JPS59231802A - Moisture sensor - Google Patents
Moisture sensorInfo
- Publication number
- JPS59231802A JPS59231802A JP58105423A JP10542383A JPS59231802A JP S59231802 A JPS59231802 A JP S59231802A JP 58105423 A JP58105423 A JP 58105423A JP 10542383 A JP10542383 A JP 10542383A JP S59231802 A JPS59231802 A JP S59231802A
- Authority
- JP
- Japan
- Prior art keywords
- zinc oxide
- humidity
- thin film
- oxide thin
- lead
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 67
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 36
- 239000011787 zinc oxide Substances 0.000 claims description 33
- 239000010409 thin film Substances 0.000 claims description 27
- 229910052759 nickel Inorganic materials 0.000 claims description 18
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 description 14
- 238000001514 detection method Methods 0.000 description 11
- 230000004044 response Effects 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 9
- 229910052744 lithium Inorganic materials 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 244000126211 Hericium coralloides Species 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000026041 response to humidity Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Non-Adjustable Resistors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
この発明は鉛とニッケルを含有した酸化亜鉛薄膜よりな
る湿度センサに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a humidity sensor made of a zinc oxide thin film containing lead and nickel.
従来から存在する電気抵抗式の湿度センサとしては、櫛
型電極上に固体型jI?質を高分子材料と架橋重合させ
た有機物皮膜からなる湿度センサ、あるいは多孔性金属
酸化物磁器を用いた湿度センサが知られている。Conventional electrical resistance humidity sensors include a solid-state type jI? on a comb-shaped electrode. 2. Description of the Related Art Humidity sensors made of an organic film formed by cross-linking and polymerizing a polymeric material, or humidity sensors using porous metal oxide porcelain are known.
しかしながら、前者の有機物皮膜からなる湿度センサは
、高温での使用ができないこと、長時間の結露した環境
下では電解質が溶は出すなどの欠点があった。However, the former humidity sensor made of an organic film has drawbacks such as not being able to be used at high temperatures and the electrolyte leaching out in an environment with long-term dew condensation.
また多孔性金41ヒ物磁器を用いた湿度センサは、初期
においてはすぐれた湿度応答を有するものであるが、長
時間使用すると水分子が空孔の奥深くに浸入し、化学吸
着するようになり表面抵抗は上昇する。Additionally, humidity sensors using porous gold-41 porcelain have an excellent humidity response initially, but when used for a long time, water molecules penetrate deep into the pores and become chemically adsorbed. Surface resistance increases.
これを再生するために加熱によるクリーニングが必要と
なり、ヒータ制御回路という複雑な機構が必要である。In order to regenerate this, cleaning by heating is required, and a complicated mechanism called a heater control circuit is required.
一方酸化亜鉛を用いた湿度センサも従来からよく知られ
ている。これはセラミック、ガラスなどの絶縁基板の上
に酸化亜鉛の薄膜を形成し、さらにこの上に一対の検出
電極を形成したものである。On the other hand, humidity sensors using zinc oxide have also been well known. This consists of forming a thin film of zinc oxide on an insulating substrate such as ceramic or glass, and further forming a pair of detection electrodes on this.
この湿度センサは雰囲気の湿度が変化したとき抵抗値が
変化するという特性を有するものであり、応答性が速い
という特徴をもっている。This humidity sensor has a characteristic that its resistance value changes when the humidity of the atmosphere changes, and is characterized by fast response.
ところがこの抵抗値は、実用測定範囲内にあることが重
要であるが、酸化亜鉛の場合抵抗′埴をこの実用測定範
囲内にコントロールするに用いる元素もあまり知られて
いない。However, it is important that this resistance value be within a practical measurement range, but in the case of zinc oxide, the elements used to control the resistance within this practical measurement range are not well known.
また、この酸化亜鉛薄膜を用いた湿度センサは主として
酸化亜鉛の金属過剰のn型半導体である。Moreover, the humidity sensor using this zinc oxide thin film is mainly an n-type semiconductor with a metal excess of zinc oxide.
