JPS5965403A - thick film resistor - Google Patents

thick film resistor

Info

Publication number
JPS5965403A
JPS5965403A JP57175716A JP17571682A JPS5965403A JP S5965403 A JPS5965403 A JP S5965403A JP 57175716 A JP57175716 A JP 57175716A JP 17571682 A JP17571682 A JP 17571682A JP S5965403 A JPS5965403 A JP S5965403A
Authority
JP
Japan
Prior art keywords
resistor
printed resistor
laser beam
thick film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57175716A
Other languages
Japanese (ja)
Other versions
JPS644642B2 (en
Inventor
小西川 薫
常包 敏明
澤入 精
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57175716A priority Critical patent/JPS5965403A/en
Publication of JPS5965403A publication Critical patent/JPS5965403A/en
Publication of JPS644642B2 publication Critical patent/JPS644642B2/ja
Granted legal-status Critical Current

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  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はアルミナ等のセラミック基板に互に対向する導
体層を形成し、これらの導体層間に抵抗ベーストを用い
て印刷抵抗体を形成したいわゆる厚膜の抵抗器に関する
。
[Detailed Description of the Invention] Industrial Field of Application The present invention is a so-called thick film method in which conductor layers facing each other are formed on a ceramic substrate such as alumina, and a printed resistor is formed using a resistor base between these conductor layers. Regarding resistors.

従来例の構成とその問題点 一般に厚膜抵抗器は第1図に示すようにアルミナ等のセ
ラミック基板1に互に対向するように導体層2を形成し
、これらの導体層2,2間に所要の印刷抵抗体3を形成
することによって構成されている。そして、印刷抵抗体
3の抵抗値を正確に規定の値に調整する場合には、第1
図、第2図に示すように印刷抵抗体3の側方から印刷抵
抗体3の中央部までレーザ光線を当てここに切欠4を形
成するようにしている。ところでこの種のものではレー
ザ光線を当てるスタートポイントが直接アルミナ等の基
板1上になり、しだがって、レーザ光線のボンピング効
果により、第2図に示すように上記スタートポイントが
異常に深く切削加工され、セラミック基板1そのものの
強度が低下したリ、印刷抵抗体そのものの耐湿性が低下
したりするなど余り好ましいものではなかった。
Conventional Structure and Problems In general, thick film resistors, as shown in FIG. It is constructed by forming the required printed resistor 3. In order to accurately adjust the resistance value of the printed resistor 3 to a specified value, the first
As shown in FIG. 2, a laser beam is applied from the side of the printed resistor 3 to the center of the printed resistor 3 to form a notch 4 there. By the way, in this type of device, the starting point to which the laser beam is applied is directly on the substrate 1 made of alumina, etc. Therefore, due to the bombing effect of the laser beam, the starting point is cut abnormally deeply as shown in Fig. 2. This was not very desirable, as the strength of the ceramic substrate 1 itself was reduced and the moisture resistance of the printed resistor itself was reduced.

発明の目的 本発明は以上のような従来の欠点を除去するものであり
、m′j単な構成で容易に優れた厚膜抵抗器を提供する
ものである。
OBJECTS OF THE INVENTION The present invention eliminates the above-mentioned conventional drawbacks and provides an easily superior thick film resistor with a simple structure.

発明の構成 本発明は印刷抵抗体の側方に別に層を設け、この層から
印刷抵抗体に向けてレーザ光線による切欠を形成するよ
うに構成したものであシ、レーザ実施例の説明 第3図、第4図は本発明の厚膜抵抗器における一実施例
を示すものであり、図中第1図、第2図と同−付号を付
したものは第1図、第2図に示すものと同一の本のを示
している。そして、5は印刷抵抗体3を形成する前に上
記印刷抵抗体3を印刷する部分を含めて上記印刷抵抗体
30仙11方に突出するように上記セラミック基板1上
に印刷、乾燥、焼成して形成された低誘電率のガラス層
であシ、レーザ光線による切欠4は上記印刷抵抗体3の
側方に位11すする上記ガラス肱15から」二記印刷抵
抗体3に向けて形成するようにしている。
Structure of the Invention The present invention is structured such that a separate layer is provided on the side of the printed resistor, and a notch is formed by a laser beam from this layer toward the printed resistor. Figures 1 and 4 show an embodiment of the thick film resistor of the present invention, and the same numbers as in Figures 1 and 2 in the figures refer to Figures 1 and 2. Shows the same book as shown. 5, before forming the printed resistor 3, prints, dries, and fires it on the ceramic substrate 1 so as to protrude toward the printed resistor 30 and 11, including the portion where the printed resistor 3 is printed. A notch 4 formed by a laser beam is formed from the glass collar 15 located on the side of the printed resistor 3 toward the printed resistor 3. That's what I do.

