,
3,5,6−テトラカルボン酸二無水物。Naphthalene-1+2.4.5-Tetracarboxylic dianhydride, Naphthalene-1,4,5,8-tetracarboxylic dianhydride, 2.6-dichloronaphthalene-1,4°5.8
-tetracarboxylic dianhydride, 2.7-cyclopentane-1.4,5.8-tetracarboxylic dianhydride, 2
.. 6.6.7-Tetrachlorna 2talene-1,4,5,
8-tetracarboxylic dianhydride, enanthrene-1,
s, 9.10-tetracarboxylic dianhydride, 2.2
-bis(2,3-dicarboxy 2-dicarboxylic acid) 2m water 9m, 1.1-bis(2,5-dicarboxyphenyl)ethane dianhydride 11.1-bis(6,4-dicarboxylphenyl) Xyphenylene ethane dianhydride, bis(2,5-
Dito Ruboxy 2 Eninori Methani Anhydride, Bis(6,4
-dicarboxy(2-enyl)methane dianhydride, bis(3,
4-dicarboxyphenyl)sulfone dianhydride 9a *benzene 1.2.3.4-tetracarboxylic dianhydride, 2,6゜2-3-benzophenonetetracarboxylic acid di#c hydrate, 2.6.5' , 4'-benzoneenonetetracarboxylic dianhydride, pyrazine-2,5,5,6-tetracarboxylic dianhydride, thionene-2,5,4,5
-Tetracarboxylic dianhydride, ethylenetetracarboxylic dianhydride, decahydronaphthalene-1,4,5°8-
Tetracarboxylic dianhydride, 4,8-dimethyl-1,2
,5,5,6,7-hexahydrof2talene-1.2.
5.6-Tetracarboxylic dianhydride, cyclopentane-
1,2,,5,4-tetracarboxylic dianhydride, pyrrolidine-2,5,4,5-tetracarboxylic dianhydride,
1.2.3.4-butanetetracarboxylic dianhydride,
bicyclo-(2,2,2)-otato(7)-ene-2,
3,5,6-tetracarboxylic dianhydride.
2.6.5’、4’−ビフヱニルテトラカルボン酸二無
水物、s、4.s′、4′−ビフェニルテトラカルボン
酸二無水vlJs 2+5+2’+5’ −ヒ2z
=ルテトラjyルyyン酸二無水物、ビス(3,4−ジ
カルボキシ2エニル)ジメチンしシランニ無水?l、ビ
ス(3,4−ジカルボキシフェニル)メチル2エニルシ
ランニ無水物、ビス(5,4−ジカルボキシフェニル)
ジンエニルシ2ンニ無水?/1. ビス(2,5−ジカ
ルボキシフェニル)ジメテルシランニ無水物、1.4−
ビス(3,4−ジカルボキシンエニルジメテルシリル)
ベンゼンニ無水物、1.6−ビス(5,4−ジカルボキ
シ2ヱニル) −1,1,3,6,−テトラメテルジシ
ロキサンニ無水物、p−ン工ニレノービス(j’!jメ
リットtlflモ/xy、チルH無水1勿)エチレンク
リコールビス(トリメリット酸無水物・)% 2,2−
ビス(6,4−ジカルボキシフェニル)へキサフロロフ
ロバンニm水物。2.6.5',4'-biphenyltetracarboxylic dianhydride, s, 4. s', 4'-biphenyltetracarboxylic dianhydride vlJs 2+5+2'+5' -H2z
= Lutetrazylic dianhydride, bis(3,4-dicarboxy2enyl)dimethine and silaniic anhydride? l, bis(3,4-dicarboxyphenyl)methyl 2enylsilanihydride, bis(5,4-dicarboxyphenyl)
Anhydrous? /1. Bis(2,5-dicarboxyphenyl)dimetersilanihydride, 1.4-
Bis(3,4-dicarboxinyldimetersilyl)
Benzene dianhydride, 1,6-bis(5,4-dicarboxy2enyl)-1,1,3,6,-tetramethedisiloxane dianhydride, /xy, Chill H anhydride 1) ethylene glycol bis(trimellitic anhydride) % 2,2-
Bis(6,4-dicarboxyphenyl)hexafluoroflobanni hydrate.
2.2−ビス(4−(5,4,−ジカルボキシ2エノキ
シ)フェニル〕ヘキサンロログロバノニ熊水物、4.4
′−ビス(5,4−ジカルボキノンエノキシンジンエニ
ルスルンイドニ無ボ物咎がお心。2.2-bis(4-(5,4,-dicarboxy-2-enoxy)phenyl)hexanerologlobanonikumasuimono, 4.4
'-Bis(5,4-dicarboquinone enoxydine enyl sulundi)
本発明VLk・いて使用すゐ芳香族ジアミン成分U、
4.4’−ジアミノジフェニルエーテルで王賊分と丁
Φものでろ!;l、 4.4’−ジアミノジフェニル
エーテル(以下DLlt!:と略丁)か芳香族ジアミン
成分の70モル%以よ、好ましくに75モル%以上、史
に好t L (は80モル%以上でめ)Lばよい。The aromatic diamine component U used in the present invention VLk,
4.4'-Diaminodiphenyl ether is the king and the king! ; L, 4.4'-diaminodiphenyl ether (hereinafter referred to as DLlt!) or aromatic diamine component in an amount of 70 mol% or more, preferably 75 mol% or more, and preferably 80 mol% or more. Me) L is good.
LADEの童が70モル%よジ少ないと反応途中V(ハ
ロゲン化フェノール化合物に不浴なホリマーが生成した
シ反応漱に冷却すると故が白濁したり了るため好ましく
ない。If the amount of LADE is less than 70 mol%, it is not preferable because during the reaction V (a polymer which is not bathable for the halogenated phenol compound is formed) and the reaction mixture becomes cloudy when cooled to the reaction slag.
