JPS5927754B2 - Diamond synthesis method - Google Patents
Diamond synthesis methodInfo
- Publication number
- JPS5927754B2 JPS5927754B2 JP56204321A JP20432181A JPS5927754B2 JP S5927754 B2 JPS5927754 B2 JP S5927754B2 JP 56204321 A JP56204321 A JP 56204321A JP 20432181 A JP20432181 A JP 20432181A JP S5927754 B2 JPS5927754 B2 JP S5927754B2
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- gas
- substrate
- hydrogen gas
- hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010432 diamond Substances 0.000 title claims description 37
- 229910003460 diamond Inorganic materials 0.000 title claims description 36
- 238000001308 synthesis method Methods 0.000 title claims description 3
- 239000000758 substrate Substances 0.000 claims description 29
- 229930195733 hydrocarbon Natural products 0.000 claims description 28
- 150000002430 hydrocarbons Chemical class 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 25
- 239000007789 gas Substances 0.000 claims description 21
- 239000004215 Carbon black (E152) Substances 0.000 claims description 17
- 230000002194 synthesizing effect Effects 0.000 claims description 4
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 9
- 229910002804 graphite Inorganic materials 0.000 description 8
- 239000010439 graphite Substances 0.000 description 8
- 238000001556 precipitation Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 230000005281 excited state Effects 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000010581 sealed tube method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
Description
【発明の詳細な説明】
本発明は化学気相析出法によるダイヤモンドの合成法に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for synthesizing diamond by chemical vapor deposition.
従来、気相析出法によるダイヤモンド合成法としては次
のような方法が知られている。Conventionally, the following method is known as a diamond synthesis method using a vapor phase precipitation method.
1)炭化水素を加熱した基板表面に導入し、その熱エネ
ルギーで熱分解して、遊離炭素を生成せしめて、ダイヤ
モンドを析出する化学気相析出法。1) A chemical vapor deposition method in which hydrocarbons are introduced onto the heated substrate surface and thermally decomposed using the thermal energy to generate free carbon and precipitate diamond.
2)アーク放電とスパッタリングの技術を組合せて、炭
素の正イオンビームを生成せしめ、これを加速、さらに
集束して、基板表面に衝突させてダイヤモンドを析出さ
せるイオンビーム法。2) An ion beam method that combines arc discharge and sputtering techniques to generate a positive carbon ion beam, which is accelerated, focused, and collided with the substrate surface to deposit diamond.
3)電極間に直流放電を発生し、放電中の高エネルギー
を持った電子を利用して炭化水素の化学結合を解き放す
と同時に励起状態の炭素原子を生成せしめ、基板表面に
ダイヤモンド析出する化学気相析出法。3) A direct current discharge is generated between the electrodes, and the high-energy electrons in the discharge are used to release the chemical bonds of hydrocarbons and at the same time generate excited carbon atoms, creating a chemical gas that precipitates diamonds on the substrate surface. Phase precipitation method.
4)黒鉛、基板と水素ガスを封入し、黒鉛を高温部に基
板を低温部に設置し、水素ガスを熱的、あるいは放電に
よって、原子状水素を生成せしめ、不均化反応を利用し
て、基板表面にダイヤモンドを析出させる化学輸送法な
どがある。4) Enclose graphite, a substrate, and hydrogen gas, place the graphite in a high-temperature area and the substrate in a low-temperature area, generate atomic hydrogen from the hydrogen gas thermally or by electric discharge, and use a disproportionation reaction. , a chemical transport method that deposits diamond on the surface of a substrate, etc.
前記1)の化学気相析出法は減圧下で1100°C以下
の温度に加熱した基板表面で炭化水素を熱分解して、ダ
イヤモンド層を形成せしめるため、ダイヤモンドより安
定な黒鉛、非ダイヤモンド炭素の析出が避けられない。In the chemical vapor deposition method described in 1) above, hydrocarbons are thermally decomposed on the surface of a substrate heated to a temperature of 1100°C or less under reduced pressure to form a diamond layer. Precipitation is inevitable.
