JPS5956739A - ウエハ装填装置 - Google Patents
ウエハ装填装置Info
- Publication number
- JPS5956739A JPS5956739A JP57166680A JP16668082A JPS5956739A JP S5956739 A JPS5956739 A JP S5956739A JP 57166680 A JP57166680 A JP 57166680A JP 16668082 A JP16668082 A JP 16668082A JP S5956739 A JPS5956739 A JP S5956739A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- arm
- wafers
- loaded
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3402—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57166680A JPS5956739A (ja) | 1982-09-27 | 1982-09-27 | ウエハ装填装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57166680A JPS5956739A (ja) | 1982-09-27 | 1982-09-27 | ウエハ装填装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5956739A true JPS5956739A (ja) | 1984-04-02 |
| JPS6246062B2 JPS6246062B2 (2) | 1987-09-30 |
Family
ID=15835730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57166680A Granted JPS5956739A (ja) | 1982-09-27 | 1982-09-27 | ウエハ装填装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5956739A (2) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63108713A (ja) * | 1986-10-27 | 1988-05-13 | Nec Kansai Ltd | イオン注入方法 |
| JPH0640517A (ja) * | 1985-10-24 | 1994-02-15 | Texas Instr Inc <Ti> | ウェーハ移送方法及び集積回路ステーション |
-
1982
- 1982-09-27 JP JP57166680A patent/JPS5956739A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0640517A (ja) * | 1985-10-24 | 1994-02-15 | Texas Instr Inc <Ti> | ウェーハ移送方法及び集積回路ステーション |
| JPS63108713A (ja) * | 1986-10-27 | 1988-05-13 | Nec Kansai Ltd | イオン注入方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6246062B2 (2) | 1987-09-30 |
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