1)1)Eと共Vこ便用で@ゐ芳香族ジアミンとじては
2.2−ビス(4−アミノ−2エニル)グロバン%
2+6 ”−シアミノーヒリジン、ビス−(4−アミノ
ーアエニル)ジエテルシ2ノ、ビス−(4−アミノ−フ
ェニル)ジフェニル7ラン、ベンジジン、3,6−シク
ロルーベンジジン、3゜6′−ジメトキシベンジジン、
ビス−(4−アミノ−フェニル)エテルホスフィンオキ
サイド、ビス−(4−アミン−2工ニル)−N−ブナル
アミン、ビス−(4−アミノ−フェニル)−N−メテル
アεン、 5.5’−ジメチル−4,4′−ジアジ゛
ミノクフニニル、N−(3−アミノフェニル)−4−ア
ミノベンズアミド、4−アミノフェニル−6−フミノ安
息香酸、5.5’−ジノナル−4゜4′−ジアミノジフ
ェニルメタン、 6.5’−ジメトキシ−4,47−
ジアミノジフェニルメタン、3.6’−ジエトキシ−4
,4′−ジアミノジフェニルメタン、 5.5’−ジ
カルボキシ−4,4′−シアξノジフ工−”ルメタンs
5+6’−シンロロー4.4’−ジアミノジフェニ
ルメタン、 5+5’−シクロロー4.4’−ジアミ
ノジフェニルメタン、 3.3’−ジブロム−4,4
′−ジアミノジフェニルメタン、 5.5’−ジヒドロ
キシ−4,4′−ジアミノジフェニルメタン。1) 1) E and V are used for this purpose @2 aromatic diamine is 2.2-bis(4-amino-2enyl) globan%
2+6''-cyaminohyridine, bis-(4-aminoaenyl)diethercy2no, bis-(4-amino-phenyl)diphenyl 7rane, benzidine, 3,6-cyclorubenzidine, 3゜6'-dimethoxybenzidine,
Bis-(4-amino-phenyl)etherphosphine oxide, bis-(4-amine-2-enyl)-N-bunalamine, bis-(4-amino-phenyl)-N-metheramine, 5.5'- Dimethyl-4,4'-diadiminocufninyl, N-(3-aminophenyl)-4-aminobenzamide, 4-aminophenyl-6-huminobenzoic acid, 5,5'-dinonal-4°4'-diaminodiphenylmethane , 6,5'-dimethoxy-4,47-
Diaminodiphenylmethane, 3,6'-diethoxy-4
, 4'-diaminodiphenylmethane, 5,5'-dicarboxy-4,4'-cyanodiphenylmethane s
5+6'-cyclolo 4.4'-diaminodiphenylmethane, 5+5'-cyclolo 4.4'-diaminodiphenylmethane, 3.3'-dibrome-4,4
'-Diaminodiphenylmethane, 5,5'-dihydroxy-4,4'-diaminodiphenylmethane.
5.6フージスルホー4.4′−ジアミノジフェニルメ
タン、 5.5’−ジメチル−4,4′−ジアミノジ
フェニルエーテル、 3..5’−ジメトキシ−4,4
′−ジアミノジン1ニルエーテル、 5.6’−ジェ
トキシ−4,4’−シアミノジンエニルエーテル、 6
+5’−シ〃ルボキシー4.4′−ジアミノ72エニル
エーテル、6,6′−ジクロロ−4,4′−ジアミノジ
ン1ニルエーテル、 3.6’−ジヒドロキシー4.
4′−ジアミノジンエニルエーテル、 3.3’−ジ
スルホ−4゜4′−ジアミノジフェニルエーテル、6.
6′−ジメチル−4,4’−ジアミノジフェニルスルホ
ン、6゜6′−ジメトキシ−4,47−ジア好ノジ2エ
ニルスルホン、6.6′−ジェトキシ−4,4′−ジア
ミノジフェニルスルホン、6,6′−ジカルホ゛キンー
4.47−ジアミツシンエニルスルホン+ 3,3’
yタロo −C4’ −シフ ミノジフェニルスル
ホン、 3.3’−ジヒドロキシ−4,4′−ジアミ
ノジフェニルスルホン、 6.5’−ジスルホ−4,4
′−ジアミノジフェニルスルホン、 6.5’−ジノ
ナル−4,4’−シアミノジ2エニルズロバン、 3
.5’−ジメトキシ−4,4′−ジアミノジフェニルプ
ロパン、 6.5’−シーcトー+シー4,4′−ジア
ミノジンェニルグロバン、6.6′−ジカルボキシ−4
,4′−ジアミノジンエニルグロバン、3.3’−ジク
ロロ−4,47−ジアミツジ2エニル7°ロバン、
5.5’−ジヒドロキシ−4゜4′−シアミノジフェニ
ルプロパンs 31.5’−’;スルホー4.4′−ジ
アミノジフェニルグロバン、6゜6′−ジメチル−4,
4′−ジアミノジフェニルスルファイド、 5.5’
−ジメトキシ−4,4′−ジアミノジフェニルスル2ア
イド、6.5’−ジェトキシ−4,4′−シアばフジ2
エニルスル2アづド、 5.5’−ジカルボキシ−4
,47−ジアミノジフェニルスルファイド、 3.3
’−ジクロロ−4,4′−ジアミノジフェニルスルファ
イド、5.5’−ジヒドロキン−4,4’−ジアミノジ
フェニルスル2アイド、6゜6′−ジスルホ−4+47
−ジアミノジフェニルスルファイド、 6.6フーシ
アミノジ2エニルメタン、6.6′−ジアミノジフェニ
ルエーテル、 3.5’−ジアミノジフェニルスルホン
、 6.5’−ジアミノジフェニルプロパン、 3
.3’−ジアミノジフェニルスルファイド、2.4−ジ
アミノトルエン、2.6−ジアミノトルエン、バラ−2
エニレンジアミン、メタ−フェニレンジアミン、 4
.4’−シアεラージ2エニルプロパン、’4.4’−
ジアミノージフェニルメタン、 5.3’−ジアミノ
ベンンアヱノン、4.47−ジアミツージ2ヱニルスル
ンイト、’L4”/アミノージフェニルスルホン、
3.4’−ジアミノジフェニルエーテル、1.5−ジア
ミノ−ナフタレン、 5.5’−ジメトヤシベジシン
、2゜4−ビス(ベーク−アミノ−1−ブナル)トルエ
ン、ビス−(バラ−ベーターアミノ−t−プチルーンエ
ニル)エーテル、ビス−(ハラーベーターメナルーデル
ターアミノーベンテル)ベンゼン、とスーパーラー(1
,1−ジノナル−5−アミノ−ペンチル)ベンセン、1
−イア70ビル−2,4−メタンヱニレンジア(/、r
n−キシレンジアミン等がああ。5.6 fudisulfo 4.4'-diaminodiphenylmethane, 5.5'-dimethyl-4,4'-diaminodiphenyl ether, 3. .. 5'-dimethoxy-4,4
'-Diaminodine 1 nyl ether, 5.6'-jethoxy-4,4'-cyaminodine enyl ether, 6
+5'-Cylboxy 4.4'-Diamino 72enyl ether, 6,6'-dichloro-4,4'-diaminodine 1-nyl ether, 3.6'-dihydroxy4.