これらはダイヤモンドの生成を阻害する。These inhibit diamond formation.
従って周期的に析出の操作と酸素ガス、または水素ガス
を導入して、基板表面に析出した黒鉛、非ダイヤモンド
炭素を除去する操作を繰返して行うことが必璧である。Therefore, it is necessary to periodically repeat the precipitation operation and the operation of introducing oxygen gas or hydrogen gas to remove graphite and non-diamond carbon deposited on the substrate surface.
また析出速度が遅く、基板がダイヤモンドに限定される
などの欠点がある。Further, there are drawbacks such as slow deposition rate and the substrate being limited to diamond.
前記2)のイオンビーム法は常温で各種材料の基板表面
にダイヤモンドを析出することができる利点がある。The ion beam method (2) above has the advantage that diamond can be deposited on the surface of a substrate made of various materials at room temperature.
炭素の正イオンビームを発生する装置、およびその集束
装置が高価であり、放電持続に用いる不活性ガスの原子
が析出したダイヤモンド格子中に取り込まれるなどの欠
点がある。The device for generating a positive carbon ion beam and its focusing device are expensive, and the atoms of the inert gas used to sustain the discharge are trapped in the precipitated diamond lattice.
前記3)の反応ガスの導入と同期して、周期的にプラズ
マを発生して、ダイヤモンドを合成する方法は、プラズ
マの密度を全域にわたって均一に保持することが困難で
ある。In the method of 3) above, in which diamond is synthesized by periodically generating plasma in synchronization with the introduction of the reaction gas, it is difficult to maintain the plasma density uniformly over the entire area.
この密度の不均質により、ダイヤモンド以外に非ダイヤ
モンド炭素が析出する欠点がある。This non-uniform density has the disadvantage that non-diamond carbon is deposited in addition to diamond.
前記4)の化学輸送法は封管法であり、封管内で黒鉛と
原子状水素との反応によって生成した炭化水素を利用す
る方法であるため、連続操業することが困難である。The chemical transport method (4) above is a sealed tube method, which utilizes hydrocarbons produced by a reaction between graphite and atomic hydrogen in a sealed tube, and therefore is difficult to operate continuously.
また反応ガスの濃度、およびその比率、加熱温度等の合
成条件を独立して可変することができないなどの欠点を
有している。It also has the disadvantage that synthesis conditions such as the concentration of reaction gas, its ratio, and heating temperature cannot be varied independently.
本発明の方法は前記の従来法の欠点を改善せんとするも
のであり、反応ガスの濃度、およびその比率、加熱温度
、反応系の圧力、などの合成条件を独立して可変するこ
とが容易であり、基板表面に粒状ダイヤモンド、あるい
は膜状ダイヤモンドを安定して、合成する方法を提供す
るものである。The method of the present invention aims to improve the drawbacks of the conventional method described above, and it is easy to independently vary synthesis conditions such as the concentration of reaction gas, its ratio, heating temperature, and pressure of the reaction system. This method provides a method for stably synthesizing granular diamond or film-like diamond on the surface of a substrate.
本発明は水素ガスをマイクロ波無極電放電中を通過させ
た後炭化水素と混合した混合ガス、または炭化水素と水
素との混合ガスをマイクロ波無極電放電中を通過せしめ
た混合ガスを300〜1300℃に加熱した基板表面に
導入して、励起状態の炭化水素の熱分解によりダイヤモ
ンドを析出させる方法によって、前記目的を達成したも
のである。The present invention uses a mixed gas in which hydrogen gas is passed through a microwave non-electrode discharge and then mixed with a hydrocarbon, or a mixed gas in which a mixed gas of hydrocarbon and hydrogen is passed through a microwave non-electrode discharge. The above object was achieved by a method in which diamond was precipitated by thermal decomposition of hydrocarbons in an excited state by introducing the diamond onto the surface of a substrate heated to 1300°C.
