JPS6018231B2 - cleaning equipment - Google Patents

cleaning equipment

Info

Publication number
JPS6018231B2
JPS6018231B2 JP7522077A JP7522077A JPS6018231B2 JP S6018231 B2 JPS6018231 B2 JP S6018231B2 JP 7522077 A JP7522077 A JP 7522077A JP 7522077 A JP7522077 A JP 7522077A JP S6018231 B2 JPS6018231 B2 JP S6018231B2
Authority
JP
Japan
Prior art keywords
cleaning
liquid
cleaning liquid
outside
cleaning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7522077A
Other languages
Japanese (ja)
Other versions
JPS549458A (en
Inventor
昌宏 羽山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP7522077A priority Critical patent/JPS6018231B2/en
Publication of JPS549458A publication Critical patent/JPS549458A/en
Publication of JPS6018231B2 publication Critical patent/JPS6018231B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 この発明は、被洗浄物を洗浄する洗浄装置に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning device for cleaning an object to be cleaned.

特に、被洗浄物を洗浄した後のすすぎ(以下、「リンス
」と言う)をする洗浄装置に適する。電子装置等に用い
られるガラス板・半導体基板・セラミック板等は、界面
活性剤・有機溶剤・酸溶液・アルカリ溶液等にて洗浄し
た後、水や蒸溜水、有機溶剤等にて流液リンスまたは超
音波をかけた状態での流液リンスにより、被洗浄物の汚
染を除きかつ洗浄剤を除く必要があった。
It is particularly suitable for a cleaning device that performs rinsing (hereinafter referred to as "rinsing") after cleaning an object to be cleaned. Glass plates, semiconductor substrates, ceramic plates, etc. used in electronic devices, etc. are cleaned with surfactants, organic solvents, acid solutions, alkaline solutions, etc., and then rinsed with water, distilled water, organic solvents, etc. It was necessary to remove contamination from the object to be cleaned and to remove the cleaning agent by rinsing with a flowing liquid while applying ultrasonic waves.

とくに、洗浄剤自体の徴量雑存でさえ、電子装置の特性
に著しい影響を与えるため、主洗浄工程は勿論、リンス
洗浄工程においても十分な配慮が必要とされた。例えば
、液晶表示装置に使用されるガラス板の汚れは、液晶分
子の配向性を劣化させ、また寿命を劣化させるため、界
面活性剤等を用いて汚れを除去するが、この界面活性剤
のガラス板への残存は、液晶分子の配向性を著しく劣化
させるため、界面活性剤を用いた後の水によるリンス洗
浄も十分に行なう必要があった。
In particular, since even the amount of the cleaning agent itself has a significant effect on the characteristics of electronic devices, sufficient consideration has been required not only in the main cleaning process but also in the rinsing process. For example, dirt on the glass plates used in liquid crystal display devices deteriorates the alignment of liquid crystal molecules and also reduces the lifespan, so surfactants are used to remove the dirt. Since remaining on the plate significantly deteriorates the alignment of liquid crystal molecules, it was necessary to thoroughly rinse with water after using the surfactant.

そのため、大量の水を必要とした。従来のこの種の装置
として第1図に漠式的断面図を示すものがあった。
Therefore, a large amount of water was required. As a conventional device of this kind, there is one shown in a vague cross-sectional view in FIG.

図において、1は未使用洗浄液たとえば水の取入口、2
は洗浄液の排出口、3は穴をあげた棚、4は超音波発生
器である。次に動作について説明する。
In the figure, 1 is an inlet for unused cleaning liquid, such as water;
1 is a cleaning liquid outlet, 3 is a shelf with holes, and 4 is an ultrasonic generator. Next, the operation will be explained.

例えばガラス板の洗浄において、界面活性剤溶液中にて
洗浄されたガラス板が、第1図に示したように洗浄装置
にてリンス洗浄される場合について説明する。洗浄取入
口1よりある流量のリンス洗浄液、例えば水が取り入れ
られ、穴をあげた棚3を通り一様に洗浄装置内に流れこ
み、ガラス板に付着した汚れ、界面活性剤を薄めながら
除去していく。
For example, in cleaning a glass plate, a case will be described in which a glass plate that has been cleaned in a surfactant solution is rinsed in a cleaning device as shown in FIG. A certain flow rate of rinsing cleaning liquid, for example water, is taken in from the cleaning intake port 1, flows uniformly into the cleaning device through the shelf 3 with holes, and removes dirt and surfactant adhering to the glass plate while diluting it. To go.