4'-diaminodienyl ether, 3.3'-disulfo-4°4'-diaminodiphenyl ether, 6.
6'-dimethyl-4,4'-diaminodiphenylsulfone, 6°6'-dimethoxy-4,47-diaphilonodieneylsulfone, 6.6'-jethoxy-4,4'-diaminodiphenylsulfone, 6, 6'-dicarphoquine-4,47-diamicinyl sulfone + 3,3'
ytalo o -C4'-Sifminodiphenylsulfone, 3,3'-dihydroxy-4,4'-diaminodiphenylsulfone, 6,5'-disulfo-4,4
'-Diamino diphenyl sulfone, 6,5'-dinonal-4,4'-cyamino di-2enylzuloban, 3
.. 5'-dimethoxy-4,4'-diaminodiphenylpropane, 6.5'-cy c-to+cy 4,4'-diaminodiphenylgloban, 6,6'-dicarboxy-4
, 4'-diaminodienylgloban, 3,3'-dichloro-4,47-diaminodienyl 7°loban,
5.5'-dihydroxy-4゜4'-cyaminodiphenylpropane s 31.5'-';sulfo4.4'-diaminodiphenylgloban,6゜6'-dimethyl-4,
4'-diaminodiphenyl sulfide, 5.5'
-dimethoxy-4,4'-diaminodiphenylsul2ido, 6,5'-jethoxy-4,4'-cyabafuji2
enylsul2ad, 5,5'-dicarboxy-4
, 47-diaminodiphenyl sulfide, 3.3
'-dichloro-4,4'-diaminodiphenylsulfide, 5,5'-dihydroquine-4,4'-diaminodiphenylsulfide, 6°6'-disulfo-4+47
-diaminodiphenyl sulfide, 6.6-diaminodihenylmethane, 6.6'-diaminodiphenyl ether, 3.5'-diaminodiphenylsulfone, 6.5'-diaminodiphenylpropane, 3
.. 3'-diaminodiphenyl sulfide, 2.4-diaminotoluene, 2.6-diaminotoluene, rose-2
Enylene diamine, meta-phenylene diamine, 4
.. 4'-Sia ε large 2-enylpropane, '4.4'-
Diaminodiphenylmethane, 5.3'-diaminobennone, 4.47-diaminodi2enylsulunite, 'L4'/aminodiphenylsulfone,
3.4'-diaminodiphenyl ether, 1.5-diamino-naphthalene, 5.5'-dimethoyacivedicin, 2゜4-bis(baked-amino-1-bunal)toluene, bis-(barabeta-amino- t-butyrunenyl) ether, bis-(halabetamenaludertaaminobentel)benzene, and superlar(1
,1-dinonal-5-amino-pentyl)benzene, 1
-ia 70 building-2,4-methanelenedia (/, r
N-xylene diamine etc.
芳香族ジアミン成分との便用量比は、蝮担静モルで使用
し、頁台イミド化忙1攻階で行71’)。The fecal dose ratio with the aromatic diamine component is used in a static mole, and the imidization process is performed in line 71').
しかじ四成分の使用句比に刀・ならずしも寺しくl〈て
もよくいずn7D・一方の成分が他の成分に対して10
モル%以内好讐しくに5モル%以内の刀n米;j前でろ
nげよい。The usage ratio of the four components is katana, nashi mo terashiku l〈tada good izu n7D, one component is 10 compared to the other component.