本発明の方法の原理を示すと、黒鉛が熱力学的に安定な
温度、圧力でダイヤモンドを合成するためには、個々に
分離した炭素原子を生成せしめること、これらの炭素原
子が励起状態にあること、この励起状態がダイヤモンド
の核を形成するまで持続すること等の条件を満たすこと
が必要である。The principle of the method of the present invention is that in order to synthesize diamond at a temperature and pressure at which graphite is thermodynamically stable, individual carbon atoms must be generated, and these carbon atoms must be in an excited state. In addition, it is necessary to satisfy conditions such as that this excited state persists until a diamond nucleus is formed.
また炭化水素の熱分解で生成した遊離炭素からダイヤモ
ンドを成長させるためにはSF3の結合を生じせしめる
に充分な反応エネルギーを遊離炭素に供給することが必
要である。In addition, in order to grow diamond from free carbon produced by thermal decomposition of hydrocarbons, it is necessary to supply reaction energy sufficient to cause bonding of SF3 to the free carbon.
本発明の方法においては、水素ガスをマイクロ波無極放
電中を通過せしめた後、炭化水素と混合、または炭化水
素と水素ガスとを混合した後、マイクロ波無極放電中を
通過せしめて励起状態の炭化水素、励起状態または原子
状態の水素を生成せしめる。In the method of the present invention, hydrogen gas is passed through a microwave non-polar discharge and then mixed with a hydrocarbon, or after the hydrocarbon and hydrogen gas are mixed, the hydrogen gas is passed through a microwave non-polar discharge to form an excited state. Produces hydrocarbons, excited or atomic hydrogen.
この励起状態の炭化水素が加熱された基板表面で熱分解
した時に生成する遊離炭素原子にSP3結合を起すに充
分な反応エネルギーを供給する。When this excited hydrocarbon is thermally decomposed on the heated substrate surface, reaction energy sufficient to cause SP3 bonding is supplied to the free carbon atoms generated.
また励起状態または原子状態の水素は黒鉛および非ダイ
ヤモンド炭素を成長させる原因となるSF3.SP結合
を持った核と反応し、これをSP3結合に変換、あるい
は炭化水素を生成し、ダイヤモンドが成長する面の清浄
化の作用をする。Also, excited or atomic hydrogen causes the growth of graphite and non-diamond carbon in SF3. It reacts with nuclei with SP bonds, converting them to SP3 bonds, or producing hydrocarbons, which acts to clean the surface on which diamond grows.
本発明の方法においては安定に放電を持続させルタめマ
イクロ波無極放電を採用した。In the method of the present invention, a stable microwave non-polar discharge was used to sustain the discharge stably.
直流放電の場合は電極を利用するため、長時間連続して
放電の発生は電極が損傷を受けるため困難である。In the case of DC discharge, electrodes are used, so it is difficult to generate a discharge continuously for a long time because the electrodes will be damaged.
また数拾メガヘルツ以下の周波数による無極放電の発生
は糸の圧力に強く依存する。Furthermore, the occurrence of nonpolar discharge at frequencies below several megahertz strongly depends on the pressure of the thread.
マイクロ波無極放電は糸の圧力の依存度を軽減すること
ができる。Microwave non-polar discharge can reduce the dependence of thread pressure.
数拾メガヘルツでは炭化水素にダイヤモンドを析出する
に充分な励起状態を与えるには不充分である。A few tens of megahertz is insufficient to provide sufficient excitation in hydrocarbons to deposit diamond.
使用する混合ガスの炭化水素と水素ガスとの混合比率は
広い範囲に変更し得られるが黒鉛、非ダイヤモンド炭素
の析出を防止する観点から、その上限は10以下である
ことが望ましい。The mixing ratio of hydrocarbon and hydrogen gas in the mixed gas used can be varied over a wide range, but from the viewpoint of preventing the precipitation of graphite and non-diamond carbon, it is desirable that the upper limit is 10 or less.
粒状ダイヤモンドを合成するには約0.01以下、膜状
ダイヤモンドを析出するには0.1以上であることが望
ましい。It is desirable that it be about 0.01 or less for synthesizing granular diamond, and about 0.1 or more for depositing film-like diamond.
