JPS6032005A - Radiation resistant optical fiber - Google Patents
Radiation resistant optical fiberInfo
- Publication number
- JPS6032005A JPS6032005A JP58142056A JP14205683A JPS6032005A JP S6032005 A JPS6032005 A JP S6032005A JP 58142056 A JP58142056 A JP 58142056A JP 14205683 A JP14205683 A JP 14205683A JP S6032005 A JPS6032005 A JP S6032005A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optical fiber
- radiation
- buffer layer
- halogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 29
- 230000005855 radiation Effects 0.000 title claims abstract description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 21
- 239000010453 quartz Substances 0.000 claims abstract description 13
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 12
- 150000002367 halogens Chemical class 0.000 claims abstract description 12
- 239000011347 resin Substances 0.000 claims abstract description 11
- 229920005989 resin Polymers 0.000 claims abstract description 11
- 239000000843 powder Substances 0.000 claims abstract description 8
- 230000003287 optical effect Effects 0.000 claims abstract description 6
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 6
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 5
- 239000010703 silicon Substances 0.000 claims description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- 235000012239 silicon dioxide Nutrition 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 4
- 239000011575 calcium Substances 0.000 claims description 4
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 3
- -1 oxidized domicum Chemical compound 0.000 claims description 3
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 2
- IQDXNHZDRQHKEF-UHFFFAOYSA-N dialuminum;dicalcium;dioxido(oxo)silane Chemical group [Al+3].[Al+3].[Ca+2].[Ca+2].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O IQDXNHZDRQHKEF-UHFFFAOYSA-N 0.000 claims description 2
- 229910000464 lead oxide Inorganic materials 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 229920001038 ethylene copolymer Polymers 0.000 claims 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 7
- 238000000354 decomposition reaction Methods 0.000 abstract description 5
- 239000000835 fiber Substances 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 206010073306 Exposure to radiation Diseases 0.000 abstract 1
- 229910052788 barium Inorganic materials 0.000 abstract 1
- 229910052790 beryllium Inorganic materials 0.000 abstract 1
- 229910052793 cadmium Inorganic materials 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910052749 magnesium Inorganic materials 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 42
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers
- G02B6/03616—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference
- G02B6/03622—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference having 2 layers only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/1065—Multiple coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02395—Glass optical fibre with a protective coating, e.g. two layer polymer coating deposited directly on a silica cladding surface during fibre manufacture
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
Abstract
Description
【発明の詳細な説明】
１技術分野
未発明は、ハロゲン捕獲能の高いシリコンバッファ層及
び／又はジャケット層を有する、放射線被曝下での使用
に好適な石英系の耐放射線性光７アイバに関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION 1. Technical field The invention relates to a quartz-based radiation-resistant optical fiber suitable for use under radiation exposure, having a silicon buffer layer and/or jacket layer with high halogen trapping ability. It is.
１１背景技術
原子炉周辺等の放射線被曝下における作業をロボット等
の機械によるものとするため、これに必要な耐放射線性
の光ファイバの提供が要請されＣいる。11 Background Art In order to use machines such as robots to perform work under radiation exposure, such as in the vicinity of nuclear reactors, there is a demand for the provision of radiation-resistant optical fibers necessary for this work.
この要請に応えて従来、図のように、コア部ｌ及びクラ
ッド層２よりなる石英系光ファイバをシ層４及び四フッ
化エチレンーエチレン共重合体のジャケット層５で被覆
した耐放射線性光ファイバが提案されている。これは、
耐熱性をもたせて動力線等との複合ケーブル化を可能と
したジャケット層が放射線被曝下で分解して生成１７た
フッ素系ガスが光ファイバの中心部に浸透することを防
止し、かつ、放射線の石英系光フアイバ部への影響を緩
和ないし無くすためシリコンからなるバッフ１層を設け
たものである。In response to this demand, conventional radiation-resistant optical fibers have been developed in which a quartz-based optical fiber consisting of a core part l and a cladding layer 2 is coated with a cladding layer 4 and a jacket layer 5 of tetrafluoroethylene-ethylene copolymer, as shown in the figure. Fiber has been proposed. this is,
The jacket layer, which has heat resistance and enables composite cables to be combined with power lines, etc., decomposes under radiation exposure and prevents fluorine-based gases produced17 from penetrating into the center of the optical fiber. A single buffer layer made of silicon is provided to reduce or eliminate the influence of the quartz fiber on the silica-based optical fiber section.
