JPS6035930B2 - curable composition - Google Patents

curable composition

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Publication number
JPS6035930B2
JPS6035930B2 JP52081097A JP8109777A JPS6035930B2 JP S6035930 B2 JPS6035930 B2 JP S6035930B2 JP 52081097 A JP52081097 A JP 52081097A JP 8109777 A JP8109777 A JP 8109777A JP S6035930 B2 JPS6035930 B2 JP S6035930B2
Authority
JP
Japan
Prior art keywords
curable composition
composition according
integer
aromatic
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52081097A
Other languages
Japanese (ja)
Other versions
JPS5322597A (en
Inventor
ジエイムズ・ヴインセント・クリヴエロ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS5322597A publication Critical patent/JPS5322597A/en
Publication of JPS6035930B2 publication Critical patent/JPS6035930B2/en
Expired legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)

Description

【発明の詳細な説明】 本発明は乾燥薄膜フオトレジストとして又はその製法に
有用な硬化性組成物、及び種々の基体上に被覆された硬
化状態の絶縁用被膜に関する。
DETAILED DESCRIPTION OF THE INVENTION This invention relates to curable compositions useful as dry thin film photoresists or in their preparation, and to cured insulating coatings coated onto various substrates.

本発明の硬化性組成物は重量基準で、凶 0.5%乃至
98%のェポキシ樹脂、{B} 0.5乃至98%のポ
リビニルアセタール乃び{C} 0.1%乃至10%の
芳香族オニウム塩を含んで成り、ここに上記■,【Bー
及び■の合計は100%であり、‘C’は、式‘1’〔
(R)a(RI)bD〕さ〔MQd〕‐(d−e)で表
わされる芳香族ハロニウム塩、式(21 〔(R)f(
R2)g(R3)hE〕さ〔MQd〕−(d‐e)で表
わされる第Va属の芳香族オニウム塩、及び式【3}
〔(R)j(R4)k(R5)mG〕さ〔MQd〕−(
dで表わされる第Via属元素の芳香族オニゥム塩(但
し、Rは1価の芳香族有機基、RIは2価の芳香族有機
基、R2及びR4はアルキル、シクロアルキル及び置換
アルキルから選ばれた1価の脂肪族有機基、R3及びR
5はE又はGと複秦環又は縮合環礎造を形成する多価有
機基、Dはハロゲン基例えば1、EはN,P,As,S
b及びBiから選ばれた第Va属元素、GはS,Se及
びTeから選ばれた第Via属元素、Mは金属又は半金
属、Qはハロゲン、aは1又は2の整数、bは0又は1
の整数、a+bの和は2又はDの原子価、fは0〜4の
整数、gは0〜2の整数、hは0〜2の整数、f+g+
hの和は4又はEの原子価、jは0〜3の整数、kは0
〜2の整数、mは0又は1の整数、i十k+mの和は3
又はGの原子価、c=d−e、eはMの原子価で2〜7
の整数、dはeより大きく8までの整数)から選択され
る。
The curable composition of the present invention contains, by weight, 0.5% to 98% epoxy resin, {B} 0.5 to 98% polyvinyl acetal, and {C} 0.1% to 10% aroma. contains a group onium salt, where the sum of the above ■, [B- and ■] is 100%, and 'C' is the formula '1' [
Aromatic halonium salt represented by (R)a(RI)bD]sa[MQd]-(de), formula (21)[(R)f(
Group Va aromatic onium salt represented by R2)g(R3)hE]sa[MQd]-(de), and formula [3}
[(R)j(R4)k(R5)mG]sa[MQd]-(
An aromatic onium salt of a Group Via element represented by monovalent aliphatic organic groups, R3 and R
5 is a polyvalent organic group forming a compound ring or fused ring structure with E or G, D is a halogen group, e.g. 1, E is N, P, As, S
Group Va element selected from b and Bi, G is a Group Vi element selected from S, Se and Te, M is a metal or metalloid, Q is a halogen, a is an integer of 1 or 2, b is 0 or 1
, the sum of a+b is 2 or the valence of D, f is an integer of 0 to 4, g is an integer of 0 to 2, h is an integer of 0 to 2, f+g+
The sum of h is 4 or the valence of E, j is an integer from 0 to 3, k is 0
An integer of ~2, m is an integer of 0 or 1, the sum of i + k + m is 3
Or the valence of G, c=de, e is the valence of M, 2 to 7
d is an integer greater than e and up to 8).

Rによって包含される基は同じでも異ってもよく炭素原
子6〜2の固の芳香族炭素環式基が複秦環式基であり、
C,〜8アルコキシ、C,〜8アルキル、ニトロ、クロ
ロ等から選ばれた1価の基1〜4個で置換されてよい。
The groups encompassed by R may be the same or different, and a hard aromatic carbocyclic group of 6 to 2 carbon atoms is a double cyclic group,
It may be substituted with 1 to 4 monovalent groups selected from C, -8 alkoxy, C, -8 alkyl, nitro, chloro, and the like.

Rはより特定的にはフェニル、クロロフエニル、ニトロ
フヱニル、メトキシ・フヱニル、ピリジル等である。R
Iに包含される基は2価の基で例えばや である。
R is more specifically phenyl, chlorophenyl, nitrophenyl, methoxyfenyl, pyridyl and the like. R
The groups included in I are divalent groups, such as .

