JPS596820B2 - Manufacturing method of optical fiber base material - Google Patents
Manufacturing method of optical fiber base materialInfo
- Publication number
- JPS596820B2 JPS596820B2 JP21665382A JP21665382A JPS596820B2 JP S596820 B2 JPS596820 B2 JP S596820B2 JP 21665382 A JP21665382 A JP 21665382A JP 21665382 A JP21665382 A JP 21665382A JP S596820 B2 JPS596820 B2 JP S596820B2
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- refractive index
- porous glass
- glass preform
- boron compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
本発明は、VAD法により光ファイバ母材を製造する方
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an optical fiber preform by a VAD method.
従来より、光通信に使用される光ファイバは各種の方法
により製造されているが、VAD法が最近注目されつつ
ある。Conventionally, optical fibers used for optical communications have been manufactured by various methods, but the VAD method has recently been attracting attention.
VAD法(気相軸付法)は、回転しながら上方向に移動
する棒状基材の下端に煤状ガラス微粒子を付着堆積し、
棒状基材を引き上げながら煤状ガラス微粒子を軸方向に
成長させて棒状の多孔質ガラスプリフォームを形成した
後、所定の処理を施して光ファイバ母材を形成する方法
である。そして、この光ファイバ母材を紡糸して光ファ
イバを形成している。ところで、VAD法により光ファ
イバを製造する場合、種々の形の屈折率プロファイルが
形成されている。In the VAD method (vapor phase attachment method), soot-like glass particles are attached and deposited on the lower end of a rod-shaped base material that moves upward while rotating.
This is a method in which a rod-shaped porous glass preform is formed by growing soot-like glass particles in the axial direction while pulling up a rod-shaped base material, and then a predetermined process is performed to form an optical fiber preform. Then, this optical fiber preform is spun to form an optical fiber. By the way, when manufacturing optical fibers by the VAD method, refractive index profiles of various shapes are formed.
そして、屈折率プロファイルを規定するものとして火炎
内の反応状態や煤状ガラス微粒子の流れや温度分布等が
あるが、VAD法による場合には第1図の実線で示すよ
うに外側付近aにおける屈折率が比較的高いプロファイ
ルが得られる傾向がある。外側付近aにおける屈折率が
比較的高いプロファイルを有する光ファイバは、帯域特
性が良好でない。そこで、火炎内の反応状態や煤状ガラ
ス微粒子の流れや温度分布等を調整することにより屈折
率分布を良好にしようとする試みもあるが、満足な結果
は得られず、外側付近aにおける屈折率を低くする方法
の出現が要望されている。本発明者等は上記要望に答え
るために鋭意研究を行つた結果、VAD法により形成さ
れた多孔質ガラスプリフォームを硼素化合物および酸素
の存在下で熱処理した後、所定の処理を施すと、第1図
の点線に示すように外側付近aにおける屈折率が低下し
、二乗分布型で帯域特性の良好な光ファイバが得られる
ことを知見した。The refractive index profile is determined by the reaction state within the flame, the flow of sooty glass particles, temperature distribution, etc., but in the case of the VAD method, the refraction at the outer vicinity a is shown by the solid line in Figure 1. Profiles with relatively high rates tend to be obtained. An optical fiber having a profile in which the refractive index near the outside a is relatively high does not have good band characteristics. Therefore, some attempts have been made to improve the refractive index distribution by adjusting the reaction state within the flame, the flow of soot-like glass particles, temperature distribution, etc., but no satisfactory results have been obtained. There is a need for a method to reduce the rate. The inventors of the present invention conducted extensive research in order to meet the above-mentioned needs, and found that when a porous glass preform formed by the VAD method is heat-treated in the presence of a boron compound and oxygen, and then subjected to a predetermined treatment, As shown by the dotted line in Figure 1, the refractive index in the vicinity of the outer side a decreases, and it has been found that an optical fiber having a square distribution type and good band characteristics can be obtained.