しかしながら、バッファ層の浸透防止性が十分でなくこ
の光ファイバは、実用上満足できるものでなか・りた。However, the buffer layer did not have sufficient penetration prevention properties, and this optical fiber was not practically satisfactory.
すなわち、光フアイバ素線がフッ素系ガスの影響を受け
て光損失度が増加し、また機械的強度が低Ｆ（劣化）す
るという欠点があった。That is, the optical fiber wire is affected by the fluorine-based gas, resulting in an increased optical loss and a low mechanical strength (deterioration).
１１１発明の目示
未発明者らは、上記の欠点を克服し、浸透防止性にすぐ
れるバッフ１層等の被覆層を有する光７アイパを開発す
るために鋭意研究を重ねた結果、シリコンバッファ層に
合成ゼオライトの一種でモレキュラーシーブ作用のある
ケイ酸アルミニウムカルシクムの微粉末−を混入させる
ことにより、分解生成したフッ素系ガスがバッファ層を
通過してより内部へと浸透することを著しく抑制しうる
ことを見出し、この知見に基づいて木発Ｉ４１−Ｊをな
すに至った。111 Object of the Invention The inventors have conducted extensive research to overcome the above-mentioned drawbacks and to develop a Hikari 7-iper having a coating layer such as a single layer of buffer that has excellent permeation prevention properties, and have developed a silicone buffer. By mixing fine powder of aluminum calcium silicate, which is a type of synthetic zeolite and has a molecular sieve effect, in the layer, it is significantly suppressed that the fluorine-based gas generated by decomposition passes through the buffer layer and penetrates further into the interior. Based on this knowledge, we developed Kiba I41-J.
すなわち、本発明ｔま、石英系光ファイバをシリコンバ
ッファ層及び含ハロゲン樹脂ジャケット層で被覆した光
ファイバにおいて、シリコンバッファ層及び／又は含ハ
ロゲン樹脂ジャケット層が酸化アルミニクム、その誘導
体、酸化ベリリウム、酸化マグネシクム、酸化力ルシク
ム、酸化パリクム、酸化亜鉛、酸化力ドミクム、二酸化
ケイ素、酸化・スズ又Ｉ／′ｉ酸化鉛の微粉末を少なく
とも１種含有することを特徴とする耐放射線性光ファイ
バを提供するものである。That is, the present invention provides an optical fiber in which a quartz-based optical fiber is coated with a silicon buffer layer and a halogen-containing resin jacket layer, in which the silicon buffer layer and/or the halogen-containing resin jacket layer is made of aluminum oxide, a derivative thereof, beryllium oxide, or aluminum oxide. Provided is a radiation-resistant optical fiber characterized by containing at least one fine powder of magnesium oxide, oxidizing lucicum, pallicum oxide, zinc oxide, oxidizing domicum, silicon dioxide, tin oxide, or I/'i lead oxide. It is something to do.
本発明において光の実質的通路となる石英系光ファイバ
は、ステップ型ないしモディファイド・ステップ型のも
のであってもよいし、グレーデッド型のものであっても
よい。The silica-based optical fiber that serves as a substantial path for light in the present invention may be of a step type or modified step type, or may be of a graded type.
前記石英系光７アイパを被覆するシリコンバッファ層は
、γ線等の放射線の被曝下石英系光７アイパ部を保護す
るためのものである。このシリコンバッファ層は、石英
系光ファイバの外周を直接被覆する状態にあってもよい
し、例えばシリコンブリフート層などを介して被覆する
状態にあってもよい。また、シリコンバッファ層を被覆
するジャケット層は、例えばポリテトラフルオロエチレ
ン、ポリクロロトリアルオロエチレン、ポリフッ化ビニ
リデン、四フッ化エチレンーエチレン共重合体、四フッ
化エチレンー六フッ化プロピレン共重合体、ポリ塩化ビ
ニル、ポリ塩化ビニリデンなどの、放射線被曝下で石英
系光フアイバ部を変質させる分解ガスを生成する含ハロ
ゲン樹脂で形成されてｈる。The silicon buffer layer covering the eyer of the quartz light 7 is intended to protect the eyer portion of the quartz light 7 from being exposed to radiation such as gamma rays. This silicon buffer layer may be in a state in which the outer periphery of the silica-based optical fiber is directly covered, or may be in a state in which it is covered through, for example, a silicon brift layer. Further, the jacket layer covering the silicon buffer layer may be made of, for example, polytetrafluoroethylene, polychlorotrialoethylene, polyvinylidene fluoride, tetrafluoroethylene-ethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, It is made of a halogen-containing resin, such as polyvinyl chloride or polyvinylidene chloride, which generates decomposed gas that alters the quality of the quartz-based optical fiber when exposed to radiation.