そしてこの口型半導体をスパッタリング法で形成するた
めには、酸素量をへらしてスパッタリングする方法が考
えられるが、酸素を減らすとある限解値で急激に亜鉛金
属のスパッタ膜が形成されるようになり、この条件をコ
ントロールすることが困難であった。In order to form this mouth-shaped semiconductor by a sputtering method, a method of sputtering with a reduced amount of oxygen can be considered, but if the amount of oxygen is reduced, a sputtered film of zinc metal will suddenly be formed at a certain limit value. Therefore, it was difficult to control this condition.
本発明者らは上記の点から酸化亜鉛薄膜を用いlζ湿度
センサで実用測定範囲内に抵抗値を有づるものを得るべ
く検問を行い、鉛を含有した酸化亜鉛薄膜よりなる湿度
センサであれば、抵抗値が容易に下り、加熱によるクリ
ーニング処理をすることなく湿度の連続測定が可能であ
ることを見出し、さきに特許出願を行った。In view of the above, the present inventors conducted tests to obtain a humidity sensor using a zinc oxide thin film with a resistance value within the practical measurement range. They discovered that the resistance value could be easily reduced and that humidity could be measured continuously without cleaning by heating, and they filed a patent application.
ところが鉛を含有しただりでは抵抗を下げる効果は有す
るものの湿度に対する応答性、特に復帰時間が長いとい
う欠陥のあることがわかった。However, it has been found that although lead-containing materials have the effect of lowering resistance, they have drawbacks such as poor responsiveness to humidity, especially long recovery time.
そこで、この応答性をさきに改善すべく検討を続りた結
果、鉛とともにリチウムを加えることによって抵抗値を
下げる効果を有して、かつ湿度に対する応答性、特に復
帰時間の短縮がはがれることを見出した。Therefore, as a result of continuing studies to improve this response, we found that adding lithium along with lead has the effect of lowering the resistance value, and also reduces the response to humidity, especially the recovery time. I found it.
ところが鉛とリチウムを含有した酸化亜鉛薄膜を得るこ
と、特に亜鉛金属中にリチウムを添加(ることは技術的
に非常に困難であり、このため酸化リチウム(Li 2
0 )を鉛を含有した亜鉛合金上にのせるなどの方法が
行なわれたが、この方法では酸化亜鉛薄膜中に同じ量を
安定して添加することは困難である。However, it is technically very difficult to obtain a zinc oxide thin film containing lead and lithium, especially adding lithium to zinc metal.
0) on a zinc alloy containing lead, but with this method it is difficult to stably add the same amount into a zinc oxide thin film.
またリチウムをL120の酸化物の形で添加して焼結し
た酸化亜鉛焼結体を用いる方法も考えられたが、焼結中
にリチウムの飛散があり、〜定量の鉛とリチウムを添加
した焼結体ターゲットを得るのは困難であっlζ。Another idea was to use a zinc oxide sintered body sintered with lithium added in the form of L120 oxide, but lithium would scatter during sintering. Obtaining solid targets is difficult.
そこで本発明者らはリチウムに代えて合金化可能であっ
てしかもリチウム添加と同等の湿度に対する応答性や復
帰時間の短縮がはかれる湿度センサを得るべく種々検問
の結果、鉛とともにニッケルを加えるならば上記特性の
ある湿度センサが得られることを見出したものである。Therefore, the present inventors conducted various tests in order to obtain a humidity sensor that can be alloyed in place of lithium and has the same humidity response and shortened recovery time as when adding lithium. It has been discovered that a humidity sensor having the above characteristics can be obtained.
