JPS6024372A - Method for making surface of porous member dense - Google Patents
Method for making surface of porous member denseInfo
- Publication number
- JPS6024372A JPS6024372A JP13309883A JP13309883A JPS6024372A JP S6024372 A JPS6024372 A JP S6024372A JP 13309883 A JP13309883 A JP 13309883A JP 13309883 A JP13309883 A JP 13309883A JP S6024372 A JPS6024372 A JP S6024372A
- Authority
- JP
- Japan
- Prior art keywords
- porous
- porous member
- cvd reaction
- densified
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 23
- 238000006243 chemical reaction Methods 0.000 claims abstract description 27
- 239000000919 ceramic Substances 0.000 claims abstract description 23
- 239000011148 porous material Substances 0.000 claims abstract description 23
- 238000010438 heat treatment Methods 0.000 claims abstract description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 5
- 239000007790 solid phase Substances 0.000 claims abstract description 5
- 238000000280 densification Methods 0.000 claims description 18
- 239000012495 reaction gas Substances 0.000 claims description 9
- 238000001556 precipitation Methods 0.000 claims description 6
- 230000006698 induction Effects 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 abstract description 7
- 230000008021 deposition Effects 0.000 abstract description 4
- 239000002344 surface layer Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- 229910010271 silicon carbide Inorganic materials 0.000 description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000007751 thermal spraying Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 241000975357 Salangichthys microdon Species 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- -1 WXMo Chemical class 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 210000003746 feather Anatomy 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は多孔質部材の表面緻密化法に係り、特に、多孔
質セラミックス等の多孔質部材の表面部を有効に緻密化
するに好適な多孔質部材の表面緻密化法に関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a method for densifying the surface of a porous member, and in particular, a porous material suitable for effectively densifying the surface of a porous member such as porous ceramics. This invention relates to a surface densification method for quality parts.
近年高温高強度構造材料として窒化珪素、炭化珪素、サ
イアロン等の非酸化物セラミックス、あるいは酸化アル
ミニウム、酸化ジルコニウム等、いわゆるニューセラミ
ックスが急速にクローズアップされ、多くの研究や開発
がなされている。これらのセラミックスの用途は、ガス
タービンのブレードや燃焼器、ディーゼルエンジンのシ
リンダやピストンその他高温用機械部品として数多くあ
る。In recent years, non-oxide ceramics such as silicon nitride, silicon carbide, and sialon, as well as so-called new ceramics such as aluminum oxide and zirconium oxide, have rapidly attracted attention as high-temperature, high-strength structural materials, and much research and development has been conducted. These ceramics have many uses as gas turbine blades and combustors, diesel engine cylinders and pistons, and other high-temperature mechanical parts.
しかしてセラミックスの中でも多孔質のセラミック部材
は断熱性、吸音性、軽量性、耐熱衝撃性等の点において
優れた特性を有するところから広い範囲の応用が期待さ
れている。ところで通常多孔質セラミック部材は、セラ
ミック粉体の加圧成形密度を低くして焼成を行うか、又
は成形時に揮発性あるいは可燃性物質を添加して焼成を
行う、あるいはシラスのように焼成過程で発泡するよう
なイオ料を用いる、などの方法によって製造されている
。しかしながら、周知の如くセラミックは脆性材料であ
シ、上記のニューセラミックスといえども金属材料に比
べれば亀裂の伝播が速く破断しやすく、その！まの状態
で高強度及び高靭性を要求される材料としては用いるこ
とができないという基本的な欠点を有している。Among ceramics, porous ceramic members have excellent properties in terms of heat insulation, sound absorption, light weight, thermal shock resistance, etc., and are therefore expected to be used in a wide range of applications. By the way, porous ceramic members are usually made by firing the ceramic powder with a low pressure-molding density, or by adding volatile or flammable substances during molding, or by adding volatile or flammable substances during the firing process, such as with whitebait. It is manufactured by methods such as using an ionic material that foams. However, as is well known, ceramics are brittle materials, and even with the new ceramics mentioned above, cracks propagate faster and are more likely to break than metal materials. It has a fundamental drawback that it cannot be used as a material that requires high strength and high toughness in its raw state.
