JPS6041733B2 - Standard gas preparation device - Google Patents
Standard gas preparation deviceInfo
- Publication number
- JPS6041733B2 JPS6041733B2 JP14034677A JP14034677A JPS6041733B2 JP S6041733 B2 JPS6041733 B2 JP S6041733B2 JP 14034677 A JP14034677 A JP 14034677A JP 14034677 A JP14034677 A JP 14034677A JP S6041733 B2 JPS6041733 B2 JP S6041733B2
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- gas
- flow
- return
- generated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003085 diluting agent Substances 0.000 claims description 6
- 230000001105 regulatory effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 61
- 238000010790 dilution Methods 0.000 description 11
- 239000012895 dilution Substances 0.000 description 11
- 238000012544 monitoring process Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
Description
【発明の詳細な説明】
本発明は、ガス分析計の校正などに用いられる標準ガ
スを定量発生機やガス希釈装置を用いて調製する装置に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for preparing a standard gas used for calibrating a gas analyzer using a quantitative generator or a gas diluter.
従来、紫外線照射オゾン発生機やパーミェーションチ
ューブ等の自己定量発生機にて発生した原料ガスを分析
計の校正などに用いるため濃度を変える場合には、濃度
、電流、(光量又は表面積の)遮蔽などと希釈ガスの流
量で調整している。Conventionally, when changing the concentration of raw material gas generated by a self-quantification generator such as an ultraviolet irradiation ozone generator or a permeation tube for calibrating an analyzer, it is necessary to change the concentration, current, (light intensity or surface area). ) It is adjusted by shielding etc. and the flow rate of diluent gas.
ところが、これら従来手段では、校正用ガスに要求さ
れる濃度調整についての簡便性、迅速性に欠け、又、希
釈ガス流量を変えるため、所要流量と発生流量との整合
が困難であつた。 さらに、従来のガス希釈装置は、精
度、応答性など性能を向上させるためガスの一部をオー
バーフローし無駄が多い。However, these conventional means lack the simplicity and speed of adjusting the concentration required for the calibration gas, and because the dilution gas flow rate is changed, it is difficult to match the required flow rate with the generated flow rate. Furthermore, in order to improve performance such as accuracy and responsiveness, conventional gas dilution devices overflow a portion of the gas, resulting in a lot of waste.
本発明は、上述のよう欠点に鑑みなされたものであつ
て、濃度調整を簡便且つ迅速に行なえ、しかも希釈ガス
の無駄をなくすことができる等種々の利点を有するもの
を提供することを目的としている。The present invention has been made in view of the above-mentioned drawbacks, and an object of the present invention is to provide a device having various advantages such as being able to easily and quickly adjust the concentration and eliminating waste of dilution gas. There is.
以下、本発明の一実施例を図面について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
図において、1は希釈ガス(たとえばOs、Nα、H
。In the figure, 1 is a diluent gas (e.g. Os, Nα, H
.
O、HC等を除去した精製空気)の入口、2は希釈ガス
流路であつて、その下流側は第1流路3、第2流路4に
分岐している。5は前記第1、第2流路3、4をつなぐ
第3流路であつて、この第3流路5には、並列状態に配
置した複数本の毛管流量抵抗6、〜0(いずれも同一の
構造、大きさである。The inlet (2) of purified air from which O, HC, etc. have been removed is a dilution gas flow path, and its downstream side is branched into a first flow path 3 and a second flow path 4. Reference numeral 5 denotes a third flow path connecting the first and second flow paths 3 and 4, and this third flow path 5 includes a plurality of capillary flow resistances 6, . They have the same structure and size.