したがって、上記実施例によれば、第4図に示すように
レーザ光線による切欠4をスタートポイントから印刷抵
抗体3の中央部まではソ均一に形成することができ、セ
ラミック基板そのものの切削がきわめて少なくなるとい
う利点を有する。すなわち、上記実施例によればレーザ
光線の切欠4のスター1−ポイントにガラス層5が別に
形成されているだめ、仮にここでレーザ光線のボンピン
グ効果による異常な加工深さが生じたとしても上記層5
によってこれを吸収することができ、セラミック基板1
そのものの切欠けきわめて浅いものになシ、その強度が
極端に低下したシ、印刷抵抗体の耐湿性を悪化させたり
するということがほとんどないという利点を有する。
Therefore, according to the above embodiment, as shown in FIG. 4, the notch 4 formed by the laser beam can be uniformly formed from the starting point to the center of the printed resistor 3, making it extremely easy to cut the ceramic substrate itself. It has the advantage of being less. That is, according to the above embodiment, since the glass layer 5 is separately formed at the star 1 point of the notch 4 of the laser beam, even if an abnormal machining depth occurs here due to the bumping effect of the laser beam, the above-mentioned layer 5
This can be absorbed by the ceramic substrate 1
It has the advantage that the notch itself is extremely shallow, its strength is extremely reduced, and the moisture resistance of the printed resistor is hardly deteriorated.

尚、第3図、第4図に示す実施例では印刷抵抗体3の下
面と側方に一体にレーザ光線のボンピング効果による異
常な加工深さの影響を小さくするガラス層5を形成して
いるが、ガラス層5は印刷抵抗体3の側方にのみ形成す
るようにしても良い。
In the embodiment shown in FIGS. 3 and 4, a glass layer 5 is integrally formed on the lower surface and the sides of the printed resistor 3 to reduce the influence of abnormal processing depth due to the bombing effect of the laser beam. However, the glass layer 5 may be formed only on the sides of the printed resistor 3.

まだ、第5図〜第7図に示すようにガラス層5に代えて
印刷抵抗体3の側方にこの印刷抵抗体3と一体に突出部
6を形成し、この突出部6によってレーザ光線のボンピ
ング効果による異常な加工深さの影響を小さくするよう
にしても良い。このようにした場合には突出部6を印刷
抵抗体3と同時に一体に印刷し、乾燥、焼成することが
でき、その製造がよシ簡単になるという利点を有する。
Still, as shown in FIGS. 5 to 7, a protrusion 6 is formed on the side of the printed resistor 3 integrally with the printed resistor 3 instead of the glass layer 5, and the protrusion 6 blocks the laser beam. The influence of abnormal machining depth due to the bombing effect may be reduced. In this case, the protrusions 6 can be printed simultaneously with the printed resistor 3, dried and fired, which has the advantage of simplifying its manufacture.

尚、第5図〜第7図に示すように突出部6を形成した場
合には切欠4を突出部6から一旦外に出し、再び突出部
6に入れて印刷抵抗体3の中央部に至 −るようにはM
L字状に形成する必要がある。□このようにすると切欠
4のそれぞれの断面が第6図、第7図に示すようにはソ
全体に亘って均一になり、第3図・第4図に示す実施例
と同様の効果を得ることができる。
In addition, when the protruding part 6 is formed as shown in FIGS. 5 to 7, the notch 4 is once removed from the protruding part 6, and then put back into the protruding part 6 until it reaches the center of the printed resistor 3. - M
It is necessary to form it in an L shape. □By doing this, the cross section of each of the notches 4 becomes uniform over the entire length as shown in FIGS. 6 and 7, and the same effect as the embodiment shown in FIGS. 3 and 4 is obtained. be able to.