ところで、これらの方法によって製造された従来の多孔
質セラミックスにおいては、その表面も多孔質である。By the way, the surface of conventional porous ceramics manufactured by these methods is also porous.
そのだめに特に耐摩耗性が低重、あるいけ圧縮強度が低
いなどの問題がある。従って、セラミックスを多孔化し
て用いる場合には、特に、このような問題点を改善する
ことが必要とされていた。The downside is that it has particularly low abrasion resistance, low compressive strength, and other problems. Therefore, when ceramics are used in a porous manner, it has been particularly necessary to improve such problems.
このため、従来、多孔化されたセラミックスは、使用目
的及び使用部位に応じて、特に荷重等が加えられる箇所
又は表面部等は緻密化して用いるのが最も合理的とされ
ており、この緻密化法としては、セラミック粉末を塗布
して焼き付ける方法、溶射などが提案されている。この
溶射法は部材の表面に溶融状態の粉末物質を吹き付ける
ようにしたものであるが、多孔質セラミック部材の表面
及びその近傍に分布する孔（ボア）の内部までは十分に
は埋めきれない。また焼き付は法、溶射法のいずれの方
法によっても付着物やコーテイング膜がはがれ易く緻密
化部分が損傷し易いという問題がある。For this reason, it has traditionally been thought that it is most rational to use porous ceramics with densification, especially in areas or surface areas where loads are applied, depending on the purpose and location of use. Proposed methods include coating and baking ceramic powder and thermal spraying. Although this thermal spraying method sprays a molten powder substance onto the surface of a member, it cannot fully fill the inside of the pores distributed on and near the surface of a porous ceramic member. In addition, regardless of whether the baking method or the thermal spraying method is used, there is a problem in that deposits and coating films are likely to peel off and densified portions are likely to be damaged.
本発明の目的は、上記従来技術の問題点を解消し、緻密
化部分が極めて安定化される、多孔質部ノジ′
材の表面緻密化法を提供することにある。An object of the present invention is to provide a method for densifying the surface of a porous nozzle material, which solves the problems of the prior art described above and makes the densified part extremely stable.
この目的を達成するために、本発明の表面緻密化方法は
、ＣＶＤ反応を利用して多孔質体の表面の気孔中に析出
物を析出させ、これにょシ表面を緻密化するようにした
ものであって、少なくとも表面部が連続気孔を有する多
孔質部材の、多孔質表面部のみをＣＶ、Ｄ反応の析出温
度域に加熱しておき、前記連続気孔を経由してＣＶＤ反
応ガスを前記多孔質表面部に供給してＣＶＤ反応させ、
該表面部に固相を析出させることにょシ、該表向部を緻
密化するようにしたものである。In order to achieve this objective, the surface densification method of the present invention utilizes a CVD reaction to deposit precipitates in the pores on the surface of a porous body, thereby densifying the surface of the porous body. Only the porous surface portion of a porous member having continuous pores at least in the surface portion is heated to a precipitation temperature range for CV and D reactions, and the CVD reaction gas is passed through the continuous pores to the porous member. supply to the surface of the material to cause a CVD reaction,
In addition to depositing a solid phase on the surface portion, the surface portion is densified.
以下に本発明を図面を参照して詳細に説明する。The present invention will be explained in detail below with reference to the drawings.
第１図なりし第３図は本発明の一実施例に係る多孔質部
材の断面の概略図である。FIG. 1 and FIG. 3 are schematic cross-sectional views of a porous member according to an embodiment of the present invention.
本発明においては、まず、多孔質部材１の表面部のみを
ＣＶＤ反応の析出温度域に加熱する。In the present invention, first, only the surface portion of the porous member 1 is heated to a precipitation temperature range for CVD reaction.