基板温度は析出したダイヤモンドが黒鉛に逆転移する現
象を防止し、また励起状態の炭化水素が基板表面で熱分
解を起すに必要な温度であることを必要とするので、3
00〜1300℃であることが望ましい。The substrate temperature needs to be at a temperature necessary to prevent the reverse transition of precipitated diamond to graphite and to cause thermal decomposition of excited hydrocarbons on the substrate surface.
The temperature is preferably 00 to 1300°C.
特に500〜1000°Cが好ましい。Particularly preferred is 500 to 1000°C.
無極型放電を発生する管内の圧力は、放電を安定に維持
するために0.05〜400 Torrの範囲がよい。The pressure within the tube that generates the non-polar discharge is preferably in the range of 0.05 to 400 Torr in order to maintain stable discharge.
本発明の方法は開管法であるため炭化水素と水素ガスと
の混合比率、ガスの流速、基板温度、ならびにマイクロ
波発振機の出力を調整することによって、励起状態の炭
化水素、水素、原子状態の水素の生成量などを独立に制
御することができるので、核形成速度を制御することが
容易である。Since the method of the present invention is an open tube method, by adjusting the mixing ratio of hydrocarbon and hydrogen gas, the gas flow rate, the substrate temperature, and the output of the microwave oscillator, it is possible to Since the amount of hydrogen produced in each state can be independently controlled, it is easy to control the nucleation rate.
この核形成速度を制御することにより粒状ダイヤモンド
、あるいは膜状ダイヤモンドを容易に合成し得る。By controlling this nucleation rate, granular diamond or film-like diamond can be easily synthesized.
次に本発明の方法を実施する装置の態様を示すと第1図
、第2図に示す通りである。Next, the embodiment of the apparatus for carrying out the method of the present invention is shown in FIGS. 1 and 2.
第1図は水素ガスをマイクロ波無極電放電中を通過せし
めた後、炭化水素ガスと混合する方法であり、第2図は
炭化水素と水素ガスとの混合ガスをマイクロ波無極放電
中を通過せしめる方式である。Figure 1 shows a method in which hydrogen gas is passed through a microwave non-polar discharge and then mixed with hydrocarbon gas, and Figure 2 shows a method in which a mixed gas of hydrocarbon and hydrogen gas is passed through a microwave non-polar discharge. This is a method of forcing people to do something.
第1図、第2図において、1は炭化水素ガス供給装置、
2は水素ガス供給装置、3はマイクロ波発振機、4はウ
ェーブガイド、5は反応室、6は排気装置である。In FIG. 1 and FIG. 2, 1 is a hydrocarbon gas supply device;
2 is a hydrogen gas supply device, 3 is a microwave oscillator, 4 is a waveguide, 5 is a reaction chamber, and 6 is an exhaust device.
5の析出室には基板7を支持する支持台8が設置され、
第1図においては抵抗加熱炉9にて基板を加熱している
。A support stand 8 for supporting the substrate 7 is installed in the precipitation chamber 5.
In FIG. 1, the substrate is heated in a resistance heating furnace 9.
第2図においてはハロゲンランプから発する光を集光す
る赤外線集中照射炉10で加熱を行っている。In FIG. 2, heating is performed in an infrared concentrated irradiation furnace 10 that condenses light emitted from a halogen lamp.
12,13.14は水素ガス、炭化水素ガスの流量なら
びに装置内の圧力を調整するコックである。12, 13, and 14 are cocks that adjust the flow rates of hydrogen gas and hydrocarbon gas as well as the pressure inside the device.
15は排気口である反応室5内の支持上に基板7を設置
した後、排気装置6を作動して、装置内を減圧すると共
にコック12,13.14を調整して、水素ガスの流量
ならびに装置内の圧力を所定の値に保持する。15 is an exhaust port. After placing the substrate 7 on a support inside the reaction chamber 5, the exhaust device 6 is activated to reduce the pressure inside the device, and the cocks 12, 13, and 14 are adjusted to adjust the flow rate of hydrogen gas. and maintain the pressure within the device at a predetermined value.