本発明はこの知見に基づいて完成されたもので、その特
徴はVAD法により形成された多孔質ガラスプリフォー
ムを硼素化合物および酸素の存在下で熱処理して屈折率
分布を調整することにある。以下、本発明を詳細に説明
する。The present invention was completed based on this knowledge, and its feature lies in adjusting the refractive index distribution by heat treating a porous glass preform formed by the VAD method in the presence of a boron compound and oxygen. The present invention will be explained in detail below.
先ず、VAD法により回転しながら上方向に移動する棒
状基材の下端に煤状ガラス微粒子を付着堆積し、棒状基
材を引き上げながら煤状ガラス微粒子を軸方向に成長さ
せて棒状の多孔質ガラスプリフオームを形成する。First, soot-like glass particles are attached and deposited on the lower end of a rod-shaped substrate that moves upward while rotating by the VAD method, and the soot-like glass particles are grown in the axial direction while pulling up the rod-shaped substrate to form a rod-shaped porous glass. Form a preform.
ついで、上記多孔質ガラスプリフオームを硼素化合物と
酸素の存在下で熱処理する。Next, the porous glass preform is heat treated in the presence of a boron compound and oxygen.
具体的には、例えば第2図に示すような石英パイプやア
ルミナパイプなどで形成された反応容器1内に上記多孔
質ガラスプリヒオーム2を収容し、反応容器1のほぼ中
央部に設けられた硼素化合物ガス導入パイプ3からガス
状の硼素化合物を供給し、反応容器1の下部に設けられ
た酸素ガス導入パイプ4から酸素ガスを同時に送り込む
。硼素化合物としては、BBr3,B2H6等が用いら
れ、B2H6は常温で気体であるので、そのまま反応容
器1に送り込まれ、BBr3は常温で液体であるので、
Arガスなどの不活性ガスでバブリングさせて気化させ
られたうえ、反応容器1内に供給される。硼素化合物ガ
スの供給量は、多孔質ガラスプリフオーム2の大きさ、
処理温度、処理時間および硼素化合物の種類によつて左
右されるが通常は10〜30CC/分の範囲が望ましい
値である。また、酸素ガスの供給量は硼素化合物ガスの
供給量によつて決められ、硼素化合物を十分に酸化し、
酸化物としうる量が必要であり、上記硼素化合物ガスの
供給量に対応して200〜600CC/分とされる。そ
して、反応容器1の外側には、この容器1を取り囲む加
熱ヒータ5が設けられ、この加熱ヒータ5によつて反応
容器1内の多孔質ガラスプリフオーム2、硼素化合物お
よび酸素力坊口熱され、熱処理が行われる。Specifically, the porous glass prehiome 2 is housed in a reaction vessel 1 formed of, for example, a quartz pipe or an alumina pipe as shown in FIG. A gaseous boron compound is supplied from a boron compound gas introduction pipe 3, and oxygen gas is simultaneously introduced from an oxygen gas introduction pipe 4 provided at the bottom of the reaction vessel 1. As the boron compound, BBr3, B2H6, etc. are used. Since B2H6 is a gas at room temperature, it is sent as it is to the reaction vessel 1, and since BBr3 is a liquid at room temperature,
It is vaporized by bubbling with an inert gas such as Ar gas, and then supplied into the reaction vessel 1 . The amount of boron compound gas supplied depends on the size of the porous glass preform 2,
Although it depends on the treatment temperature, treatment time, and type of boron compound, a desirable value is usually in the range of 10 to 30 CC/min. In addition, the amount of oxygen gas supplied is determined by the amount of boron compound gas supplied, and the boron compound is sufficiently oxidized.
An amount that can be used as an oxide is required, and the amount is set at 200 to 600 CC/min depending on the amount of the boron compound gas supplied. A heater 5 surrounding the reaction vessel 1 is provided on the outside of the reaction vessel 1, and this heater 5 heats the porous glass preform 2, boron compound, and oxygen in the reaction vessel 1. , heat treatment is performed.
