JPS60262402A - Variable resistance unit - Google Patents

Variable resistance unit

Info

Publication number
JPS60262402A
JPS60262402A JP11551385A JP11551385A JPS60262402A JP S60262402 A JPS60262402 A JP S60262402A JP 11551385 A JP11551385 A JP 11551385A JP 11551385 A JP11551385 A JP 11551385A JP S60262402 A JPS60262402 A JP S60262402A
Authority
JP
Japan
Prior art keywords
cam
support beam
variable resistance
flexible
cam surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11551385A
Other languages
Japanese (ja)
Inventor
オーブリ・マイケル・クリツク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
ITT Inc
Original Assignee
Deutsche ITT Industries GmbH
ITT Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH, ITT Industries Inc filed Critical Deutsche ITT Industries GmbH
Publication of JPS60262402A publication Critical patent/JPS60262402A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C10/00—Adjustable resistors
    • H01C10/14—Adjustable resistors adjustable by auxiliary driving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C10/00—Adjustable resistors
    • H01C10/10—Adjustable resistors adjustable by mechanical pressure or force

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Adjustable Resistors (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は可変抵抗装置、即ちポテンショメータ装置(=
関する。
[Detailed description of the invention] [Field of application of the invention] The present invention relates to a variable resistance device, i.e. a potentiometer device (=
related.

〔発明の背景〕[Background of the invention]

本出願人の出願係属中の英国特許出願第8312279
号(J、C,グリーンワット 56)は、第1および第
2本体間の相対回転連動を検出するためのトランスジュ
ーサC二関し、このトランスジューサのセンナ部材は、
回転運動1二よって曲げられる様幅二配列された単結晶
ピエゾ抵抗物質の可撓性薄板材で成るものである。
Applicant's pending UK Patent Application No. 8312279
No. (J, C, Greenwatt 56) relates to a transducer C2 for detecting relative rotational interlocking between first and second bodies, the sensor member of this transducer comprising:
It consists of flexible thin sheets of monocrystalline piezoresistive material arranged in two widths so that they can be bent by rotational motion.

〔発明の課題〕[Problem of invention]

本出願人は、ここ(二類似の構造が可変抵抗装置即ちポ
テンショメータ装置の製造(−採用し得ることを知見し
た。そこでこのようなピエゾ抵抗素子(二よる高精度の
簡単な可変抵抗装置を提供することが本発明の目的であ
る。
The applicant has now discovered that a similar structure can be employed in the manufacture of variable resistance devices or potentiometer devices. It is an object of the present invention to do so.

〔発明の概要〕[Summary of the invention]

本発明のひとつの特徴によれば、可撓性ピエゾ抵抗素子
と、該素子1:曲げ力を加えてそれC二よって素子の電
気抵抗を定める装置とを含む可変抵抗即ちポテンショメ
ータが提供される。
According to one aspect of the invention, a variable resistance or potentiometer is provided which includes a flexible piezoresistive element and a device for applying a bending force C2 to the element and thereby determining the electrical resistance of the element.

本発明の別の特徴によれば、支持ビーム上(二取付けら
れた可撓ピエゾ抵抗素子と、該素子ζ:当接する第1カ
ム面および支持ビーム1二当接する第2カム面を有する
可動カム構体と、前記カム構体を動かすための手段とを
有し、カムの形状の相対関係に対応する距離だけ支持ビ
ーム!二対して1〕記素子が曲げられるようC二なされ
た可変抵抗即ちポテンショメータが提供される。
According to another feature of the invention, there is provided a flexible piezoresistive element mounted on the support beam 1, said element ζ a movable cam having an abutting first cam surface and a movable cam surface having an abutting second cam surface. a support beam having a structure and means for moving said cam structure, a variable resistor or potentiometer arranged so that said element can be bent by a distance corresponding to the relative relationship of the shapes of the cams; provided.

本装置は汎用的なものであるが、例えば高い精度と信頼
性が要求されるチャート記録計、X−Yプロッタおよび
差動圧力記録計(二特に利用されるものである。
Although this device is of general use, it is particularly used in, for example, chart recorders, X-Y plotters, and differential pressure recorders, which require high accuracy and reliability.

〔実施例〕〔Example〕

本発明の実施例を以下添付図面を参照して説明するが、
唯一つの図中C二は本可変抵抗装置の略図を示す。明確
(−するため本装置がその中(二取付けられるハウジン
グは図示しない。
Embodiments of the present invention will be described below with reference to the accompanying drawings.
C2 in the only figure shows a schematic diagram of the present variable resistance device. For clarity, the housing within which the device is mounted is not shown.

図面を参照すると、本装置はプラスチック材から一体成
型した二重カム構体011を有し、該構体はシャツ) 
02上(二取付けられている。カム構体011は、所望
の電気抵抗特性を生じる様な外面形状1′ニジた作動用
、即ち倣いカムα1と、はぼ円形の規準カムα◆とを有
する。各カムは対応カムフォロア(]Fj、(16(二
当接している。
Referring to the drawings, the device has a double cam structure 011 integrally molded from plastic material, which structure is a shirt).
The cam assembly 011 has an operating or copying cam α1 with an outer surface shape 1' which produces the desired electrical resistance characteristics, and a semi-circular reference cam α◆. Each cam is in contact with a corresponding cam follower (]Fj, (16).

