JPS603334B2 - Polymer base material with fluorinated surface - Google Patents
Polymer base material with fluorinated surfaceInfo
- Publication number
- JPS603334B2 JPS603334B2 JP11907577A JP11907577A JPS603334B2 JP S603334 B2 JPS603334 B2 JP S603334B2 JP 11907577 A JP11907577 A JP 11907577A JP 11907577 A JP11907577 A JP 11907577A JP S603334 B2 JPS603334 B2 JP S603334B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- discharge
- film
- fluorine
- polymer base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Treatments Of Macromolecular Shaped Articles (AREA)
- Graft Or Block Polymers (AREA)
Description
【発明の詳細な説明】
本発明は基材の表面のみが弗素樹脂の特性を有する高分
子基材に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a polymer base material in which only the surface of the base material has the characteristics of a fluororesin.
更に詳しく言えば基材表面に含弗素不飽和単量体から形
成されるグラフト重合(共重合)層を有する高分子基材
に関するものである。弗素樹脂は弗素原子によってもた
らされる安定性、耐熱性、耐薬品性、低摩擦係数、目巳
潤滑性、非粘着性、生体適合性などのすぐれた特性を有
している。More specifically, the present invention relates to a polymer base material having a graft polymerization (copolymerization) layer formed from a fluorine-containing unsaturated monomer on the surface of the base material. Fluororesins have excellent properties brought about by fluorine atoms, such as stability, heat resistance, chemical resistance, low coefficient of friction, lubricity, non-adhesion, and biocompatibility.
一方、弗素樹脂は力学的強度に乏しく、不透明であり、
溶融および溶液製膜が困難な事から極薄膜にできない等
の問題を有ている。さらに特に重大な問題は弗素樹脂が
極めて高価な事である。ところで前述した発素樹脂の特
長の多くは弗素樹脂の表面特性に起因するものである。On the other hand, fluororesin has poor mechanical strength and is opaque.
Due to the difficulty of melting and solution casting, there are problems such as the inability to form ultra-thin films. A particularly serious problem is that fluororesins are extremely expensive. By the way, many of the features of the fluororesin mentioned above are due to the surface characteristics of the fluororesin.
そこで弗素樹脂以外の樹脂の表面へ薄層の弗素樹脂層を
設ける事ができれば、力学強度および透明性に優れかつ
耐薬品性に優れた、易滑性、非粘着性、生体適合性の安
価な高分子基材をうる事ができる。従来グラフト重合法
自体は知られている技術であるが、発素化合物の如き特
殊なものをグラフト重合することは試みられていない。
即ち弗素系化合物は溶剤に雛溶であり、溶液系で重合さ
せることは考えられず、考えられるとすれば放射線重合
であるがかかる重合法だと基材そのものを劣化させてし
まうので、絹局弗素系化合物をグラフト重合することは
未だ工業的に試みられていない。本発明者らはこのよう
な高分子基材を得るため鋭意研究の結果本発明に至った
。即ち本発明は高分子基材の表面に、C舷=CHCOO
CH2(CF2)nCF2日(nは0三n三3の整数)
、CH2=C(C瓜)COOCH2(CF2)nCF2
日(nは0または1)、C比:CHCOOCH2CH2
(CF2)hCF2日(nは0または1)、CH2=C
HCOOCH2(CF2)nCF3(nは0ミnミ4の
整数)、C比=C(C凡)COOCH2(CF2)nC
F3(nは0ミnミ2の整数)、CH2=CHCOOC
H2CH2(CF2)nCF3(nは0ミnミ3の整数
)、CH2=C夕(CH3)COOCH2CH2CF3
から選ばれた放電グラフト重合層を有してなる表面が発
素化された高分子基材である。Therefore, if it is possible to provide a thin fluororesin layer on the surface of a resin other than fluororesin, it would be possible to create an inexpensive material that has excellent mechanical strength, transparency, and chemical resistance, is easy to slip, is non-adhesive, and is biocompatible. Polymer base materials can be obtained. Although the graft polymerization method itself is a known technique, no attempt has been made to graft polymerize a special substance such as a generating compound.