処理温度は、硼素化合物の種類、処理時間等によつて左
右されるが、通常のSiO2系ガラスプリフオームの場
合は1000〜1300℃程度の範囲とされる。また、
処理時間は処理温度、多孔質ガラスプリフオーム2の大
きさ、硼素化合物の種類等によつて変動するが、1〜1
0時間の範囲とされる。さらに、この熱処理中に多孔質
ガラスプリフオーム2を回転数10〜 30rpmで回
転させつつ下方に、送り速度2 〜10mm/分で移送
して熱処理の均一化を計るようにする。このような硼素
化合物ガスと酸素との存在下での熱処理によつて、まず
硼素化合物ガスと酸素ガスとが多孔質ガラスプリフオー
ム2中に拡散してゆくとともに次の反応式によつて表わ
される熱酸化反応により酸化硼素(B,O。)となる。
このB2O3は多孔質ガラスプリフオーム2の外側付近
のポーラスな部分に沈着、付着する。B2O,の屈折率
はSiO2に比べて小さいので結果的に多孔質ガラスプ
リフオーム2の外側付近の屈折率は低下し、第1図の点
線で示すような二乗分布型の屈折率分布(プロフアイル
)が得られる。この際、硼素化合物ガスおよび酸素ガス
の供給量、処理温度、処理時間等を適宜上記範囲内で変
化させることにより、多孔質ガラスプリフオーム2の外
側部分の屈折率の低下の程度を制御することができる。
ついで、この熱処理が終つた多孔質ガラスプリフオーム
2は加熱されて透明ガラス化され、光フアイバ母材とな
る。なお、上記熱処理に伴つて生成する排ガスは反応容
器1の上部に設けられた排気パイプ6から反応容器1外
に排出される。The treatment temperature depends on the type of boron compound, treatment time, etc., but in the case of a normal SiO2 glass preform, it is in the range of about 1000 to 1300°C. Also,
The processing time varies depending on the processing temperature, the size of the porous glass preform 2, the type of boron compound, etc.
The range is 0 hours. Furthermore, during this heat treatment, the porous glass preform 2 is rotated at a rotation speed of 10 to 30 rpm and transferred downward at a feed rate of 2 to 10 mm/min to ensure uniform heat treatment. Through such heat treatment in the presence of the boron compound gas and oxygen, the boron compound gas and oxygen gas are first diffused into the porous glass preform 2, and the reaction is expressed by the following reaction formula. A thermal oxidation reaction results in boron oxide (B, O.).
This B2O3 is deposited and attached to the porous portion near the outside of the porous glass preform 2. Since the refractive index of B2O is smaller than that of SiO2, the refractive index near the outside of the porous glass preform 2 decreases, resulting in a square distribution type refractive index distribution (profile) as shown by the dotted line in Figure 1. ) is obtained. At this time, the degree of decrease in the refractive index of the outer portion of the porous glass preform 2 can be controlled by appropriately changing the supply amount of boron compound gas and oxygen gas, processing temperature, processing time, etc. within the above ranges. Can be done.
Next, the porous glass preform 2 that has undergone this heat treatment is heated to become transparent vitrification, and becomes an optical fiber base material. Note that the exhaust gas generated during the heat treatment is discharged to the outside of the reaction container 1 from an exhaust pipe 6 provided at the upper part of the reaction container 1.
以下、実施例を示して本発明を具体的に説明する。Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例 1
SiCι4200CC/分、GeCt45OCC/分、
POct35CC/分、H23OOOCC/分、025
500CC/分を四重管バーナに供給し、かつ棒状基材
を回転数20rpmで回転させつつ引上げ速度50mm
/時間で引上げ、VAD法にて外径50mm.長さ35
0關の多孔質ガラスプリフオームを形成した。Example 1 SiCι4200CC/min, GeCt45OCC/min,
POct35CC/min, H23OOCC/min, 025
500 CC/min was supplied to the quadruple tube burner, and the rod-shaped base material was rotated at a rotational speed of 20 rpm while pulling at a pulling speed of 50 mm.
