JPS60202437A - Composition for forming photosensitive image - Google Patents
Composition for forming photosensitive imageInfo
- Publication number
- JPS60202437A JPS60202437A JP6025784A JP6025784A JPS60202437A JP S60202437 A JPS60202437 A JP S60202437A JP 6025784 A JP6025784 A JP 6025784A JP 6025784 A JP6025784 A JP 6025784A JP S60202437 A JPS60202437 A JP S60202437A
- Authority
- JP
- Japan
- Prior art keywords
- photochemical reaction
- reaction initiator
- composition
- generating agent
- radical generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims description 20
- 125000002883 imidazolyl group Chemical group 0.000 claims abstract description 6
- 239000000178 monomer Substances 0.000 claims abstract description 6
- 239000003999 initiator Substances 0.000 abstract description 7
- -1 particularly Chemical class 0.000 abstract description 6
- 150000001412 amines Chemical class 0.000 abstract description 2
- 150000003512 tertiary amines Chemical class 0.000 abstract description 2
- 238000006552 photochemical reaction Methods 0.000 abstract 5
- 239000003795 chemical substances by application Substances 0.000 abstract 4
- 239000004305 biphenyl Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- 239000000539 dimer Substances 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 229920001169 thermoplastic Polymers 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000004416 thermosoftening plastic Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 241000607142 Salmonella Species 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- SIVZFLKJXSKCGT-UHFFFAOYSA-N 2-(naphthalen-1-ylamino)acetic acid Chemical compound C1=CC=C2C(NCC(=O)O)=CC=CC2=C1 SIVZFLKJXSKCGT-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- 238000010953 Ames test Methods 0.000 description 2
- 231100000039 Ames test Toxicity 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 231100000693 bioaccumulation Toxicity 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- SEOVTRFCIGRIMH-UHFFFAOYSA-N indole-3-acetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CNC2=C1 SEOVTRFCIGRIMH-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- WUALQPNAHOKFBR-UHFFFAOYSA-N lithium silver Chemical compound [Li].[Ag] WUALQPNAHOKFBR-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 231100000150 mutagenicity / genotoxicity testing Toxicity 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WZZBNLYBHUDSHF-DHLKQENFSA-N 1-[(3s,4s)-4-[8-(2-chloro-4-pyrimidin-2-yloxyphenyl)-7-fluoro-2-methylimidazo[4,5-c]quinolin-1-yl]-3-fluoropiperidin-1-yl]-2-hydroxyethanone Chemical class CC1=NC2=CN=C3C=C(F)C(C=4C(=CC(OC=5N=CC=CN=5)=CC=4)Cl)=CC3=C2N1[C@H]1CCN(C(=O)CO)C[C@@H]1F WZZBNLYBHUDSHF-DHLKQENFSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- GZEYLLPOQRZUDF-UHFFFAOYSA-N 7-(dimethylamino)-4-methylchromen-2-one Chemical compound CC1=CC(=O)OC2=CC(N(C)C)=CC=C21 GZEYLLPOQRZUDF-UHFFFAOYSA-N 0.000 description 1
- XJGFWWJLMVZSIG-UHFFFAOYSA-N 9-aminoacridine Chemical compound C1=CC=C2C(N)=C(C=CC=C3)C3=NC2=C1 XJGFWWJLMVZSIG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- FIZZUEJIOKEFFZ-UHFFFAOYSA-M C3-oxacyanine Chemical compound [I-].O1C2=CC=CC=C2[N+](CC)=C1C=CC=C1N(CC)C2=CC=CC=C2O1 FIZZUEJIOKEFFZ-UHFFFAOYSA-M 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229940123973 Oxygen scavenger Drugs 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- AOPPUZRTOPMJPH-UHFFFAOYSA-N acetic acid;5-chloro-1h-indole Chemical compound CC(O)=O.ClC1=CC=C2NC=CC2=C1 AOPPUZRTOPMJPH-UHFFFAOYSA-N 0.000 description 1
- 150000001251 acridines Chemical class 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229960001441 aminoacridine Drugs 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 231100000704 bioconcentration Toxicity 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- KFUJUTFTRXYQMG-UHFFFAOYSA-N bis[4-(dimethylamino)phenyl]methanethione Chemical compound C1=CC(N(C)C)=CC=C1C(=S)C1=CC=C(N(C)C)C=C1 KFUJUTFTRXYQMG-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- AFYCEAFSNDLKSX-UHFFFAOYSA-N coumarin 460 Chemical compound CC1=CC(=O)OC2=CC(N(CC)CC)=CC=C21 AFYCEAFSNDLKSX-UHFFFAOYSA-N 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000005802 health problem Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000003617 indole-3-acetic acid Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- NRZLHHHHUNKJOP-UHFFFAOYSA-N methyl 4-(diethylamino)benzoate Chemical compound CCN(CC)C1=CC=C(C(=O)OC)C=C1 NRZLHHHHUNKJOP-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 231100000219 mutagenic Toxicity 0.000 description 1
- 230000003505 mutagenic effect Effects 0.000 description 1
- 231100000299 mutagenicity Toxicity 0.000 description 1
- 230000007886 mutagenicity Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000820 toxicity test Toxicity 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は感光性像形成性組成物に関する。さらに詳しく
は本発明は感度が良好で熱安定性に優れ、しかも人体に
対しても安全な感光性像形成性組成物に関する。DETAILED DESCRIPTION OF THE INVENTION This invention relates to photosensitive imageable compositions. More specifically, the present invention relates to a photosensitive image-forming composition that has good sensitivity, excellent thermal stability, and is safe for the human body.