In other words, fluorine-based compounds are soluble in solvents, and it is unthinkable to polymerize them in a solution system.If possible, radiation polymerization would be possible, but such a polymerization method would deteriorate the base material itself, so it was not possible to polymerize it in a solution system. Graft polymerization of fluorine-based compounds has not yet been attempted industrially. The present inventors conducted intensive research to obtain such a polymeric base material, and as a result, they arrived at the present invention. That is, in the present invention, on the surface of the polymer base material, C=CHCOO
CH2(CF2)nCF2 days (n is an integer of 03n33)
, CH2=C(Cmelon)COOCH2(CF2)nCF2
day (n is 0 or 1), C ratio: CHCOOCH2CH2
(CF2) hCF2 days (n is 0 or 1), CH2=C
HCOOCH2 (CF2) nCF3 (n is an integer of 0 min n 4), C ratio = C (C general) COOCH2 (CF2) nC
F3 (n is an integer of 0 min n mi 2), CH2=CHCOOC
H2CH2 (CF2) nCF3 (n is an integer of 0 min 3), CH2 = C (CH3) COOCH2CH2CF3
This is a polymeric base material whose surface is made up of a discharge graft polymerization layer selected from the following.
ここでいう高分子基材とは天然高分子、合成高分子基材
のいずれでもよい。The polymer base material here may be either a natural polymer or a synthetic polymer base material.
かかる高分子基材としては弗素樹脂を除く通常の有機高
分子物質で、例えばポリエチレン、ポリプロピレン、再
生セルロース、ジアセテート、トリアセテート、ポリ塩
化ビニル、ポリ塩化ビニリデン、ポリビニールアルコー
ル、ポリスチレン、ポリエステル、ポリカーボネイト、
ポリ酢酸ビニル、ポリウレタン、ポリイミド、ポリアミ
ド、ポリフヱニレンオキサイド、ポリスルホン、ポリア
クリル酸ェステル、ポリメタクリル酸ェステル、シリコ
ーンゴムなど、あるいはこれらの混合物、またはこれら
の単量体からなる共重合物などがある。本発明の高分子
基材の形態はブロック状、板状、フィルム状のものであ
る。Such polymeric base materials include ordinary organic polymeric substances other than fluororesins, such as polyethylene, polypropylene, regenerated cellulose, diacetate, triacetate, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polystyrene, polyester, polycarbonate,
Examples include polyvinyl acetate, polyurethane, polyimide, polyamide, polyphenylene oxide, polysulfone, polyacrylic ester, polymethacrylic ester, silicone rubber, mixtures thereof, and copolymers made of these monomers. . The polymer base material of the present invention has a block-like, plate-like, or film-like form.
ブロック状とは高分子物質の団塊をさすものでその形は
球、立方体、直方体、円柱、中空体などいかなる形のも
のでもよく、特に限定されるものではない。The term "block shape" refers to a block of polymeric material, and its shape may be any shape such as a sphere, cube, rectangular parallelepiped, cylinder, or hollow body, and is not particularly limited.
板状とは一辺が他の二辺より特に短い直方体をさすもの
で、俗に板またはシートと呼ばれる形をした高分子物質
の形態をさす。フィルム状とは一辺が他の二辺に較べ極
めて短い直方体で、一般にその厚さが1から300仏か
らなる高分子物質の形態を言い、一般に当該業者におい
てプラスチックフィルムと呼ばれているものをさす。本
発明でいう放電グラフト重合(共重合)とは活性あるい
は不活性ガス中の高電圧放電に基材をさらし、該基材表
面に活性点を生成した後〆チルメタァクリレート誘導体
などの含弗蓑不飽和単量体に触れさせ該基村表面に該単
量体のグラフト重合(共重合)層を設けるものである。
放電グラフト重合法には次の3つの方法が考えられる。The term "plate-shaped" refers to a rectangular parallelepiped with one side particularly shorter than the other two sides, and refers to the form of a polymeric material that is commonly called a plate or sheet. Film-like refers to the form of a polymeric substance that is a rectangular parallelepiped with one side that is extremely short compared to the other two sides, and whose thickness generally ranges from 1 to 300 mm, and generally refers to what is called a plastic film in the industry. . Discharge graft polymerization (copolymerization) as used in the present invention refers to exposing a base material to high voltage discharge in an active or inert gas to generate active sites on the surface of the base material, and then adding methyl methacrylate derivatives etc. to the base material. A graft polymerization (copolymerization) layer of the monomer is provided on the surface of the substrate by bringing it into contact with an unsaturated monomer.
