JPS5969952A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5969952A
JPS5969952A JP57181108A JP18110882A JPS5969952A JP S5969952 A JPS5969952 A JP S5969952A JP 57181108 A JP57181108 A JP 57181108A JP 18110882 A JP18110882 A JP 18110882A JP S5969952 A JPS5969952 A JP S5969952A
Authority
JP
Japan
Prior art keywords
moisture
resin
aluminum
pellet
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57181108A
Other languages
Japanese (ja)
Inventor
Tsutomu Matsuura
松浦 勉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57181108A priority Critical patent/JPS5969952A/en
Publication of JPS5969952A publication Critical patent/JPS5969952A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40—Leadframes
    • H10W70/456—Materials
    • H10W70/457—Materials of metallic layers on leadframes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07551—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/874—On different surfaces
    • H10W72/884—Die-attach connectors and bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/951—Materials of bond pads
    • H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Lead Frames For Integrated Circuits (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To prevent moisture intruding from the interface of an external lead and a resin in the vicinity of the external lead by attaching a metal, which is the same as a wiring metal for a pellet or an ionization tendency thereof is larger than the wiring metal, to the external lead and at least a part of a section enclosed with the resin of a hanging pin for holding of a pellet mounting section. CONSTITUTION:Thin-film layers 11 made of the same material as a wiring on a chip or a material, the ionization tendency thereof is larger than the wiring metal material, are formed. The metal layers may be formed in the vicinity of pads for bonding wires, and moisture reaches pad sections 3 when it intrudes from the interface of the leads 1 and the resin 8, but the pad sections 3 have large resistance against moisture and do not react with moisture because they are formed by Au or Ag, and moisture reaches the surface of the pellet along the bonding wires and corrodes wiring Al. However, moisture intruding along lead wires is in contact with aluminum layers formed near the bonding pads 3, reacts with aluminum and corrodes aluminum. The moisture consumes after it corrodes aluminum, and does not intrude in the direction of the pellet.

Description

【発明の詳細な説明】 本発明は半導体装置にかかり、特に耐湿性を向上させた
樹脂封止半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device, and particularly to a resin-sealed semiconductor device with improved moisture resistance.

樹脂封止半導体装置は安価に製造できることと、樹脂特
性並びにモールド技術の向上による信頼性の向上により
、現在ICパッケージの主流は樹脂パッケージとなって
いる。
Resin-sealed semiconductor devices can be manufactured at low cost, and due to improved reliability due to improvements in resin properties and molding technology, resin packages are currently the mainstream of IC packages.

第1図は従来一般的に用いられている樹脂封止ICの断
面図である。1及び2は銅合金又は鉄合金を主とするリ
ードフレームであり、1は外部リード、2はベレットマ
ウント部である。ベレットマウント部2の表面並びに外
部リード1のボンディング線のポンディングパッド部に
は、金、又は銀の薄膜3,4が形成され°Cいる。表面
にアルミニウム配線を有するシリコンチップ5はロー材
6によりベレットマウント部2に接続されている。
FIG. 1 is a sectional view of a conventionally commonly used resin-sealed IC. 1 and 2 are lead frames mainly made of copper alloy or iron alloy, 1 is an external lead, and 2 is a bullet mount part. Thin films 3 and 4 of gold or silver are formed on the surface of the bullet mount portion 2 and on the bonding pad portion of the bonding wire of the external lead 1. A silicon chip 5 having aluminum wiring on its surface is connected to the bullet mount part 2 by a brazing material 6.

また金のボンディング線7によりシリコンチップ5と外
部リードのボンディング部3は接続されている。ボンデ
ィング線7としてはアルミニウム線が使われることもあ
るが、生産技術面からしてモールドICには殆んど金線
が使われている。また8はモールド樹脂でちりベレット
搭載部、外部す−ドの一部、ボンディング線を刺入して
いる。
Further, the silicon chip 5 and the bonding portion 3 of the external lead are connected by a gold bonding wire 7. Aluminum wire is sometimes used as the bonding wire 7, but gold wire is almost always used in molded ICs from the viewpoint of production technology. In addition, 8 is made of molded resin and the dust pellet mounting part, a part of the outer board, and the bonding wire are inserted.

このように形成された樹脂封止半導体装置は信頼性が向
上したとはいえ金属やセラミックのパッケージのものに
比べると信頼性がおとり、特に耐湿特性が問題となって
いる。ICの内部配線としては前記したようにアルミニ
ウムが使われているが、水の侵入によりアルミニウムの
腐食が発生する。従ってこの問題の解決のためには水分
のアルミニウム配線部への侵入を防ぐことが必要である
。
Although the reliability of resin-sealed semiconductor devices formed in this manner has been improved, the reliability is lower than that of metal or ceramic packages, and moisture resistance is particularly problematic. As mentioned above, aluminum is used for the internal wiring of the IC, but corrosion of the aluminum occurs due to the intrusion of water. Therefore, in order to solve this problem, it is necessary to prevent moisture from entering the aluminum wiring portion.