)の各々一端を接続してあり、さらに、該接続個所71
〜5に対し、互いちがいになるように、並列状態に配置
した複数の排出流路81〜6の各々一端を前記第3流路
5に接続してある。(接続個所を91〜6で示す)そし
て、これら各排出流路81〜5の他端は、分割バルブ1
0を介して帰還流路11に接続してあり、分割バルブ1
0の切換によつて排出流路81〜6のうちいずれかと、
帰還流路11とを連通できるようになつている。12は
発生ガス流路であつて、前記毛管流量抵抗61〜5の各
々他端が、この発生ガス流路12に接続されており、又
、、前記帰還流路11をこの発生ガス流路12に連通さ
せてある。13は前記第1流路3中に設けられたガス濃
度調整用の流量調整器であつて、これにより第1流路3
中を流れる希釈ガスの流量を変え、もつて発生ガスの濃
度を調整するものである。) are connected at one end of each, and furthermore, the connection point 71
5, one end of each of a plurality of discharge channels 81 to 6 arranged in parallel is connected to the third channel 5 so as to be different from each other. (The connection points are indicated by 91 to 6.) The other end of each of these discharge channels 81 to 5 is connected to the division valve 1.
0 to the return flow path 11, and the dividing valve 1
By switching 0, one of the discharge channels 81 to 6,
It is designed to be able to communicate with the return flow path 11. Reference numeral 12 denotes a generated gas flow path, and the other ends of each of the capillary flow resistances 61 to 5 are connected to the generated gas flow path 12. It is connected to. Reference numeral 13 denotes a flow rate regulator for gas concentration adjustment provided in the first flow path 3;
The concentration of generated gas is adjusted by changing the flow rate of diluent gas flowing through it.
14は第1流路3中に設けられた定量発生機(たとえば
、紫外線照射オゾン発生機、パーミェーションチューブ
、パーミェーションメンブレン、電解法02/H2発生
機等)てあつて、単位時間あたりに一定量の成分ガスを
発生させる。14 is a quantitative generator (for example, an ultraviolet irradiation ozone generator, a permeation tube, a permeation membrane, an electrolytic method 02/H2 generator, etc.) provided in the first flow path 3, and the unit is Generates a certain amount of component gas per hour.
従つて、第1流路3において、定量発生機14よりも下
流側においては、発生ガスと希釈ガスとの混合ガスが流
Iることになる。15は前記第2流路4中に設けられた
差圧調整器であつて、毛管流量抵抗61〜5の入口側と
出口側との差圧を所定の一定圧に保ち、発生ガス流路1
2を流れる発生ガスの流量Vを一定量に保つ働きをする
。Therefore, in the first flow path 3, on the downstream side of the quantitative generator 14, a mixed gas of the generated gas and the diluent gas flows. Reference numeral 15 denotes a differential pressure regulator provided in the second flow path 4, which maintains the differential pressure between the inlet side and the outlet side of the capillary flow resistances 61 to 5 at a predetermined constant pressure, and controls the generated gas flow path 1.
It functions to keep the flow rate V of the generated gas flowing through 2 at a constant amount.
16は第3流路5中に設けられた流量計、17は帰還流
路11中に設けられた流量調整素子(たとえばニードル
弁、毛管流量抵抗等。16 is a flow meter provided in the third flow path 5; 17 is a flow rate adjusting element (eg, a needle valve, a capillary flow resistance, etc.) provided in the return flow path 11;
固定又は半固定)であつて、前記流量調整器13を閉(
流量0)にした状態で、流量計16をみながら流量調整
素子17を調整して発生ガス流路12に所定量■のガス
が流れるようにする。18は、帰還流路11中に設けら
れたスクラバであつて、定量発生機14で発生した成分
ガスのうち、帰還流路11中を流れる成分ガスを除去す
るはたらきをする。fixed or semi-fixed), and the flow rate regulator 13 is closed (fixed or semi-fixed).
With the flow rate set to 0), adjust the flow rate adjustment element 17 while watching the flow meter 16 so that a predetermined amount of gas flows into the generated gas flow path 12. 18 is a scrubber provided in the return flow path 11, and functions to remove component gas flowing through the return flow path 11 from among the component gases generated by the quantitative generator 14.
このスクラバとしては活性炭(成分ガスが03,S02
の場合)、モレキユラシーブ(成分ガスがSO2の場合
)が用いられる。This scrubber uses activated carbon (component gas is 03, S02
), a molecular sieve (when the component gas is SO2) is used.