従って、十分なりンスをおこなうためには、かなりの水
量とりンス洗浄時間を必要とした。リンス効果をあげる
ために、超音波をかけたり、被洗浄物に効率よく水があ
たるように穴あきの棚3を配置したりして下から水を流
し、上方よりすててし、た。第2図は、第1図に示す洗
浄装置において被洗浄物をそう入し(被洗浄物のホルダ
ーは図示していない)、洗浄液の流れを模式化した模式
的断面図である。
Therefore, in order to perform a sufficient rinse, a considerable amount of water and a considerable amount of time were required. In order to improve the rinsing effect, ultrasonic waves were applied, and a perforated shelf 3 was arranged so that water could hit the object to be cleaned efficiently, so that water flowed from below and was disposed of from above. FIG. 2 is a schematic cross-sectional view illustrating the flow of cleaning liquid when an object to be cleaned is inserted into the cleaning apparatus shown in FIG. 1 (the holder for the object to be cleaned is not shown).

図において、5は被洗浄物、6は洗浄液の流線である。
従来の洗浄装置は以上のように構成されていたため、第
2図に示すごとく、入力の水量のうちガラス板近傍(図
に示すA領域)を通る水は、リンス洗浄液として作用す
るが、その他の領域(図に示すB領域)では、ほとんど
リンス作用もなく、あるいは、軽い汚染のみで排出され
ていた。
In the figure, 5 is the object to be cleaned, and 6 is the streamline of the cleaning liquid.
Since the conventional cleaning device was constructed as described above, as shown in Figure 2, the water that passes near the glass plate (area A shown in the figure) among the input water acts as a rinsing cleaning liquid, but other In the region (region B shown in the figure), there was almost no rinsing effect or only light pollution was discharged.

従って、リンス洗浄液の使用効率(以下、「ご」とあら
わす。どく1)は極めて低く、10‐2%位〜数10%
位と考えられる。以上のように、従来の洗浄装置は、リ
ンス洗浄液の使用効率が低く、大量のリンス洗浄液を必
要とし、かつリンス洗浄時間は長時間を要するという欠
点があった。
Therefore, the usage efficiency (hereinafter referred to as "go") of the rinse cleaning solution is extremely low, ranging from about 10-2% to several tens of percent.
It is considered to be a rank. As described above, the conventional cleaning apparatus has the drawbacks that the efficiency of using the rinsing liquid is low, a large amount of the rinsing liquid is required, and the rinsing time is long.

これは、量産的な製造において大きなコスト高につなが
った。この発明は、上記のような従来のものの欠点を除
去するためになされたもので、洗浄液の使用効率をあげ
て、少量の洗浄液の使用とより短い洗浄時間にて従来と
同機の洗浄効果があがる洗浄装置を提供することを目的
としている。
This has led to significant cost increases in mass production. This invention was made in order to eliminate the drawbacks of the conventional machine as described above, and by increasing the efficiency of use of cleaning liquid, the cleaning effect of the conventional machine is improved by using a small amount of cleaning liquid and a shorter cleaning time. The purpose is to provide cleaning equipment.

以下、この発明を実施例に基づいて説明する。Hereinafter, this invention will be explained based on examples.

第3図はこの発明による洗浄装置の一実施例の模式的断
面図である。図において、1〜4は第1図に示したもの
と同じものを表わしている。7は排出液と循還液との分
離系、8は禾使用洗浄液と循還液との混合系、9は循還
管、10‘ま循還用ポンプ(流量通整用機構を含む)、
11は循遠系の取入口、12は循還系の排出口である。
FIG. 3 is a schematic cross-sectional view of one embodiment of the cleaning device according to the present invention. In the figure, numerals 1 to 4 represent the same components as shown in FIG. 7 is a separation system for the discharged liquid and the circulating liquid, 8 is a mixing system for the cleaning liquid used and the circulating liquid, 9 is a circulation pipe, 10' is a circulation pump (including a flow rate regulating mechanism),
11 is an intake port of the circulation system, and 12 is an outlet of the circulation system.