一般に、水系での化学物質は、水生生物で生体濃縮を起
こし1食物連鎖を通して最終的には人体に移動する可能
性があると言われている。このため通産省では化学物質
審査規制法で新規化学物質の魚類の体内における濃縮性
試駆を義務づけている。また化学物質による労働者の健
康障害を防止する目的で、「新規化学物質」を製造また
は輸入しようとする場合にはあらかじめ変異原性試験等
有害性の試験および労働大臣への届は出が労働安全衛生
法で義務付けられている。It is generally said that chemical substances in water systems can bioaccumulate in aquatic organisms and may eventually be transferred to the human body through the food chain. For this reason, the Ministry of International Trade and Industry requires testing of the concentration of new chemical substances in the bodies of fish under the Chemical Substances Examination and Regulation Law. In addition, when manufacturing or importing a "new chemical substance" for the purpose of preventing workers' health problems caused by chemical substances, it is necessary to carry out toxicity tests such as mutagenicity tests and submit a notification to the Minister of Labor in advance. Mandated by the Safety and Health Act.
ところで、感度の良好な感光性組成物としてラジカル発
生剤およびエチレン性不飽和単量体化合物にその他の添
加剤と組合せてヘキサアリ−μビイミダゾール化合物を
使用する写真画像形成性組酸物が知られている。さらに
熱安定性を満足する化合物とし、ては、2位のフェニル
基のオ/l/ソ位にクロル基ヲ有する2、2′−ビス(
0−クロルフエニ/l’ ) −414’15+5’−
テトラキスフェニル・ビ・イミダゾ−1v(以下CI
−HAB Iという)が知られている。しかし、このC
J−IIABI は非ハロゲン系溶剤にほとんど不溶で
あるためこのCJ−TIABIを含むコーティング用ド
ープにはハロゲン系溶剤を使用することが必要であるが
、そのことが一般にコいう欠陥を有する。また、ハロゲ
ン紙を仔する化合物は生物濃縮性、有害性(変異原性)
および非ハロゲン系溶剤適性等で劣る傾向にあることが
一般に知られている。By the way, as a photosensitive composition with good sensitivity, there is known a photographic image-forming acid combination in which a hexaary-μbiimidazole compound is used in combination with a radical generator, an ethylenically unsaturated monomer compound, and other additives. ing. Further, as a compound satisfying thermal stability, 2,2'-bis(
0-chlorpheni/l') -414'15+5'-
Tetrakisphenyl bi-imidazo-1v (hereinafter referred to as CI
-HABI) is known. However, this C
Since J-IIABI is almost insoluble in non-halogenated solvents, it is necessary to use halogenated solvents in coating dopes containing CJ-TIABI, which generally has the following drawbacks. In addition, the compounds that make up halogen paper are bioaccumulative and harmful (mutagenic).
It is generally known that they tend to be inferior in their suitability to non-halogenated solvents.
そこで本発明者らは感光性組成物としての感光性能およ
び熱安定性などの基本性能が優れ、かつ人体に対しても
安全な組成物を得るため鋭意努力した結果、遂に本発明
を完成するに到った。すなわち本発明は、(A)光開始
剤、(B)ラジカル発生剤および(C)付加重合性エチ
レン性不飽和単量体から主としてなり、前記(A)光開
始剤が下記一般式で示される2 、4.5−ドリアリー
ルイミダゾリル二量体であることを特徴とする感光性像
形成性組成物である。Therefore, the present inventors have made earnest efforts to obtain a composition that has excellent basic properties such as photosensitive performance and thermal stability as a photosensitive composition and is also safe for the human body, and as a result, has finally completed the present invention. It has arrived. That is, the present invention mainly consists of (A) a photoinitiator, (B) a radical generator, and (C) an addition polymerizable ethylenically unsaturated monomer, and the (A) photoinitiator is represented by the following general formula. A photosensitive image-forming composition characterized in that it is a 2,4,5-doaryrylimidazolyl dimer.