次に抵抗加熱炉9により、基板を所定の温度に保持する
。Next, the substrate is maintained at a predetermined temperature using the resistance heating furnace 9.
赤外線集中照射炉の場合はハロゲンランプ11に流れる
電流を調整して基板温度を制御する。In the case of an infrared concentrated irradiation furnace, the substrate temperature is controlled by adjusting the current flowing through the halogen lamp 11.
次にマイクロ波発振機を作動し、マイクロ波無極電放電
を発生せしめると共に、予め流量調整した炭化水素ガス
を導入する。Next, the microwave oscillator is activated to generate a microwave non-polar discharge, and a hydrocarbon gas whose flow rate has been adjusted in advance is introduced.
実施例 1
モリブデンを基板とし、反応ガスとしてメタンガスと水
素ガスを用いる。Example 1 Molybdenum is used as a substrate, and methane gas and hydrogen gas are used as reaction gases.
排気装置を作動し、反応系を減圧にする。Activate the exhaust system to reduce the pressure in the reaction system.
次に水素ガスを毎分1ooccの流量で供給すると共に
コック12.13を調整して、反応系内の圧力をQ、5
Torrに調整する。Next, hydrogen gas is supplied at a flow rate of 1 oocc per minute, and the cocks 12 and 13 are adjusted to reduce the pressure in the reaction system to Q, 5.
Adjust to Torr.
マイクロ波発振機によって無極電放電を発生する。A microwave oscillator generates a non-polar electrical discharge.
次に基本温度を900℃に上昇せしめると共に、メタン
ガスを毎分20CCの流量で供給し、前記の無極電放電
中を通過した水素ガスと混合し、加熱基板上に導入する
。Next, the base temperature is raised to 900° C., and methane gas is supplied at a flow rate of 20 cc per minute, mixed with the hydrogen gas that has passed through the non-polar electrode discharge, and introduced onto the heated substrate.
3時間析出を行い、基板表面に1μm程度のダイヤモン
ドの析出層を得た。Precipitation was carried out for 3 hours, and a diamond precipitated layer of about 1 μm was obtained on the substrate surface.
実施例 2
シリコンウェハーを基板とし、反応ガスとしてメタンガ
スと水素ガスを用いる。Example 2 A silicon wafer is used as a substrate, and methane gas and hydrogen gas are used as reaction gases.
排気装置を作動し、反応系を減圧にする。Activate the exhaust system to reduce the pressure in the reaction system.
次に水素ガス、炭化水素ガスを各々毎分t o occ
y i occで供給すると共にコック12.13を調
整して、反応系内の圧力を0.ITorrに調整する。Next, hydrogen gas and hydrocarbon gas are each added to occ per minute.
y i occ and adjust the cock 12.13 to bring the pressure inside the reaction system to 0. Adjust to ITorr.
次に基板温度を700℃に上昇せしめると共に、マイク
ロ波発振機によって無極電放電を発生する。Next, the substrate temperature is raised to 700° C., and a non-polar electric discharge is generated by a microwave oscillator.
3時間析出を行い、基板表面に2μm程度のダイヤモン
ド粒子の析出を得た。Precipitation was carried out for 3 hours, and diamond particles of about 2 μm were deposited on the substrate surface.
第1図、第2図は本発明の方法を実施する合成装置の態
様を示す。
1・・・・・・炭化水素ガス供給装置、2・・・・・・
水素ガス供給装置、3・・・・・・マイクロ波発振機
4 sa+lll+’ウェーブガイド、5・・・・・・
反応室、6・・・・・・排気装置、7・・・・・・基板
、8・・・・・・支持台、9・・・・・−加熱炉、1o
・・・・・・赤外線集中照射炉、11・・・・・史ロゲ
ンランプ、12.13,14・・・・・・コック、15
・・聞排気口。FIGS. 1 and 2 show embodiments of a synthesis apparatus for carrying out the method of the present invention. 1... Hydrocarbon gas supply device, 2...