Preferably within 5 mol%; preferably within 5 mol%;
不発明にあ・いて反応浴媒として便用丁ゐハロゲン化ン
エノール化5qvJta、水取基とハロゲン原子とがベ
ンゼン杉τ形成している炭素に1Iil接鮎台していオ
tばよく融点が100’C以下、好ましくは80℃増、
下であってしη・も沸点が3000C以)幻瞥しく31
280℃以下でめゐハロケン化フェノール化合物7jは
−t−tシい。ベンゼン核に結付しているハロクン原子
に、待VC眠足さnないが好ましくに塩累又は臭素がよ
い。またハロゲン化フェノール化@物は、ハロケン原子
と水酸泰以外の置候基としてメチル、エチル、ノロビル
などの低級アルキル基がペンセン核の戻素原子vc粕台
しているものであってもよい。Inventively, as a reaction bath medium, it is convenient to use a halogenated enol of 5 qvJta, and if the water removal group and the halogen atom are attached to the carbon forming the benzene tau, the melting point should be 100. 'C or less, preferably 80℃ increase,
The boiling point is below 3000C) 31
At temperatures below 280°C, the halogenated phenol compound 7j becomes -tt. The halogen atom bonded to the benzene nucleus is preferably a salt or bromine, although it does not require VC. Further, the halogenated phenol compound may be one in which a lower alkyl group such as methyl, ethyl, or norobyl is substituted with a halogen atom and a lower alkyl group such as ethyl or norobyl as a substituent other than the hydroxyl atom.
:+発明においてハロゲン化ンエノール化@物としては
?llλば0−クロルフェノール、m−クロルフェノー
ル、p〜ジクロル2エノールo−ブロムフェノール、m
−クロルフェノール、p−フロムフェノール、2−クロ
ル−4−ヒドロキシトルエン、2−クロル−5−ヒドロ
キシトルエン、6−クロル−6−ヒドロキシトルエン4
りoルー2−ヒ)”oキシトルエン、2−7’ロム−4
−ヒ)”ロキシトルエン、2−ブロムー5−ヒドロキシ
トルエン、 2.4.ジクロル2エノール、 2.6
.−ジクロル2エノール、2.4.6−ドリクロルフエ
ノール、 2.4.6−トリフロム2エノールなど老
挙けること713出米/8゜不発明においてに瞥にp−
クロル2工ノールm−クロル2エノール、p−ブロム2
1ノールm−7−ロムンエノール、2.4シタロル2エ
ノール、2,4.6 )ジクロルフェノール、2,4ジ
ノロム2ヱノール、 2,4.6 トリフロム2エノ
ール、あるいに01しらのハロゲン化2エノー” 化8
faの2棟以上(/J ?M台浴媒が好lしい。:+What is the enolization of halides in inventions? llλ 0-chlorophenol, m-chlorophenol, p~dichloro2enol o-bromophenol, m
-Chlorphenol, p-fromphenol, 2-chloro-4-hydroxytoluene, 2-chloro-5-hydroxytoluene, 6-chloro-6-hydroxytoluene 4
2-7'rom-4
-H)” Roxytoluene, 2-bromo-5-hydroxytoluene, 2.4. Dichloro-2-enol, 2.6
.. - Dichloro 2-enol, 2.4.6-dolychlorophenol, 2.4.6-trifluorome 2-enol, etc. are listed in 713 publications / 8 degrees.
Chlor 2-enol m-Chlor 2-enol, p-Brom 2
1-norm-7-romenol, 2.4 citalol-2enol, 2,4.6) dichlorophenol, 2,4-dinorom-2enol, 2,4.6-triflom-2enol, or halogenated 2 of 01 8
Fa 2 or more buildings (/J?M bath medium is preferred.
マタ、不発明に2いてハロケン化フェノール化合物に他
の有磯極性浴味ケ60蓮童%以内でめ′nは添カロして
使用−3−ゐことηj川用仁でりゐ。However, uninventively, the halo-saponified phenol compound and other polar baths are added within 60% and used.
不発明に2いて浴媒4除い7ζ他の成分の普耐粛に各成
分の8M′f濃匿が2〜60厘負%、さらに好ましくは
6〜2Q菫童%、ざらに好ましくに4〜15夏童%とl
る貢であることが好ましい0
本発明において初期反応の温度に100〜200°C1
7J軛囲であnばよいが好ましくは100〜180℃史
に好ましくは100〜160℃である。反応湿度に一短
に維持丁ゐことが好ましいが前記範四内でめγしは笈化
させてよい0反応源度が100℃よジ低いとイミド化が
光分に進行せず、俊崖曾でケル化し丸り、イミド化率の
1炊い4#I’l旨し刀・侍らrL7Zい。また反工6
温度が200℃より高いとケル化し流動性のない樹脂浴
数や不為−l佃脂浴液になり易いため過当でない0また
。縮台水忙除去丁め方法に不活性カスによる追い出しな
ど公知の方法でよいが俊電台に入/:)還元比粘度に容
易に?ff1l倫するためにに、ゼ第2イトで縮合水ン
除去丁ゐのか好ましい。In accordance with the present invention, the concentration of 8M'f of each component is 2 to 60%, more preferably 6 to 2%, more preferably 4 to 2%. 15 summer child% and l
In the present invention, the temperature of the initial reaction is preferably 100 to 200°C.
The temperature may be 7J, but preferably 100 to 180°C, preferably 100 to 160°C. It is preferable to keep the reaction humidity at a low level, but it is unlikely that the reaction temperature will be oxidized within the above range.If the reaction temperature is lower than 100°C, imidization will not proceed to the light level, and the temperature will be very high. It is rounded and rounded, and the imidization rate is 4# I'l delicious sword and samurai rL7Z. Also anti-work 6
If the temperature is higher than 200°C, it tends to become kelp, resulting in a resin bath with no fluidity or a tsukufat bath liquid, which is not unreasonable. Known methods such as expulsion using inert scum may be used to remove dirt from the reduction table, but is it easy to reduce the specific viscosity? It is preferable to remove the condensed water at the second stage in order to maintain the ff1l level.
また、後貞台に入ゐ還元比粘度に0.1以上であnばよ
いが好ましく汀、0.1〜2.0更に好ましくに0゜1
〜1.5でめゐ。還元比粘度が0.1よすφさいと1分
子扉の小さな樹脂しか倚らnlい0
不発明に2いて佼厘8孕竹lう装置に、大気圧下で還流
管才辿して反応装置の少なくとも1ケF9Tが開放さi
tたものがよい。In addition, the specific viscosity of the reduced specific viscosity after entering the wafer is preferably 0.1 or more, preferably 0.1 to 2.0, more preferably 0.1.
