JPS6042731U - Exhaust equipment for semiconductor manufacturing equipment - Google Patents

Exhaust equipment for semiconductor manufacturing equipment

Info

Publication number
JPS6042731U
JPS6042731U JP13365383U JP13365383U JPS6042731U JP S6042731 U JPS6042731 U JP S6042731U JP 13365383 U JP13365383 U JP 13365383U JP 13365383 U JP13365383 U JP 13365383U JP S6042731 U JPS6042731 U JP S6042731U
Authority
JP
Japan
Prior art keywords
equipment
semiconductor manufacturing
exhaust
manufacturing equipment
cold trap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13365383U
Other languages
Japanese (ja)
Inventor
管 祥次
山本 則明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13365383U priority Critical patent/JPS6042731U/en
Publication of JPS6042731U publication Critical patent/JPS6042731U/en
Pending legal-status Critical Current

Links

Landscapes

  • Mechanical Optical Scanning Systems (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の排気装置の簡略図、第2図は本考案の排
気装置の簡略図である。 1・・・・・・処理室、2・・・・・・配管、3・・・
・・・バルブ、4・・・・・・コールドトラップ、5・
・・・・・真空ポンプ、6・・・・・・バイパス配管、
7・・・・・・フィルター。
FIG. 1 is a simplified diagram of a conventional exhaust system, and FIG. 2 is a simplified diagram of an exhaust system according to the present invention. 1...Processing room, 2...Piping, 3...
...Valve, 4...Cold trap, 5.
...Vacuum pump, 6...Bypass piping,
7...Filter.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体製造装置の真空ポンプとこれに接続されている配
管およびバルブと反応生成ガスを吸着させるコールドト
ラップよりなる排気装置において、コールドトラップの
前に反応生成物を捕獲するフィルターを設けたことを特
徴とする半導体製造装置の排気装置。
An exhaust system for semiconductor manufacturing equipment consisting of a vacuum pump, piping and valves connected thereto, and a cold trap for adsorbing reaction product gases, characterized in that a filter is provided in front of the cold trap to capture reaction products. Exhaust equipment for semiconductor manufacturing equipment.
JP13365383U 1983-08-31 1983-08-31 Exhaust equipment for semiconductor manufacturing equipment Pending JPS6042731U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13365383U JPS6042731U (en) 1983-08-31 1983-08-31 Exhaust equipment for semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13365383U JPS6042731U (en) 1983-08-31 1983-08-31 Exhaust equipment for semiconductor manufacturing equipment

Publications (1)

Publication Number Publication Date
JPS6042731U true JPS6042731U (en) 1985-03-26

Family

ID=30301417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13365383U Pending JPS6042731U (en) 1983-08-31 1983-08-31 Exhaust equipment for semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS6042731U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013071A (en) * 1983-07-01 1985-01-23 Canon Inc Evacuating system of device for vapor phase method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013071A (en) * 1983-07-01 1985-01-23 Canon Inc Evacuating system of device for vapor phase method

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