/ hour, and the outer diameter was 50 mm using the VAD method. length 35
A zero-pore porous glass preform was formed.
ついで、この多孔質ガラスプリフオームを第2図に示す
反応容器1に収容してB2H6ガスおよび酸素ガスの存
在下で熱処理を行つた。Next, this porous glass preform was placed in a reaction vessel 1 shown in FIG. 2, and heat-treated in the presence of B2H6 gas and oxygen gas.
熱処理の条件は次の通りである。B2H6供給量 20
CC/分
02供給量 600CC/分
熱処理温度 1200℃
熱処理時間 3時間
多孔質ガラスブリフオームの回転数および 25rpm
送り速度 5mTfL/分このようにして、熱処理され
た多孔質ガラスプリフオームを1450℃で透明ガラス
化して光フアイバ母材とし、この光フアイバ母材から光
フアイバを製造した。The conditions for heat treatment are as follows. B2H6 supply amount 20
CC/min02 Supply rate 600CC/min Heat treatment temperature 1200℃ Heat treatment time 3 hours Porous glass brifform rotation speed and 25 rpm
Feed rate: 5 mTfL/min In this way, the heat-treated porous glass preform was vitrified transparent at 1450° C. to obtain an optical fiber preform, and an optical fiber was manufactured from this optical fiber preform.
得られた光フアイバは、第3図に示すような屈折率分布
を有していた。一方、比較のため、B2H6ガスおよび
02ガスで処理しない多孔質ガラスプリフオームから同
様の方法によつて光フアイバを製造したところ、第4図
に示すような屈折率分布を有する光フアイバが得られた
。The obtained optical fiber had a refractive index distribution as shown in FIG. On the other hand, for comparison, when an optical fiber was manufactured by the same method from a porous glass preform that was not treated with B2H6 gas or 02 gas, an optical fiber having a refractive index distribution as shown in Fig. 4 was obtained. Ta.
第3図と第4図との屈折率分布を比較すると明らかなよ
うに、本発明の方法で処理されたもののプロフアイルは
二乗分布型で外側付近における屈折率は低いのに対し、
処理しない従来のもののプロフアイルは完全な二乗分布
型ではなく、外側付近における屈折率が比較的高い。As is clear from comparing the refractive index distributions in FIG. 3 and FIG. 4, the profile of the one processed by the method of the present invention is of a square distribution type and the refractive index near the outside is low, whereas
The profile of the conventional one without treatment is not a perfect square distribution type, and the refractive index near the outside is relatively high.
このことから、本発明の方法で処理された光フアイバ母
材から形成される光フアイバは、従来のものに比べて帯
域特性が良好であることがわかる。実施例 2
実施例1と同様にして得られた多孔質ガラスプリフオー
ムをBBr3ガスおよび02ガスの存在下で熱処理した
。From this, it can be seen that the optical fiber formed from the optical fiber base material treated by the method of the present invention has better band characteristics than the conventional fiber. Example 2 A porous glass preform obtained in the same manner as in Example 1 was heat treated in the presence of BBr3 gas and 02 gas.
熱処理条件は、BBr3の供給量を10CC/分とし、
02の供給量を200CC/分とした以外は実施例1と
同一とした。熱処理後の多孔質ガラスプリフオームから
得られた光フアイバの屈折率分布は第3図に示したもの
とほぼ同様の二乗分布型であつた。以上説明したように
、本発明の光フアイバ母材の製造法は、VAD法により
得られた多孔質ガラスプリフオームを硼素化合物および
酸素の存在下で熱処理するものである。The heat treatment conditions were a BBr3 supply rate of 10 CC/min,
The procedure was the same as in Example 1 except that the supply amount of 02 was 200 cc/min. The refractive index distribution of the optical fiber obtained from the porous glass preform after heat treatment was a square distribution type almost similar to that shown in FIG. As explained above, the method for producing an optical fiber preform of the present invention involves heat-treating a porous glass preform obtained by the VAD method in the presence of a boron compound and oxygen.