即ち、この発明の湿度センサは、感湿要素が鉛とニッケ
ルを含有した酸化亜鉛薄膜よりなるものであって、これ
によって
(1)高湿度中に放置しても自己復帰性があり、クリー
ニングを心数としないこと、
(2)応答性がはやいこと、
(3)実用測定が容易な範囲の抵抗値を有すること、(
4)耐久性が良好であること、
(5) 合金ターゲットとして用いることができるた
め、安価でありまたスパッタリング効率も高く、コスト
ダウンにも寄与すること、
などの効果を奏するのである。That is, in the humidity sensor of the present invention, the humidity sensing element is made of a zinc oxide thin film containing lead and nickel, and as a result, (1) it has self-recovery properties even when left in high humidity, and does not require cleaning; (2) Fast response; (3) Resistance value within a range that makes practical measurement easy;
4) It has good durability; (5) It can be used as an alloy target, so it is inexpensive and has high sputtering efficiency, contributing to cost reduction.
以下この発明の湿度センリについて詳細に説明する。The humidity sensor of the present invention will be explained in detail below.
第1図はこの発明にがかる湿度センサの一例を示す概略
平面図であって、1はセラミック、ガラスなどからなる
絶縁基板であり、この基板1上にはくし歯状の一対の検
出電極2.3が形成され、ざらにくし歯部分を覆うよう
に感湿要素である酸化亜鉛薄膜4が形成されている。FIG. 1 is a schematic plan view showing an example of a humidity sensor according to the present invention. Reference numeral 1 denotes an insulating substrate made of ceramic, glass, etc. On this substrate 1, a pair of comb-shaped detection electrodes 2 and 3 are arranged. is formed, and a zinc oxide thin film 4, which is a moisture-sensitive element, is formed so as to roughly cover the comb tooth portion.
5.6は検出電極2.3にそれぞれ接続された端子であ
る。なお図示省略したが、酸化亜鉛薄膜4上に多孔性の
検出電極を網目状またはくし歯状に形成したもの、ある
いは上下平行電極にJ:るバルク型のものであってもよ
く、電極はAu、NL、針、Tj 、 Cu 、 Fe
なとの導電性物質をマスク蒸着法などにより形成すれば
よい。5.6 are terminals respectively connected to the detection electrodes 2.3. Although not shown, it may be a porous detection electrode formed on the zinc oxide thin film 4 in a mesh or comb shape, or a bulk type with upper and lower parallel electrodes. , NL, needle, Tj, Cu, Fe
The conductive material may be formed using a mask vapor deposition method or the like.
酸化亜鉛1JIB14を形成する手段どしては、例えば
スパッタリング法、真空蒸着法、イオンブレーティング
法などがあるが、特に形成手段の容易さから反応性スパ
ッタリング法が適している。Methods for forming zinc oxide 1JIB14 include, for example, sputtering, vacuum evaporation, and ion blasting, but reactive sputtering is particularly suitable because of its ease of formation.
この発明において、感湿要素である酸化亜鉛薄膜に含有
さぜる鉛およびニッケルの使用範囲としては、鉛1、は
0.1〜20原子%、好ましくは3〜4原子%であり、
ニッケルは0.1〜20原子%、好ましくは0,5〜2
原子%が望ましい。In this invention, the usage range of lead and nickel contained in the zinc oxide thin film, which is a moisture sensitive element, is 0.1 to 20 atomic %, preferably 3 to 4 atomic %, for lead 1.
Nickel is 0.1 to 20 at%, preferably 0.5 to 2
Atomic % is preferable.
この理由゛は、鉛が0.1原子%以下では抵抗値は10
0以上となり、実用測定可能範囲を越え、20原子%以
上を用いると、湿度に対する抵抗変化が小さくなって好
ましくなく、またニッケルが0.1原子%以下では添加
の効果がなく、20原子%以上では抵抗値が上昇して鉛
との併用効果が14られず、何れも湿度セン4ノどして
は不適当である。The reason for this is that when lead is less than 0.1 atomic percent, the resistance value is 10
0 or more, which exceeds the practical measurable range; if 20 atom% or more is used, the change in resistance against humidity becomes small, which is undesirable; if nickel is less than 0.1 atom%, there is no effect of adding nickel, and if it is 20 atom% or more In this case, the resistance value increases and the effect of using it in combination with lead is not achieved, and both are inappropriate as humidity sensors.