発明の効果 本発明は上記実施例より明らかなように基板上に形成さ
れた互に列内する肩体J、yη間に印刷抵抗体を形成す
ると共にこの印刷抵抗体の側方にレーザ光線のボンピン
グ効果による異常な加工深さの影響を小さくする層を形
成し、この層をスタートポイントとして上記印刷抵抗体
に抵抗値を調整するレーザ光線による切欠を形成したも
のであり、したがって、本発明によればレーザ光線のボ
ンピング効果による基板の異常な加工深さによる影響を
効果的に阻止することができ、実用上きわめて有利なも
のである。
Effects of the Invention As is clear from the above embodiments, the present invention forms a printed resistor between shoulder bodies J and yη formed on a substrate in mutually arranged rows, and also irradiates a laser beam on the side of this printed resistor. A layer is formed to reduce the influence of abnormal processing depth due to the bombing effect, and a notch is formed in the printed resistor using a laser beam to adjust the resistance value using this layer as a starting point. According to this method, it is possible to effectively prevent the influence of abnormal machining depth of the substrate due to the bombing effect of the laser beam, which is extremely advantageous in practice.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の厚膜抵抗器の概略正面図、第2図は同抵
抗器のA−A’断面図、第3図は本発明の厚膜抵抗器に
おける一実施例の概略正面図、第4図は同実施例のB 
−B’断面図、第5図は他の実施例の概略正面図、第6
図、第7図は同実施例のC−c’断面図及びD−D’断
面図である。 1・・・・・・基板、2・・・・・・導体層、3・・・
・・・印刷抵抗体、4・・・・・・切欠、5・・・・・
・ガラス層、6・・・・・・突出部。 第1図 第4図 第5図 第6図 / 第7図 11
FIG. 1 is a schematic front view of a conventional thick film resistor, FIG. 2 is a sectional view taken along line AA' of the same resistor, and FIG. 3 is a schematic front view of an embodiment of the thick film resistor of the present invention. Figure 4 shows B of the same example.
-B' sectional view, FIG. 5 is a schematic front view of another embodiment, and FIG. 6 is a schematic front view of another embodiment.
7 are a C-c' cross-sectional view and a D-D' cross-sectional view of the same embodiment. 1...Substrate, 2...Conductor layer, 3...
...Printed resistor, 4...Notch, 5...
-Glass layer, 6... protrusion. Figure 1 Figure 4 Figure 5 Figure 6/ Figure 7 11

Claims (3)

【特許請求の範囲】[Claims] (1)基板上に形成された互に対向する心体層間に印刷
抵抗体を形成すると共にこの印刷抵抗体の側方にレーザ
光線のボンピング効果による影響を小さくする層を形成
し、この層から上記印刷抵抗体に向けて上記印刷抵抗体
の抵抗値を調整するためのレーザ光線による切欠を形成
して成る厚膜抵抗器。
(1) A printed resistor is formed between mutually opposing core layers formed on a substrate, and a layer is formed on the side of this printed resistor to reduce the influence of the bombing effect of the laser beam, and from this layer A thick film resistor comprising a notch formed by a laser beam toward the printed resistor for adjusting the resistance value of the printed resistor.
(2)  レーザ光線のボンピング効果による影響を小
さくする層を低誘電率のガラス層によって形成したこと
を特徴とする特許請求の範囲第1項記載の厚膜抵抗器。
(2) The thick film resistor according to claim 1, wherein the layer for reducing the influence of the bombing effect of the laser beam is formed of a glass layer with a low dielectric constant.
(3)  レーザ光線のボンピング効果による影響を小
さくする層を互に対向する導体層間に形成された印刷抵
抗体と同一材料で一体に形成して成る特許請求の範囲第
1項記載の厚膜抵抗器。
(3) A thick film resistor according to claim 1, wherein a layer for reducing the effect of the bombing effect of a laser beam is integrally formed of the same material as the printed resistor formed between mutually opposing conductor layers. vessel.
JP57175716A 1982-10-06 1982-10-06 thick film resistor Granted JPS5965403A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57175716A JPS5965403A (en) 1982-10-06 1982-10-06 thick film resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57175716A JPS5965403A (en) 1982-10-06 1982-10-06 thick film resistor

Publications (2)

Publication Number Publication Date
JPS5965403A true JPS5965403A (en) 1984-04-13
JPS644642B2 JPS644642B2 (en) 1989-01-26

Family

ID=16000982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57175716A Granted JPS5965403A (en) 1982-10-06 1982-10-06 thick film resistor

Country Status (1)

Country Link
JP (1) JPS5965403A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4522109A (en) * 1983-11-21 1985-06-11 J. I. Case Company Leak-detecting hydraulic system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4522109A (en) * 1983-11-21 1985-06-11 J. I. Case Company Leak-detecting hydraulic system

Also Published As

Publication number Publication date
JPS644642B2 (en) 1989-01-26

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