It's ~1.5. The reaction was carried out using a reflux tube under atmospheric pressure in a device with a reduced specific viscosity of 0.1 diameter and a single molecule door. At least one F9T of the device is open.
It's better to have something like that.
また、披皇台の反応渦度に100〜200℃の範囲でめ
tばよいが、好’iしくo i o o〜180℃史に
好舊しくLrX1QQ〜160℃でアル。In addition, it is best to adjust the reaction vorticity of the reaction vorticity in the range of 100 to 200°C, but preferably in the range of 180°C to LrX1QQ to 160°C.
茂応漏度σ−足に班持丁ゐCとが好よしいか。Is it good to have a sigmoidal leakage degree σ-foot with a ton of weight on the foot?
前B己卓龜F15円でめlしは、貧化させてよい。戊尾
、粘デ度が100℃より世いとイミド化が光分子り連打
ぜずイミド化率の低い倒8゛占し〃・侍らnらい0また
20D℃より旨いとグル化し加8M性のない樹脂浴数や
不均一な樹脂浴数になり易いため球当てない。If you pay 15 yen for the previous B, you may be poor. If the viscosity is higher than 100℃, the imidization will not be repeated and the imidization rate will be low. Do not hit the ball with the ball as it can easily result in an uneven number of resin baths.
また、候厘せを行な9時の戊紀、准中り水分須rL反応
の結果理論的に生成下/)紬会水菫の1150〜1 /
2 モルM(1)堵nWで67シはよl/’O好lし
くに1/40〜1/2モル逮、更に好−fL(σ1/2
5〜1/2モル童である。俊厘付り除前記ニア1−駕よ
り少lい揚甘には効果が/」\σ〈。In addition, as a result of the 9 o'clock Boki, the result of the semi-nakatori water-sugar reaction, the theoretically produced amount is 1150-1 of Tsumugi-kai Mizuhire.
2 mol M(1) and nW is 67 mol/'O, preferably 1/40 to 1/2 mol, more preferably -fL(σ1/2
He is a 5-1/2 mole child. It is effective for fried sweets that are less than the near 1-kake, excluding shunri./''\σ〈.
多い編付にに、反応時間が畏〈なゐ〇
また。初期反応の結果、前記水分量に満たlい揚8 t
’、J @ @1J記範囲内に人ゐように水葡添加丁γ
しはよい。Due to the large amount of editing, the reaction time was a bit scary. As a result of the initial reaction, the water content was filled to 8 t.
'、J @ @1 Add water grapes so that there are people within the range of J
It's good.
また、俊亜台の反応時間に回転粘度が−足にlゐまで)
X応をぜ2%はよいが通常1〜50時間である。In addition, the rotational viscosity during the reaction time of Shunadai is -1 to 1)
X-reaction time of 2% is good, but it is usually 1 to 50 hours.
不発明に2いて、俊ム台芒ぜた後、情脂浴准甲の水分上
除去する方法に、不活性カスにより追い出し、乾燥剤に
よる方法なと公知の方法−〇よいが、操作上ゼオライト
で脱水するりか好l(7い。In the second aspect of the invention, there is a known method of removing water from the oil bath after drying it with an inert scum and using a drying agent. It is better to dehydrate with water (7 days).
なた、ゼオライトで脱水する際の温度に極力低い方がよ
いが灯でしくに60〜140℃がよい0しかしこfLよ
シも篩〈てt可能でるる。h兄水のa#i’、1ポリイ
ミド架脂浴液に宮まfL心水分童に1150モル以下に
するのが好ましい。It is better to keep the temperature as low as possible when dehydrating with zeolite, but it is best to set it at 60 to 140 degrees Celsius under a lamp, but it is also possible to use a sieve. It is preferable that the amount of water a#i' of h brother water, 1 polyimide crosslinking bath liquid, and 1,150 mol or less for miyama fL heart water child.
また、本発明において便用丁ゐゼオライトの量によって
は初期反応で便用したゼオライトオ除去せずに恢恵台老
行なうことも町15にでおゐ〇また、本発明で用い57
しるゼオライトとじてに天然腫でも@成品でもよいO1
九軸台剤を言んでいてもよい0ゼオンイトの帷孔住とし
てに水分子とほぼ同等かそ扛以止で、佼用浴媒分子、便
用モノマー分子よりも小芒汀几ばよいが6〜5Aが好ま
しい。11こゼオライト(1)形や(とじでに、轡に制
Viにないがペレント状、球状が好ましい0
また本発明に2いて還元比粘度はが1」ボ錨展5)
0℃、濃度0.19/100m1浴媒でp−タロルフェ
ノール紮浴媒として測足した0ホリづミド樹脂浴欣中の
水分量の測だはカールフィソンヤー法で御」足した○
回転粘度にE型粘度計に波列(L70Cで側建した0
以下、実施例2よび比&せりにボテ。In addition, depending on the amount of zeolite used in the present invention, it is also possible to carry out the aging process without removing the zeolite used in the initial reaction.
O1 can be used as a natural zeolite or as a manufactured product.
0 zeonite, which may be referred to as a nine-axis agent, is almost the same as a water molecule, or even less than a water molecule, and should be smaller than a bath medium molecule or a toilet monomer molecule, but 6~ 5A is preferred. 11 This zeolite (1) has a shape (there is no limit to binding or lining, but pellet-like or spherical is preferable. In addition, according to the present invention, the reduced specific viscosity is 1" and the anchor is 5) at 0°C and concentration 0. .19/100ml The water content in the 0-horidumide resin bath was measured using the p-thalolphenol bath medium and was added using the Karl Fisson-Yar method. In total, the wave train (L70C with sidewall 0) Below, Example 2 and comparisons & auctions were made.