本発明における前記一般式で示される光開始剤として具
体的には2−(3−ブロム−2−メトキシ−1−フエニ
/k)−4,5−ジフェニルイミダゾリル二量体、2−
(4−クロル−2−エトキシ−1−フェニル)−4,5
−ジフェニルイミダゾリル二量体、2−(5−クロ/L
/−2−メトキシー1−フェニル)−4,5−ジナフチ
ルイミダゾリルニに体、2−(6−フルオr1−2−メ
トギシー1−フエニ/L/) −4,5−ジナフチルイ
ミダゾリルニ1体。Specifically, the photoinitiator represented by the above general formula in the present invention includes 2-(3-bromo-2-methoxy-1-phenylene/k)-4,5-diphenylimidazolyl dimer, 2-
(4-chloro-2-ethoxy-1-phenyl)-4,5
-diphenylimidazolyl dimer, 2-(5-chloro/L
/-2-methoxy1-phenyl)-4,5-dinaphthylimidazolyl, 2-(6-fluoro1-2-methoxy1-phenyl/L/)-4,5-dinaphthylimidazolyl .
2−(2−クロル−3−エトキシ−1−フェニル)−4
,5−ジナフチルイミダゾリルニ椎体、2−(2−クロ
A/−4−ブトキシー1−フェニル)−4゜5−ジフェ
ニルイミダゾリル二量体、2−(2−クロA/−5−メ
トキシー1−フェニル) −4,5−ジフェニルイミダ
ゾリル二量体、2−(2−ブロム−6−メドキシー1−
フェニル) −4,5−ジフェニルイミダゾリル二量体
、2− (2−りT”1V−4,5−ジメトキシ−1−
フェニル)−4,5−ジフェニルイミダゾリル二量体、
2−(5−ブロム−2,3−ジエトキV−1−フェニル
)−4,5−ジフェニルイミダゾリル二量体、2−(2
,3−ジクロル−4,5,6−)ジメトキシ−1−フエ
ニ/L’)−415−ジフェニルイミダゾリル二量体等
が例示される。t7tc、4.5位のフェニル基に炭素
原子数1〜5−
4のアルコキシ基を有する。2−(5−クロル−2−メ
トキシ−1−フェニル)−4,5−ビス(3−メトキシ
−1−フエニ/I/)イミダゾリルニ量体。2-(2-chloro-3-ethoxy-1-phenyl)-4
, 5-dinaphthylimidazolyl divertebral body, 2-(2-chloroA/-4-butoxy-1-phenyl)-4゜5-diphenylimidazolyl dimer, 2-(2-chloroA/-5-methoxy-1 -phenyl) -4,5-diphenylimidazolyl dimer, 2-(2-bromo-6-medoxy1-
phenyl) -4,5-diphenylimidazolyl dimer, 2- (2-riT"1V-4,5-dimethoxy-1-
phenyl)-4,5-diphenylimidazolyl dimer,
2-(5-bromo-2,3-diethoxyV-1-phenyl)-4,5-diphenylimidazolyl dimer, 2-(2
, 3-dichloro-4,5,6-)dimethoxy-1-phenylene/L')-415-diphenylimidazolyl dimer and the like. t7tc, has an alkoxy group having 1 to 5-4 carbon atoms in the phenyl group at the 4.5-position. 2-(5-chloro-2-methoxy-1-phenyl)-4,5-bis(3-methoxy-1-pheny/I/)imidazolyl dimer.
2−(2−クロル−5−エトキシ−1−フエニ/I/)
−4,5−ビス(3−メトキシ−1−フェニル)イ。2-(2-chloro-5-ethoxy-1-pheny/I/)
-4,5-bis(3-methoxy-1-phenyl)i.
ミダゾリルニ量体、2−(2−ブロム−4,5−ジメト
キシ−1−フエニIV )−415−ビス(3−エトキ
シ−1−フェニル)イミダゾリルニ量体等モ1−フェニ
ル)−4,5−ジナフチルイミダゾリル本発明において
ラジカル発生剤としては,栄来二μ体専がある。Midazolyl dimer, 2-(2-bromo-4,5-dimethoxy-1-phenyl IV)-415-bis(3-ethoxy-1-phenyl)imidazolyl dimer isomer 1-phenyl)-4,5- Dinaphthylimidazolyl In the present invention, the radical generator includes Eirai 2μ compound.