本発明におけるシリコンバッファ層、ジャケット層は、
その両方が又はいずれか一方が、例えばＡ４０ｓ、Ｃａ
Ｏ・Ａ４０ｘ −２Ｓ ｉｏｚ ・４ＨｚＯ，Ｂｅ０％
Ｍ１１０．ＣａＯ１ＢａＯ１ＺｎＯ１ＣｄＯ１ＳｉＯｉ
、５ｎＯｚ−ＰｂＯなどの微粉末ｔ−１種又は２種以上
含有するものである。これにｒ ｈ ｔ ｎ ａＢ Ｆ
＜、 ｄ ｚ ：１１１−１ ’／ 、？ −ｖ −
１−／ ｍ ｖ ＆−） ＋ −。The silicon buffer layer and jacket layer in the present invention are
Both or one of them, for example, A40s, Ca
O・A40x-2S ioz・4HzO, Be0%
M110. CaO1BaO1ZnO1CdO1SiOi
, 5nOz-PbO and the like. To this r h t n a B F
<, dz:111-1'/,? −v −
1−/m v &−) + −.
ロゲン樹脂ジャケット層は、該ジャケット層の放射線被
曝によるハロゲン系ガス等の分解生成物を高効率で捕獲
し、該バッファ層を通過して石英系光フアイバ部に到達
する分解生成物を著しく減少させ、実用上十分に満足で
きる耐放射線性光ファイバを与える。前記微粉末の粒度
は、１００μｍ秩下なかんづく０．１−１０μｍ、添加
量は用いる含ノ・ロゲン樹脂の種類、そのジャケット層
の厚さ、所望により設けるシリコンブリフート層の厚さ
などの条件により適宜決定され一通常シリフン又は含１
１０ゲン樹脂１００重量部あたり０．０１〜５重量部で
あるが、粒度共々これらに限定されない。なお、ケイ酸
アルミニ♂ｍｌ孔質体を用いる場合、そのＢＥＴ表面積
２００７ヴｆ歯以上、なかんず＜４００ｍ／ｆ Ｎｍ以
上のものが適当である。The halogen resin jacket layer highly efficiently captures decomposition products such as halogen gases due to radiation exposure of the jacket layer, and significantly reduces the decomposition products that pass through the buffer layer and reach the silica optical fiber section. This provides a radiation-resistant optical fiber that is sufficiently satisfactory for practical use. The particle size of the fine powder is 100 μm or less, or 0.1 to 10 μm, and the amount added depends on conditions such as the type of nitrogen-containing resin used, the thickness of its jacket layer, and the thickness of the silicone brief layer provided if desired. As determined as appropriate, one ordinary silicone or one
The amount is 0.01 to 5 parts by weight per 100 parts by weight of the 10-gen resin, but the particle size is not limited thereto. In addition, when using an aluminum silicate porous body, it is suitable that its BET surface area is 2007 m/f or more, especially <400 m/f Nm or more.
前記シリコンバッファ層の形成は、例えば未加硫のシリ
コンゴムに前記微粉末を加え、これを石英系光７アイパ
に塗布し、焼付けることにより行うことができる。耐放
射線性光７アイパにおけるシリコンバッファ層の厚さは
、通常ｌＯ〜２００μｍ、なかんずく３０〜１２０μｍ
が適当である。他方、含ハロゲン樹脂ジャケット層の厚
さは、限定するものでないが通常０，１〜２０−で十分
である。The silicon buffer layer can be formed, for example, by adding the fine powder to unvulcanized silicone rubber, applying it to a quartz-based optical 7-eyeper, and baking it. The thickness of the silicon buffer layer in the radiation-resistant optical 7 iPa is usually lO ~ 200 μm, especially 30 ~ 120 μm.
is appropriate. On the other hand, the thickness of the halogen-containing resin jacket layer is not particularly limited, but a thickness of 0.1 to 20 is usually sufficient.
未発明の光ファイバは、放射線被曝下で石英系光フアイ
バ部の性能劣化が実質的にほとんどないし全くないもの
であり、ジャケット層の材質を適宜選択することにぶり
、例えば耐熱性等の特性も付与できるものである。The uninvented optical fiber has virtually no or no performance deterioration in the silica-based optical fiber section under radiation exposure, and by appropriately selecting the material of the jacket layer, properties such as heat resistance can be improved. It is something that can be granted.
１ｖ実施例−比較例 次に実施例により本発明をさらに詳細に説明する。1v Example-Comparative Example Next, the present invention will be explained in more detail with reference to Examples.