漉度計、攪#装置、麓光酊坤肯釦1jmχ/こ四つロン
ラスコにBTDA 12.a 8g ((J、04モル
)ピロメリット酸′−)無水物218g(0,01モル
)DDE90g(0,045モル)、p−フェニレンジ
アミン0.54 g (0,05モル)を50℃に抹っ
7tp−クロルフェノール260gに入rt、攪拌しl
がら15U’G”f、で約1.5時間で弁筒した。16
0℃に昇渦した所で五酸化リンのデシケータ中に保存し
ておいfc4Aのモレキュラーシーブス(;tU光純桑
#)3.6gを添加した。脩加後2時IWJ 150℃
で反応させた候、ろ過紮何ない透明なポリイミド樹脂浴
液(初期反応物A)2侍た0侍らnた初期反尾;物の還
元比粘度に0.48(測友泥度り0℃、濃度0.1g/
100m1溶媒でp−タロルフェノール忙浴媒として測
足しfc)、水分量0.05%(理輪生成縮せ木掘り0
.07モル)であり几。12. Strain meter, stirring device, and BTDA at the foot of the light. a 8 g ((J, 04 mol) pyromellitic acid'-) anhydride 218 g (0.01 mol) DDE 90 g (0.045 mol) and p-phenylenediamine 0.54 g (0.05 mol) were heated to 50°C. Add 7tp to 260g of chlorophenol at RT, stir.
The valve cylinder was completed in about 1.5 hours at 15U'G"f.16
When the mixture was heated to 0° C., 3.6 g of fc4A molecular sieves (;tU Kojun Mulwa #), which had been stored in a phosphorus pentoxide dessicator, was added. 2 o'clock after shuka IWJ 150℃
When the reaction was carried out, a transparent polyimide resin bath solution (initial reactant A) without any filtration was used. , concentration 0.1g/
Measured in 100ml of solvent as p-thalolphenol bathing medium (fc), water content 0.05% (reinforced shrinkage 0
.. 07 mol) and 几.
温度計攪拌装置、窒累導入管忙備えた四つロフラスコに
、 BTDA 16.1 g (0,05モル)DDE
10.0 g (0,05モル)ン50℃に保ったp
−クロルフェノール220gに人7し、f′i件しなが
ら120℃に外淵した。その恢120℃で20分間反応
させ透明なポリイミド樹脂浴液(初期反応物B)を#た
0
得らnた初期反応物の還元比+iJ1度にr[J、07
、水分量0,51%(理論生成給付ポリ0.69七〕っ
であった。BTDA 16.1 g (0.05 mol) DDE was added to a four-lobe flask equipped with a thermometer stirrer and a nitrogen inlet tube.
10.0 g (0.05 mol) p kept at 50°C
- 7 people were exposed to 220 g of chlorophenol and heated to 120° C. while heating. The reaction was then carried out at 120°C for 20 minutes to prepare a transparent polyimide resin bath solution (initial reactant B).
The moisture content was 0.51% (theoretical yield poly 0.697).
〔フィルムの作製方法」
ポリイミド樹脂浴液にガラス1ス土に−足り浮式Vc流
延して博膜忙形敗した。作製した℃膜に100℃のオー
7ン中で約1吋+M、l l)−クロル2工ノールkm
発除云し、ポリイミドフィルム〒倚た。さらにポリイミ
ドフィルム第400℃のオープン甲で刀り熱して夾實的
Vc、、p−夕ロルフェノールを除去してポリイミドフ
ィルム忙昨製した。[Method for producing film] A polyimide resin bath solution was cast by floating Vc on one glass of soil, and the result was a complete failure. The produced °C film was heated in an oven at 100 °C for approximately 1 inch + M, l l)-chlor 2-ethanol km.
I removed the polyimide film. Further, the polyimide film was heated in an open shell at 400 DEG C. to remove the actual Vc and p-olphenol, thereby producing a polyimide film.
実施例1
湖度肘、慣拌表面、還広勺却官忙1准えた四つロフラ、
X コK、−vi J47J )y: LC,物A 2
D Og AJシ償f4’しながら80℃1で昇温さ
ぜた。昇tyイ支水L1.2g(水分量として理輪生成
動台刀(100,2モルに和尚)に添加した。ホヤぢξ
加椴温度第150℃まで昇温させ反応芒せた。反応液の
粘度げ時間と伴に壇天し、15時間以後でに一足とlっ
7c。Example 1 Lake degree elbow, inertial stirring surface, four loafers prepared for return to Guangzhou and official service 1,
X KoK, -vi J47J)y: LC, thing A 2
The temperature was raised to 80° C.1 while adjusting D Og AJ. 1.2 g of water (water amount added to 100.2 moles of Osho).
The temperature was raised to 150°C to complete the reaction. The viscosity of the reaction solution increased over time, and after 15 hours it became 7c.
160℃に外淵してから、20時間反工6させた後、輪
度牙90℃に下け4Aリモレキユラーシーブス(和光純
系JR)6g厳加した。この幅板″T:1時tu」撹拌
した俊ろ處忙行ない透り」で粘稠lポリイミド&(脂浴
漱に得た。After the temperature was raised to 160°C, the mixture was heated for 20 hours, the temperature was lowered to 90°C, and 6g of 4A remolecular sieves (Wako JR Co., Ltd.) were added. This width plate "T: 1 o'clock" was stirred to obtain a viscous polyimide & (fat bath).