からアミン類,特に第三アミン、ロイコ染料,ハロゲン
化炭化水素、N−フェニルグリシン、ミヒラーケトン、
ミヒラーチオケトン、ジメドン、チオ尿素類などが知ら
れており,本発明においてはいずれも使用され得る。な
お、本発明で使用する光開始剤と組合せて顕著な効果を
挙げるラジカル発生剤を櫨々検討した結果,ジメドン、
インド一6一
ル酢酸、N−ナフチルグリシン、5−n−ブチルチオグ
リコール酸、 4.4’−ビス(ジメチルアミノ)ベン
ジル、p−ジアルキルアミノ安息香酸エステル、ロイコ
クリスタルバイオレット、インドギンル酸及びこれらの
誘導体が優れていることが判った0
上記例示の化合物のほかに本発明で使用17得るラジカ
ル発生剤としては、1−クロロインドキシル酸、2−ク
ロロインドキシル酸、 4.4’−ビス(ジエチルアミ
ノ)ベンジル、p−ジエチルアミノ安息香酸メチル、ト
リ(p−ジエチルアミノ−0−トリル)メタン、トリ(
p−ジメチルアミノ−o−トリル)メタン、5−クロロ
−インドール酢酸停を挙げることができる。from amines, especially tertiary amines, leuco dyes, halogenated hydrocarbons, N-phenylglycine, Michler's ketone,
Michler's thioketone, dimedone, thioureas, and the like are known, and any of them can be used in the present invention. In addition, as a result of thorough investigation of radical generators that exhibit remarkable effects in combination with the photoinitiator used in the present invention, dimedone,
Indo-61-acetic acid, N-naphthylglycine, 5-n-butylthioglycolic acid, 4,4'-bis(dimethylamino)benzyl, p-dialkylaminobenzoic acid ester, leuco crystal violet, indoginic acid, and these In addition to the compounds exemplified above, the radical generators used in the present invention include 1-chloroindoxylic acid, 2-chloroindoxylic acid, 4,4'-bis( diethylamino)benzyl, methyl p-diethylaminobenzoate, tri(p-diethylamino-0-tolyl)methane, tri(
Mention may be made of p-dimethylamino-o-tolyl)methane and 5-chloro-indole acetate.
本発明において特定の2.4.5− ) リアリールイ
ミダゾリルy二量体(A)とラジカル発生剤との配合割
合はモル比で2:1乃至1:5の範囲が望ましい。モル
比が2:1を越えると、感度が低下し。In the present invention, the blending ratio of the specific 2.4.5-) realyl imidazolyl y dimer (A) and the radical generator is preferably in the range of 2:1 to 1:5 in terms of molar ratio. When the molar ratio exceeds 2:1, sensitivity decreases.
2:1以下では感度は変化しないが、ラジカル発生剤は
過剰に配合しすぎても慧味がないので1:5以上が好ま
しい。If the ratio is less than 2:1, the sensitivity will not change, but if the radical generator is added too much, there will be no effect, so the ratio is preferably 1:5 or more.
本発明の新規な光重合開始剤系を含有する感光性樹脂組
成物としては主としてエチレン系不飽和化合物と必要に
より熱可塑性結合剤を含有している。本発明における遊
離基ラジカルにより開始され、連鎖成長性である付加重
合によって高分子化合物を形成17うるエチレン系不飽
和化合物としては、シクロヘキシルアクリレート、デシ
ルアクリレ−(・、ラウリルアクリレート等のアルキル
アクリレート類、2−ヒドロキシエチルアクリレート等
の2−ヒドロキシアルキルアクリレートmtN+N−ジ
メチ7レアミノエチルアクリレート等のアミノアルキル
アクリレート類、2−メトキシエチルアクリレート等の
エーテルアルキルアクリレート類、グリンジルアクリレ
ート類、ハロゲン化アルキtV1クリv−ト類、トリメ
チロールプロパントリアクリレート、トリメチロールプ
ロパントリメタクリレート、トリエチレングリコールジ
メタクリレート等の多官能アクリレートが挙げられる。The photosensitive resin composition containing the novel photopolymerization initiator system of the present invention mainly contains an ethylenically unsaturated compound and, if necessary, a thermoplastic binder. In the present invention, the ethylenically unsaturated compounds that can form a polymer compound by chain-growth addition polymerization initiated by a free radical radical include cyclohexyl acrylate, decyl acrylate (.), alkyl acrylates such as lauryl acrylate, and 2 -2-hydroxyalkyl acrylates such as hydroxyethyl acrylate mtN+N-aminoalkyl acrylates such as N-dimethy7leaminoethyl acrylate, ether alkyl acrylates such as 2-methoxyethyl acrylate, grindyl acrylates, halogenated alkyl tV1 clv- Examples include polyfunctional acrylates such as trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, and triethylene glycol dimethacrylate.