実施例１
屈鉾平（ｎ２０）ｌ、４５２、直径５０μｍの石英糸ガ
ラスからなるコア部と、ドーノでントとしてＢ％Ｆを含
み、属性率（ｎ２０） ｌ、４３８の石英系ガラスｄ−
らなるステップ型の直径１２５μ〃ｌの石英系光ファイ
バの外周に、液状のシリコンをディップコートしたのち
５００℃の温度で焼付処理しＣ厚さ２５μｍのシリコン
よりなるプリコート層を形成し、ついで、ケイ酸アルミ
ニクムカルシクム（ＣａＯ”Ａｌ５Ｏｉ・２Ｓｉ（ｈ・
４ＨｔＯ；平均粒度０．６〜１μｍ、ＢＥＴ表面積７０
０〜８００ｍン’ｆ”ｈ 、：Ｃ５１００Ｓ、耕正■製
）を１重量％含有するシリコン（ＯＦＩＩＩ、信越シリ
コン社製）からなるバッフ７層を、ディップコーティン
グ方式により、焼付温度５００℃で形成した。層厚は３
８μｍであった。続いて、該バッフ７層の外周に押出方
式により厚さ０．３２５１Ｅ１の四フッ化エチレンーエ
チレン共重合体よりなるジャケット層を形成し、目的物
の耐放射線性光７アイパを得た。Example 1 A core part made of quartz thread glass with a diameter of 50 μm and an attribute ratio (n20) of 438, containing B%F as a donut.
After dip-coating liquid silicon on the outer periphery of a step-type quartz-based optical fiber with a diameter of 125 μl, a precoat layer of silicon with a thickness of 25 μm was formed by baking at a temperature of 500° C.; Aluminum silicate calcium (CaO”Al5Oi・2Si(h・
4HtO; average particle size 0.6-1 μm, BET surface area 70
Seven buff layers made of silicon (OFIII, manufactured by Shin-Etsu Silicon Co., Ltd.) containing 1% by weight of 0 to 800 m'f"h, : C5100S, manufactured by Kosei ■, were formed at a baking temperature of 500°C by a dip coating method. The layer thickness was 3.
It was 8 μm. Subsequently, a jacket layer made of a tetrafluoroethylene-ethylene copolymer having a thickness of 0.3251E1 was formed on the outer periphery of the buff 7 layer by an extrusion method to obtain the target radiation-resistant Hikari 7 Eyepa.
次にこのものの耐放射線性を調べた。すなわち、このも
のにｌ Ｘ １０’ Ｒ／ｈのγ線照射線量率で２０時
間（照射線量：２Ｘ１０７Ｒ）放射線を照射したのち、
０２８８μｍの光の損失増加量を測定した。結果を表に
示しＴ：。Next, we investigated the radiation resistance of this material. That is, after irradiating this object with radiation at a gamma ray irradiation dose rate of 1 x 10' R/h for 20 hours (irradiation dose: 2 x 107 R),
The increase in loss of light at 0.0288 μm was measured. The results are shown in the table.
比較例１．２ ケイ酸アルミニクムカルシクムを用いず又はこ 。Comparative example 1.2 Aluminum silicate calcium is not used.
れに代えてＴｉＯｘを用いたほかは実施例１と同様にし
゛ＣＣ耐放射線性光フアイバ得、その耐放射線性を調べ
た。結果を表に示した。A CC radiation-resistant optical fiber was obtained in the same manner as in Example 1, except that TiOx was used instead, and its radiation resistance was examined. The results are shown in the table.
実施例２
平均粒度２，２〜２．５μｍのケイ酸アルミニクム力ル
シクム（Ｃ５−１００、耕正■製）を用いたｔよかは実
施例１と同様にして耐放射線性光７アイノくを得、その
耐放射線性を調べた。結果を表に示した。Example 2 Using aluminum silicate (C5-100, manufactured by Kosei Corporation) with an average particle size of 2.2 to 2.5 μm, radiation-resistant Hikari 7 Inoku was produced in the same manner as in Example 1. The radiation resistance was investigated. The results are shown in the table.
実施例３〜１２
ケイ酸アルミニクムカルシクムに代え゛〔種々の化合物
を用いたほかＦｉ実施例１と同様にし゛で耐放射線性光
７アイパを得、その耐放射線性を調べた。Examples 3 to 12 Radiation-resistant optical 7-ipers were obtained in the same manner as in Example 1 except that various compounds were used in place of aluminum silicate calcium, and their radiation resistance was investigated.
結果を表に示した。The results are shown in the table.