一方樹脂封止半導体装置に於ける水分の侵入経路として
は、リードフレームと樹脂の界面及びバルク自体を通る
ものとが考えられる。しかし樹脂を直接通って水分がペ
レット表面に達することは殆んどなく、大部分は水分が
リードと樹脂の界面を通って侵入し、その後ボンディン
グ線にそってベレットに到達すること及びペレットマウ
ント部保持用の吊りビンを通っ°Cベレット部に到達す
ることが知られている。もしモールド樹脂にクラック等
の欠陥があるときは外観検査により除去することが出来
るので水分の侵入に対してはリードと樹脂の界面に最も
注目すべきであることがわかる。
On the other hand, the routes for moisture to enter a resin-sealed semiconductor device are thought to be through the interface between the lead frame and the resin and the bulk itself. However, water rarely reaches the pellet surface directly through the resin, and most of the water enters through the interface between the lead and resin, and then reaches the pellet along the bonding line and the pellet mount. It is known to reach the °C pellet section through a holding hanging bottle. If there is a defect such as a crack in the molding resin, it can be removed by visual inspection, so it can be seen that the interface between the lead and the resin should be given the most attention to prevent moisture from entering.

一方モールドICに於ては高密度化にともないペレット
上のアルミニウムの内部配線は微細化される一方ベレ、
トの大きさは大きくなっている。
On the other hand, in mold ICs, as the density increases, the internal wiring of aluminum on the pellet becomes finer,
The size of the net is increasing.

しかしながら小型化の要望からベレットとパッケージ表
面との距離//i短かくなり、かつ高集積化のためリー
ドの数は多くなり水分の侵入防止の面から見るとますま
す条件が悪くなっている。特に小型化とリード数の増大
はICの半田デイツプ時に熱容量のすくないことから直
接ペレットに熱影響を与えると共にリードと樹脂の間に
すき間を生ずることになる。
However, due to the demand for miniaturization, the distance between the pellet and the package surface has become shorter, and the number of leads has increased due to higher integration, making the conditions increasingly poor in terms of preventing moisture intrusion. In particular, miniaturization and an increase in the number of leads directly affect the heat of the pellet and create gaps between the leads and the resin since the heat capacity is small when soldering the IC.

これらの問題に対しリードとモールド樹脂にすき間が出
来にくいような方法9手段、例えば樹脂とリードの熱膨
張係数の選択、なじみ易さの改善などの方法がとられて
いるが十分な解決は困難である。
To address these problems, nine methods have been taken to make it difficult for gaps to form between the lead and the molding resin, such as selecting the coefficient of thermal expansion of the resin and the lead, and improving ease of compatibility, but it is difficult to solve the problem satisfactorily. It is.

また水分と反応しにくい金をペレット上の配線に用いる
ことも考えられるが、モールド品の様な安価なICには
とても用いられないため専らアルミニウムが用いられ”
でいる。
It is also possible to use gold, which does not easily react with moisture, for the wiring on the pellets, but since it is rarely used for inexpensive ICs such as molded products, aluminum is used exclusively.
I'm here.

一部モールド樹脂の中に入る水分といっても水浸しにな
る程多量の水分が入るわけではないので、リードのル[
から入る水分がリードのところで長くとどめられていれ
はベレット表面への水分の侵入〃r遅くなりICの寿命
がのびることは明らかである。
Even though some of the moisture may enter the mold resin, it does not mean that it is so large that it becomes waterlogged.
It is clear that the longer the moisture that enters the lead is retained at the leads, the slower the moisture will enter the pellet surface and the life of the IC will be extended.

従って本発明は以上の問題点に対処してなされたもので
、リードと樹脂の界面から侵入する水分を外部リード近
傍で侵入防害をし信頼性の優れた樹脂封止半導体装置を
提供するにある。
Therefore, the present invention has been made to address the above-mentioned problems, and it is an object of the present invention to provide a highly reliable resin-sealed semiconductor device that prevents moisture from entering from the interface between the lead and the resin near the external lead. be.

本発明の要旨は、樹脂封止半導体装置において、外部リ
ード並びにペレットマウント部の保持用量ビンの樹脂に
封入される部分の少くとも一部にベレットの配線金属と
同じか、又は該配線金属よりイオン化傾向の大きい金属
を付層させたことを特徴とする半導体装置にある。
The gist of the present invention is that, in a resin-sealed semiconductor device, at least a part of the external lead and the portion sealed in the resin of the holding dose bottle of the pellet mount part is ionized to be the same as the wiring metal of the pellet or more ionized than the wiring metal. A semiconductor device is characterized in that a metal with a large tendency is layered.