加熱方法は、多孔質部材の緻密化予定部分のみが加熱さ
れるような方法であればよく、特に限定されないが、高
周波誘導加熱等が有利である。高周波誘導加熱を採用す
る場合、多孔質部材が炭化珪素等の導電性の部材であれ
ばそのままの状態で緻密化予定部分のみに磁界を印加し
て加熱（ジルコニアであれば１０００℃程度以上）され
るが、多孔質部材が非導電性の場合には第１図に示す如
く、多孔質部材１の緻密化予定部分に予め炭素等の導電
性物質を数１０μｍの厚さにコーティング（図中２はコ
ーティングされた層を示す）する等して、導電化処理を
施した後、反応器中に挿入し、高周波コイル３により交
番磁界を印加する等して、高周波誘導加熱するのが有利
である。The heating method may be any method as long as only the portion of the porous member to be densified is heated, and is not particularly limited, but high frequency induction heating or the like is advantageous. When high-frequency induction heating is used, if the porous member is a conductive material such as silicon carbide, it is heated as it is by applying a magnetic field only to the area to be densified (at about 1000°C or more in the case of zirconia). However, if the porous member is non-conductive, as shown in Fig. 1, the portion of the porous member 1 to be densified is coated with a conductive substance such as carbon to a thickness of several tens of micrometers (see Fig. 1). It is advantageous to perform high-frequency induction heating by applying an alternating magnetic field using a high-frequency coil 3 after being subjected to a conductive treatment such as (indicates a coated layer), and then inserted into a reactor. .
本発明においては、加熱は多孔質表面の緻密化予定部の
みがＣＶＤ反応の析出温度となるように保持し、それ以
外の部分は析出温度以下とし、ＣＶＤ反応ガスの通路を
確保する必要があり、これにより、第２図に示す如く、
ＣＶＤ反応ガス４が多孔質部材ｌの気孔を経由して緻密
化予定部（第２図においては炭素コーティング層２）で
ＣＶＤ反応の析出温度域に加熱され、ＣＶ、Ｄ反応析出
物５を析出させることとなる。なお第２図Ａは析出温度
域に加熱される領域を示している。このようにして、加
熱部にＣＶＤ反応ガスを供給し、緻密化を予定する表面
部にＣＶＤ反応析出物の固相を析出させる。そして希望
する緻密化度に緻密化された時点で、加熱及びガス供給
を止め、緻密化を終了する。（第３図参照）
本発明において、多孔質部材としては少なくとも一部の
表面が連続気孔を有する多孔質部材であればよく、その
材質や気孔径分布も任意のものでよい。具体的には、ジ
ルコニア、アルミナ、シリカ、炭化珪素等のセラミック
ス等が掌げられるが、本発明はこれらのセラミックスに
限られず、多孔質状に成形された金属、プラスチック又
はその他の物質でもよい。またＣＶＤ反応で多孔質部材
の連続気孔内に緻密化のために析出される析出物の材質
にも特に限定はなく種々のＣＶＤ反応による析出物質が
採用できる。例えばＷＸＭｏ、、Ｔａ等の金属、その他
、超合金系物質又は炭化珪素等のセラミックス等が挙げ
られる。In the present invention, it is necessary to maintain heating so that only the portion of the porous surface scheduled for densification reaches the deposition temperature for the CVD reaction, and keep the other portions at or below the deposition temperature to ensure a passage for the CVD reaction gas. , As a result, as shown in Figure 2,
The CVD reaction gas 4 passes through the pores of the porous member 1 and is heated to the CVD reaction precipitation temperature range in the area to be densified (the carbon coating layer 2 in FIG. 2), thereby precipitating CV, D reaction precipitates 5. It will be necessary to do so. Note that FIG. 2A shows the region heated to the precipitation temperature range. In this way, the CVD reaction gas is supplied to the heating section, and a solid phase of the CVD reaction precipitate is deposited on the surface portion where densification is planned. Then, when the densification is achieved to a desired degree of densification, heating and gas supply are stopped to complete the densification. (See FIG. 3) In the present invention, the porous member may be any porous member having continuous pores on at least a portion of its surface, and its material and pore size distribution may be arbitrary. Specifically, ceramics such as zirconia, alumina, silica, and silicon carbide can be used, but the present invention is not limited to these ceramics, and metals, plastics, or other materials formed into porous shapes may also be used. Further, there is no particular limitation on the material of the precipitate deposited in the continuous pores of the porous member for densification by the CVD reaction, and various precipitated substances by the CVD reaction can be employed. Examples include metals such as WXMo, Ta, etc., superalloy materials, and ceramics such as silicon carbide.