R2及びR4基にはC,〜8アルキル例えばメチル、エ
チル等、置換ァルキル例えば一C2山OC戊,一CH2
COOC2公,一CH2COCH3等が含まれる。
R2 and R4 groups include C, ~8 alkyl such as methyl, ethyl, etc., substituted alkyl such as 1C2 OC戊, 1CH2
COOC2 public, 1CH2COCH3, etc. are included.

R3及びR5基にはの如き構造が含まれ、Q′は○,C
山,N,R及びSから選ばれ、Zは○,S及びから選ば れ、そしてR′は水素及び炭化水素から選ばれた1価の
基である。
The R3 and R5 groups include the following structures, Q' is ○, C
Z is selected from O, S and S, and R' is a monovalent group selected from hydrogen and hydrocarbon.

式1のMによって包含される金属又は半金属は遷移金属
例えばSb,Fe,Sn,Bi,AI,Ga,ln,T
i,Zr,Sc,V,Cr,Mn,Cs、希±頚元素例
えばランタニド例えばCb,Pr.Nd等、アクチニド
例えばTh,Pa,U,Np等、及び半金属例えばB,
P,As等である。
The metals or metalloids encompassed by M in formula 1 are transition metals such as Sb, Fe, Sn, Bi, AI, Ga, ln, T
i, Zr, Sc, V, Cr, Mn, Cs, rare elements such as lanthanides such as Cb, Pr. Nd etc., actinides such as Th, Pa, U, Np etc., and semi-metals such as B,
P, As, etc.

MQ;(d−e)によって包含される鍔アニオンは例え
ばBFZ,PF5,AsF言,SbFぅ,FeCIZ,
SnCIき, S比に,BjCI亨等である。式1によ
って包含されるハロニウム塩は例えばである。式2によ
って包含される第Va属オニウム塩は例えばである。
MQ; Tsuba anions encompassed by (de) are, for example, BFZ, PF5, AsF, SbF, FeCIZ,
SnCI, S ratio, BjCI, etc. Halonium salts encompassed by Formula 1 are for example. Group Va onium salts encompassed by Formula 2 are, for example.

式3によって包含される第Via属オニウム塩には例え
ば、等がある。
Group Via onium salts encompassed by Formula 3 include, for example.

式1〜3のオニウム塩は種々の方法で製造できる。Onium salts of formulas 1-3 can be prepared in a variety of ways.

式1のオニウム塩は水性の条件下で硫酸水素アリールハ
ロニゥム塩と、対応する六弗化酸又は塩例えばYIMF
6(但し、YIは水素、アルカリ金属イオン、アルカリ
士類金属イオン又は遷移金属イオンである)との間に接
触をもたらして製造できる。対応するハロニウム塩を製
造するための上記のメタセシスに加えて、銀化合物例え
ば酸化銀又はテトラフルオロ棚秦酸銀塩を使ってこれを
適当なジアリールハロニウム塩と反応させるM.C.C
aserio等のJ.Am.Chem.SM.81,3
36(1959)に於いて又はM.C.Berin鉾r
等のJ.Am.Chem.S比.81,342(195
9)に於いて示される方法によっても調製できる。
The onium salt of formula 1 can be prepared by combining the arylhalonium hydrogensulfate salt under aqueous conditions with the corresponding hexafluoric acid or salt such as YIMF.
6 (wherein YI is hydrogen, an alkali metal ion, an alkali metal ion, or a transition metal ion). In addition to the metathesis described above to prepare the corresponding halonium salts, M. C. C
J. Aserio et al. Am. Chem. S.M. 81,3
36 (1959) or M. C. Berin hoko r
J. et al. Am. Chem. S ratio. 81,342 (195
It can also be prepared by the method shown in 9).

第Via属化合物例えばスルホニウム、セレノニゥム及
びテルロニウム化合物は、J.W.KMpczyk及び
W.E.McEwenのJ.Am.Chem.Soc.
,91145(1969)、A.L.Maycock及
びG.A.BerchtoldのJ.0rg.Chem
.,35M.8,2532(1970)、日.M.Pi
ttの米国特許第2807648号、E.Gbetha
ls及びP.De Ra舷etzkyのB山.SM.C
him.&1g.,73払6(1964)、日.M.皮
;chester及びF.W.茂r袋tromのJ.A
m,Chem.S血,.513587(1929)等に
示された方法によって製造できる。第Va属オニゥム塩
例えばアルソニウム、アンチモニウム及びビスマソニゥ
ムを製造するのに使用できる方法は仇erdelerの
MethMen derび鱗nishenChimie
ll/2,591−640(1985)及びK.Sas
se,idid,12/1 79−112(1963)
に見ることができる。
Group Via compounds such as sulfonium, selenonium and telluronium compounds are described in J. W. KMpczyk and W. E. McEwen, J. Am. Chem. Soc.
, 91145 (1969), A. L. Maycock and G. A. Berchtold, J. 0rg. Chem
.. , 35M. 8, 2532 (1970), Sun. M. Pi
No. 2,807,648 to E.T.T. Gbetha
ls and P. Mt. B of De Ra Etzky. S.M. C
Him. &1g. , 73 Pay 6 (1964), Sun. M. skin; chester and F. W. J. of Moribukuro trom. A
m, Chem. S blood,. 513587 (1929) and the like. Methods that can be used to produce Group Va onium salts, such as arsonium, antimonium and bismasonium, are described in the MethMen der and Scale Nishen Chimie
ll/2, 591-640 (1985) and K. Sas
se, idid, 12/1 79-112 (1963)
It can be seen in

本発明の硬化性組成物の記載にあたり使用される用語「
ェポキシ樹脂」は1個あるいは複数のェポキシ官能基を
含んだ任意の単量体、二量体、オリゴマー又はポリマー
性ェポキシ物質を包含する。
The term “
"Epoxy resin" includes any monomeric, dimeric, oligomeric or polymeric epoxy material containing one or more epoxy functional groups.