The following three methods can be considered for the discharge graft polymerization method.
m 放電による活性後、単量体蒸気にふれさせる方法で
、蒸気圧の高い単量体をグラフトする場合に適している
。■ 放電による活性後、単量体溶液にふれさせる方法
で、蒸気圧の低い単量体をグラフトする場合に適してい
る。‘3} 放電による活性後、基材を02または02
を含むガスにふれさせ、次いで加熱した単量体溶液にふ
れさせる方法である。本発明においては上記1〜3の方
法のいずれを使用してもよく、本発明の表面が弗素化さ
れた高分子基材を作る方法には特に限定されるものでは
ない。m This method is suitable for grafting monomers with high vapor pressure by exposing them to monomer vapor after activation by electric discharge. (2) This method is suitable for grafting monomers with low vapor pressure by exposing them to a monomer solution after activation by electrical discharge. '3} After activation by discharge, the substrate is heated to 02 or 02
This is a method in which the monomer is exposed to a gas containing , and then exposed to a heated monomer solution. In the present invention, any of the above-mentioned methods 1 to 3 may be used, and the method for producing the surface-fluorinated polymer base material of the present invention is not particularly limited.
然し本発明者らの研究結果から判断して{11の方法が
より好ましいと言える。表面を活性化する高電圧放電に
おけるガスの種類、ガス圧力、処理装置、処理電源およ
び電極などの種々の要因に応じ適宜選択すべきもので、
特に限定されるものではない。However, judging from the research results of the present inventors, it can be said that the method of {11] is more preferable. It should be selected appropriately depending on various factors such as the type of gas, gas pressure, processing equipment, processing power source, and electrodes in the high voltage discharge that activates the surface.
It is not particularly limited.
要は高電圧(持続電圧200〜500V)放電により処
理すべき基材が活性化され、含弗黍単量体がグラフト重
合されさえすればよい。ただ本発明者らの知見では、活
性の均一性および活性化効率の点からガス圧力0.1〜
20肋Hgさらには0.1〜1仇吻Hgの低圧グロー放
電による処理がより好ましい。使用される不活性ガスは
例えばAr、He、N2等をあげることができる。既に
放電グラフト重合法による各種基材へのアクリル酸、メ
タクリル酸、メチルメタクリレート、酢酸ビニル、ジビ
ニールベンゼン、2ービニールピロリドンのグラフト重
合(共重合)は知られているが、本発明の含弗秦不飽和
単量体が各種高分子基材へ容易に放電グラフト重合(共
重合)可能であり、かっこのようにして形成された薄層
のグラフト重合層を有する基材が弗素樹脂と同機の表面
特性を有するという具体的事実は知られていない。なお
該含弗素不飽和単量体は単独で用いてもよく、あるいは
2種以上を同時に、さらには該含弗素不飽和単豊体と他
の単量体を同時に用いることによって、これらの単量体
からなる共重合グラフト重合層を形成してもよい。In short, it is only necessary that the substrate to be treated be activated by high voltage (sustained voltage 200 to 500 V) discharge and that the fluorine-containing monomer be graft-polymerized. However, according to the findings of the present inventors, from the viewpoint of uniformity of activity and activation efficiency, gas pressure of 0.1 to
Treatment by low-pressure glow discharge of 20 mm Hg, more preferably 0.1 to 1 mm Hg, is more preferable. Examples of the inert gas used include Ar, He, and N2. Graft polymerization (copolymerization) of acrylic acid, methacrylic acid, methyl methacrylate, vinyl acetate, divinylbenzene, and 2-vinylpyrrolidone onto various substrates by discharge graft polymerization is already known, but the method of the present invention uses a fluorine-containing polymer. Qin unsaturated monomers can be easily discharge-grafted polymerized (copolymerized) to various polymeric base materials, and the base material with a thin graft polymerized layer formed like parentheses can be The specific fact that it has surface properties is not known. Note that the fluorine-containing unsaturated monomer may be used alone, or two or more types can be used simultaneously, and furthermore, the fluorine-containing unsaturated monomer and other monomers can be used simultaneously. A copolymerized graft polymer layer may be formed.