ここでこの発明で特徴どする鉛とニッケルの併用につい
て説明すると、鉛を加えることにより抵抗値は下がるが
応答性、再現性が好ましくない。Here, the combination of lead and nickel, which is a feature of this invention, will be explained. Adding lead lowers the resistance value, but the response and reproducibility are unfavorable.
またニッケルを添加すると、抵抗値は上昇する。Furthermore, when nickel is added, the resistance value increases.
しかしてこの鉛とニッケルの両者を添加すると応答性、
再現性が改善されるのである。However, when both lead and nickel are added to the lever, the response improves.
Reproducibility is improved.
しかし、ニッケルの添加で抵抗値は上背するので、鉛と
ニッケルの添加比はまず実用抵抗値が湿度40%で1M
Ω以下になるように調整することが必要である。従って
両者の使用量としては、酸化亜鉛薄膜中に鉛3〜4原子
%、ニッケル0.5〜2原子%稈度が最も好ましい。However, the resistance value increases with the addition of nickel, so the addition ratio of lead and nickel should be adjusted so that the practical resistance value is 1M at 40% humidity.
It is necessary to adjust it so that it is Ω or less. Therefore, the most preferable amounts of both are 3 to 4 atom % of lead and 0.5 to 2 atom % of nickel in the zinc oxide thin film.
以下この発明を一実施例により詳細に説明する。The present invention will be explained in detail below using one example.
アルミナ基板上にくし歯の間隔が0.5mm、対向長さ
が65 mmの金からなるくし歯状の検出電極を形成し
ICO
さらにこの上にくし歯部分を覆うように、鉛とニッケル
を含有する酸化亜鉛薄膜をスパッタリング法により形成
した。A comb-shaped detection electrode made of gold with a comb-tooth spacing of 0.5 mm and a facing length of 65 mm is formed on an alumina substrate. Furthermore, lead and nickel are contained on top of this to cover the comb-teeth portion. A zinc oxide thin film was formed using a sputtering method.
この酸化亜鉛薄膜の形成は、ターゲットとして金属亜鉛
を用いて次のにうにして行なった。This zinc oxide thin film was formed using metallic zinc as a target in the following manner.
くし歯状の検出電極を形成したアルミナ基板をスパッタ
リング装置の陽極側に設置した。一方陰極側にはあらか
じめ金属亜鉛に鉛3原子%どニッケル1原子%を混入し
、溶融して得た合金をターグツ1〜どして配置した。An alumina substrate on which a comb-shaped detection electrode was formed was placed on the anode side of the sputtering device. On the other hand, on the cathode side, an alloy obtained by mixing 3 at. % lead and 1 at. % nickel in metal zinc and melting the mixture was placed in an array of 1 to 3 atomic percent.
そしてスパッタリング室内の真空圧を5x10−2T
orrとし、酸素(02)とアルゴン(Ar )の比率
1:1からなる混合ガスをスパッタリング室内に一す
導入し、該室内を3x 1OTorrの圧力に保った。Then, the vacuum pressure in the sputtering chamber was set to 5x10-2T.
A mixed gas consisting of oxygen (02) and argon (Ar) in a ratio of 1:1 was introduced into the sputtering chamber, and the pressure in the chamber was maintained at 3×1 OTorr.
その後排気弁を調整し、スパッタリング室圧力l
が1.5X IOT Orrになるよう調整し、300
Wの高周波電源(13,56M l−1z )を供給し
てくし歯状の検出電極を有するアルミナ基板上に鉛とニ
ッケルを含有する膜厚1μmの酸化亜鉛薄膜を形成した
。After that, adjust the exhaust valve so that the sputtering chamber pressure l becomes 1.5X IOT Orr, and
A 1 μm thick zinc oxide thin film containing lead and nickel was formed on an alumina substrate having a comb-like detection electrode by supplying a W high frequency power source (13.56 M l-1z ).