以下実施例に基き本発明の詳細な説明する。The present invention will be described in detail below based on Examples.

第2図は本発明の一実施例による半導体装置の断面図で
ある。図において1〜10は従来の第1図と同じ部分を
示す。従来例と異る点は外部リードのモールド樹脂に封
入される部分の少くとも一部にチップ上の配線(本実施
例ではアルミニウム)と同一の月利又は配線金属材料よ
りイオン化傾向の大きい材料の薄膜層11を形成し′C
いる点である。この金属層はボンディング線用パッドの
近傍に形成すればよく、従来のパッドを兼ねて比較的広
い範囲にアルミニウム薄膜を形成してもよい。
FIG. 2 is a sectional view of a semiconductor device according to an embodiment of the present invention. In the figure, numerals 1 to 10 indicate the same parts as in the conventional figure 1. The difference from the conventional example is that at least a part of the external lead sealed in the molding resin is made of a material that has the same monthly rate as the wiring on the chip (aluminum in this example) or has a higher ionization tendency than the wiring metal material. Forming a thin film layer 11'C
The point is that there is. This metal layer may be formed in the vicinity of the bonding line pad, and an aluminum thin film may be formed over a relatively wide area to also serve as a conventional pad.

このような構成にするときは水分がリード1と樹脂8の
界面より仲人し”Cきたとき従来のAu。
When such a structure is used, moisture is absorbed from the interface between the lead 1 and the resin 8, and when it reaches "C", the conventional Au.

又はAgのパッド部3に到達するが上記パッド部3はA
u又はAgで形成されているため水分に対する耐性が犬
で反応することなく水分はボンディング線に沿ってベレ
ット表面に到達し配線A7を腐食する。然るに前記した
ようにリード線に沿って進入した水分はポンディングパ
ッド3の近傍に設けられたアルミニウム層に接しこのア
ルミニウムと反応しアルミニウムをル゛i食する。前記
したようにこの侵入する水分は水浸しにする程多量に入
るわけでないのでこの水分はアルミニウムを腐食すると
消耗しペレットの方向に侵入しなくなる。
Or, it reaches the pad part 3 of Ag, but the pad part 3 is A
Since it is made of aluminum or Ag, it has poor resistance to moisture, and moisture reaches the surface of the pellet along the bonding line and corrodes the wiring A7 without reacting. However, as described above, the moisture that has entered along the lead wire comes into contact with the aluminum layer provided near the bonding pad 3, reacts with the aluminum, and erodes the aluminum. As mentioned above, this invading moisture is not so large as to cause water immersion, so when this moisture corrodes the aluminum, it is consumed and no longer intrudes in the direction of the pellet.

すなわちアルミニウム層が存在し侵入した水分がアルミ
ニウムと反応している間は水分がペレットのアルミニウ
ム配線部に到達しないことを利用したものでおる。なお
ペレットマウント部の保持用量°リピンの切断部も外部
に露出するので同様処理により半導体装置の耐湿性を向
上させることができる。
In other words, this method takes advantage of the fact that the aluminum layer exists and the moisture that has entered the pellet does not reach the aluminum wiring portion of the pellet while it is reacting with the aluminum. Incidentally, since the cut portion of the repin held in the pellet mount portion is also exposed to the outside, the moisture resistance of the semiconductor device can be improved by the same treatment.

次に本発明を実施した第2図構造の半導体装置と第1図
構造の従来の半導体装置を高温・高湿の加速試験(80
℃、85チ以上)を行い時間と不良発生率の関係を求め
た。この関係を第3図に示した。第3図においてAI/
i従来品、Bは本発明の一実施例の結果である。この図
から明らかなように従来品のAでは100時間で不良率
は相当大きく、その後急激に不良率が大きくなっ“Cい
るが本発明によるBでは100時間では殆んど不良品の
発生がなく大幅に寿命が延びていることを示している。
Next, the semiconductor device with the structure shown in FIG. 2 in which the present invention was implemented and the conventional semiconductor device with the structure shown in FIG.
The relationship between time and failure rate was determined. This relationship is shown in Figure 3. In Figure 3, AI/
i is the conventional product, and B is the result of an embodiment of the present invention. As is clear from this figure, with the conventional product A, the defective rate was quite large after 100 hours, and after that, the defective rate suddenly increased. This shows that lifespan is significantly extended.

以上説明したとお9本発明によれば従来モールド樹脂の
耐湿性の改善のみでは十分な効果が得られなかった樹脂
封止半導体装置の耐湿性を改良し、信頼性を大幅に向上
させることができる。
As explained above, according to the present invention, it is possible to improve the moisture resistance of a resin-sealed semiconductor device, which has not been sufficiently effective only by improving the moisture resistance of the mold resin, and to significantly improve the reliability. .