本発明の表面が弗素化された高分子基材における含弗素
化合物からなるグラフト重合層は放電にさらす面を選択
する事により、片面もしくは両面あるいは任意のパター
ン状に設ける事ができ、通常200〜2000A程度の
厚さ}こ形成できる。尚本発明の放電グラフト重合法に
おいて、蒸気圧の低い該弗素化合物を用いる場合は温度
を高めて重合処理するが、通常室温〜基材の軟化点まで
の温度範囲で処理される。次に本発明の表面が※素化さ
れた高分子基材の特質のいくつかを挙げる。The graft polymerization layer made of a fluorine-containing compound on the surface-fluorinated polymer base material of the present invention can be provided on one side or both sides or in any pattern by selecting the side to be exposed to electric discharge. A thickness of about 2000A} can be formed. In the discharge graft polymerization method of the present invention, when the fluorine compound having a low vapor pressure is used, the polymerization treatment is carried out at a raised temperature, but the treatment is usually carried out at a temperature ranging from room temperature to the softening point of the base material. Next, some of the characteristics of the surface-treated polymer base material of the present invention will be listed.
‘1} 基材表面が鮫水、綾油性である。{21 非粘
着性である。{3’ 基村の耐薬品性が向上する。‘4
1 易滑‘性である。‘51 透明性がもとの基材に較
べ向上すると共に染色された基材においてはその色の深
み感が向上する。通常、高分子基材の溌水化のため、フ
ッ素樹脂をコーティングすることが行なわれているが、
この場合数Am以上のフッ素樹脂層を設けないとフッ素
樹脂のもつ表面特性は得られない。これはフッ素樹脂層
が薄い場合は高分子基材表面に均一な樹脂層を形成せず
、さらにフッ素原子が表面に配向しないためと解釈され
ている。これに対し、本発明では200〜2000A程
度の厚さ、つまりコーティングに較べ1/10〜1/1
00の厚さでフッ素樹脂特有の性質を発現するといった
従来では考えられない特質が得られる。'1} The surface of the base material is shark water and twill oil. {21 Non-adhesive. {3'Motomura's chemical resistance improves. '4
1. Easy to slip. '51 Transparency is improved compared to the original base material, and the depth of color is improved in the dyed base material. Usually, coating with fluororesin is performed to make polymeric base materials water repellent.
In this case, the surface characteristics of a fluororesin cannot be obtained unless a fluororesin layer with a thickness of several amperes or more is provided. This is interpreted to be because when the fluororesin layer is thin, a uniform resin layer is not formed on the surface of the polymer base material, and furthermore, fluorine atoms are not oriented on the surface. In contrast, in the present invention, the thickness is about 200 to 2000A, that is, 1/10 to 1/1 compared to coating.
With a thickness of 0.00 mm, properties unique to fluororesin can be realized, which was previously unimaginable.
さらにまた本発明には次のような特徴がある。Furthermore, the present invention has the following features.
‘61 基材の力学的特性はもとの基材の特性を有する
ため、弗素樹脂の有する特性に較べ極めて向上する。の
表面の含弗素樹脂層は基材へグラフト重合されている
ため溶媒により溶解流失するような事がなく、極めて耐
久性に富んでいる。またこれらの特質はもとの基材の限
定された面にのみ付与する事も可能である。'61 The mechanical properties of the base material are the same as those of the original base material, so they are significantly improved compared to the properties of fluororesin. Since the fluorine-containing resin layer on the surface is graft-polymerized to the base material, it will not be dissolved or washed away by solvents and is extremely durable. It is also possible to impart these properties only to limited surfaces of the original base material.
以下実施例にて本発明についてより詳細に説明する。The present invention will be explained in more detail in the following examples.
なお当然の事ながら本発明はかかる実施例に示した態様
に限定されるものではない。実施例 1
厚さ60仏の二鞄延伸ポリプロピレンフィルム“トレフ
ァン”(東レ■製)を0.6肋Hgの〜ガス雰園域下で
4kWの目励発振型高周波高電圧電源を用い、50m/
minの処理スピードで放電処理した。Note that, as a matter of course, the present invention is not limited to the embodiments shown in these Examples. Example 1 A two-bag stretched polypropylene film "Torefan" (manufactured by Toray) with a thickness of 60 cm was stretched for 50 m using a 4 kW eye-excited oscillation type high frequency high voltage power supply in a gas atmosphere of 0.6 Hg. /
Discharge treatment was performed at a processing speed of min.