ここで、循環系の取入口11は、洗浄液の排出口2より
下面に配置する。未使用洗浄液と循還液とは混合系8に
て混合された後、洗浄槽に流入する。このように洗浄装
置において、洗浄液のみE液の一部を循還させることに
よって、洗浄液の使用効率を増大させ、より少量の洗浄
液の使用とより短い洗浄時間にて従来と同様の洗浄効果
があがる。
Here, the intake port 11 of the circulation system is disposed below the cleaning liquid discharge port 2. After the unused cleaning liquid and the circulating liquid are mixed in the mixing system 8, they flow into the cleaning tank. In this way, in the cleaning device, by circulating only a part of the E solution only for the cleaning solution, the usage efficiency of the cleaning solution is increased, and the same cleaning effect as before can be achieved with the use of a smaller amount of cleaning solution and a shorter cleaning time. .

次に、この発明の装置の動作原理を説明する。第4図に
この発明による洗浄装置の模式図を示す。図において、
6は洗浄液の流れを示す。7洗浄排出液と循還液との分
離系、8は未使用洗浄液と循還液との混合系、13は模
式化して示した洗浄槽である。洗浄装置に毎分当り流入
する新しい禾使用洗浄液量をlo(夕/min)とし、
外部に排出する洗浄液量lout(夕/min)とする
。
Next, the operating principle of the device of this invention will be explained. FIG. 4 shows a schematic diagram of a cleaning device according to the present invention. In the figure,
6 indicates the flow of the cleaning liquid. 7 is a separation system for washing discharge liquid and circulating liquid; 8 is a mixing system for unused washing liquid and circulating liquid; 13 is a washing tank shown schematically. Let the amount of new cleaning liquid flowing into the cleaning device per minute be lo (night/min),
The amount of cleaning liquid discharged to the outside is set as lout (t/min).

定常状態においては、lo=loutとなる。洗浄装置
の排出側から循遠される液量をIF(夕/min)とす
る。IFは楯還用ポンプなどの能力によって決まる。洗
浄装置の構造と被洗浄物の構造と配置によって決まる洗
浄液の実効使用効率をご(ごく1)とする。通常、ごは
10‐4から10‐1位と考えられる。被洗浄物の汚れ
、界面活性剤等の汚染物の洗浄液に溶解する溶解度〔飽
和溶液における溶媒100のこ対する溶質の量(グラム
数)〕をm(夕)とし、実効熔解速度〔流水状態におけ
る未飽和溶媒100夕に単位時間に溶ける溶質の量(グ
ラム数)のその溶媒に関するその熔質の溶解度に対する
比率〕をn(1/min)とすると、溶解量は、mとn
に比例する。実効溶解速度nは、流速によって異なるの
で、洗浄液を循還させない時を比(1/min)循還ご
せた時をnF(1/min)とあらわす。循遠させたと
きは、被洗浄物近傍での流速が、循遠させないときより
遠いから、nFはnoより大きい。被洗浄物近傍での洗
浄液の実効汚染濃度をQ%とし、分離系8では、汚染濃
度は一様に均質化されているとし、汚染濃度を3%とす
ると、簡単には8=Qご(%〉 (1) とあらわすことができる。
In steady state, lo=lout. Let the amount of liquid circulated from the discharge side of the cleaning device be IF (hours/min). IF is determined by the capacity of the shielding pump, etc. The effective usage efficiency of the cleaning liquid is determined by the structure of the cleaning device and the structure and arrangement of the objects to be cleaned. Usually, rice is considered to be ranked 10-4 to 10-1. The solubility of dirt, surfactants, and other contaminants on the object to be washed is dissolved in the cleaning solution [the amount of solute (in grams) per 100 grams of solvent in a saturated solution] is defined as the effective dissolution rate [in flowing water]. If the ratio of the amount of solute (in grams) dissolved in unsaturated solvent per unit time to the solubility of that solute in that solvent is n (1/min), then the amount dissolved is m and n.
is proportional to. Since the effective dissolution rate n varies depending on the flow rate, the time when the cleaning solution is not circulated is expressed as (1/min), and the time when the cleaning solution can be circulated is expressed as nF (1/min). When circulating, the flow velocity near the object to be cleaned is farther than when not circulating, so nF is larger than no. Assuming that the effective contamination concentration of the cleaning liquid near the object to be cleaned is Q%, and that the contamination concentration is uniformly homogenized in the separation system 8, and the contamination concentration is 3%, then 8 = Q ( %〉 (1) It can be expressed as