例えば、ビスフェノールーA(4,4′ーイソプロピリ
デンジフエノール)とエピクロロヒドリンとの反応から
生じた又は低分子量フェノール−ホルムアルデヒド樹脂
(/ボラック樹脂)とェピクロロヒドリンとの反応によ
って生じた樹脂を単独で、又は反応性稀釈剤としてのェ
ポキシ含有化合物と組み合わせて使用できる。フェニル
グリシジルヱーテル、4ービニルシクロヘキセンジオキ
シド、リモネンジオキシド、1,2ーシクロヘキセンオ
キシド、グリシジルアクリレート、グリシジリメタクリ
レート、スチレンオキシド、アリルグリシジルェーテル
等の希釈剤が粘度変調剤として添加できる。更に、これ
等の化合物の範囲は末端又は懸垂ェボキシ基を含んだ重
合体物質を含む程度に拡張できる。
For example, those resulting from the reaction of bisphenol-A (4,4'-isopropylidenediphenol) with epichlorohydrin or the reaction of low molecular weight phenol-formaldehyde resins (/borac resins) with epichlorohydrin. These resins can be used alone or in combination with epoxy-containing compounds as reactive diluents. Diluents such as phenylglycidyl ether, 4-vinylcyclohexene dioxide, limonene dioxide, 1,2-cyclohexene oxide, glycidyl acrylate, glycidyl methacrylate, styrene oxide, and allyl glycidyl ether can be added as viscosity modifiers. . Additionally, the scope of these compounds can be extended to include polymeric materials containing terminal or pendant eboxy groups.

これ等の化合物の例は共単量体の一つとしてグリシジル
アクリレート又はメタクリレートを含んだビニル共重合
体である。上記の触媒を使って硬化に服するェポキシ含
有重合体の他の類のものはェポキシーシロキサン樹脂、
ェポキシーポリウレタン及びェポキシーポリエステルで
ある。これ等の重合体は重合体鎖の末端にェポキシ官能
基を有するのが普通である。ェポキシーシロキサン樹脂
とその製法はE.P.P1ueddemann及びG.
Fran鉾rのJ.Am.Chem.SM.80632
5(1959)により詳しく示されている。文献に記載
されているように、ェポキシ樹脂は又例えばアミン、カ
ルボン酸、チオール、フェノール、アルコール等との反
応の如き多くの標準法によって変性でき、これについて
は例えば米国特許第2935488号、第323562
0号、第3369055号、第3379653号、第3
398211号、第3403199号、第356385
び号、第3567797号、第3677995号等に示
されている。
Examples of these compounds are vinyl copolymers containing glycidyl acrylate or methacrylate as one of the comonomers. Other classes of epoxy-containing polymers that are subject to curing using the above catalysts include epoxy siloxane resins,
Epoxy polyurethane and epoxy polyester. These polymers typically have epoxy functionality at the end of the polymer chain. Epoxysiloxane resin and its manufacturing method are described by E. P. Plueddemann and G.
Fran Hokor's J. Am. Chem. S.M. 80632
5 (1959). As described in the literature, epoxy resins can also be modified by a number of standard methods, such as reaction with amines, carboxylic acids, thiols, phenols, alcohols, etc., as described for example in U.S. Pat.
No. 0, No. 3369055, No. 3379653, No. 3
No. 398211, No. 3403199, No. 356385
No. 3567797, No. 3677995, etc.

使用できるェポキシ樹脂の例が更にEncyclope
dia of Polymer Science
andTechnology , Vol.6 ,
1967 , InteRclenceP肋lish
eは,NewYork,pp 209,271に示され
ている。本発明の硬化性組成物に使用できるポリビニル
アセタールは例えば、及び が と化学的に結合した諸単位の混合物でよく、ここに該重
合体は平均約5〜500山単位を含むことができ、R6
は水素、C,〜8アルキル、例えばメチル、エチル、ブ
チル及びこれ等の混合物から選ばれる。
Further examples of epoxy resins that can be used are Encyclope
Dia of Polymer Science
andTechnology, Vol. 6,
1967, InterReclencePlish
e is shown in New York, pp 209,271. The polyvinyl acetal that can be used in the curable compositions of the present invention can be, for example, a mixture of units chemically combined with R6
is selected from hydrogen, C, ~8 alkyl, such as methyl, ethyl, butyl and mixtures thereof.

本発明の実施に使用できるポリビニルアセタールが更に
Encyclopediaof PolymerSci
enceand Technology , 日.F.
Mark and N.G.Gaylord,Vol
.14,149(1971)に示されている。本発明の
硬化性組成物は有機溶媒溶液から注型して乾燥薄膜フオ
トレジストとすることができる。使用できる適当な有機
溶媒は例えば塩化メチレン、クロロホルム、メチルエチ
ルケトン、セロソルプアセテート、テトラヒドロフラン
、アセトニトリル等で、硬化性組成物の1〜8の重量%
で使われる。この硬化性組成物は100〜200qCの
温度で熱硬化できる。好ましくは、本発明の硬化性組成
物を紫外線に露出して耐溶剤性の状態の注型薄膜とする
ことができる。
Polyvinyl acetals that can be used in the practice of this invention are further described in the Encyclopedia of PolymerSci
enceand Technology, Japan. F.
Mark and N. G. Gaylord, Vol.
.. 14, 149 (1971). The curable composition of the present invention can be cast from an organic solvent solution into a dry thin film photoresist. Suitable organic solvents that can be used include, for example, methylene chloride, chloroform, methyl ethyl ketone, cellosol acetate, tetrahydrofuran, acetonitrile, etc., in an amount of from 1 to 8% by weight of the curable composition.
used in This curable composition can be thermally cured at a temperature of 100 to 200 qC. Preferably, the curable composition of the present invention can be exposed to ultraviolet light to form a cast thin film in a solvent-resistant state.