次いで室温にて発生させたCH2:CHCOOCH2C
F2CF2日蒸気を装置内に導入し、5分間談放電処理
基材を該単量体にさらした。CH2:CHCOOCH2C was then generated at room temperature.
F2CF vapor was introduced into the apparatus and the electrical discharge treated substrate was exposed to the monomer for 5 minutes.
このようにして得られたフィルムの全反射赤外吸収スペ
クトルを観察した結果、1755仇‐1にェステル、1
450肌‐1、1240仇‐1、840弧‐1、77反
か‐1、720肌‐1に各々弗化物による強い強度の特
性吸収ピークが観測され、ポリプロピレンフィルム表面
に該弗化物単量体が放電グラフト重合されている事が判
定できた。なおポリプロピレンフィルムの赤外吸収スペ
クトルではこの波数には吸収ピークが存在しない。該フ
ィルムをソツスクレー抽出器に入れフレオン113(C
C12FCCIF2商品名“フレオンTF”、三井フロ
ロケミカル製)を抽出溶媒として2岬時間抽出操作を行
った。As a result of observing the total reflection infrared absorption spectrum of the film obtained in this way, it was found that 1755-1 was ester, 1
Strong characteristic absorption peaks due to fluoride were observed for 450 skin-1, 1240 skin-1, 840 arc-1, 77 skin-1, and 720 skin-1, indicating that the fluoride monomer was present on the polypropylene film surface. It was determined that the polymer had been subjected to discharge graft polymerization. Note that there is no absorption peak at this wave number in the infrared absorption spectrum of the polypropylene film. The film was placed in a Sotscray extractor and Freon 113 (C
An extraction operation was performed for 2 hours using C12FCCIF2 (trade name: Freon TF, manufactured by Mitsui Fluorochemicals) as an extraction solvent.
その後このフィルムの全反射赤外吸収スペクトルを観察
した結果、禾抽出のフィルムと比較して特性吸収ピーク
およびその強度ともほとんど変化していない事が確認さ
れた。この事から該フィルムの表面の含弗素樹脂層は極
めて耐久性にとんでいる事が確認できた。比較例 1
C&=CHCOOCH2CF2CF2日の重合物をポリ
プロピレンフィルム上へ塗布積層する目的で、該単量体
を通常の乳化重合法により重合し、次いでフレオン11
3およびアセトンに溶解した。After that, the total reflection infrared absorption spectrum of this film was observed, and it was confirmed that there was almost no change in the characteristic absorption peak and its intensity compared to that of the film obtained by extracting grains. This confirmed that the fluorine-containing resin layer on the surface of the film was extremely durable. Comparative Example 1 In order to coat and laminate the C&=CHCOOCH2CF2CF2-day polymer onto a polypropylene film, the monomer was polymerized by a normal emulsion polymerization method, and then Freon 11
3 and dissolved in acetone.
然し該重合物はこれらの溶媒に膨補するのみで完全に溶
解せず、該重合物を該フィルム上に塗布積層する事は困
難であった。実施例 2
厚さ100rの二鞠延伸ポリエチレンテレフタレートフ
ィルム“ルミラー”(■東レ製)を0.6肋HgのN2
ガス霧圏域下で水Wの間欠発振型高周波高圧電源を用い
、low/mjnの処理スピードで放電処理した。However, the polymer only swells in these solvents and is not completely dissolved, making it difficult to coat and laminate the polymer onto the film. Example 2 A double-stretched polyethylene terephthalate film “Lumirror” (manufactured by Toray) with a thickness of 100 r was heated with N2 at 0.6 Hg.
Discharge treatment was performed at a processing speed of low/mjn using an intermittent oscillation type high frequency high voltage power source of water W under a gas fog area.
次いで室温にて発生させたCH2=CHCOOCH2C
FよF2日蒸気を装置内に導入し、10分間談放電処理
基材を該単量体にさらした。このようにして得られたフ
ィルムは可視光領域においてポリエチレンテレフタレー
トフイルムと比較して4%程度透明性が良好であった。
また表面張力はポリエチレンテレフタレートフィルムの
44dyne/弧に対し、31dyne/のと低下し、
より穣水性となった。比較例 2
繊維加工用弗秦系綾水綾油剤アサヒガードAG一710
(旭硝子製)を水で希釈分散した2%水溶液にバーコー
タを用いて厚さ100ムの二鞠延伸ポリエチレンテレフ
タレートフイルム上に塗布、次0いで130午0で20
分間乾燥した。CH2=CHCOOCH2C was then generated at room temperature.