本装置のセンサ素子は、可動支持ビームα鶏に一体化さ
れた取付部分α八を介して取付けられた単結晶シリコン
の可撓性薄hvtを有する。ビーム0Iの移動は比較的
薄い可撓性ヒンジ部分−(二よって生ヤ じる。通常両カムフォロア(15,CI@とビームα譜
とはプラスチック材から成型される。有利にはビームa
締と素子025とはカムフォロアQOとαうとにはね(
至)とに)C二よって当接されている。
The sensor element of the device has a flexible thin hvt of monocrystalline silicon attached via an integral mounting part α8 to the movable support beam α. The movement of the beam 0I is caused by a relatively thin flexible hinge part (2). Usually both cam followers (15, CI@ and the beam α) are molded from plastic material. Advantageously, the beam a
The tightening element 025 is the cam follower QO and the α spring (
to) and) are abutted by C2.

センサ素子αηは例えば硼素によってドープされて1個
ないしそれ以上のピエゾ抵抗領域Q]Jが形成されてい
る。通常、素子叩はホイートストンブリッジ抵抗回路罵
二却込まれ、その各抵抗値は素子0ηの無歪状態でブリ
ッジが平衡する様C:なっている。
The sensor element αη is doped, for example with boron, to form one or more piezoresistive regions Q]J. Normally, element damage is rejected by a Wheatstone bridge resistor circuit, and each resistance value is set so that the bridge is balanced in the undistorted state of the element 0η.

抵抗回路(ハ)への接続は支持ビームα9に取付けられ
た導線(ハ)で行う。
Connection to the resistance circuit (c) is made by a conductor (c) attached to the support beam α9.

カム構体α刀を回すと、当接カムフォロアαうを介して
素子が曲げられ、通常20%(二まで抵抗の値が変化し
てブリッジの対応不平衡を生じる。この不平衡信号を図
示しない増幅器で増幅してカム構体の回転位置6二対応
する出カイー号を作ってもよい。
When the cam structure α is rotated, the element is bent through the abutting cam follower α, and the resistance value changes by usually up to 20%, resulting in a corresponding unbalance of the bridge. This unbalance signal is transmitted to an amplifier (not shown). The output signal may be amplified by 2 to produce an output signal corresponding to the rotational position 62 of the cam structure.

好ましくはカムa4はカムの角変位と素子q力の抵抗値
との間5二線形の関係が生じる様な輪郭形状とする。こ
の輪郭形状は使用する特定の素子の歪−抵抗特性を基と
した計算によって定められる。
Preferably, the cam a4 has a contour shape such that a bilinear relationship occurs between the angular displacement of the cam and the resistance value of the element q force. This contour shape is determined by calculations based on the strain-resistance characteristics of the specific element used.

トランスジューサ素子aηはシリコンウニ八からマスキ
ングおよびエツチングすることによって単結晶シリコン
から作られる。通常ウエノ・は抵抗Qηを形成するため
1二加工され、次いでその表裏両面をマスクされる。表
面マスクは素子69間の境界を定め、裏面マスクは各素
子の取付部分を定める。
The transducer element a.eta. is made from single crystal silicon by masking and etching from a silicon substrate. Normally, Ueno is processed to form a resistor Qη, and then its front and back surfaces are masked. The front mask defines the boundaries between elements 69, and the back mask defines the mounting portions of each element.

ウェハは最初各素子の可撓部分を定めるため6二重面か
ら、次いで各素子を分離するため表面からそれぞれエツ
チングされる。通常のエツチングで素子の可撓部分の厚
さを1ミクロン以内(二維持できる非常に一様なカット
ができることが判明した。
The wafer is etched first from the six double sides to define the flexible portion of each element and then from the surface to separate each element. It has been found that conventional etching produces very uniform cuts that maintain the thickness of the flexible portion of the device to within 1 micron.

最後6二接続リード(イ)が、例えばネイルヘッドポン
ディング(二よって施されて抵抗回路(二接続され、次
いで素子は取付部分<lFGによって支持ビーム(至)
(二取付けられる。
The last 6 two connecting leads (A) are connected to the resistor circuit (2) by e.g. nail head bonding (2), and then the element is connected to the support beam (A) by the mounting part <lFG.
(Two installed.

カム構体の離心度の補償は、支持ビームC11l二当接
するカムフォロアαQと規準カムαによって行う。
Compensation for the eccentricity of the cam structure is performed by a cam follower αQ and a reference cam α that are in contact with the support beam C11l.

カム構体Qllを回転すると、センサc1ηの曲がりが
2個のカムの半径の差(二対応する様略二円形カムが規
準ビームを制御する。これがカム構体の非同軸性ないし
離心度の自動的補償るもたらす。
When the cam assembly Qll is rotated, the curvature of the sensor c1η corresponds to the difference in radius of the two cams (2), so that the approximately two-circular cam controls the reference beam. This automatically compensates for non-coaxiality or eccentricity of the cam assembly. bring about.

