JPS6056238B2 - 電気メツキ方法 - Google Patents

電気メツキ方法

Info

Publication number
JPS6056238B2
JPS6056238B2 JP54067483A JP6748379A JPS6056238B2 JP S6056238 B2 JPS6056238 B2 JP S6056238B2 JP 54067483 A JP54067483 A JP 54067483A JP 6748379 A JP6748379 A JP 6748379A JP S6056238 B2 JPS6056238 B2 JP S6056238B2
Authority
JP
Japan
Prior art keywords
electrode
plated
plating
distance
electroplating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54067483A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55161092A (en
Inventor
潔 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP54067483A priority Critical patent/JPS6056238B2/ja
Priority to US06/154,953 priority patent/US4269672A/en
Priority to FR8012123A priority patent/FR2457912B1/fr
Priority to GB8017691A priority patent/GB2052562B/en
Priority to IT48862/80A priority patent/IT1127490B/it
Priority to DE3020824A priority patent/DE3020824C2/de
Publication of JPS55161092A publication Critical patent/JPS55161092A/ja
Publication of JPS6056238B2 publication Critical patent/JPS6056238B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
JP54067483A 1979-06-01 1979-06-01 電気メツキ方法 Expired JPS6056238B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP54067483A JPS6056238B2 (ja) 1979-06-01 1979-06-01 電気メツキ方法
US06/154,953 US4269672A (en) 1979-06-01 1980-05-30 Gap distance control electroplating
FR8012123A FR2457912B1 (fr) 1979-06-01 1980-05-30 Procede d'electro-deposition d'un metal sur un substrat
GB8017691A GB2052562B (en) 1979-06-01 1980-05-30 Scanning electroplating method and apparatus
IT48862/80A IT1127490B (it) 1979-06-01 1980-06-02 Procedimento di galvanostegia con controllo dell'ampiezza dell'interspazio
DE3020824A DE3020824C2 (de) 1979-06-01 1980-06-02 Verfahren zum galvanischen Metallabscheiden

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54067483A JPS6056238B2 (ja) 1979-06-01 1979-06-01 電気メツキ方法

Publications (2)

Publication Number Publication Date
JPS55161092A JPS55161092A (en) 1980-12-15
JPS6056238B2 true JPS6056238B2 (ja) 1985-12-09

Family

ID=13346261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54067483A Expired JPS6056238B2 (ja) 1979-06-01 1979-06-01 電気メツキ方法

Country Status (6)

