JPS60201877A - Diamond grinding wheel composed of deposited artificial diamond particles - Google Patents

Abstract

PURPOSE:To improve the polishing performance by depositing artificial diamond particles with strong contacting force around coarse convex face of reaction layer with quite limited grain size distribution range. CONSTITUTION:Reaction layer composed of any one of W, MO, Nb and their alloy is applied onto the polishing face of metal or cermet substrate having the polishing face corroded coarsely through etching. Then artificial diamond particles having average grain size of 2-4mum are deposited with distribution area ratio of 50-60% and strong contacting force around the convex coarse face of said reaction layer. Then metal surface layer is formed onto the surface of such diamond grinding wheel through vacuum deposition or galvanization thus to exhibit excellent polishing performance for long term.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a diamond polishing wheel, and particularly to a novel diamond polishing wheel composed of precipitated artificial diamond grains.

Conventionally, diamond polishing wheels have been generally used for grinding and polishing cemented carbide, other cermets, ceramics, glass, and the like.

This conventional diamond abrasive wheel uses resin resin or C as a bonding agent on the abrasive surface of the M or M alloy base.
It has a structure in which natural diamond grains or artificial diamond grains produced by ultra-high pressure and high temperature synthesis are dispersed and bonded using metals such as u or Ni.

Therefore, in the conventional diamond grinding wheel mentioned above,
Not only are natural diamond grains and artificial diamond grains expensive, but the diamond grains that affect the polished surface must be kept within a particle size distribution as narrow as possible, which requires an extremely long classification process. Therefore, the manufacturing cost had to be high.

Therefore, from the above-mentioned viewpoint, the present inventors conducted research in order to manufacture a diamond polishing wheel composed of diamond grains having a particle size distribution within a narrow range at a low manufacturing cost. .

Metals such as Fe, Ni, and co, and alloys containing any of these components as main components, or tungsten carbide (WC) based? - knot,
Titanium carbide (TIC) based cermet, titanium nitride (TI
N)-based cermets and titanium carbonitride (TiCN)-based cermets are used to corrode the abrasive surfaces of the nine bases by etching them with acid or electrolysis. A reaction layer made of W 2 , Mo 2 , Nb, or an alloy thereof is applied to the planarized polishing surface by a conventional chemical vapor deposition method or physical vapor deposition method; or an electrolytic plating method or an electroless plating method. In this case, the thickness of the coating is made as thin as possible so that the etched surface is not smoothed by the reaction layer, and in this state, it is subjected to the usual artificial diamond precipitation method, that is, heating the reaction mixture gas. (a) For example, as a means of activating
A method using a thermionic emitting material as described in Japanese Patent Publication No. 91100, (b) For example, JP-A-58-135117
A method using high frequency plasma discharge as described in the above publication.

(C) A method using microwave plasma discharge as described in JP-A No. 58-110494. When treated by any of the methods (a) to (C) above, the rough surface of the reaction layer Artificial diamond grains begin to precipitate and form with strong adhesion around the convex parts,
The resulting artificial diamond grains have a particle size distribution within an extremely narrow range, so when used as a polishing wheel, they exhibit excellent grinding performance. When the layer is formed by vapor deposition using a normal chemical vapor deposition method or physical vapor deposition method, or when it is formed by plating using an electrolytic plating method or an electroless plating method, the adhesion of the precipitated artificial diamond grains is further improved. In addition, we have found that the manufacturing cost of this diamond polishing wheel is extremely low.

The present invention has been made based on the above findings, and includes: (1) a metal or cermet base whose polishing surface has been roughened by corrosion through etching; and a roughened polishing surface of the base. a reaction layer made of any one of W, Mo, and Nb, or an alloy thereof, coated on the reaction layer; and artificial diamond i formed by precipitation mainly on the rough surface convex portions of the reaction layer. Polishing whetstone.

(2) A metal or cermet base whose polishing surface has been roughened by corrosion through etching, and W, Mo, and Nb coated on the roughened polishing surface of the base.
, and a reaction layer made of any of the alloys thereof; artificial diamond grains precipitated centering on the rough surface convex portions of the reaction layer; and a metal surface having a large amount of vapor deposited or plated on the surface thereof. A diamond polishing wheel consisting of layers and. - It has the following characteristics.

Next, the diamond polishing grindstone of the present invention will be specifically explained using examples.

Example 1 As a substrate, TiN: 3%, TiC: 3%
%, TaC: 3%, Co: 8%, WC: residue, and the dimensions of the polishing surface are near the outer diameter.

A cup-shaped grinding wheel body made of cemented carbide (cermet) with diameter φ x inner diameter 50 Bφ is prepared. First, a voltage of 6 V is applied to the polishing surface of the grinding wheel body using a 10% NaOH aqueous solution as an etching liquid. After the polishing surface was roughened to 58 degrees by electrolytic etching for 2 seconds, it was loaded into an ordinary chemical vapor deposition apparatus, and the reaction gas composition was 2%, WF6:4%, CH30H:
15%, H2: 35%, Ar: remainder.

Reaction gas flow rate: 2t/fox.

Heating temperature of whetstone body: 1000℃.

Reaction time: 20 minutes.

By applying chemical vapor deposition treatment under the conditions, the roughened polishing surface of the grinding wheel body is coated with an average layer thickness.

A 1.2 μm W reaction layer is coated on the grinding wheel body after the chemical vapor deposition treatment, and a thermionic emissive material such as a filament made of metallic tungsten is used as a means for heating and activating the reaction mixture gas. Used, Japanese Patent Application Publication No. 58-9110
A quartz tube having an outer diameter of 120 m x φ was charged into an artificial diamond precipitation generation apparatus as described in Publication No. 0.