従って、同一物質により気孔部を緻密化する場合に限ら
れず、多孔質部材の用途に応じて各種の多孔質部材及び
ＣＶＤ反応ガスを選択することガニできる。Therefore, it is not limited to the case where the pores are densified using the same substance, and various porous members and CVD reaction gases can be selected depending on the use of the porous member.
また、緻密化の程度はＣＶＤ反応ガスの供給量又は加熱
時間を調節することにより適宜調整することができる。Furthermore, the degree of densification can be adjusted as appropriate by adjusting the supply amount or heating time of the CVD reaction gas.
以下に本発明を実施例により更に具体的に説明するが本
発明はその要旨を超えない限り、以下の実施例に限定さ
れるものではない。EXAMPLES The present invention will be explained in more detail with reference to examples below, but the present invention is not limited to the following examples unless it exceeds the gist thereof.
実施例１
連続気孔（気孔部６０チ、平均気孔径（２８０μｍ）の
炭化珪素質セラミック体について、本発明法に従って表
面緻密化処理を施１７た。Example 1 A silicon carbide ceramic body with continuous pores (60 pores, average pore diameter (280 μm)) was subjected to surface densification treatment according to the method of the present invention.
セラミック体け３０φＸ５０ｅの円柱状である。まずそ
の端面部を雰囲気コントロール可能な容器に入れ、第１
図に示しだ様な鉄芯入υノ＜ンケーキ型高周波コイルを
近接させると共に、該コイルに５００ ＫＨ２の高周波
電流を流し炭化珪素セラミック体の端面部を加熱した。The ceramic body has a cylindrical shape of 30φ×50e. First, place the end face in a container where the atmosphere can be controlled, and
A υ-shaped high-frequency coil with an iron core as shown in the figure was placed close to the coil, and a high-frequency current of 500 KH2 was passed through the coil to heat the end face of the silicon carbide ceramic body.
端面部近傍にセットされた熱電対によシ温度を検出し、
加熱部の温度を１３００〜１４００℃に保持した。The temperature is detected by a thermocouple set near the end surface,
The temperature of the heating section was maintained at 1300-1400°C.
一方、容器内を不活性ガスにて置換した後に、ＣＨ，５
ｉＣｄ、ガスを容器内に導入し、多孔質孔内部を経由し
て加熱端面部にＣＨ３ＥＩｉＣ１３ガスを供給した。On the other hand, after replacing the inside of the container with inert gas, CH,5
iCd and gas were introduced into the container, and CH3EIiC13 gas was supplied to the heated end surface through the inside of the porous hole.
ＣＨ，５ｉＣｌｓガスは端面加熱部にて分解され、Ｓ、
ｉＧが析出した。CH,5iCls gas is decomposed in the end heating section, and S,
iG was precipitated.
このときの析出速度はほぼ５０μｍ／＝＋であシ３０分
程０析出反応を継続させた後ガスの供給及び加熱を停止
し、次いで徐冷した。The deposition rate at this time was approximately 50 μm/=+. After continuing the precipitation reaction for about 30 minutes, the gas supply and heating were stopped, and then the mixture was slowly cooled.
本試料を容器から取シ出し、切断研磨し光学顕微鏡によ
って観察したところ端面反応析出層は連続的に緻密化さ
れ、その厚みは約２．５羽程度であることが認められた
。When this sample was taken out from the container, cut and polished, and observed under an optical microscope, it was found that the end face reaction precipitated layer was continuously densified, and its thickness was about 2.5 feathers.
又、このようにして緻密化処理された試料と、緻密化処
理前の試料とについて耐摩耗性を比較したところ本発明
によって緻密化処理されたものは未処理のものに対し６
〜７倍高い耐摩耗性を有していることが認められた。（
耐摩耗性の測定は、表面に鋼球を吹きつけこれによる損
耗量を測定することによシ行った。）
実施例２
連続気孔（平均径６３０μｍ）をもつアルミナ系多孔質
セラミック体を用いて、表面の緻密化を行った。用いた
試料の形状は実施例１の場合と同様である。なおアルミ
ナの場合は電気型導度がない絶縁体なので、本実施例に
おいては、緻密化予定部をスラリー状黒鉛中に浸漬後引
きあげることによシ、５０μｍ程度の厚みの黒鉛層を付
着させ導電化処理を行った。In addition, when comparing the wear resistance of the sample densified in this way and the sample before the densification treatment, the one densified according to the present invention was 6 times lower than the untreated one.