乾燥薄膜フオトレジストとして使うときには、波長18
49A〜4000△で強度少なくとも5000〜800
00AW/地の紫外線照射によりマスクを使って薄膜に
模様をかたどることができる。こうした放射線の発生に
使われるランプ系統は紫外線ランプ、例えば動作圧力が
数ミリメートルから約10気圧のキセノン、金属ハロゲ
ン化物、金属アーク例えば低圧、中圧又は高圧水銀蒸気
放電灯等の放電灯1〜50個で形成される。ランプには
波長約1849A〜4000A好ましくは2400A〜
4000△の光を透過できる外被を含みうる。このラン
プ外被は石英例えばSpectrocjlあるいはPの
ex等から成ることができる。紫外線放射線を提供する
のに使用できる代表的なランプは例えば中圧水銀ァーク
灯例えばGEHT37ァーク灯及び触novia450
Wァーク灯である。全部あるいは一部が不活性雰囲気中
で動作できる種々のランプの組合せによって硬化を行う
ことができる。紫外線ランプを使って乾燥薄膜フオトレ
ジストの硬化を行うためには基体上にあたる照射線東は
少なくとも0.01ワット/平方ィンチであってよい。
硬化性組成物にはェポキシ樹脂10礎郡あたり100部
までの量で、不活性成分例えば無機充填剤、染料、顔料
、増容剤、粘度制御剤、処理助剤、紫外線遮蔽物等を含
んでよい。
When used as a dry thin film photoresist, wavelength 18
49A~4000△ and strength at least 5000~800
00AW/By irradiating the surface with ultraviolet rays, a pattern can be created on a thin film using a mask. The lamp systems used for the generation of such radiation include ultraviolet lamps, e.g. formed by individuals. The lamp has a wavelength of approximately 1849A to 4000A, preferably 2400A to
It can include a jacket that can transmit 4000Δ light. The lamp envelope can be made of quartz, such as Spectrocjl or Pex. Typical lamps that can be used to provide ultraviolet radiation include, for example, medium pressure mercury arc lamps such as the GEHT37 arc lamp and the Nova450
It is a W arc light. Curing can be effected by a variety of lamp combinations, all or part of which can be operated in an inert atmosphere. For curing of dry thin film photoresists using ultraviolet lamps, the radiation beam on the substrate may be at least 0.01 watts per square inch.
The curable composition may contain inert ingredients such as inorganic fillers, dyes, pigments, bulking agents, viscosity control agents, processing aids, ultraviolet light shielding agents, etc. in amounts up to 100 parts per 10 parts of epoxy resin. good.

硬化性組成物は金属、ゴム、プラスチック、成形部品、
薄膜、紙、木、ガラス、布、コンクリート、セラミック
等の如き基体に塗布できる。本発明の実施を容易にする
ため以下に実施例を示すが、これ等実施例は例示にすぎ
ず限定的な意味はもたない。
Curable compositions can be used for metals, rubber, plastics, molded parts,
It can be applied to substrates such as thin films, paper, wood, glass, cloth, concrete, ceramics, etc. Examples are shown below to facilitate implementation of the present invention, but these examples are merely illustrative and do not have a limiting meaning.

部は全て重量部である。実施例 1 ボリビニルホルマール(Mo船anto Fo皿var12/85)lo部、Ciba−Gigy
AralditeECN1299クレゾールーノボラッ
クェポキシ樹脂2.5部、トリフェニルスルホニウムヘ
キサフルオロアンチモネート0.3部及びクロロホルム
約80部より成る溶液をガラス板上に注型して5ミルの
薄膜とした。
All parts are parts by weight. Example 1 Vorivinyl formal (Mo ship anto Fo dish var12/85) lo part, Ciba-Gigy
A solution consisting of 2.5 parts of Araldite ECN 1299 cresol novolacepoxy resin, 0.3 parts of triphenylsulfonium hexafluoroantimonate, and about 80 parts of chloroform was cast onto a glass plate into a 5 mil thin film.

この薄膜を取り剥がしこれを6インチの距離にあるGE
HT37中圧水銀アーク灯からの紫外線にガラス接触マ
スクを通して3分間露出した。照射後、薄膜中に可視像
が認められた。薄膜をクロロホルム中に浸潰して潜像を
現像した。薄膜中にはっきり浮き上がったマスクのネガ
像が生じた。実施例 2 Formvar15/9班ポリビニルホルマール1館郭
、実施例1のェポキシ樹脂(ECN1299)5部、ト
リフエニルスルホニウムヘキサフルオロアンチモネート
0.3部及び塩化メチレン8碇都から調製した溶液をポ
リエチレンテレフタレート基体上に5ミルの薄膜として
注型した。
Peel off this thin film and place it at a distance of 6 inches.
Exposure to ultraviolet light from an HT37 medium pressure mercury arc lamp was performed for 3 minutes through a glass contact mask. After irradiation, a visible image was observed in the thin film. The film was immersed in chloroform to develop the latent image. A negative image of the mask clearly raised in the thin film was produced. Example 2 A solution prepared from Formvar 15/9 polyvinyl formal, 5 parts of the epoxy resin (ECN1299) of Example 1, 0.3 parts of triphenylsulfonium hexafluoroantimonate, and 8 parts of methylene chloride was added to a polyethylene terephthalate base. It was cast as a 5 mil thin film on top.