ごは洗浄液の実効使用効率で1より4・さし、から8<
Qとなる。したがって、洗浄液を循還させたときの入力
側の汚染濃度は新しい洗浄液と循還した洗浄液が混合系
8にて十分均質化されるとし、y%とすると、簡単には
y=ご¥は(%) く。
The effective usage efficiency of the cleaning solution is 1 to 4, and 8 to 8.
It becomes Q. Therefore, when the cleaning liquid is circulated, the contamination concentration on the input side is assumed that the new cleaning liquid and the recycled cleaning liquid are sufficiently homogenized in the mixing system 8, and if it is y%, then y = ¥ is simply ( %) Ku.

)となりyは8より常に小さい。), and y is always smaller than 8.

洗浄液を循還させないときの被洗浄物からの汚染物溶解
量を地(夕/min)とすると、簡単には鳩=続xど1
0刈 皿)とあらわすことができる。
If the amount of contaminants dissolved from the object to be cleaned when the cleaning solution is not circulated is defined as the amount of contaminants dissolved in the object to be cleaned (minutes/min), then it can be easily expressed as Ha = Continuation x Do1
It can be expressed as 0.

次に洗浄液を循還させたときの被洗浄物からの汚染物溶
解量をMF(夕/min)とすると、簡単には、1F MF={帯6‐続市岡} Xご(L+IF)XnF (W)とあらわす
ことができる。
Next, if the amount of contaminants dissolved from the object to be cleaned when the cleaning solution is circulated is MF (night/min), then simply, 1F MF = {Obi 6-Zoku Ichioka} X (L + IF) XnF ( W).

式(W)を変形すると、MF=高。Transforming equation (W), MF=high.

XどLXnF+辛だ×ごIFXnF (V
) となる。
XdoLXnF+Spicy×GoIFXnF (V
) becomes.

mは3より常に大きく、またnFはnoより大きいから
、式(m)、式(V)よりMFはMoより大きい。この
算定による汚染物の全溶解量の時間変化の模式図を第5
図に示す。図において、実線Aはこの発明による洗浄装
置において洗浄液を循還させたときの全溶解曲線であり
点線Bは、従来の洗浄装置を用いたときの全溶解量であ
る。このように、未使用洗浄液の単位時間当りの消費量
が同じであっても、この発明による洗浄装置によれば、
従来のものより短い洗浄時間にて従来と同じ洗浄効果が
得られる。従って、より少ない洗浄液の使用にてすむ。
なお、上記実施例では、排出液と循還液との分離または
未使用洗浄液と循還液との混合を、洗浄槽とは別に設け
た分離系または混合系によって行ったが、第6図に模式
的断面図を示すような洗浄装置によって洗浄槽の中でお
こなってもよい。
Since m is always greater than 3 and nF is greater than no, MF is greater than Mo from formulas (m) and (V). A schematic diagram of the time change in the total amount of dissolved contaminants based on this calculation is shown in Figure 5.
As shown in the figure. In the figure, the solid line A is the total dissolution curve when the cleaning liquid is circulated in the cleaning device according to the present invention, and the dotted line B is the total dissolution amount when the conventional cleaning device is used. In this way, even if the consumption amount of unused cleaning liquid per unit time is the same, according to the cleaning device according to the present invention,
The same cleaning effect as the conventional one can be obtained in a shorter cleaning time than the conventional one. Therefore, less cleaning liquid can be used.
In the above embodiments, the separation of the discharged liquid and the circulating liquid or the mixing of the unused cleaning liquid and the circulating liquid were carried out using a separation system or a mixing system provided separately from the cleaning tank. The cleaning may be carried out in a cleaning tank using a cleaning device as shown in the schematic cross-sectional view.