熱可塑性重合体の側鎖置換基にエチレン性不飽和基が存
在するもの1例えば式
%式%
で表されるものも挙げることができる・一方、熱可塑性
結合剤は本発明の必須の要件ではないが1種々の可溶性
重合体を組成物の物性調節のため添加することができる
。Thermoplastic polymers in which an ethylenically unsaturated group is present in the side chain substituent 1 For example, those represented by the formula % can also be mentioned. On the other hand, the thermoplastic binder is not an essential requirement of the present invention. However, various soluble polymers can be added to adjust the physical properties of the composition.
上記エチレン系不飽和化合物とともに、光照射によって
全体として溶媒に不溶性となる重合体(光重合性物質と
結合しても17なくてもよい)。Together with the ethylenically unsaturated compound, a polymer (which may or may not be bonded to a photopolymerizable substance) becomes insoluble in a solvent as a whole upon irradiation with light.
例えばポリアミド、ポリアクリル酸エステル、アクリル
酸およびアクリル酸アルキルエステル共重合体メタクリ
ル酸およびメタクリル酸アルキルエステル共重合体、ポ
リビニルフェノール、ポリビニルエステル、ポリアクリ
ルアミド、ポリビニルアルコ−/I/、ポリエチレンオ
キシド、ゼラチン。For example, polyamide, polyacrylic acid ester, acrylic acid and acrylic acid alkyl ester copolymer, methacrylic acid and methacrylic acid alkyl ester copolymer, polyvinylphenol, polyvinyl ester, polyacrylamide, polyvinyl alcohol/I/, polyethylene oxide, gelatin.
9−
セルロースエステル、セルロースエーテル等ノ高分子物
質が熱可塑性結合剤として必要により併用される。9- Polymeric substances such as cellulose esters and cellulose ethers are used in combination as thermoplastic binders if necessary.
熱可塑性結合剤として好適なものはカルボキシル基、フ
ェノール基、スルホン酸基あるいハ酸によって4級化で
きる窒素を含むポリマーである。Suitable thermoplastic binders are nitrogen-containing polymers that can be quaternized with carboxyl groups, phenolic groups, sulfonic acid groups or halonic acid.
前3者は水系アルカリ溶媒で現像可能であり、水洗によ
って洗い落としおよび現像の停止すなわち定着すること
ができる。後者は水系酸溶媒による現像、水洗による定
着が可能である。The former three can be developed with an aqueous alkaline solvent, and can be washed off and development can be stopped, ie, fixed, by washing with water. The latter can be developed with an aqueous acid solvent and fixed by washing with water.
また、増感剤も本発明の必須要件ではないが。Furthermore, a sensitizer is not an essential requirement of the present invention.
次に記すものは添加することにより増8効果が期待でき
る。By adding the following substances, an 8-enhancing effect can be expected.
ヒドロキシフタレイン染料(フルオレセイン。Hydroxyphthalein dye (fluorescein).
エオシン等)、アミノアクリジン染料(3,6−ヒス(
アルキルアミノ)アクリジン類等)、カルボシアン染料
(3,3’−ジエチルオキサカルボシアニンヨーダイド
等)、クマリン(7−シメチルアミノー4−メチルクマ
リン、7−ジエチルアミノ−4−メチルクマリン等)、
p−アミノフエニ〜ヶ10−
トン、フラン、オキサゾール、オギ勺ジアゾール類、芳
香族炭化水素、ペリレン、ピレン類、ビス(p−アミノ
フェニル)−α、β−不飽和ケトン等。eosin etc.), aminoacridine dye (3,6-his(
alkylamino) acridines, etc.), carbocyan dyes (3,3'-diethyloxacarbocyanine iodide, etc.), coumarin (7-dimethylamino-4-methylcoumarin, 7-diethylamino-4-methylcoumarin, etc.),
p-aminophenyl, furan, oxazole, diazole, aromatic hydrocarbons, perylene, pyrene, bis(p-aminophenyl)-α, β-unsaturated ketone, etc.
本発明の感光性樹脂組成物組成物は1凸版1石版印刷版
、非銀系リスフィルム、色校正版等の印刷関連材料の用
途や、或は液状又はフィルム状のフ第1・レジスト、ソ
ルダーマスク等のように電子関連材料用途に供すること
が出来る。The photosensitive resin composition composition of the present invention can be used for printing-related materials such as 1-letterpress 1-lithographic printing plates, non-silver lithography films, and color proofing plates, or as liquid or film resists and solders. It can be used for electronic related materials such as masks.