上述の記載は円形カム(二重するものではあるが、他の
カム構造、例えば円形面またはリニアなカムも使用し得
ることは述べるまでもない。
Although the above description is redundant for circular cams, it goes without saying that other cam structures may also be used, such as circular surface or linear cams.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の実施例に係る可変抵抗装置の概略を示す
斜視図である。 図中、11は可動カム構体、16は第1カム面、14は
第2カム面、is、16はカムフォロア、17は可撓性
ピエゾ抵抗素子、19は支持ビーム、22.23は与圧
ばねを示す。 代理人 弁理士 佐 藤 正 年
The drawing is a perspective view schematically showing a variable resistance device according to an embodiment of the present invention. In the figure, 11 is a movable cam structure, 16 is a first cam surface, 14 is a second cam surface, is, 16 is a cam follower, 17 is a flexible piezoresistive element, 19 is a support beam, and 22.23 is a pressurized spring. shows. Agent Patent Attorney Masatoshi Sato

Claims (6)

【特許請求の範囲】[Claims] (1)可撓性ピエゾ抵抗素子と、前記素子(二曲げ力を
加えて前記素子の電気抵抗を定める部材とを有する可変
抵抗装置。
(1) A variable resistance device comprising a flexible piezoresistance element and a member that applies two bending forces to determine the electrical resistance of the element.
(2)支持ビーム上(二取付けられた可撓性ピエゾ抵抗
素子と、該素子に当接する第1カム面および支持ビーム
c当接する第2カム面を有する可動カム構体と、前記素
子が支持ビームC二対してカムの相対的形状(=対応す
る距離だけ曲げられるよう6二前記力ム構体を動かす手
段とを有する可変抵抗装置。
(2) a movable cam structure having a flexible piezoresistive element mounted on the support beam (2), a first cam surface abutting the element and a second cam surface abutting the support beam; A variable resistance device having a relative shape of the cam relative to C2 (=means for moving said force ram assembly so that it is bent by a corresponding distance).
(3)それぞれ前記各カム1二当接してカムフォロワが
設けられている特許請求の範囲第2項6二記載の装置。
(3) The device according to claim 2, wherein a cam follower is provided in contact with each of the cams 12, respectively.
(4)前記カム構体がプラスチック材製の一体部品であ
る特許請求の範囲第2項1または第6項(二記載の装置
。
(4) The device according to claim 2 (1) or (6) (2), wherein the cam structure is an integral part made of plastic material.
(5)前記第1カム面がカムの角変位と素子の抵抗との
間(二線形の関係を生じる様に輪郭形成されている特許
請求の範囲第2項、第6項または第4項のいずれかひと
つC記載の装置。
(5) The first cam surface is contoured to create a bilinear relationship between the angular displacement of the cam and the resistance of the element. Any one of the devices described in C.
(6)前記支持ビームと可撓性素子とがそれぞれのカム
(二ばねで与圧されている特許請求の範囲第2〜5項の
いずれかひとつ(二記載の装置。
(6) The device according to any one of claims 2 to 5, wherein the support beam and the flexible element are pressurized by respective cams (two springs).
JP11551385A 1984-05-31 1985-05-30 Variable resistance unit Pending JPS60262402A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8413939 1984-05-31
GB08413939A GB2159953B (en) 1984-05-31 1984-05-31 Variable resistance piezo-resistive devices

Publications (1)

Publication Number Publication Date
JPS60262402A true JPS60262402A (en) 1985-12-25

Family

ID=10561762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11551385A Pending JPS60262402A (en) 1984-05-31 1985-05-30 Variable resistance unit

Country Status (2)

Country Link
JP (1) JPS60262402A (en)
GB (1) GB2159953B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6222525B1 (en) 1992-03-05 2001-04-24 Brad A. Armstrong Image controllers with sheet connected sensors
US6906700B1 (en) 1992-03-05 2005-06-14 Anascape 3D controller with vibration
US8674932B2 (en) 1996-07-05 2014-03-18 Anascape, Ltd. Image controller
US6067863A (en) * 1997-08-29 2000-05-30 Eaton Corporation Multiple-function selector utilizing a force sensitive, variable impedance device
EP0899752A1 (en) * 1997-08-29 1999-03-03 Eaton Corporation Rotary movement transducer
DE69816382T2 (en) * 1997-08-29 2004-04-22 Delphi Technologies, Inc., Troy Kipphebelwandler

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1081501A (en) * 1977-11-10 1980-07-15 Ronald Price Diesel fuel pipe transducer
CA1161273A (en) * 1980-07-25 1984-01-31 Bourns Instruments, Inc. Differential pressure transducer with high compliance, constant stress cantilever beam
IT1194839B (en) * 1980-12-22 1988-09-28 Bourns Instr Inc APPARATUS TO MEASURE THE PRESSURE IN PARTICULAR OF A FLUID THAT FLOWS THROUGH AN ORIFICE OR SIMILAR

Also Published As

Publication number Publication date
GB2159953B (en) 1987-08-12
GB2159953A (en) 1985-12-11
GB8413939D0 (en) 1984-07-04

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