第6図に示す洗浄装置においては、循還系の取入口11
は洗浄液の排出口2の近傍に配置し、かつ排出口2の下
面に配置する。楯還系の排出口12は、未使用洗浄液の
取入口の近傍に配置し未使用洗浄液と循還液とがよく混
合するようにする。また、第7図にその模式的断面図を
示す洗浄装置のように分離系と混合系を構成してもよい
。第7図に示す洗浄装置においては、洗浄槽から同一管
にて取出した後、管を二つにわけて排出口2と循還系と
を形成する。第7図において、14は流量バルブである
。15は流量バルブで循還液量を調整するたもにもので
ある。
In the cleaning device shown in FIG. 6, the intake port 11 of the circulation system
is arranged near the outlet 2 of the cleaning liquid and on the lower surface of the outlet 2. The discharge port 12 of the shield system is arranged near the intake port for the unused cleaning liquid so that the unused cleaning liquid and the circulating liquid are well mixed. Furthermore, a separation system and a mixing system may be configured as in the cleaning device whose schematic cross-sectional view is shown in FIG. In the cleaning device shown in FIG. 7, after taking out the same pipe from the cleaning tank, the pipe is divided into two to form the discharge port 2 and the circulation system. In FIG. 7, 14 is a flow valve. Reference numeral 15 is a flow valve for adjusting the amount of circulating fluid.

また、第7図に示すように禾使用洗浄液の敬入口1を循
還用ポンプ10の前にもってきて未使用洗浄液と循還液
を混合させてもよい。また、循還ポンプにフィル夕を取
りつければ、異物等に関し更に有効になる。
Alternatively, as shown in FIG. 7, the inlet 1 for the used cleaning liquid may be brought in front of the circulation pump 10 to mix the unused cleaning liquid and the circulating liquid. Also, if a filter is attached to the circulation pump, it will be even more effective in preventing foreign matter.

なお、この発明は、電子装置等に用いられる基板の高度
な洗浄だけでなく、その他の工業用洗浄装置、家庭用洗
浄装置にも適用できることはいうまでもない。
It goes without saying that the present invention can be applied not only to advanced cleaning of substrates used in electronic devices and the like, but also to other industrial cleaning equipment and household cleaning equipment.

以上詳述したように、この発明による洗浄装置において
は、洗浄液の循還機構を備え、排出液の一部を洗浄装置
に循還させるので、洗浄液の使用効率を増加させること
ができ、少量の洗浄液の使用と短時間の洗浄にて従来と
同様な、かつ十分な洗浄効果が得られ、省資源および製
品のコストの低減、製品の性能の向上をはかることがで
きる。
As described in detail above, the cleaning device according to the present invention is equipped with a cleaning liquid circulation mechanism and circulates a portion of the discharged liquid to the cleaning device, so that the usage efficiency of the cleaning liquid can be increased and a small amount of By using a cleaning liquid and cleaning for a short time, the same and sufficient cleaning effect as before can be obtained, and it is possible to save resources, reduce product costs, and improve product performance.

また、洗浄液の供給量が、限られている時、例えば、上
水の使用において水道管の管径等によって供給量に限度
がある場合、水道管の配管工事をすることなく、実効的
に水量を増加させることができる利点もある。
In addition, when the supply amount of cleaning liquid is limited, for example, when using tap water, the supply amount is limited due to the diameter of the water pipe, etc., and the amount of water can be effectively reduced without doing any plumbing work. It also has the advantage of increasing the

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は従来の洗浄装置の模式的断面図、
第3図はこの発明の一実施例である洗浄装置の模式的断
面図、第4図は実施例装置における洗浄液の流れを示す
模式図、第5図は実施例装置および従来装置における洗
浄時間に対する汚染物全熔解量の関係を示すグラフ、第
6図および第7図はそれぞれこの発明の他の実施例の漠
式的断面図である。 図において、1は未使用洗浄液の取入口、2は洗浄液の
排出口、5は被洗浄物、6は洗浄液の流線、7は排出液
と循還液との分離系、8は未使用洗浄液と循還液との浪
合系、9は循還管、10は楯還用ポンプ、11は循還系
の取入口、12は循還系の排出口である。 なお、図中同一符号はそれぞれ同一または相当部分を示
す。第1図 L,第2図 第3図 第4図 第5図 第6図 第7図
Figures 1 and 2 are schematic cross-sectional views of conventional cleaning equipment;
FIG. 3 is a schematic cross-sectional view of a cleaning device that is an embodiment of the present invention, FIG. 4 is a schematic diagram showing the flow of cleaning liquid in the embodiment device, and FIG. 5 is a diagram showing the cleaning time of the embodiment device and the conventional device. Graphs showing the relationship between the total amount of dissolved contaminants, FIGS. 6 and 7, are vague cross-sectional views of other embodiments of the present invention. In the figure, 1 is an intake port for unused cleaning liquid, 2 is an outlet for cleaning liquid, 5 is an object to be cleaned, 6 is a flow line for cleaning liquid, 7 is a separation system for drained liquid and circulating liquid, and 8 is an unused cleaning liquid 9 is a circulation pipe, 10 is a shielding pump, 11 is an intake port of the circulation system, and 12 is an outlet of the circulation system. Note that the same reference numerals in the figures indicate the same or corresponding parts. Figure 1 L, Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7

