JPS6043489A - 分子線堆積装置 - Google Patents

分子線堆積装置

Info

Publication number
JPS6043489A
JPS6043489A JP13712384A JP13712384A JPS6043489A JP S6043489 A JPS6043489 A JP S6043489A JP 13712384 A JP13712384 A JP 13712384A JP 13712384 A JP13712384 A JP 13712384A JP S6043489 A JPS6043489 A JP S6043489A
Authority
JP
Japan
Prior art keywords
molecular beam
deposition
beam deposition
section
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13712384A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6229508B2 (fr
Inventor
Juichi Shimada
嶋田　寿一
Yoshifumi Katayama
片山　良史
Osamu Kanehisa
金久　修
Toshikatsu Manabe
真辺　俊勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13712384A priority Critical patent/JPS6043489A/ja
Publication of JPS6043489A publication Critical patent/JPS6043489A/ja
Publication of JPS6229508B2 publication Critical patent/JPS6229508B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP13712384A 1984-07-04 1984-07-04 分子線堆積装置 Granted JPS6043489A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13712384A JPS6043489A (ja) 1984-07-04 1984-07-04 分子線堆積装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13712384A JPS6043489A (ja) 1984-07-04 1984-07-04 分子線堆積装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP23491584A Division JPS60194065A (ja) 1984-11-09 1984-11-09 分子線堆積方法

Publications (2)

Publication Number Publication Date
JPS6043489A true JPS6043489A (ja) 1985-03-08
JPS6229508B2 JPS6229508B2 (fr) 1987-06-26

Family

ID=15191352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13712384A Granted JPS6043489A (ja) 1984-07-04 1984-07-04 分子線堆積装置

Country Status (1)

Country Link
JP (1) JPS6043489A (fr)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216482A (en) * 1975-07-30 1977-02-07 Toshiba Corp Surface treatment apparatus using activated gas
JPS52143980A (en) * 1976-05-25 1977-11-30 Nec Corp Equipment for plasma deposition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216482A (en) * 1975-07-30 1977-02-07 Toshiba Corp Surface treatment apparatus using activated gas
JPS52143980A (en) * 1976-05-25 1977-11-30 Nec Corp Equipment for plasma deposition

Also Published As

Publication number Publication date
JPS6229508B2 (fr) 1987-06-26

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