生じた複合物の頂部上に次いで接触マスクを置き実施例
1に記載のようにして紫外光下に3分間露出した。次い
でこうして得られた複合物を2ーェトキシェチルアセテ
ート中に浸潰して現像した。こうして、表面にマスクの
ネガ像を有するポリエチレンテレフタレート基体が得ら
れたが、これは印刷板として有用であつた。実施例 3
Fo皿var15/9虫1の部、トリフェニルスルホニ
ウムヘキサフルオロアルセネート0.3部、〜aidi
teECN1299を5部及び塩化メチレン約80部を
溶かして硬化性組成物を調製した。
A contact mask was then placed on top of the resulting composite and exposed to UV light for 3 minutes as described in Example 1. The composite thus obtained was then immersed in 2-ethoxyshetylacetate and developed. A polyethylene terephthalate substrate was thus obtained with a negative image of the mask on its surface, which was useful as a printing plate. Example 3
Fo dish var15/9 insect 1 part, triphenylsulfonium hexafluoroarsenate 0.3 part, ~aidi
A curable composition was prepared by dissolving 5 parts of teECN1299 and about 80 parts of methylene chloride.

次いで、生じた溶液をガラス板上に注型した。この溶液
より溶媒を蒸発させると半透明の薄膜が得られた。次い
でこの薄膜をガラス基体より剥がしてマスクと接触させ
た。次ぎに、実施例1に記載の如くこの薄膜を約1.5
分間照射した。この薄膜を次いで炉内で100ooに5
分間加熱した。クロロホルムを使って薄膜を現像すると
マスクのはっきりしたネガが再生された。実施例 4 ポリビニルアルコールとブチルアルデヒドの反応生成物
(Butvar B − 74)10部、〜aidit
eECN1299を2.5部、トリフヱニルスルホニウ
ムヘキサフルオロアルセネート0.3部及び塩化メチレ
ン約9碇部から成る硬化性組成物よりガラス坂上に薄膜
を注型した。
The resulting solution was then cast onto a glass plate. When the solvent was evaporated from this solution, a translucent thin film was obtained. This thin film was then peeled off from the glass substrate and brought into contact with a mask. This thin film was then deposited as described in Example 1 to approximately 1.5
Irradiated for minutes. This thin film was then heated to 100 oz in a furnace.
Heated for minutes. Developing the thin film using chloroform reproduced the clear negative of the mask. Example 4 10 parts of reaction product of polyvinyl alcohol and butyraldehyde (Butvar B-74), ~aidit
A thin film was cast onto a glass slope from a curable composition consisting of 2.5 parts of eECN1299, 0.3 parts of triphenylsulfonium hexafluoroarsenate, and about 9 parts of methylene chloride.

この薄膜をガラス板から剥がし、次いで銅で被覆したェ
ポキシーガラス回路坂上に加圧下130ooにて積層し
た。実施例1の如くして接触マスクを使ってこの積層板
を紫外光にさらした。次いで、クロロホルムを使ってこ
の積層物を現像し銅上に硬化性樹脂のネガ像を生成させ
た。次ぎに、銅積層物を塩化第二鉄を使ってエッチング
した。ェポキシガラス基体の表面上の銅中にマスクのポ
ジ像を有する銅被覆積層物が得られた。実施例 5 光開始剤としてトリフェニルスルホニゥムヘキサフルオ
ロアンチモネートを使用し組成物中にDaygloT−
13顔料0.1部を使った外は、実施例4に記載したよ
うにして硬化性組成物を調製した。
This thin film was peeled off from the glass plate and then laminated onto a copper-coated epoxy glass circuit slope under pressure of 130 oo. The laminate was exposed to ultraviolet light using a contact mask as in Example 1. The laminate was then developed using chloroform to produce a negative image of the curable resin on the copper. The copper laminate was then etched using ferric chloride. A copper coated laminate was obtained with a positive image of the mask in the copper on the surface of the epoxy glass substrate. Example 5 Dayglo T-
A curable composition was prepared as described in Example 4, except that 0.1 part of No. 13 pigment was used.

一枚のポリエチレンテレフタレート薄板上に薄膜を洋型
した。薄膜を乾燥後、これを接触マスクで被覆し実施例
1に記載のようにして紫外光にさらした。こうして照射
した感光性薄膜−ポリエチレンテレフタレート複合物を
次いで平坦な白い紙に接触させ加圧下で13000に加
熱した。白い紙の上にマスクの明瞭なネガ像が得られた
。この複合物を同じ手順に従って使い、更に数枚の紙に
マスクの鮮明なネガ像を転写できるのが分った。上記の
結果に基づき、本発明の硬化性組成物を乾燥薄膜フオト
レジストとして使い印刷板、銅被覆積層物等が製造でき
る。
A thin film was molded onto a polyethylene terephthalate thin plate. After drying the film, it was covered with a contact mask and exposed to ultraviolet light as described in Example 1. The thus irradiated photosensitive thin film-polyethylene terephthalate composite was then brought into contact with a flat white paper and heated under pressure to 13,000 ℃. A clear negative image of the mask was obtained on white paper. It was found that this composite could be used to transfer clear negative images of the mask onto several additional sheets of paper using the same procedure. Based on the above results, the curable compositions of the present invention can be used as dry thin film photoresists to produce printing plates, copper-coated laminates, etc.