Reaction mixture gas composition: CH4/H2-1/1 in volume ratio
00° Distance between the thermionic emitting material and the polishing surface of the grindstone body: 15+
u+.

The atmospheric pressure inside the reaction vessel was 10 torr.

Heating temperature of thermionic radiation material: 2200°C.

The heating temperature of the polishing surface by the thermionic radiation material is near 50
℃.

Reaction treatment time: 20 hours.

By processing under the following conditions, artificial diamond grains having an average grain size of 4 μm were precipitated and formed at a distribution area ratio of 60% on the reaction layer on the polishing surface of the grindstone body.

Next, the resulting diamond polishing wheel of the present invention was used, and furthermore, a surface-coated diamond polishing wheel of the present invention, on which a metal surface layer was formed by electroplating Ni with an average layer thickness of 2 μm under normal conditions, was used. , the polished surface is 2 'i'
0+ K adjusted and plane 10jIJI0 x thickness 5
The time required to polish the polished surface of the silicon nitride-based ceramic specimen having dimensions B to a 0.28 mm diameter was measured. It was also found to be equivalent to the same type of conventional diamond polishing whetstone made of resin.

Example 2 The base is made of brass, and both end surfaces have an outer diameter of 501u.
ILφ×thickness: It has a disc shape with dimensions of 15 fins,
Furthermore, a formed whetstone main body having a convex strip with a radius of 5 mm along the circumference at the center of the outer circumferential surface which becomes the abrasive action surface of the disk is prepared, and first, the abrasive action surface of this whetstone main body is adjusted to 5%. The grinding wheel itself was immersed in a nitric acid aqueous solution for 20 seconds to cause intergranular corrosion, and then the grinding wheel body, whose polishing surface had been roughened by etching, was loaded into a conventional sputtering device and placed in a reaction vessel. Vacuum degree: 2 X 10-t, orr.

Atmosphere: Ar.

A voltage of 1500 V was applied to the Moi or Nb target placed at the top of the reaction vessel.

The voltage applied to the grindstone body, which was placed vertically at the bottom of the reaction container while rotating at a speed of 4 rotations/min, was 200 V.
.

Reaction time: 2 hours.

By performing vapor deposition treatment under the following conditions, M with an average layer thickness of 0.8 μm is applied to the polishing surface (outer peripheral surface) of the grindstone body.
Subsequently, a reaction layer of O or Nb is formed.

After the reaction layer has been formed, the grindstone body is subjected to artificial diamond precipitation as described in Japanese Patent Application Laid-Open No. 110494/1983, which uses plasma discharge by microwaves as a means of heating and activating the reaction mixture. Charged into the generator: Reaction vessel: a quartz tube with a diameter of 120uφ.

Reaction mixture gas composition: CH4/H2/A in volume ratio
r-1/100-/10).

Atmospheric pressure inside the reaction vessel was 0.8 torr.

Microwave: 2.45GHz.

The heating temperature of the grinding wheel body is near 00℃.

Reaction treatment time: 8 hours.

By processing under the following conditions, artificial diamond with an average particle size of 2 μm was precipitated and formed at a distribution area ratio of 50% on the reaction layer made of Mo or Nb on the polishing surface of the grindstone body. .

Next, the resulting reaction layers are each M.

or a diamond polishing wheel of the present invention formed of Nb;
Further, a normal sputtering method was applied to the surface, and the vacuum inside the reaction vessel was set to 2 x 10-''torr.

Atmosphere: Ar+ The applied voltage to the Cu target was -'100OV.

Applied voltage to the grinding wheel (rotating at 4 rotations/min) I CI
OV.

Reaction time: 30 minutes.

Regarding the surface-coated diamond polishing wheel of the present invention, on which a metal surface layer made of Cu with an average layer thickness of 2 μm was deposited under the conditions of When a recess with a radius of 4.8 IIm was formed and the recess was finished polished in a cemented carbide material, it took 120 seconds. Is this the time required for resin? It was equivalent to the same type of conventional diamond polishing whetstone in India.

As mentioned above, the diamond abrasive wheel of the present invention has diamond grains that are bonded together with strong adhesion,
Moreover, the particle size is distributed within an extremely narrow range, so it exhibits excellent polishing performance over a long period of time.Furthermore, diamond grains can be formed by the normal artificial diamond precipitation method, so it is possible to It has industrially useful properties such as the formation of artificial diamond grains and low manufacturing costs.

Applicant: Mitsubishi Metals Corporation Agent Tomi 1) Kazuo Haka 1 person

Claims (2)

[Claims] (1) A metal or cermet base whose polishing surface has been roughened by etching, W, Mo, and Nb coated on the roughened polishing surface of the base, and alloys thereof. A diamond composed of precipitated artificial diamond grains, characterized in that it is composed of: a reaction layer consisting of any one of the following; and artificial diamond grains precipitated around the rough surface convex portions of the reaction layer. Polishing whetstone. (2) A metal or cermet base whose polishing surface has been roughened by corrosion through etching, and W, Mo, and Nb coated on the roughened polishing surface of the base.
, and a reaction layer consisting of any of the alloys thereof. A precipitation formation characterized by comprising: artificial diamond particles formed by precipitation around the rough surface convex portions in the reaction layer; and a metal surface layer formed on the surface by vapor deposition or plating. A diamond polishing whetstone made of artificial diamond grains.