これらの用途に対する感光性樹脂組成物の標準的な重量
組成は(A)式に示す特定の2.4.5− ト!Jフェ
ニルイミダゾリルニ値体とジメドン、インドール酢酸、
N−ナフチルグリシン、S−アルキルチオグリコール酸
、 4.4’−ビス(ジアルキルアミノ)ベンジ/L/
、I)−ジアルキルアミノ安息香酸エステル、ロイコク
リスタルバイオレット、インドキシル酸及びこれらの誘
導体の中から選ばれた化合物のうち少くとも一種の重櫨
和が0.3〜15%(全組成物に対する重量%)、エチ
レン系不飽和化合物30〜80チ、熱可塑性結合剤0〜
60%。The standard weight composition of the photosensitive resin composition for these uses is the specific 2.4.5-t! shown in formula (A). J phenylimidazolyl divalent body and dimedone, indole acetic acid,
N-naphthylglycine, S-alkylthioglycolic acid, 4.4'-bis(dialkylamino)benzi/L/
, I) -dialkylaminobenzoic acid ester, leuco crystal violet, indoxylic acid, and at least one compound selected from derivatives thereof. %), ethylenically unsaturated compound 30~80%, thermoplastic binder 0~
60%.
好ましくは10〜60%の範囲が一応の基準として選ば
れる。Preferably, a range of 10 to 60% is selected as a tentative standard.
この他に当該技術分野で周知の種々の添加剤が必要に応
じて添加される。これらの添加剤としては、カーボンブ
ラック、酸化チタン、各種金属や金属酸化物の粉末、各
種顔料や染料等の活性光線吸収剤、更には各種のエネル
ギー移送性染料、酸素除去剤、連鎖移動促進剤、熱重合
禁止剤等を挙げることができる。これらの添加剤は一般
に重量で全組成物当り3%以内の少量添加されるが顔料
等が添加される場合には全組成物当り5〜75%の量が
添加されて、UV1il化塗料、インク、更には非銀系
リスフィルム用の組成物とされるのが一般的である。画
像形成性版材の製造には、上記の組成物を通常の塗工技
術により基板上にコート又はシート状に成形することに
より達せられる。本発明においては感光性樹脂層の厚み
が通常10μ以下の薄い場合に特に効果が顕著である。In addition, various additives well known in the art may be added as necessary. These additives include carbon black, titanium oxide, powders of various metals and metal oxides, actinic ray absorbers such as various pigments and dyes, as well as various energy transfer dyes, oxygen scavengers, and chain transfer promoters. , thermal polymerization inhibitors, and the like. These additives are generally added in small amounts within 3% by weight of the total composition, but when pigments are added, they are added in amounts of 5 to 75% of the total composition, such as UV 1il coatings and inks. Furthermore, it is generally used as a composition for non-silver lithium film. The image-forming plate material can be produced by coating the above composition on a substrate or forming it into a sheet by a conventional coating technique. In the present invention, the effect is particularly remarkable when the thickness of the photosensitive resin layer is thin, usually 10 μm or less.
本発明に拘わる光重合可能な画像形成性版材の使用には
一般に適当な原図、パターンマスクと重ね合せて露光し
た後、鏡像プロセスを経て、可視画像として利用される
のであるが、既に述べ友ように本発明の光重合開始剤系
は非ハロゲン系溶剤に可溶であるため、塗工ドープ溶剤
としてハロゲン系溶剤を使用する必要がないので、コー
ターおよびその他の装置を害することがなく、また1蓄
積性(濃縮性)および変異原性(エームス・テスト)も
良好なため、生産および取扱い時の安全性にも優れてい
る。しかも、またすぐれた熱安定性を有する故に、室温
において1年取」二の長期間にわたって性能がほとんど
変化しない。In general, the photopolymerizable image-forming plate material of the present invention is used by superimposing it on a suitable original image or pattern mask, exposing it to light, and then using it as a visible image through a mirror image process. As the photopolymerization initiator system of the present invention is soluble in non-halogenated solvents, there is no need to use halogenated solvents as coating dope solvents, so the coater and other equipment will not be harmed. 1 accumulation (concentration) and mutagenicity (Ames test), it also has excellent safety during production and handling. Moreover, because it has excellent thermal stability, its performance hardly changes over a long period of one year or two at room temperature.
以下に実施例を挙げて本発明を具体的に説明する。The present invention will be specifically described below with reference to Examples.
参考例1゜
第1表に示す光開始剤の各種溶剤に対する溶解度をそれ
ぞれ第1表に併記する。Reference Example 1 The solubility of the photoinitiators shown in Table 1 in various solvents is also shown in Table 1.