次の実施例はジアリールハロニウム塩を、ェポキシ樹脂
に対する可視光光開始剤としての或る種の有機染料と共
に使う例を示している。
The following example illustrates the use of diarylhalonium salts with certain organic dyes as visible light photoinitiators for epoxy resins.

実施例 6 Formvar15/9班10部、〜aiditeEC
N1299を2.5部、ジフェニルョードニウムヘキサ
フルオロアルセネート0.3部、ベンゾフラビン0.1
部及び塩化メチレン約80部から成る塩化メチレン溶液
をMylar薄膜上に注型した。
Example 6 Formvar15/9 group 10 copies, ~aiditeEC
2.5 parts of N1299, 0.3 part of diphenyliodonium hexafluoroarsenate, 0.1 part of benzoflavin
A methylene chloride solution consisting of approximately 80 parts and 80 parts of methylene chloride was cast onto the Mylar film.

薄膜を乾燥後、これを可視光源であるGE375W写真
用電球を使って像様式の露出にかけた。5分照射すると
薄膜中に鮮明な像が生じた。
After drying the film, it was subjected to imagewise exposure using a visible light source, a GE375W photographic bulb. A clear image was formed in the thin film after 5 minutes of irradiation.

クロロホルム、2−ェトキシェチルァセテート又は塩化
メチレンを使って潜像を現像し、マスクの鮮明に浮き上
がった複製物をもたらした。ペンゾフラビンの代りにア
クリジンオレソジを使う外、上の手順を繰り返えした。
The latent image was developed using chloroform, 2-ethoxyshetylacetate or methylene chloride, resulting in a sharp raised replica of the mask. The above steps were repeated, except substituting acridine olethochloride for penzoflavin.

更に、ベンゾフラビンの代りにホスフェン−R染料を使
って第3の薄膜を洋型した。ペンゾフラビンに代えて使
った前記染料の各々について実質的に等価な結果が得ら
れた。Fo皿var15/9斑を等量のエチルセルロー
スで置き換えて上記のようにして硬化性組成物を調製し
た。
Additionally, a third film was made using phosphene-R dye in place of benzoflavin. Substantially equivalent results were obtained with each of the dyes used in place of penzoflavin. A curable composition was prepared as described above, replacing the Fo dish var 15/9 spots with an equal amount of ethyl cellulose.

この混合物から薄膜を洋型し接触マスクを使って像様式
の露出にかけた。この薄膜の現像を試みたところ露出生
成薄膜はクロロホルム中に完全に溶解した。このことは
、乾燥薄膜フオトレジストの作成に必要とされるポリビ
ニルアセタールが存在しないと架橋が生じなかったこと
を示している。本発明の可視光硬化性組成物に使われる
上記の染料の外に、本発明の実施にあたりジフェニルョ
ードリウム塩と共に使用できる他の染料は例えばKir
k−○thmer Encyclopedia,sec
ond editionl965,Vol.20pp
l94一7,John Wiley &Sons,Ne
wYorkに示されている如き陽イオン染料である。
Thin films were molded from this mixture and subjected to imagewise exposure using a contact mask. When an attempt was made to develop this thin film, the exposed thin film was completely dissolved in chloroform. This indicates that crosslinking did not occur in the absence of the polyvinyl acetal required to make the dry thin film photoresist. In addition to the above-mentioned dyes used in the visible light curable compositions of the present invention, other dyes that can be used with diphenylodrium salts in the practice of the present invention include, for example, Kir
k-○thmer Encyclopedia, sec
ond edition 965, Vol. 20pp
l94-7, John Wiley & Sons, Ne
A cationic dye as shown in wYork.

上述の陽イオン染料に加えて、塩基性染料も使用でき、
これについては上記のKirk−CMhmerEncy
clopedia,Vol.7,pp532一4に示さ
れている。使用できる陽イオン染料のいくつかを例示す
ると、アクリジンオレンジ C.1.460
05アクリジンエロー C.1.460
25セトフラビンT 、 C.1.490
05がある。
In addition to the cationic dyes mentioned above, basic dyes can also be used;
For this, see Kirk-CMhmerEncy above.
clopedia, Vol. 7, pp. 532-4. Some examples of cationic dyes that can be used include acridine orange C.I. 1.460
05 Acridine Yellow C. 1.460
25 Setoflavin T, C. 1.490
There is 05.

更に、使用できる塩基性染料のいくつかを例示すると、
へマトポルフイリン 4,4′ービスジメチルアミノベンゾフエノン、4,4
′ービスジエチルアミノベンゾフエノン等がある。
Furthermore, some examples of basic dyes that can be used include:
Hematoporphyrin 4,4'-bisdimethylaminobenzophenone, 4,4
'-bisdiethylaminobenzophenone, etc.