なお上記実施例では外部リードのポンディングパッドの
近傍に形成する金属としCは主とし゛Cアルミニウムに
ついて述べたがアルミニウムに限定されるものでなく、
アルミニウムよりイオン化傾向の大きい金属例えばCa
、Mg、Ce等でもよい。
In the above embodiment, C is the metal formed near the bonding pad of the external lead, and C mainly refers to aluminum, but it is not limited to aluminum.
Metals with a greater tendency to ionize than aluminum, such as Ca
, Mg, Ce, etc.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の樹脂封止半導体装置の断面図、第2図は
本発明による樹脂封止半導体装置の断面図、第3図は従
来品、及び本発明の一実施例の耐湿加速試験結果を示す
図である。 1・・・・・・外部リード、2・・・・・・ペレットマ
ウント部、3・・・・・・外部リードポンディングパッ
ド、4・・・・・・ペレットマウント部導電層、5・・
・・・・ペレット、6・・・・・・ロー材、7・・・・
・・ボンディング線(Au線)、8・・・・・・モール
ド樹脂、9・・・・・・外部リード外装メッキ、lO・
°°・°°アルミニウム内部配線、11・・・・・・防
水用金属層、A・・・・・・従来品耐湿特性曲線、B・
旧・・本発明の一実施例の耐湿特性曲線。 221− 躬 / 圀 8Z図 ′θθ  時間 第 3 図
Fig. 1 is a cross-sectional view of a conventional resin-sealed semiconductor device, Fig. 2 is a cross-sectional view of a resin-sealed semiconductor device according to the present invention, and Fig. 3 is the result of an accelerated humidity test of the conventional product and an embodiment of the present invention. FIG. DESCRIPTION OF SYMBOLS 1... External lead, 2... Pellet mount part, 3... External lead bonding pad, 4... Pellet mount part conductive layer, 5...
...Pellet, 6...Rowing material, 7...
...Bonding wire (Au wire), 8...Mold resin, 9...External lead exterior plating, lO.
°°・°°Aluminum internal wiring, 11... Waterproof metal layer, A... Conventional product moisture resistance characteristic curve, B...
Old...Moisture resistance characteristic curve of one embodiment of the present invention. 221- 躬/圀8Z图'θθ Time 3rd figure

Claims (2)

【特許請求の範囲】[Claims] (1)樹脂封止半導体装置において、外部リード並びに
ベレットマウント部の保持用量ビンの樹脂に封入される
部分の少くとも一部にベレットの配線金属と同じか、又
は該配線金属よりイオン化傾向の大きい金属を付着させ
たことを特徴とする半導体装置。
(1) In a resin-sealed semiconductor device, at least a portion of the external lead and the part encapsulated in the resin of the holding dose bottle of the bullet mount part has a tendency to ionize the same as or has a greater tendency to ionize than the wiring metal of the bullet. A semiconductor device characterized by having metal attached thereto.
(2)ベレットの配線金属と外部リード並びにベレット
マウント部の保持用吊ピンの樹脂に封入される部分の少
くとも一部に付着させる金属が共にアルミニウムである
ことを特徴とする特許請求の範囲第(1)項記載の半導
体装置。
(2) The metal attached to the wiring metal of the bullet, the external lead, and at least a part of the resin-sealed portion of the holding hanging pin of the bullet mount are both aluminum. The semiconductor device according to item (1).
JP57181108A 1982-10-15 1982-10-15 Semiconductor device Pending JPS5969952A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57181108A JPS5969952A (en) 1982-10-15 1982-10-15 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57181108A JPS5969952A (en) 1982-10-15 1982-10-15 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5969952A true JPS5969952A (en) 1984-04-20

Family

ID=16094984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57181108A Pending JPS5969952A (en) 1982-10-15 1982-10-15 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5969952A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100369501B1 (en) * 1998-12-31 2003-03-28 앰코 테크놀로지 코리아 주식회사 Semiconductor Package
WO2002011203A3 (en) * 2000-07-31 2003-07-31 Koninkl Philips Electronics Nv Plastic encapsulated semiconductor devices with improved corrosion resistance
JP2017063105A (en) * 2015-09-24 2017-03-30 トヨタ自動車株式会社 Semiconductor module

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100369501B1 (en) * 1998-12-31 2003-03-28 앰코 테크놀로지 코리아 주식회사 Semiconductor Package
WO2002011203A3 (en) * 2000-07-31 2003-07-31 Koninkl Philips Electronics Nv Plastic encapsulated semiconductor devices with improved corrosion resistance
JP2017063105A (en) * 2015-09-24 2017-03-30 トヨタ自動車株式会社 Semiconductor module

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