13−
第 1 表
参考例2゜
第2表に示す光開始剤を所定量含んだ下記組成物を40
℃で2日間保存し、光開始剤の残存率(%)を測定した
。その結果を第2表に併記する。13- Table 1 Reference Example 2゜The following composition containing a predetermined amount of the photoinitiator shown in Table 2 was
It was stored at ℃ for 2 days, and the residual rate (%) of the photoinitiator was measured. The results are also listed in Table 2.
組成物成分 (f)
光開始剤 o、ooso ’
ジメドン 0.0030 ゛
ポリ(メタクリル酸メチル/メタクリル酸 0.107
0/30モル比)
塩化メチレン/メタノール(3/1重量比)10.00
14−
第 2 表
第2表より明らかなように本発明で用いる光開始剤の残
存率は95チ以上という他と比べて非常に高い値であり
、溶液中での熱安定性が優れていることが判る。Composition Components (f) Photoinitiator o, ooso' Dimedone 0.0030 Poly(methyl methacrylate/methacrylic acid 0.107
0/30 molar ratio) methylene chloride/methanol (3/1 weight ratio) 10.00
14-Table 2 As is clear from Table 2, the residual rate of the photoinitiator used in the present invention is 95% or more, which is a very high value compared to others, and it has excellent thermal stability in the solution. I understand that.
参考例3゜
第3表に示す光開始剤をそれぞれn−オクチルアルコー
ルと水とを入れた分液ロートに入れ、数回振った後、静
置させて6液に溶は几量を測定し。Reference Example 3 The photoinitiators shown in Table 3 were each placed in a separating funnel containing n-octyl alcohol and water, shaken several times, and allowed to stand still to measure the volume of the solution in 6 liquids. .
下式により分配係数を算出した。その結果を第3表に併
記する。The distribution coefficient was calculated using the following formula. The results are also listed in Table 3.
分配係数(ρ)=瞳(0/W ) 第 3 表 なお1分配係数が大きい程生物濃縮性が大きく。Distribution coefficient (ρ) = pupil (0/W) Table 3 Note that the larger the partition coefficient, the greater the bioconcentration.
人体内蓄積性があることが知られており、約3以下であ
れば安全である。It is known that it accumulates in the human body, and it is safe if it is about 3 or less.
参考例4゜
本発明で用いる光開始剤である2−(5−クロル−2−
メトキシ−1−フェニル)−4,5−ジフェニルイミダ
ゾリルニ置体の変異原性試験(AmesTest)をサ
ルモネラ菌(TAIoo、Ta2O)を用いて行なった
ところ、ブランクに対してサルモネラ菌の増加が認めら
れず合格であった。なお、方法としては、溶剤(ジメチ
ルスルホキシド)中に前記光開始剤とサルモネフ菌を添
加し、30℃で48時間培養した後、サルモネラ菌がブ
ランクに対してどの程度増加しているかを測定した。Reference Example 4 2-(5-chloro-2-
When the mutagenicity test (AmesTest) of the methoxy-1-phenyl)-4,5-diphenylimidazolyl monomer was conducted using Salmonella (TAIoo, Ta2O), no increase in Salmonella was observed compared to the blank, and the test was passed. Met. In addition, as a method, the photoinitiator and Salmonef bacteria were added to a solvent (dimethyl sulfoxide), and after culturing at 30°C for 48 hours, the increase in Salmonella bacteria compared to the blank was measured.
実施例1゜
本発明感光性組成物を光重合性層内に顔料等の紫外線遮
断剤を高1度に含有させた非銀系リスフィルムに応用し
た例を以下に示す。Example 1 The following is an example in which the photosensitive composition of the present invention was applied to a non-silver lithium film containing a UV blocker such as a pigment to a high degree in the photopolymerizable layer.
下引き層を有する厚さ100μの二軸延伸ポリエチレン
テレフタレートフィルムに下記の組成よりなる光重合性
層用の組成物をそれぞれ調製し。A composition for a photopolymerizable layer having the following composition was prepared on a biaxially stretched polyethylene terephthalate film having a thickness of 100 μm and having an undercoat layer.
リバースコーターにより厚さ4μの光重合性層をコーテ
ィングした。光重合性層の光学濃度は350〜400m
μの範囲で平均2.6であった。A 4μ thick photopolymerizable layer was coated using a reverse coater. The optical density of the photopolymerizable layer is 350-400m
The average value was 2.6 in the μ range.
17−
さらに光重合性層の上に10チボリビニルアルコール(
ケン化度98〜99モ/I/%、重合度500)水溶液
でコーティングして厚さ2μの保護層を設けた。17- Furthermore, on top of the photopolymerizable layer, 10 tivolivinyl alcohol (
A protective layer having a thickness of 2 μm was provided by coating with an aqueous solution with a degree of saponification of 98 to 99 mo/I/% and a degree of polymerization of 500.