Claims (1)

【特許請求の範囲】 1 (A)0.5%乃至98%のエポキシ樹脂、(B)
0.5乃至98%のポリビニルアセタール乃び(C)0
.1%乃至10%の芳香族オニウム塩を重量基準にて含
み、ここの上記(A),(B)及び(C)の和は100
%であり、そして上記(C)が式〔(R)a(R^1)
bD〕^c_+〔MQd〕^−^(^d^−^e^)で
表わされる芳香族ハロニウム塩、式〔(R)f(R^2
)g(R^3)hE〕^c_+〔MQd〕^−^(^d
^−^e^)で表わされる第Va属元素の芳香族オニウ
ム塩及び式〔(R)j(R^4)k(R^5)mG〕^
c_+〔MQd〕^−^(^d^−^e^)で表わされ
る第VIa属元素の芳香族オニウム塩(但し、Rは1価の
芳香族有機基、R^1は2価の芳香族有機基、R^2及
びR^4はアルキル、シクロアルキル及び置換アルキル
から選ばれた1価の脂肪族有機基、R^3及びR^5は
E又はGと複素環又は縮合環を形成する脂肪族基及び芳
香族基から選ばれた多価の有機基、Dはハロゲン例えば
I、EはN,P,As,Sb及びBiから選ばれた第V
a属元素、GはS,Se及びTeから選ばれた第VIa属
元素、Mは金属又は半金属、Qはハロゲン、aは0又は
2の整数、bは0又は1の整数、和a+bは2又はDの
原子価、fは0〜4の整数、gは0〜2の整数、hは0
〜2の整数、和f+g+hは4又はEの原子価、jは0
〜3の整数、kは0〜2の整数、mは0又は1の整数、
和j+k+mは3又はGの原子価、c=d−e、eはM
の原子価で2〜7の整数、そしてdはeより大きく8ま
での整数)及びこれ等の混合物から選ばれる、硬化性組
成物。 2 有機溶媒溶液の形態をした特許請求の範囲第1項記
載の硬化性組成物。 3 薄膜の形態をした特許請求の範囲第1項記載の硬化
性組成物。 4 ▲数式、化学式、表等があります▼ 及び ▲数式、化学式、表等があります▼ が ▲数式、化学式、表等があります▼ と 化学的に結合した諸単位より選ばれた単位(但し、R^
6はC_1_8アルキル基)約5〜約5000個の混合
物より本質的に成るポリビニルアセタールを含んだ特許
請求の範囲第1項記載の硬化性組成物。 5 Rがメチルである特許請求の範囲第4項記載の硬化
性組成物。 6 Rがブチルである特許請求の範囲第4項記載の硬化
性組成物。 7 芳香族オニウム塩が芳香族ヨードニウム塩である特
許請求の範囲第1項記載の硬化性組成物。 8 芳香族オニウム塩が第Va属元素の塩である特許請
求の範囲第1項記載の硬化性組成物。 9 芳香族オニウム塩が第VIa属元素の塩である特許請
求の範囲第1項記載の硬化性組成物。 10 芳香族オニウム塩がトリフエニルスルホニウムヘ
キサフルオロアンチモネートである特許請求の範囲第1
項記載の硬化性組成物。 11 芳香族オニウム塩がジフエニルヨードニウムヘキ
サフルオロアルセネートである特許請求の範囲第1項記
載の硬化性組成物。 12 芳香族オニウム塩がトリフエニルスルホニウムヘ
キサフルオロアルセネートである特許請求の範囲第1項
記載の硬化性組成物。 13 ポリビニルアセタールがポリビニルホルマールで
ある特許請求の範囲第1項記載の硬化性組成物。 14 ポリビニルアセタールがポリビニルアルコールと
ブチルアルデヒドとの反応生成物である特許請求の範囲
第1項記載の硬化性組成物。 15 ポリビニルホルマール、クレゾール−ノボラツク
エポキシ樹脂及びトリフエニルスルホニウムヘキサフル
オロアンチモネートのクロロホルム溶液から成る特許請
求の範囲第1項記載の硬化性組成物。 16 ポリビニルアルコールとブチルアルデヒドの反応
生成物、クレゾール−ノボラツクエポキシ樹脂及びトリ
フエニルスルホニウムヘキサフルオロアルセネートを含
む塩化メチレン溶液形態の特許請求の範囲第1項記載の
硬化性組成物。 17 注型薄膜形態の特許請求の範囲第15項記載の硬
化性組成物。 18 芳香族ヨードニウム塩と有機染料を含んだ特許請
求の範囲第1項記載の可視光硬化性組成物。
[Scope of Claims] 1 (A) 0.5% to 98% epoxy resin, (B)
0.5 to 98% polyvinyl acetal or (C)0
.. Contains 1% to 10% aromatic onium salt on a weight basis, where the sum of the above (A), (B) and (C) is 100%.
%, and the above (C) is the formula [(R)a(R^1)
bD]^c_+[MQd]^-^(^d^-^e^), an aromatic halonium salt represented by the formula [(R)f(R^2
)g(R^3)hE]^c_+[MQd]^-^(^d
Aromatic onium salt of group Va element represented by ^-^e^) and formula [(R)j(R^4)k(R^5)mG]^
Aromatic onium salt of group VIa element represented by c_+[MQd]^-^(^d^-^e^) (where, R is a monovalent aromatic organic group, R^1 is a divalent aromatic Organic group, R^2 and R^4 are monovalent aliphatic organic groups selected from alkyl, cycloalkyl and substituted alkyl, R^3 and R^5 form a heterocycle or fused ring with E or G. A polyvalent organic group selected from aliphatic groups and aromatic groups, D is a halogen such as I, and E is a group V selected from N, P, As, Sb and Bi.
A group a element, G is a group VIa element selected from S, Se and Te, M is a metal or metalloid, Q is a halogen, a is an integer of 0 or 2, b is an integer of 0 or 1, the sum a + b is valence of 2 or D, f is an integer of 0 to 4, g is an integer of 0 to 2, h is 0
An integer of ~2, the sum f+g+h is 4 or the valence of E, j is 0
An integer of ~3, k is an integer of 0 to 2, m is an integer of 0 or 1,
The sum j + k + m is 3 or the valence of G, c = d - e, e is M
a valence of 2 to 7, and d is an integer greater than e and up to 8), and mixtures thereof. 2. The curable composition according to claim 1 in the form of an organic solvent solution. 3. The curable composition according to claim 1 in the form of a thin film. 4 ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ is a unit selected from various units chemically combined with ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, R ^
6. The curable composition of claim 1 comprising a polyvinyl acetal consisting essentially of a mixture of about 5 to about 5,000 polyvinyl acetals (wherein 6 is a C_1_8 alkyl group). 5. The curable composition according to claim 4, wherein 5R is methyl. 5. The curable composition according to claim 4, wherein 6R is butyl. 7. The curable composition according to claim 1, wherein the aromatic onium salt is an aromatic iodonium salt. 8. The curable composition according to claim 1, wherein the aromatic onium salt is a salt of a Group Va element. 9. The curable composition according to claim 1, wherein the aromatic onium salt is a salt of a Group VIa element. 10 Claim 1 in which the aromatic onium salt is triphenylsulfonium hexafluoroantimonate
The curable composition described in . 11. The curable composition according to claim 1, wherein the aromatic onium salt is diphenyliodonium hexafluoroarsenate. 12. The curable composition according to claim 1, wherein the aromatic onium salt is triphenylsulfonium hexafluoroarsenate. 13. The curable composition according to claim 1, wherein the polyvinyl acetal is polyvinyl formal. 14. The curable composition according to claim 1, wherein the polyvinyl acetal is a reaction product of polyvinyl alcohol and butyraldehyde. 15. The curable composition of claim 1, comprising a chloroform solution of polyvinyl formal, cresol-novolac epoxy resin, and triphenylsulfonium hexafluoroantimonate. 16. The curable composition of claim 1 in the form of a methylene chloride solution containing a reaction product of polyvinyl alcohol and butyraldehyde, a cresol-novolac epoxy resin, and triphenylsulfonium hexafluoroarsenate. 17. The curable composition according to claim 15 in the form of a cast thin film. 18. The visible light curable composition according to claim 1, containing an aromatic iodonium salt and an organic dye.
JP52081097A 1976-07-09 1977-07-08 curable composition Expired JPS6035930B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US703860 1976-07-09
US73242176A 1976-10-14 1976-10-14
US732421 1976-10-14