It was found to have ~7 times higher wear resistance. (
Wear resistance was measured by blowing a steel ball onto the surface and measuring the amount of wear caused by this. ) Example 2 An alumina-based porous ceramic body having continuous pores (average diameter 630 μm) was used to densify the surface. The shape of the sample used was the same as in Example 1. In the case of alumina, since it is an insulator with no electric type conductivity, in this example, the part to be densified was immersed in slurry graphite and then pulled up, thereby depositing a graphite layer with a thickness of about 50 μm. Conductive treatment was performed.
本試料を実施例１と同様に高周波加熱装置を用いて加熱
しＣＨ３５ｉＣｅ、ガスを多孔質孔を経由して流しだ。This sample was heated using a high-frequency heating device in the same manner as in Example 1, and CH35iCe and gas were allowed to flow through the porous pores.
ＣＨ，５ｉＣｌ、ガスは黒鉛層加熱部にて分解されＳｉ
Ｃが析出した。この状態に１時間保持し反応を継続して
行わせた後冷却し容器から取シ出した。CH, 5iCl, gas is decomposed in the graphite layer heating section and Si
C was precipitated. This state was maintained for 1 hour to continue the reaction, then cooled and taken out from the container.
本試料を切断研磨し光学顕微鏡によって観察すると、Ａ
ｅ２０３骨材の上に黒鉛層があり、その上にＳｉＣ析出
物によって埋められて表面層（端面部）は緻密化してい
ることが認められた。本試料も又緻密化前の試料と比較
すると、ｌＯ倍程度高い耐摩耗性を有していることが認
められた。When this sample was cut and polished and observed under an optical microscope, A
It was observed that there was a graphite layer on the e203 aggregate, and that the surface layer (end surface portion) was denser because it was filled with SiC precipitates. This sample was also found to have wear resistance approximately 10 times higher than that of the sample before densification.
以上の通シ末完明け、連続気孔を有する多孔質部材の多
孔質表面部の気孔内にＣＶＤ反応によってＣＶＤ反応析
出物を析出させるようにしたものであり、このＣＶＤ反
応析出物は投錨効果により気孔壁面と強固に接合されて
おシ、極めて安定した緻密化表面を得ることができる。After completing the above process, CVD reaction precipitates are precipitated by CVD reaction in the pores of the porous surface of a porous member having continuous pores, and the CVD reaction precipitates are caused by the anchoring effect. Since it is firmly bonded to the pore wall surface, an extremely stable densified surface can be obtained.
しかも、本発明方法においては多孔質部材及びＣＶＤ反
応ガスを選択することによシ、用途に応じて各種の特性
の素材を提供することができるという利点がある。Moreover, the method of the present invention has the advantage that by selecting the porous member and the CVD reaction gas, it is possible to provide materials with various characteristics depending on the application.
また加熱部を適宜選択することにより任意の箇所を緻密
化できるうえ、ＣＶＤ反応ガスの供給量及び加熱時間を
１節することによシ、緻密化の程度も任意に調斃できる
。Further, by appropriately selecting the heating section, any part can be densified, and the degree of densification can also be adjusted arbitrarily by adjusting the supply amount of the CVD reaction gas and the heating time.
従って、本発明方法によれば、各種の構造体として多孔
質部材を用いる場合に有用な優れた表面緻密化多孔質部
材を提供することができ、工業的に極めて有利である。Therefore, according to the method of the present invention, it is possible to provide an excellent surface-densified porous member that is useful when porous members are used as various structures, and is extremely advantageous industrially.
第１図ないし第３図は本発明の一実施例を示す概略図で
あり、第１図は多孔質部材の断面図、第２図けＣＶＤ反
応析出物により緻密化している状態を示す断面図、第３
図はＣＶＤ反応析出物により緻密化終了後の状態を示す
断面図である。
ｌ・・・多孔質部材、 ２・・・炭素、３・・・パンケ
ーキ型コイル、
３ａ・・−鉄芯、 ４・・・ＣＶＤ反応ガス、５・・・
ＣＶＤ反応析出物。
代理人 弁理士 重 野 剛1 to 3 are schematic diagrams showing one embodiment of the present invention, in which FIG. 1 is a sectional view of a porous member, and FIG. 2 is a sectional view showing a state in which it is densified by CVD reaction precipitates. , 3rd
The figure is a cross-sectional view showing the state after completion of densification by CVD reaction precipitates. 1...Porous member, 2...Carbon, 3...Pancake-shaped coil, 3a...-Iron core, 4...CVD reaction gas, 5...