Hydrogen gas supply device, 3...Microwave oscillator
4 sa+llll+' wave guide, 5...
Reaction chamber, 6...exhaust device, 7...substrate, 8...support stand, 9...-heating furnace, 1o
...Infrared concentrated irradiation furnace, 11... History rogen lamp, 12.13,14 ... Cook, 15
・Exhaust port.
Claims (1)
炭化水素と混合した混合ガス、または炭化水素と水素ガ
スとの混合ガスをマイクロ波無極電放電中を通過させた
混合ガスを、300〜1300℃に加熱した基板表面に
導入し、炭化水素の熱分解によりダイヤモンドを析出さ
せることを特徴とするダイヤモンドの合成法。 2 炭化水素と水素ガスとの混合比率が100〜0.0
01の範囲である特許請求の範囲第1項記載のダイヤモ
ンドの合成法。[Claims] 1 Hydrogen gas is passed through a microwave non-electrodischarge and then a mixed gas mixed with a hydrocarbon or a mixed gas of hydrocarbon and hydrogen gas is passed through a microwave non-electrodischarge. A diamond synthesis method characterized by introducing a mixed gas onto the surface of a substrate heated to 300 to 1300°C and depositing diamond by thermal decomposition of hydrocarbons. 2 The mixing ratio of hydrocarbon and hydrogen gas is 100 to 0.0
01. A method for synthesizing diamond according to claim 1.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56204321A JPS5927754B2 (en) | 1981-12-17 | 1981-12-17 | Diamond synthesis method |
| US06/442,506 US4434188A (en) | 1981-12-17 | 1982-11-17 | Method for synthesizing diamond |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56204321A JPS5927754B2 (en) | 1981-12-17 | 1981-12-17 | Diamond synthesis method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58110494A JPS58110494A (en) | 1983-07-01 |
| JPS5927754B2 true JPS5927754B2 (en) | 1984-07-07 |
Family
ID=16488545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56204321A Expired JPS5927754B2 (en) | 1981-12-17 | 1981-12-17 | Diamond synthesis method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5927754B2 (en) |
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| DE19543723A1 (en) * | 1994-11-25 | 1996-05-30 | Kobe Steel Ltd | Process for the production of single crystal diamond films |
| DE19543722A1 (en) * | 1994-11-25 | 1996-05-30 | Kobe Steel Ltd | Process for the production of substrates for the formation of single-crystal diamond films by chemical vapor deposition |
| JP2005310963A (en) * | 2004-04-20 | 2005-11-04 | National Institute For Materials Science | Diamond ultraviolet light sensor element |
| JP2005310964A (en) * | 2004-04-20 | 2005-11-04 | National Institute For Materials Science | Diamond ultraviolet phototransistor |
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|---|---|---|---|---|
| JPS60112699A (en) * | 1983-11-24 | 1985-06-19 | Nec Corp | Manufacture of diamond |
| JPS60122796A (en) * | 1983-12-06 | 1985-07-01 | Sumitomo Electric Ind Ltd | Vapor phase synthesis method of diamond |
| JPS60204695A (en) * | 1984-03-28 | 1985-10-16 | Mitsubishi Metal Corp | Method of precipitation and formation of artificial diamond film |
| JPS60231498A (en) * | 1984-05-01 | 1985-11-18 | Hitachi Ltd | Synthesizing method of diamond under low pressure |
| SE453474B (en) * | 1984-06-27 | 1988-02-08 | Santrade Ltd | COMPOUND BODY COATED WITH LAYERS OF POLYCristalline DIAMANT |
| JPS61209990A (en) * | 1985-03-14 | 1986-09-18 | Nec Corp | Gas phase synthesizing method for diamond |
| JPH0637348B2 (en) * | 1985-04-25 | 1994-05-18 | 株式会社神戸製鋼所 | Diamond vapor phase synthesizer |
| DE3546113A1 (en) * | 1985-12-24 | 1987-06-25 | Santrade Ltd | COMPOSITE POWDER PARTICLES, COMPOSITE BODIES AND METHOD FOR THE PRODUCTION THEREOF |
| US5270029A (en) * | 1987-02-24 | 1993-12-14 | Semiconductor Energy Laboratory Co., Ltd. | Carbon substance and its manufacturing method |