侍らnたホリイミド樹1猶の赤外線分光分析〒行なった
げL 1 780cm−’l/Cイ ミ ド粕1う弓
′り荷注牧収ピークが耐めらn、アミド縮合り翁性奴収
ヒークか紹聞)らnl刀1つたりで、イミド化率75%
以上のホリイミド樹脂全言有してい/)cとがわかった
。Infrared spectroscopic analysis of the polyimide tree was carried out at 1 780 cm-'l/C. 75% imidization rate for just one sword
It was found that all of the above polyimide resins have /)c.
侍らnたポリイミド樹脂溶液の保存安定性に図−1に示
すO
1た侍らjL7こポリイミド樹脂溶液の還元比粘度に、
2,11、水分量に0.012%(a商生戟扇台水煮(
/、+0.017モ/1=)70℃の回転粘度は478
ボイズでめった。また付しnたポリイミド樹脂溶液から
作製し7こホリイばドフイルムatR紡’M爽16.9
kg /mm、 d防伸ひ52%とpBkものであっ
たo−f7ζ部分所開始幅吸刀)450℃と商〈耐熱性
に後nたものでめつノこ0比収例1
後頁8簾了抜モレキュラー/−ブスでノ況水π行lわl
いOと以外に実施vaJiとPJ椋にして透明で粘1f
8Zポリイミド便加浴畝を侍7こ。The storage stability of the polyimide resin solution shown in Figure 1 is shown in Figure 1.The reduced specific viscosity of the polyimide resin solution is
2, 11, moisture content 0.012% (a.
/, +0.017mo/1=) The rotational viscosity at 70°C is 478
I met Boise. In addition, a 7-layer film was prepared from a polyimide resin solution with an attached coating of atRspun'M Soft 16.9
kg/mm, d anti-elongation 52% and pBk starting width of o-f7ζ part) 450℃ and quotient (example 1 of 0 ratio yield with heat resistance) Molecular without the 8th screen / - ugly and no situation water π line
In addition to O, it is transparent and sticky with vaJi and PJ Muku.
7 Samurai 8Z polyimide toilet bathing ridges.
侍らγL7こホリイξド伎i脂霞竹の保存テポ任で図シ
ギにボテ。Samurai and γL7 Kohorii ξ Dokii Fat Kasumitake's preservation team was defeated by the sandpiper.
比較例2
懸笈1↑と偉拌鉄直盆累得人′1゛ン箭えた四つ目77
ス:IにB’FDAI2.88g(C1,0,4モル)
、PMDA 2.18 g (0,01モル〕、υLE
EシUg (0,045モル)、PPDo、54gC0
,005モル)に5σ℃L、/)p−クロルフェノール
260gにカロえ、恍(キし?Lから160’C−まで
矛91.5時間で昇渦し)ζ0その候160℃に珠ち、
6符藺)5L応させて透明で粘稠lポリイミド・剣胎俗
故欠製造した。侍らnたポリイミド樹脂の保存安定性を
凶と七に不丁。Comparative example 2 Kaketo 1 ↑ and the fourth 77 with a great iron picket 1↑
S: I to B'FDAI 2.88g (C1.0.4 mol)
, PMDA 2.18 g (0.01 mol), υLE
EshiUg (0,045 mol), PPDo, 54gC0
, 005 mol) to 5σ℃L, /) p-chlorophenol 260g, and the temperature rose from 160°C to 160°C in 91.5 hours. ,
6) In response to 5L, transparent and viscous polyimide was produced. The storage stability of the samurai polyimide resin was seriously criticized.
比較例6
俊血台にオートクレーン申で行なったことと後嵐台終了
偵4Aのモレキュラーシーブスで脱水を付lわな刀・っ
たこと以外に大凡例1と同様にして透明で粘稠なポリイ
ミド樹脂浴液茹侍た。Comparative Example 6 Transparent and viscous polyimide was prepared in the same manner as in General Example 1, except that the autocrane was used on Shunketsudai, and the dehydration was carried out using Molecular Sheaves on Goarandai Shutai 4A. Resin bath liquid boiled.
侍ら才したポリイミド樹脂@故の保存安定性に図4にボ
TO
比較例4
編度肘、攪拌装置、還流冷肩j管に倫えた四つ目フラス
コVC初期反応物B200g〒人7L償拌しながし16
0“′C葦で昇温ざぜ”た。反応液に時1bjと伴に糟
λし60時間以後でに一足となった0160℃昇扇俊6
5時間反応芒せた後、温度【7U″’c vc下け、4
Aのモレキュラーツーブス20g圀基力口した。この温
度で1時j肉イ費件しノζ恢ろ遇に行ない透明なポリイ
ミド樹脂俗液オ侍た〇侍ら2tたポリイミド樹脂溶液の
還元比粘度に0.16であり、フィルム9c作成しよシ
とし九肋非常にもろいフィルムしか1乍製でき1”、芙
用に耐えなかった。Comparative Example 4 Four flasks equipped with a knitting elbow, stirring device, and reflux cold shoulder tube VC Initial reactant B 200 g (7 L per person) Nagashi 16
0"'C reeds caused the temperature to rise." The reaction solution was heated to 0160°C, which was heated to 0160°C after 60 hours.
After incubating for 5 hours, the temperature was lowered to 7 U'''c vc, 4
I drank 20g of A's Molecular Twos. At this temperature, the reduced specific viscosity of the polyimide resin solution was 0.16, which was 0.16, and a film 9c was prepared. Only 1 inch of film could be made, which was extremely brittle and could not withstand heavy use.
比4!¥1タリ5
BTDA、PMDAン1.2,3.4−ブタンテトラブ
Jルボン敏二無71(倦に代えたはかl’J初期反応物
Aと同様にして初用」反応物C忙台成した。得ら扛た初
期灰地・物Cの還元比粘度に0.61ボ分知0.06%
(坤6而生成締付水−屑のU、08モル)でめった。Ratio 4! ¥1 5 BTDA, PMDA 1,2,3,4-butane tetrab The reduced specific viscosity of the obtained initial ash material C was 0.61% and 0.06%.