CVD reaction deposit. Agent Patent Attorney Tsuyoshi Shigeno
Claims (1)
孔質部材の表面を緻密化する方法において、該多孔質部
材の緻密化予定多孔質表面部のみをＣＶＤ反応の析出温
度域に加熱しておき、前記連続気孔を経由してＣＶＤ反
応ガスを前記緻密化予定多孔質表面部に供給してＣＶＤ
反応させ、該表面部に固相を析出させることによシ、該
表面部を緻密化することを特徴とする多孔質部材の表面
緻密化法。 （２） 多孔質部材が非導電性の部材であシ、該多孔質
部材の緻密化予定部分に予め導電化処理を施した後、該
予定部分を高周波誘導加熱することによｆｉｃＶＤ反応
の析出温度域に加熱することを特徴とする特許請求の範
囲＠１項に記載の表面緻密化法。 （３）該多孔質部材の緻密化予定部分に予め炭素をコー
ティングすることによシ導電化処理を施すことを特徴と
する特許請求の範囲第２項に記載の表面緻密化法。 （４）多孔質部材が多孔質セラミックス部材であること
を特徴とする特許請求の範囲第１項ないし第３項のいず
れか１項に記載の表面緻密化法。[Claims] <11 In a method for densifying the surface of a porous member in which at least the surface portion is porous with continuous pores, only the porous surface portion of the porous member to be densified is heated to a precipitation temperature of a CVD reaction. CVD reaction gas is supplied to the porous surface portion to be densified via the continuous pores to perform CVD.
A method for densifying the surface of a porous member, comprising densifying the surface by causing a reaction to precipitate a solid phase on the surface. (2) If the porous member is a non-conductive member, the portion of the porous member scheduled to be densified is subjected to a conductive treatment in advance, and then the portion scheduled to be densified is subjected to high-frequency induction heating to precipitate the ficVD reaction. The surface densification method according to claim 1, characterized in that heating is performed to a temperature range. (3) The surface densification method according to claim 2, characterized in that the portion of the porous member to be densified is subjected to a conductive treatment by coating carbon in advance. (4) The surface densification method according to any one of claims 1 to 3, wherein the porous member is a porous ceramic member.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13309883A JPS6024372A (en) | 1983-07-21 | 1983-07-21 | Method for making surface of porous member dense |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13309883A JPS6024372A (en) | 1983-07-21 | 1983-07-21 | Method for making surface of porous member dense |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6024372A true JPS6024372A (en) | 1985-02-07 |
| JPS6326194B2 JPS6326194B2 (en) | 1988-05-28 |
Family
ID=15096777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13309883A Granted JPS6024372A (en) | 1983-07-21 | 1983-07-21 | Method for making surface of porous member dense |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6024372A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62200151A (en) * | 1986-02-27 | 1987-09-03 | 株式会社荏原製作所 | Heat pump |
| EP0852223A1 (en) * | 1996-12-04 | 1998-07-08 | European Atomic Energy Community (Euratom) | Method of sealing open-pore ceramic coatings, in particular thermal barriers |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5328872A (en) * | 1976-08-30 | 1978-03-17 | Komatsu Ltd | Machine tool |
-
1983
- 1983-07-21 JP JP13309883A patent/JPS6024372A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5328872A (en) * | 1976-08-30 | 1978-03-17 | Komatsu Ltd | Machine tool |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62200151A (en) * | 1986-02-27 | 1987-09-03 | 株式会社荏原製作所 | Heat pump |
| EP0852223A1 (en) * | 1996-12-04 | 1998-07-08 | European Atomic Energy Community (Euratom) | Method of sealing open-pore ceramic coatings, in particular thermal barriers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6326194B2 (en) | 1988-05-28 |
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