Steam was introduced into the apparatus, and the discharge-treated substrate was exposed to the monomer for 10 minutes. The film thus obtained had good transparency in the visible light region by about 4% compared to polyethylene terephthalate film.
In addition, the surface tension decreased to 31 dyne/arc compared to 44 dyne/arc of polyethylene terephthalate film,
It became more watery. Comparative Example 2 Asahi Guard AG-710, a Hiraha-based twill oil for textile processing
(manufactured by Asahi Glass Co., Ltd.) was diluted and dispersed with water and applied to a 2% aqueous solution using a bar coater on a 100 mm thick stretched polyethylene terephthalate film.
Dry for a minute.
こうして得られたフィルムの表面張力は31dyne′
肌以下であったが、表面に水を滴下すると容易に弗素系
樹脂被膜が溶解剥離した。The surface tension of the film thus obtained is 31 dyne'
Although it was below skin level, the fluorine resin coating easily dissolved and peeled off when water was dropped onto the surface.
この鏡向は表面張力測定時にも見られ、表面張力の正確
な測定5は困難であった。実施例 3
厚さ12ムの二鞠延伸ポリエチレンテレフタレートフイ
ルム“ルミラー”(■東レ製)を1肌HgのArガス雰
圏域下で小Wの目励発振型高周波高電0圧電源を用い、
20の/mjnの処理スピードで放電処理した。This mirror orientation was also observed during surface tension measurement, making it difficult to accurately measure surface tension. Example 3 A 12 mm thick double-stretched polyethylene terephthalate film "Lumirror" (manufactured by Toray) was heated in an Ar gas atmosphere of 1 Hg using a small W eye excitation oscillation type high frequency high voltage 0 voltage power supply.
The discharge treatment was performed at a treatment speed of 20/mjn.
次いで室温にて生成したCH2=CHCOOCH2C比
CF2CF2CF8蒸気を装置内に導入し〜5分間談放
電処理基村を該単豊体にさらした。このようにして得ら
れたフィルムの表面張力は18dyne/弧で、極めて
良好な溌水、溌油性能を示した。Next, CH2=CHCOOCH2C ratio CF2CF2CF8 vapor generated at room temperature was introduced into the apparatus, and the discharge-treated Motomura was exposed to the single enrichment body for ~5 minutes. The film thus obtained had a surface tension of 18 dyne/arc, and exhibited extremely good water and oil repellency.
実施例 4〜22
実施例3と同様にして二軸延伸ポリエチレンテレフタレ
ートフィルム“ルミラー”に表1の含フッ素単量体を放
電グラフト重合した。Examples 4 to 22 In the same manner as in Example 3, the fluorine-containing monomers shown in Table 1 were subjected to discharge graft polymerization onto the biaxially oriented polyethylene terephthalate film "Lumirror".
放電処理条*件および含フッ素単量体にさらす時間は実
施例3と同一条件で行なった。放電グラフト重合したフ
ィルムの表面張力を測定したところ表1の如くいずれも
表面張力が低下し、含フッ素単量体重合物のもつ表面張
力に近い値が得られた。The discharge treatment conditions and the exposure time to the fluorine-containing monomer were the same as in Example 3. When the surface tension of the discharge graft polymerized films was measured, as shown in Table 1, the surface tension decreased in all cases, and a value close to that of the fluorine-containing monomer polymer was obtained.
表 1
比較例 3、4
実施例3と同様にして二鞠延伸ポリエチレンテレフタレ
ートフイルム“ルミラー”に極めてラジカル重合しやす
い含フッ素単量体である{1)CF2=CF2、■ C
F2=CFCIを放電グラフト重合した。Table 1 Comparative Examples 3 and 4 In the same manner as in Example 3, a fluorine-containing monomer that is extremely easy to radically polymerize into double-stretched polyethylene terephthalate film "Lumirror" {1) CF2=CF2, ■C
F2=CFCI was subjected to discharge graft polymerization.