次にこのリスフィルムの上に21v’2ステツプタブレ
ツトを重ねて、超高圧水銀灯(オーク製作所ポリマープ
リンター3000.140W/#/)を使用し ・て露
光した。その後水洗して保設層を除去し、2%炭酸す)
IJウム水溶液に25℃で6秒間浸漬し、水に浸漬して
スポンジでこすって現像した。第4表には、最適露光時
間(ステップタブレットの6段を硬化するのに要する露
光時間)を示した。Next, a 21v'2 step tablet was placed on top of this lithographic film, and exposed using an ultra-high pressure mercury lamp (Oak Seisakusho Polymer Printer 3000.140W/#/). After that, wash with water to remove the storage layer, and add 2% carbonic acid)
The film was developed by immersing it in an IJum aqueous solution at 25° C. for 6 seconds, then immersing it in water and rubbing it with a sponge. Table 4 shows the optimum exposure time (exposure time required to cure 6 steps of the step tablet).
また熱安定性を調べるために試料を40℃のインキュベ
ーター中に一定期間(1ケ月、2ケ月)保存し、未露光
部の感光層を完全に除去するに要18−
する2%欠酸ナトリウム水溶液(25℃)への浸漬時間
および最適露光時間を測定し友。結果をまとめて第4表
に示す。In addition, in order to examine thermal stability, the sample was stored in an incubator at 40°C for a certain period of time (1 month, 2 months), and a 2% sodium oxide aqueous solution was used to completely remove the photosensitive layer in the unexposed area. Measure the immersion time (at 25°C) and the optimal exposure time. The results are summarized in Table 4.
第4表
第4表より明らかなように、本発明で用いる光開始剤は
経時変化のない優れた化合物であることがflJる。As is clear from Table 4, the photoinitiator used in the present invention is an excellent compound that does not change over time.
特許出願人 東洋紡績株式会社 19−Patent applicant: Toyobo Co., Ltd. 19-
Claims (1)
加重合性エチレン性不飽和単鷺体から主としてなり、前
記(A)光開始剤が下記一般式で示される2、4.5−
トリアリールイミダゾリルニ縫体であることを特徴とす
る感光性像形成性組成物。It mainly consists of (A) a photoinitiator, (B) a radical generator, and (C) an addition-polymerizable ethylenically unsaturated monomer, and the photoinitiator (A) is represented by the following general formula: −
A photosensitive image-forming composition characterized in that it is a triaryl imidazolyl di-stitched body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6025784A JPS60202437A (en) | 1984-03-27 | 1984-03-27 | Composition for forming photosensitive image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6025784A JPS60202437A (en) | 1984-03-27 | 1984-03-27 | Composition for forming photosensitive image |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60202437A true JPS60202437A (en) | 1985-10-12 |
Family
ID=13136933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6025784A Pending JPS60202437A (en) | 1984-03-27 | 1984-03-27 | Composition for forming photosensitive image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60202437A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6010824A (en) * | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
| JP2002148797A (en) * | 2001-10-19 | 2002-05-22 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element which uses the same, method for laminating photosensitive resin composition layer, photosensitive resin composition laminated substrate and method for hardening photosensitive resin composition layer |
| JP2002182387A (en) * | 2001-10-19 | 2002-06-26 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element using the same |
| JP2002182385A (en) * | 2001-10-19 | 2002-06-26 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element using the same, method for stacking photosensitive resin composition layer, photosensitive resin composition layer stacked substrate and method for curing photosensitive resin composition layer |
| JP2003091067A (en) * | 2002-06-17 | 2003-03-28 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element using the same |
| WO2007052470A1 (en) | 2005-11-01 | 2007-05-10 | Konica Minolta Medical & Graphic, Inc. | Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate |
-
1984
- 1984-03-27 JP JP6025784A patent/JPS60202437A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6010824A (en) * | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
| JP2002148797A (en) * | 2001-10-19 | 2002-05-22 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element which uses the same, method for laminating photosensitive resin composition layer, photosensitive resin composition laminated substrate and method for hardening photosensitive resin composition layer |
| JP2002182387A (en) * | 2001-10-19 | 2002-06-26 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element using the same |
| JP2002182385A (en) * | 2001-10-19 | 2002-06-26 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element using the same, method for stacking photosensitive resin composition layer, photosensitive resin composition layer stacked substrate and method for curing photosensitive resin composition layer |
| JP2003091067A (en) * | 2002-06-17 | 2003-03-28 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element using the same |
| WO2007052470A1 (en) | 2005-11-01 | 2007-05-10 | Konica Minolta Medical & Graphic, Inc. | Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate |
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