実施例１１１４
シリコンバッファ層に微粉末を含ませ、６ｄ＝ワりに、
シャグツ、ト層にＰｂＯ又はＣｄＯを含ませた一１２５
ｈＨ％施例１と同様にして耐放射線性光コアイノ＜を得
、その耐放射線性を調べた。結果を表に示ｌ、た。Example 1114 Fine powder is contained in the silicon buffer layer, and 6d=warp.
PbO or CdO contained in the layer 1125
hH% A radiation-resistant photocore was obtained in the same manner as in Example 1, and its radiation resistance was investigated. The results are shown in the table.
実施例１５〜１８
シリコンバッファ層及びジャケット層に種々の微粉末を
含ませたほかは実施例１と同様にして耐放射線性光ファ
イバを得、その耐放射線性を調べた。結果を表に示した
。Examples 15 to 18 Radiation-resistant optical fibers were obtained in the same manner as in Example 1, except that various fine powders were contained in the silicon buffer layer and jacket layer, and their radiation resistance was examined. The results are shown in the table.
図は、耐放射線性光ファイバの構造例を表わした断面図
である。
図中、ｌ＃′ｉフγ部、２Ｉｆｉクラッド層、３＃″ｉ
プリコ一ト層、４はシリコンバッファ層、５はジャケッ
ト層である。
特許出願人 大日日本電線株式会社
代 理 人 藤 木 勉The figure is a cross-sectional view showing an example of the structure of a radiation-resistant optical fiber. In the figure, l#′i fγ part, 2Ifi cladding layer, 3#″i
4 is a silicon buffer layer, and 5 is a jacket layer. Patent applicant: Dainichi Nippon Electric Cable Co., Ltd. Agent: Tsutomu Fujiki
Claims (1)
ゲン樹脂ジャケット層で被覆した光ファイバにおりて、
シリコンバッファ層及ヒ／又ロ含ハロゲン樹脂ジャケッ
ト層が酸化ア／ｌ／ ミ＝クム、その誘導体、酸化ベリ
リウム、酸化マグネシクム、酸化力ルシクム、酸化バリ
クム、酸化亜鉛、酸化力ドミクム、二酸化ケイ素、酸化
スズ又は酸化鉛の微粉末を少なくとも１種含有すること
を特徴とする耐放射線性光ファイバ。 ２ ジャケット層を形成する含ハロゲン樹脂がフッ素樹
脂である特許請求の範囲第１項記載の光７アイパ。 ３ フッ素樹脂が四７ン化エチレンーエチレン共重合体
である特許請求の範囲第２項記載の４ シリコンバッフ
ァ層の含有物がケイ酸アルミニクムカルシクムである特
許請求の範囲第１項記載の光ファイバ。 ５ ケイ酸アルミニクムカルシクムが少なくとも４００
扉１／ｆＮｘのＢＥＴ表面積を有するものである特許請
求の範囲第４項記載の光７アイバ。[Claims] 1. An optical fiber in which a quartz-based optical fiber is coated with a silicon buffer layer and a halogen-containing resin jacket layer,
The silicon buffer layer and the halogen-containing resin jacket layer contain a/l/mi-cum oxide, its derivatives, beryllium oxide, magnesium oxide, oxidized lucicum, varicum oxide, zinc oxide, oxidized domicum, silicon dioxide, oxidized A radiation-resistant optical fiber characterized by containing at least one kind of fine powder of tin or lead oxide. 2. The optical 7-eyeper according to claim 1, wherein the halogen-containing resin forming the jacket layer is a fluororesin. 3. Claim 2, in which the fluororesin is a 47-ethylene-ethylene copolymer. 4. Claim 1, in which the content of the silicone buffer layer is aluminum calcium silicate. optical fiber. 5 At least 400 aluminum silicate calcium
The light 7 eyeglass according to claim 4, wherein the door has a BET surface area of 1/fNx.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58142056A JPS6032005A (en) | 1983-08-02 | 1983-08-02 | Radiation resistant optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58142056A JPS6032005A (en) | 1983-08-02 | 1983-08-02 | Radiation resistant optical fiber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6032005A true JPS6032005A (en) | 1985-02-19 |
Family
ID=15306385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58142056A Pending JPS6032005A (en) | 1983-08-02 | 1983-08-02 | Radiation resistant optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6032005A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6281923U (en) * | 1985-11-08 | 1987-05-25 |
-
1983
- 1983-08-02 JP JP58142056A patent/JPS6032005A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6281923U (en) * | 1985-11-08 | 1987-05-25 |
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