Claims (1)

【特許請求の範囲】 1 未使用の洗浄液を外部から取り入れる取入口と洗浄
液を外部へ排出する排出口とを有する洗浄槽、および排
出する洗浄液の一部を循環させ、外部から取り入れる未
使用の洗浄液と混合させる循環系を備えた洗浄装置。 2 洗浄槽本体と排出口との間に外部へ排出する排出液
と循環させる排出液とを分離する分離系を設けたことを
特徴とする特許請求の範囲第1項記載の洗浄装置。 3 洗浄槽本体と取入口との間に外部から取り入れる未
使用の洗浄液と循環されてきた排出液とを混合させる混
合系を設けたことを特徴とする特許請求の範囲第1項ま
たは第2項記載の洗浄装置。 4 循環系の排出液の取入口を洗浄槽本体と外部への排
出口との間の排出管に設けたことを特徴とする特許請求
の範囲第1項記載の洗浄装置。 5 未使用の洗浄液の外部からの取入口を循環系の中途
に設けたことを特徴とする特許請求の範囲第1項、第2
項および第4項のいずれかに記載の洗浄装置。
[Scope of Claims] 1. A cleaning tank having an inlet for taking in unused cleaning liquid from the outside and an outlet for discharging the cleaning liquid to the outside, and a part of the discharged cleaning liquid to be circulated and the unused cleaning liquid to be taken in from the outside. A cleaning device equipped with a circulation system that mixes with 2. The cleaning device according to claim 1, further comprising a separation system between the cleaning tank body and the discharge port to separate the discharged liquid to be discharged to the outside from the discharged liquid to be circulated. 3. Claims 1 or 2, characterized in that a mixing system is provided between the cleaning tank body and the intake port to mix the unused cleaning liquid taken in from the outside with the recycled discharged liquid. The cleaning device described. 4. The cleaning device according to claim 1, wherein the intake port for the discharge liquid of the circulation system is provided in the discharge pipe between the cleaning tank main body and the discharge port to the outside. 5 Claims 1 and 2, characterized in that an intake port for unused cleaning liquid from the outside is provided in the middle of the circulation system.
The cleaning device according to any one of Items 1 and 4.
JP7522077A 1977-06-23 1977-06-23 cleaning equipment Expired JPS6018231B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7522077A JPS6018231B2 (en) 1977-06-23 1977-06-23 cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7522077A JPS6018231B2 (en) 1977-06-23 1977-06-23 cleaning equipment

Publications (2)

Publication Number Publication Date
JPS549458A JPS549458A (en) 1979-01-24
JPS6018231B2 true JPS6018231B2 (en) 1985-05-09

Family

ID=13569910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7522077A Expired JPS6018231B2 (en) 1977-06-23 1977-06-23 cleaning equipment

Country Status (1)

Country Link
JP (1) JPS6018231B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61142135U (en) * 1985-02-26 1986-09-02
JPH03100325A (en) * 1989-09-13 1991-04-25 Mazda Motor Corp Control device of engine with supercharger

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154389U (en) * 1983-03-31 1984-10-16 ソニツク・フエロ−株式会社 Ultrasonic cleaning tank structure
JPH0441988Y2 (en) * 1986-03-18 1992-10-02

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61142135U (en) * 1985-02-26 1986-09-02
JPH03100325A (en) * 1989-09-13 1991-04-25 Mazda Motor Corp Control device of engine with supercharger

Also Published As

Publication number Publication date
JPS549458A (en) 1979-01-24

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