(6 ml of tightening water - U of waste, 0.8 mol).
仄に初M茂尾1物C20C20O水0.2 g (水分
量としてa、21モルに@尚ン?名橿力口して依皇せ欠
行なった外に大凡例1と回付にして透明で粘おAIポリ
イミド慎j脂浴欲を侍た0
侍ら几たポリイミド便脂浴欣の保存安定性は非常に優n
たものであったが黙分耐開始編度が約350℃と低く
l1jJ9儀材料とじ1に小尤分なものであった。The first M Shigeo 1 product C20C20O water 0.2 g (water content is a, 21 moles @ Naon? In addition to being absent from the Emperor's visit to the Emperor, it is also transparent as a general rule 1. The storage stability of the samurai-made polyimide toilet fat bath is very good.
However, the knitting resistance was low at approximately 350°C.
It was a small amount of material for binding 1.
前述したような製布方法π採ゐことによシ保任安定性に
後γした透明で均一なポリイミド細組浴液を侍ゐことか
でさる。By adopting the above-mentioned fabric manufacturing method, a transparent and uniform polyimide finely assembled bath solution with excellent storage stability can be obtained.
4.1田」の藺早/2欣明
図01+0笑施勿ノ1お・よひ比奴タリ1〜5 V(、
より侍ら7’L 7こポリイミド仙IJn浴赦り抹存女
圧性をボアグランである。4.1 田's Iihaya / 2 Kinmeizu 01 + 0 lol Shimuno 1 O Yohihi Naku Tari 1~5 V (,
Samurai et al. 7'L 7 This polyimide immortal IJn bathing and obliterating female pressure is a boa grand.
代理人弁理士 若 林 邦 1
回
転
粘
度
の
保
1寺
帯
〉く
日 数 (週)
手続補正書(自発)
昭和58B、 6 1123 11
特許庁長官殿
1・事件の表示
昭和58年特許願第65259 号
2、発明の名称
ポリイミ ド拉I月旨浴准の製コ宜方法6、補正をする
者
事件との関係 特許出願人
名 称 +4451日立化成工茎株式公子−14、代
理 人
2)明細書第3負第13行目の「ポリイシド」オ「4・
リアミド」と補正子々0Representative Patent Attorney Kuni Wakabayashi 1 Number of days (weeks) for rotational viscosity Procedural amendment (spontaneous) 1980B, 6 1123 11 Mr. Commissioner of the Japan Patent Office 1. Indication of the case 1988 Patent Application No. 65259 No. 2, Name of the invention: Method of manufacturing polyimide resin 6, Relationship with the case of the person making the amendment Patent applicant name: +4451 Hitachi Chemical Co., Ltd. - 14,
2) "Polyiside" o "4." on the third negative line 13 of the specification
Riamido” and correction children 0
Claims (1)
ホン酸類に主成分とするテトラカルボン酸類と、4.4
′−ジアミノジンエニルエーテルを主成分とする芳香族
ジアミン成分と葡、両成分のモル数が大略等しくなるよ
うな割付で便用し、ハロゲン化フェノール化付物に溶媒
とし。 100〜200℃の反応流度で還元比粘度が0.1以上
にlるまで、縮台水孕除去しながら初期反応をさせた俊
、大気圧下で水を遠丸さ一+!:ながら回転粘度が一定
になるまで披皇台させ、その俊脱水丁/bことを性徴と
するポリイミ トイ立1月nへキ 液叱ノ、少曝造方
法。 2、ゼオライトで靴付水に除去しながら初期反応にさせ
ること孕特徴と丁7)IP!f府Jη求範四第1項記載
のポリイミド側B¥1浴欣の製造方法。 3、抜Nせ佐ゼオライト′に添加して脱水丁ゐこ記載の
ポリイミド樹脂浴液(1)製造方法0[Scope of Claims] Tetracarboxylic acids whose main component is 1, 5.5', 4.4'-benzoneenonetetracarphonic acids, and 4.4
The aromatic diamine component containing '-diaminodine enyl ether as a main component and the grapes are conveniently used in such a manner that the number of moles of both components is approximately equal, and used as a solvent for the halogenated phenol adduct. At a reaction flow rate of 100 to 200°C, the initial reaction was carried out while removing water until the reduced specific viscosity was 0.1 or more. : While the rotational viscosity is kept constant, the polyimide is made to have a sexual characteristic that is its quick dehydration/b. 2. The zeolite is used to remove the water from the shoes while allowing the initial reaction to occur, which is a feature of pregnancy and 7) IP! A method for producing a polyimide-side B ¥1 bath towel as described in Item 1 of FFUJηKihan4. 3. Polyimide resin bath solution (1) production method described in 0.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6323983A JPS59189123A (en) | 1983-04-11 | 1983-04-11 | Production of polyimide resin solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6323983A JPS59189123A (en) | 1983-04-11 | 1983-04-11 | Production of polyimide resin solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59189123A true JPS59189123A (en) | 1984-10-26 |
| JPS645602B2 JPS645602B2 (en) | 1989-01-31 |
Family
ID=13223465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6323983A Granted JPS59189123A (en) | 1983-04-11 | 1983-04-11 | Production of polyimide resin solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59189123A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06334204A (en) * | 1993-05-21 | 1994-12-02 | Ind Technol Res Inst | Preparation of flexible amorphous silicon solar cell |
-
1983
- 1983-04-11 JP JP6323983A patent/JPS59189123A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06334204A (en) * | 1993-05-21 | 1994-12-02 | Ind Technol Res Inst | Preparation of flexible amorphous silicon solar cell |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS645602B2 (en) | 1989-01-31 |
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