従つて、希釈ガス入口1より希釈ガスを供給し、且つ、
定量発生機14を作動させて、第1流路3側からは希釈
ガスと発生ガスとの混合ガスを、第2流路4側からは希
釈ガスを、それぞれ第3流路5へと供給し、発生ガス流
路12に所定流量で所望濃度(可変)の発生ガスを流す
のである。Therefore, the dilution gas is supplied from the dilution gas inlet 1, and
The quantitative generator 14 is operated to supply a mixed gas of dilution gas and generated gas from the first flow path 3 side and dilution gas from the second flow path 4 side to the third flow path 5, respectively. , the generated gas having a desired concentration (variable) is made to flow through the generated gas flow path 12 at a predetermined flow rate.
このとき、たとえば、図に示すように、分割バルブ10
の切換コック(図外)を操作して排出流路83と帰還流
路11とを連通させておくと、混合ガス及び希釈ガスは
図中の矢印の方向に流れ、毛管流量抵抗61,2だけに
混合ガスが流れる。そして、希釈ガス及び混合ガスの各
々一部は分割バルブ10を経て帰還流路11を流れるが
、そのうち混合ガス中の成分ガスは、スクラバ18によ
つて除去される。次に、発生ガス流路12には、マニホ
ールド(分岐管)19が接続されていて、発生ガスを2
経路20,21に分流させている。At this time, for example, as shown in the figure, the split valve 10
When the switching cock (not shown) is operated to connect the discharge passage 83 and the return passage 11, the mixed gas and diluent gas flow in the direction of the arrow in the diagram, and only the capillary flow resistances 61 and 2 are allowed to flow. A mixed gas flows through the A portion of each of the dilution gas and the mixed gas flows through the return flow path 11 via the division valve 10, and component gases in the mixed gas are removed by the scrubber 18. Next, a manifold (branch pipe) 19 is connected to the generated gas flow path 12, and a manifold (branch pipe) 19 is connected to the generated gas flow path 12.
The flow is divided into routes 20 and 21.
一方の経路20に分流された発生ガスは、さらに分流さ
れて被校正用分析計22、瞬時モニタ用ガス分析計23
、オーバーフロー用ガス出口24へと送られる。他方の
経路21に分流させた発生ガスは、三方電磁弁25を経
て手分析用(積算モニタ用)分析計26へと送られる。
又、この経路21の発生ガスは、三方電磁弁25の切換
によつて破線の矢印aで示す方向に流すこともできる。The generated gas branched into one path 20 is further branched into an analyzer 22 for calibration and a gas analyzer 23 for instantaneous monitoring.
, to the overflow gas outlet 24. The generated gas diverted to the other path 21 is sent to an analyzer 26 for manual analysis (for integration monitoring) via a three-way solenoid valve 25.
Further, the generated gas in this path 21 can also be made to flow in the direction shown by the dashed arrow a by switching the three-way solenoid valve 25.
これは、1マニホールド19で分流したときに生じるか
もしれない濃度変化を瞬時モニタ用分析計23でチェッ
クする場合、2瞬時モニタ用分析計23に流れるガスが
不足している楊合等に行なわれる。尚、図において、2
7,28は三方電磁弁、29はチェックガス入口、30
は、チェックガスオーバーフロー出口、31はオーバー
フロー監視器(たとえば浮子式流量計など)32,33
は毛管流量抵抗であり、34は濃度分割部、35は分配
−部を示す。This is done when the instantaneous monitoring analyzer 23 is used to check the concentration change that may occur when the flow is divided by the first manifold 19, and when there is insufficient gas flowing into the second instantaneous monitoring analyzer 23. . In addition, in the figure, 2
7, 28 are three-way solenoid valves, 29 is check gas inlet, 30
is a check gas overflow outlet, 31 is an overflow monitor (for example, a rotor type flow meter, etc.) 32, 33
is a capillary flow resistance, 34 is a concentration division part, and 35 is a distribution part.