Publications (2)

Publication Number Publication Date
JPS5322597A JPS5322597A (en) 1978-03-02
JPS6035930B2 true JPS6035930B2 (en) 1985-08-17

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52081097A Expired JPS6035930B2 (en) 1976-07-09 1977-07-08 curable composition

Country Status (8)

Country Link
JP (1) JPS6035930B2 (en)
AU (1) AU517415B2 (en)
BR (1) BR7704527A (en)
DE (1) DE2730725A1 (en)
FR (1) FR2357931A1 (en)
GB (1) GB1554389A (en)
MX (2) MX159499A (en)
NL (1) NL183948C (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6078442A (en) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol Photosetting resin composition
JPS6076735A (en) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078443A (en) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol Photo-insoluble resin composition
EP0153904B1 (en) * 1984-02-10 1988-09-14 Ciba-Geigy Ag Process for the preparation of a protection layer or a relief pattern
US7255926B2 (en) * 2002-02-01 2007-08-14 Shell Oil Company Barrier layer made of a curable resin containing polymeric polyol
JPWO2011040531A1 (en) 2009-10-01 2013-02-28 日立化成株式会社 ORGANIC ELECTRONIC ELECTRONIC MATERIAL, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT, LIGHTING DEVICE, AND DISPLAY DEVICE USING THE SAME
KR101537654B1 (en) 2010-04-22 2015-07-17 히타치가세이가부시끼가이샤 Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device
US10665786B2 (en) 2013-03-08 2020-05-26 Hitachi Chemical Company, Ltd. Treatment liquid containing ionic compound, organic electronic element, and method for producing organic electronic element

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (en) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition containing glycidyl ether and a polyvinyl acetal resin
NL83160C (en) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (en) * 1965-09-17 1966-07-08 Air-heated fireplace door
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516351A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1512982A (en) * 1974-05-02 1978-06-01 Gen Electric Salts
GB1516511A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
DE2551347A1 (en) * 1975-08-14 1977-02-24 Alusuisse Negative working light sensitive compsn. - contg. epoxide and polyvinyl acetal and/or short oil alkyd resins is dry and stable

Also Published As

Publication number Publication date
MX145409A (en) 1982-02-04
FR2357931B1 (en) 1983-11-25
NL183948B (en) 1988-10-03
AU517415B2 (en) 1981-07-30
NL183948C (en) 1989-03-01
NL7707609A (en) 1978-01-11
MX159499A (en) 1989-06-20
GB1554389A (en) 1979-10-17
FR2357931A1 (en) 1978-02-03
DE2730725A1 (en) 1978-01-12
DE2730725C2 (en) 1990-08-16
AU2553177A (en) 1978-11-30
JPS5322597A (en) 1978-03-02
BR7704527A (en) 1978-04-25

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