したがつて、本発明によれば多孔質ガラスプリフオーム
の外側付近部分の屈折率を低下させることができ、二乗
分布型の屈折率分布を確実に形成できる。よつて、本発
明の方法によつて処理された多孔質ガラスプリフオーム
から得られる光フアイバは二乗分布型の屈折率分布(プ
ロフアイノリを有し、帯域特性の良好なものとなる。Therefore, according to the present invention, the refractive index in the vicinity of the outer side of the porous glass preform can be lowered, and a square distribution type refractive index distribution can be reliably formed. Therefore, the optical fiber obtained from the porous glass preform treated by the method of the present invention has a square distribution type refractive index distribution (profile curve) and has good band characteristics.
第1図は本発明の方法と従来法とで得られた光フアイバ
の屈折率分布を示すグラフ、第2図は本発明の方法を実
施するに好適な装置の一例を示す概略構成図、第3図は
実施例1で得られた光フアイバ母材から形成された光フ
アイバの屈折率分布を示すグラフ、第4図は従来法で得
られた光フアイバの屈折率分布を示すグラフである。
1・・・・・・反応容器、2・・・・・・多孔質ガラス
プリフオーム、3・・・・・・硼素化合物ガス導入パイ
プ、4・・・・・・酸素ガス導入パイプ、5・・・・・
・加熱ヒータ、6・・・・・・排気パイプ。FIG. 1 is a graph showing the refractive index distribution of optical fibers obtained by the method of the present invention and the conventional method. FIG. 2 is a schematic diagram showing an example of an apparatus suitable for carrying out the method of the present invention. FIG. 3 is a graph showing the refractive index distribution of the optical fiber formed from the optical fiber base material obtained in Example 1, and FIG. 4 is a graph showing the refractive index distribution of the optical fiber obtained by the conventional method. DESCRIPTION OF SYMBOLS 1... Reaction container, 2... Porous glass preform, 3... Boron compound gas introduction pipe, 4... Oxygen gas introduction pipe, 5.・・・・・・
・Heater, 6...Exhaust pipe.
Claims (1)
を硼素化合物および酸素の存在下で熱処理し、上記多孔
質ガラスプリフォームの外側部分に酸化硼素を沈着させ
ることにより屈折率を低下させ、上記多孔質ガラスプリ
フォームの屈折率分布を二乗分布型とすることを特徴と
する光ファイバ母材の製造法。1. A porous glass preform obtained by the VAD method is heat-treated in the presence of a boron compound and oxygen, and boron oxide is deposited on the outer part of the porous glass preform to lower the refractive index. A method for manufacturing an optical fiber preform, characterized in that the refractive index distribution of the glass preform is a square distribution type.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21665382A JPS596820B2 (en) | 1982-12-10 | 1982-12-10 | Manufacturing method of optical fiber base material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21665382A JPS596820B2 (en) | 1982-12-10 | 1982-12-10 | Manufacturing method of optical fiber base material |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54123679A Division JPS5844619B2 (en) | 1979-09-26 | 1979-09-26 | Manufacturing method of optical fiber base material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58130133A JPS58130133A (en) | 1983-08-03 |
| JPS596820B2 true JPS596820B2 (en) | 1984-02-14 |
Family
ID=16691818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21665382A Expired JPS596820B2 (en) | 1982-12-10 | 1982-12-10 | Manufacturing method of optical fiber base material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS596820B2 (en) |
-
1982
- 1982-12-10 JP JP21665382A patent/JPS596820B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58130133A (en) | 1983-08-03 |
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