本発明は、上述した構成よりなり、分割バルブの切換コ
ックの操作及び/又は流量調整器の操作により簡単且つ
述速に、定流量て所望濃度の発生ガスを得ることができ
、該発生ガスをガス分析計』の校正用標準ガスとして好
適に使用てきる。The present invention has the above-described configuration, and can easily and quickly obtain generated gas at a desired concentration at a constant flow rate by operating the switching cock of the division valve and/or by operating the flow rate regulator. It can be suitably used as a standard gas for calibration of gas analyzers.
さらに、排出流路と発生ガス流路の間に帰還流路を設け
、該帰還流路にスクラバ設けたので、希釈ガスを無駄に
消費することがなく経済的である。Furthermore, since a return flow path is provided between the discharge flow path and the generated gas flow path, and a scrubber is provided in the return flow path, the dilution gas is not wasted and is economical.
図面は、本発明の一実施例を示す説明図である。
2・・・希釈ガス流路、3・・・第1流路、4・・・第
2流路、5・・・第3流路、61〜5・・・毛管流量抵
抗、81〜6・・・排出流路、10・・・分割バルブ、
11・・・帰還流路、12・・・発生ガス流路、13・
・・流量調整器、14・・・定量発生機、15・・・差
圧調整器、18・・スクラバ。The drawings are explanatory diagrams showing one embodiment of the present invention. 2... Dilution gas flow path, 3... First flow path, 4... Second flow path, 5... Third flow path, 61-5... Capillary flow resistance, 81-6. ...Discharge flow path, 10...dividing valve,
11... Return flow path, 12... Generated gas flow path, 13.
...Flow rate regulator, 14...Quantity generator, 15...Differential pressure regulator, 18...Scrubber.
Claims (1)
もに、第1流路と第2流路とをつなぐ第3流路を設け、
該第3流路には、並列状態で複数本の毛管流量抵抗の各
々一端を接続し、さらに、該接続個所に対し互いちがい
となるように、並列状態で複数の排出流路の各々一端を
前記第3流路に接続し、これら各排出流路の他端は分割
バルブを介して帰還流路に接続し、該帰還流路は発生ガ
ス流路に連通するようになし、且つ、前記毛管流量抵抗
の各々の他端を発生ガス流路に接続し、さらに、前記第
1流路には定量発生機及びガス濃度調整用の流量調整器
を設け、前記第2流路には前記毛管流量抵抗の入口側と
出口側との差圧を一定に保つための差圧調整器を設け、
前記帰還流路にはスクラバを設けてなる標準ガス調整装
置。1. Branching the diluent gas flow path into a first and second flow path, and providing a third flow path that connects the first flow path and the second flow path,
One end of each of a plurality of capillary flow resistances is connected in parallel to the third flow path, and one end of each of a plurality of discharge flow paths is connected in parallel to the third flow path so as to be different from each other with respect to the connection point. connected to the third flow path, and the other end of each discharge flow path is connected to a return flow path via a split valve, the return flow path being communicated with the generated gas flow path; The other end of each of the flow resistances is connected to a generated gas flow path, the first flow path is further provided with a quantitative generator and a flow rate regulator for gas concentration adjustment, and the second flow path is connected to the capillary flow rate. A differential pressure regulator is installed to keep the differential pressure between the inlet and outlet sides of the resistor constant.
A standard gas regulating device including a scrubber in the return flow path.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14034677A JPS6041733B2 (en) | 1977-11-22 | 1977-11-22 | Standard gas preparation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14034677A JPS6041733B2 (en) | 1977-11-22 | 1977-11-22 | Standard gas preparation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5473090A JPS5473090A (en) | 1979-06-12 |
| JPS6041733B2 true JPS6041733B2 (en) | 1985-09-18 |
Family
ID=15266683
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14034677A Expired JPS6041733B2 (en) | 1977-11-22 | 1977-11-22 | Standard gas preparation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6041733B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56107538U (en) * | 1980-01-18 | 1981-08-21 | ||
| JPS57153234U (en) * | 1981-03-23 | 1982-09-25 |
-
1977
- 1977-11-22 JP JP14034677A patent/JPS6041733B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5473090A (en) | 1979-06-12 |
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