なお上記実施例々はターゲットとして金属亜鉛を用い、
反応性スパッタリング法により酸化亜鉛薄膜を形成する
例を示したが、ターゲットとして酸化亜鉛の焼結体を用
いることも可能である。そしてこの場合の酸化亜鉛焼結
体は、例えば酸化亜鉛粉末を主体とし、これに鉛に換紳
して3原子%のPb30〆とニッケルに換算して1原子
%のN=0を添加し、十分粉砕混合したものを500〜
600℃で仮焼し、その後プレスにてディスク状に成形
したものを700〜1300℃で焼結することにより得
ることができる。Note that the above examples used metallic zinc as the target,
Although an example of forming a zinc oxide thin film using a reactive sputtering method has been shown, it is also possible to use a sintered body of zinc oxide as a target. The zinc oxide sintered body in this case is, for example, made mainly of zinc oxide powder, to which is added 3 atomic % of Pb30 in terms of lead and 1 atomic % of N=0 in terms of nickel. 500~
It can be obtained by calcining at 600°C, then press-forming into a disk shape, and sintering at 700-1300°C.
またこの酸化亜鉛焼結体をターゲットとする場合の反応
性スパッタリングにおけるスパッタリング室内にはAr
: 02 = 9 : 1の混合ガスを用いることが
好ましい。Furthermore, Ar is present in the sputtering chamber in reactive sputtering when this zinc oxide sintered body is used as a target.
It is preferable to use a mixed gas of: 02=9:1.
上記実施例においては、アルミナ等の絶縁基板上に一対
のくし歯状の検出電極を形成し、その上にスパッタリン
グ法で酸化亜鉛薄膜を形成したものを示したが、この発
明の湿度センリ−はこのよう(
な構造に限定されるものではなく、このほかにアルミナ
等の絶縁基板上にスパッタリング法で酸化亜鉛薄膜を形
成し、その上に一対のくし歯状の検出電極を形成した構
造、あるいは尊重性基板例えばステンレス、アルミニウ
ム板等の上にスパッタリング法で酸化亜鉛薄膜を形成し
、その上にくし歯状検出電極もしくは金の島状蒸着膜あ
るいは多孔性銀ペーストによる電極を形成し、上下電極
間の抵抗値を測定する構造のもの、などであってもよい
。In the above embodiment, a pair of comb-shaped detection electrodes were formed on an insulating substrate such as alumina, and a zinc oxide thin film was formed thereon by sputtering, but the humidity sensor of this invention The structure is not limited to this one, but may also include a structure in which a zinc oxide thin film is formed by sputtering on an insulating substrate such as alumina, and a pair of comb-shaped detection electrodes are formed on the thin film, or A zinc oxide thin film is formed by sputtering on a flexible substrate, such as a stainless steel or aluminum plate, and a comb-shaped detection electrode, an island-shaped vapor-deposited film of gold, or a porous silver paste electrode is formed on the top and bottom electrodes. It may also be of a structure that measures the resistance value between the two.
かくして得たスパッタリング法に基づく酸化亜鉛薄膜は
、その形成時には表面に欠陥構造を多く含み、ガスなど
が吸着しやすいため、150℃、24時間のアニールを
行った。このアニールにより該酸化亜鉛薄膜の抵抗顧は
n9形成時より幾分高くなるが、抵抗値の経時変化が小
さくなるのである、。The thus obtained zinc oxide thin film based on the sputtering method contained many defective structures on the surface when it was formed and gases were easily adsorbed, so it was annealed at 150° C. for 24 hours. Due to this annealing, the resistance value of the zinc oxide thin film becomes somewhat higher than that at the time of N9 formation, but the change in resistance value over time becomes smaller.
なお、この発明の湿度セン1)−は低温では湿度センサ
としで作用するが、300〜500℃の高温にするとガ
スセンサとして働き、従ってガス濃度を測定するときは
感応素子を加熱し、相対湿度を測定するときは室温にす
る使い方も可能である。The humidity sensor 1) of the present invention functions as a humidity sensor at low temperatures, but at high temperatures of 300 to 500°C, it functions as a gas sensor. Therefore, when measuring gas concentration, the sensing element is heated and the relative humidity is measured. It is also possible to use it at room temperature when measuring.