Country Link
US (1) US4269672A (it)
JP (1) JPS6056238B2 (it)
DE (1) DE3020824C2 (it)
FR (1) FR2457912B1 (it)
GB (1) GB2052562B (it)
IT (1) IT1127490B (it)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL64705A0 (en) * 1981-01-13 1982-03-31 Metafuse Ltd Process and apparatus for treating electrically conductive matrices and products produced by the process
US4364802A (en) * 1981-03-05 1982-12-21 Inoue-Japax Research Incorporated Scanning electrode vibration electrodeposition method
DE3109755C2 (de) * 1981-03-13 1986-08-07 Inoue-Japax Research Inc., Yokohama, Kanagawa Verfahren und Vorrichtung zur galvanischen Abscheidung
GB2104917B (en) 1981-08-07 1985-02-13 Inoue Japax Res Electrodepositing a metal in a recess
US4425197A (en) 1981-08-19 1984-01-10 Inoue-Japax Research Incorporated Method of and apparatus for electrodepositing a metal on a conductive surface
JPS5931882A (ja) * 1982-08-12 1984-02-21 Sonitsukusu:Kk 浴中表面処理方法及びその装置
US20100038121A1 (en) * 1999-08-27 2010-02-18 Lex Kosowsky Metal Deposition
US20100044079A1 (en) * 1999-08-27 2010-02-25 Lex Kosowsky Metal Deposition
WO2001017320A1 (en) * 1999-08-27 2001-03-08 Lex Kosowsky Current carrying structure using voltage switchable dielectric material
US20100038119A1 (en) * 1999-08-27 2010-02-18 Lex Kosowsky Metal Deposition
US20100044080A1 (en) * 1999-08-27 2010-02-25 Lex Kosowsky Metal Deposition
US6746589B2 (en) * 2000-09-20 2004-06-08 Ebara Corporation Plating method and plating apparatus
US7626179B2 (en) * 2005-09-30 2009-12-01 Virgin Island Microsystems, Inc. Electron beam induced resonance
US7586097B2 (en) 2006-01-05 2009-09-08 Virgin Islands Microsystems, Inc. Switching micro-resonant structures using at least one director
US7791290B2 (en) 2005-09-30 2010-09-07 Virgin Islands Microsystems, Inc. Ultra-small resonating charged particle beam modulator
US7923844B2 (en) 2005-11-22 2011-04-12 Shocking Technologies, Inc. Semiconductor devices including voltage switchable materials for over-voltage protection
US20070200646A1 (en) * 2006-02-28 2007-08-30 Virgin Island Microsystems, Inc. Method for coupling out of a magnetic device
DE102006010808B4 (de) * 2006-03-07 2009-08-13 BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG Vorrichtung, System, Verfahren, Computerprogramm und Datenträger zur elektrophoretischen Abscheidung mit einer beweglichen Elektrode
US7876793B2 (en) * 2006-04-26 2011-01-25 Virgin Islands Microsystems, Inc. Micro free electron laser (FEL)
US7732786B2 (en) 2006-05-05 2010-06-08 Virgin Islands Microsystems, Inc. Coupling energy in a plasmon wave to an electron beam
US7728702B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Shielding of integrated circuit package with high-permeability magnetic material
US8188431B2 (en) 2006-05-05 2012-05-29 Jonathan Gorrell Integration of vacuum microelectronic device with integrated circuit
US20070258720A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Inter-chip optical communication
US7728397B2 (en) * 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Coupled nano-resonating energy emitting structures
US20070257273A1 (en) * 2006-05-05 2007-11-08 Virgin Island Microsystems, Inc. Novel optical cover for optical chip
US7986113B2 (en) 2006-05-05 2011-07-26 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
WO2008036423A2 (en) 2006-09-24 2008-03-27 Shocking Technologies, Inc. Formulations for voltage switchable dielectric material having a stepped voltage response and methods for making the same
US7990336B2 (en) 2007-06-19 2011-08-02 Virgin Islands Microsystems, Inc. Microwave coupled excitation of solid state resonant arrays
ES2342518B1 (es) * 2007-10-27 2011-01-17 Universidad De Las Palmas De Gran Canaria Sistema robotico de orientacion y soporte catodico en maquina de electroconformado.
US8272123B2 (en) 2009-01-27 2012-09-25 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US8399773B2 (en) 2009-01-27 2013-03-19 Shocking Technologies, Inc. Substrates having voltage switchable dielectric materials
US9226391B2 (en) 2009-01-27 2015-12-29 Littelfuse, Inc. Substrates having voltage switchable dielectric materials
WO2010110909A1 (en) 2009-03-26 2010-09-30 Shocking Technologies, Inc. Components having voltage switchable dielectric materials
US20110198544A1 (en) * 2010-02-18 2011-08-18 Lex Kosowsky EMI Voltage Switchable Dielectric Materials Having Nanophase Materials
US9320135B2 (en) * 2010-02-26 2016-04-19 Littelfuse, Inc. Electric discharge protection for surface mounted and embedded components
US9224728B2 (en) 2010-02-26 2015-12-29 Littelfuse, Inc. Embedded protection against spurious electrical events
US9082622B2 (en) 2010-02-26 2015-07-14 Littelfuse, Inc. Circuit elements comprising ferroic materials
EA201500948A1 (ru) 2013-03-15 2016-03-31 Модьюметл, Инк. Способ изготовления изделия и изделие, изготовленное вышеуказанным способом
WO2014146117A2 (en) 2013-03-15 2014-09-18 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
BR112017005534A2 (pt) 2014-09-18 2017-12-05 Modumetal Inc métodos de preparação de artigos por processos de eletrodeposição e fabricação aditiva
EP3194642A4 (en) 2014-09-18 2018-07-04 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
TW201821649A (zh) 2016-09-09 2018-06-16 美商馬杜合金股份有限公司 層合物與奈米層合物材料於工具及模製方法之應用
WO2018053158A1 (en) 2016-09-14 2018-03-22 Modumetal, Inc. System for reliable, high throughput, complex electric field generation, and method for producing coatings therefrom
EP3535118A1 (en) 2016-11-02 2019-09-11 Modumetal, Inc. Topology optimized high interface packing structures
CA3060619A1 (en) 2017-04-21 2018-10-25 Modumetal, Inc. Tubular articles with electrodeposited coatings, and systems and methods for producing the same
EP3784823A1 (en) 2018-04-27 2021-03-03 Modumetal, Inc. Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB259900A (en) * 1925-10-17 1927-02-03 Siemens Ag Improved method of and means for producing galvanic chromium coatings on hollow bodies, especially on narrow tubes
US1733404A (en) * 1926-03-15 1929-10-29 Frank A Fahrenwald Process and apparatus for electroplating tubes
US2206908A (en) * 1938-11-05 1940-07-09 Raymond L Lunt Method for electroplating molds for rubber articles
US3810829A (en) * 1972-06-28 1974-05-14 Nasa Scanning nozzle plating system

Also Published As

Publication number Publication date
GB2052562A (en) 1981-01-28
US4269672A (en) 1981-05-26
FR2457912B1 (fr) 1985-08-23
JPS55161092A (en) 1980-12-15
FR2457912A1 (fr) 1980-12-26
IT1127490B (it) 1986-05-21
GB2052562B (en) 1983-01-06
DE3020824C2 (de) 1984-11-29
DE3020824A1 (de) 1980-12-11
IT8048862A0 (it) 1980-06-02

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