| EP0288065B1 (en) * | 1987-04-22 | 1993-10-06 | Idemitsu Petrochemical Co. Ltd. | Method for synthesis of diamond |
| JPS6461396A (en) * | 1987-09-01 | 1989-03-08 | Idemitsu Petrochemical Co | Synthesis of diamond and installation therefor |
| US5190824A (en) | 1988-03-07 | 1993-03-02 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating |
| US6224952B1 (en) | 1988-03-07 | 2001-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Electrostatic-erasing abrasion-proof coating and method for forming the same |
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| JPH02208601A (en) * | 1989-02-08 | 1990-08-20 | Seiko Instr Inc | Optical window member and its manufacture |
| US5087434A (en) * | 1989-04-21 | 1992-02-11 | The Pennsylvania Research Corporation | Synthesis of diamond powders in the gas phase |
| US5110579A (en) * | 1989-09-14 | 1992-05-05 | General Electric Company | Transparent diamond films and method for making |
| US5242663A (en) * | 1989-09-20 | 1993-09-07 | Sumitomo Electric Industries, Ltd. | Method of and apparatus for synthesizing hard material |
| AU634601B2 (en) * | 1989-12-11 | 1993-02-25 | General Electric Company | Single-crystal diamond of very high thermal conductivity |
| CA2030049A1 (en) * | 1989-12-11 | 1991-06-12 | Thomas R. Anthony | Single-crystal diamond of very high thermal conductivity |
| JPH04358410A (en) * | 1991-06-05 | 1992-12-11 | Sumitomo Electric Ind Ltd | Surface acoustic wave element and production thereof |
| JP3163606B2 (en) * | 1993-01-29 | 2001-05-08 | 住友電気工業株式会社 | Surface acoustic wave device |
| UA81614C2 (en) * | 2001-11-07 | 2008-01-25 | Карнеги Инститьюшн Ов Вашингтон | Device for producing of diamonts, unit for sample holding (variants) and method for producing of diamonds (variants) |
| WO2007015431A1 (en) | 2005-08-01 | 2007-02-08 | National Institute For Materials Science | Diamond uv-ray sensor |
| GB201319117D0 (en) * | 2013-10-30 | 2013-12-11 | Element Six Technologies Us Corp | Semiconductor device structures comprising polycrystalline CVD Diamond with improved near-substrate thermal conductivity |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19543723A1 (en) * | 1994-11-25 | 1996-05-30 | Kobe Steel Ltd | Process for the production of single crystal diamond films |
| DE19543722A1 (en) * | 1994-11-25 | 1996-05-30 | Kobe Steel Ltd | Process for the production of substrates for the formation of single-crystal diamond films by chemical vapor deposition |
| DE19543722C2 (en) * | 1994-11-25 | 1998-02-19 | Kobe Steel Ltd | Process for the production of substrates suitable for the vapor deposition of single-crystalline diamond layers |
| JP2005310963A (en) * | 2004-04-20 | 2005-11-04 | National Institute For Materials Science | Diamond ultraviolet light sensor element |
| JP2005310964A (en) * | 2004-04-20 | 2005-11-04 | National Institute For Materials Science | Diamond ultraviolet phototransistor |
| US7768091B2 (en) | 2004-11-25 | 2010-08-03 | National Institute For Materials Science | Diamond ultraviolet sensor |
| WO2009099233A1 (en) | 2008-02-07 | 2009-08-13 | National Institute For Materials Science | Diamond uv sensor element and manufacturing method thereof, uv sensor device, diamond single crystal processing method |
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| Publication number | Publication date |
|---|---|
| JPS58110494A (en) | 1983-07-01 |
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