上記実施例で得られたこの発明の湿度センサについてそ
の応答特性を第2図に示すように相対湿度0%真空中か
ら相対湿度55%の大気中へ取り出したとき、および相
対湿度93%のK tJo 3飽和塩溶液から相対湿度
55%の大気中へ取り出した時の相対湿度−電気抵抗曲
線から換算した相対湿度指示値(%)の変化について表
わしたところ、この発明の湿度センサAは、鉛のみを添
加した酸化亜鉛薄膜を感湿要素とする湿度セン1ノBお
よび鉛とリチウムを含有した酸化亜鉛薄膜を感湿要素と
する湿度センサCにに比べて応答性のはやいことが認め
られた。The response characteristics of the humidity sensor of the present invention obtained in the above example are shown in FIG. When expressing the change in relative humidity reading (%) converted from the relative humidity-electrical resistance curve when the tJo 3 saturated salt solution is taken out into the atmosphere with a relative humidity of 55%, it is found that the humidity sensor A of the present invention It was observed that the response was faster than Humidity Sensor 1-B, which uses a zinc oxide thin film containing lead and lithium as the humidity-sensing element, and Humidity Sensor C, which uses a zinc oxide thin film containing lead and lithium as the humidity-sensing element. .
またこの発明の湿度センサの自己復帰性を相対湿度に対
する電気抵抗変化にて測定したところ第3図の結果が得
られ、再現性の良いことが認めら゛れた。Furthermore, when the self-resetting property of the humidity sensor of the present invention was measured by the change in electrical resistance with respect to relative humidity, the results shown in FIG. 3 were obtained, and it was recognized that the reproducibility was good.
第1図はこの発明にかかる湿痕しンサの一例を示す概略
平面図、第2図は応答特性を示すグラフ、第3図は相対
湿度−電気抵抗特性図である。
1・・・絶縁基板 2,3・・・検出電極4・・・酸
化亜鉛薄膜
特許出願人 株式会社 村田製作所
代 理 人 弁理士 和 1) 昭
第1図
第2FIG. 1 is a schematic plan view showing an example of the moisture mark sensor according to the present invention, FIG. 2 is a graph showing response characteristics, and FIG. 3 is a relative humidity-electrical resistance characteristic diagram. 1... Insulating substrate 2, 3... Detection electrode 4... Zinc oxide thin film patent applicant Murata Manufacturing Co., Ltd. Representative Patent attorney Kazu 1) Showa 1 Figure 2
Claims (3)
よりなることを特徴とする湿度センサ。(1) A humidity sensor characterized in that the humidity sensing element is made of a zinc oxide thin film containing lead and nickel.
0原子%であることを特徴とする特許請求の範囲第1項
記載の湿度センサ。(2) The amount of lead contained in the zinc oxide thin film is 0.1 to 2.
The humidity sensor according to claim 1, characterized in that the humidity is 0 atomic %.
20原子%であることを特徴とする特許請求の範囲第1
項記載の湿度センサ。(3) The amount of nickel contained in the zinc Mide thin film is 0.1~
Claim 1 characterized in that it is 20 atomic %.
Humidity sensor as described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58105423A JPS59231802A (en) | 1983-06-13 | 1983-06-13 | Moisture sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58105423A JPS59231802A (en) | 1983-06-13 | 1983-06-13 | Moisture sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59231802A true JPS59231802A (en) | 1984-12-26 |
| JPH0348644B2 JPH0348644B2 (en) | 1991-07-25 |
Family
ID=14407185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58105423A Granted JPS59231802A (en) | 1983-06-13 | 1983-06-13 | Moisture sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59231802A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6061111B2 (en) | 2013-08-22 | 2017-01-18 | 株式会社村田製作所 | Oxide ceramics and ceramic electronic parts |
-
1983
- 1983-06-13 JP JP58105423A patent/JPS59231802A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0348644B2 (en) | 1991-07-25 |
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