放電処理条件および含フッ素単量体にさらす時間は実施
例3と同一条件で行なった。該放電グラフト重合フィル
ムの表面張力は、‘1’CF2=CF2、単量体では4
0d肌e′伽■ CF2=CFCIでは4幻如e/弧と
放電処理のみのフィルム(65dy股/伽)に較べると
著しく低下しているが、未処理フィルム(44dyne
/肌)に較べると僅かな低下しか認められず、実施例1
〜22に較べると放電グラフト重合の効果は著しく低か
った。The discharge treatment conditions and the exposure time to the fluorine-containing monomer were the same as in Example 3. The surface tension of the discharge graft polymerized film is '1'CF2=CF2, 4 for the monomer.
0d skin e′伽■ CF2 = CFCI is significantly lower than the film with only 4 phantom e/arc and discharge treatment (65dy crotch/伽), but the untreated film (44dyne
/skin), only a slight decrease was observed compared to Example 1.
-22, the effect of discharge graft polymerization was significantly lower.
Claims (1)
2(CF_2)_nCF_2H(nは0≦n≦3の整数
)、CH_2=C(CH_3)COOCH_2(CF_
2)_nCF_2H(nは0または1)、CH_2=C
HCOOCH_2CH_2(CF_2)_nCF_2H
(nは0または1)、CH_2=CHCOOCH_2(
CF_2)_nCF_3(nは0≦n≦4の整数)、C
H_2=C(CH_3)COOCH_2(CF_2)_
nCF_3(nは0≦n≦2の整数)、CH_2=CH
COOCH_2CH_2(CF_2)_nCF_3(n
は0≦n≦3の整数)、CH_2=C(CH_3)CO
OCH_2CH_2CF_3から選ばれた放電グラフト
重合層を有してなる表面が弗素化された高分子基材。1 On the surface of the polymer base material, CH_2=CHCOOCH_
2(CF_2)_nCF_2H (n is an integer of 0≦n≦3), CH_2=C(CH_3)COOCH_2(CF_
2)_nCF_2H (n is 0 or 1), CH_2=C
HCOOCH_2CH_2(CF_2)_nCF_2H
(n is 0 or 1), CH_2=CHCOOCH_2(
CF_2)_nCF_3 (n is an integer of 0≦n≦4), C
H_2=C(CH_3)COOCH_2(CF_2)_
nCF_3 (n is an integer of 0≦n≦2), CH_2=CH
COOCH_2CH_2(CF_2)_nCF_3(n
is an integer of 0≦n≦3), CH_2=C(CH_3)CO
A polymer base material whose surface is fluorinated and has a discharge graft polymerization layer selected from OCH_2CH_2CF_3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11907577A JPS603334B2 (en) | 1977-10-05 | 1977-10-05 | Polymer base material with fluorinated surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11907577A JPS603334B2 (en) | 1977-10-05 | 1977-10-05 | Polymer base material with fluorinated surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5456671A JPS5456671A (en) | 1979-05-07 |
| JPS603334B2 true JPS603334B2 (en) | 1985-01-28 |
Family
ID=14752251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11907577A Expired JPS603334B2 (en) | 1977-10-05 | 1977-10-05 | Polymer base material with fluorinated surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS603334B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56118430A (en) * | 1980-02-26 | 1981-09-17 | Toray Ind Inc | Vinyl chloride resin molded article in which surface is modified |
| JPS5891728A (en) * | 1981-11-27 | 1983-05-31 | Daikin Ind Ltd | Polyimide or polyamideimide film having fluorine-treated surface and its bonding |
| JPS59213737A (en) * | 1983-05-19 | 1984-12-03 | Kuraray Co Ltd | Surface treated material having different characteristic function and production thereof |
| US4666991A (en) * | 1984-11-05 | 1987-05-19 | Sagami Chemical Research Center | Fluorine-containing graft copolymer and adhesive and composite membrane made thereof |
| US4732941A (en) * | 1985-07-05 | 1988-03-22 | Kansai Paint Company, Limited | Process for preparing a stable dispersion of vinyl polymer |
| JPS63144225U (en) * | 1987-03-13 | 1988-09-22 | ||
| US5328794A (en) * | 1989-04-12 | 1994-07-12 | Ricoh Company, Ltd. | Fluorine-containing graft copolymer and toner using the same |
-
1977
- 1977-10-05 JP JP11907577A patent/JPS603334B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5456671A (en) | 1979-05-07 |
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