JPS606086A - Cryopump device - Google Patents
Cryopump deviceInfo
- Publication number
- JPS606086A JPS606086A JP11184783A JP11184783A JPS606086A JP S606086 A JPS606086 A JP S606086A JP 11184783 A JP11184783 A JP 11184783A JP 11184783 A JP11184783 A JP 11184783A JP S606086 A JPS606086 A JP S606086A
- Authority
- JP
- Japan
- Prior art keywords
- outer periphery
- stage cylinder
- cylinder
- room temperature
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009833 condensation Methods 0.000 abstract description 3
- 230000005494 condensation Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 206010011878 Deafness Diseases 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は真空排気用のクライオポンプ装置に関する。[Detailed description of the invention] The present invention relates to a cryopump device for evacuation.
従来この種装置として、例えば第１図示のように、ボン
プクースａ内に、冷凍機本体すがら上方にのびる下側の
１段シリンダＣと、上側の２段シリンダｄとを備えると
共に、該２段シリンダｄの頂部から下方にのびる該シリ
ンダｄの外周のクライオパネルｅと、該１段シリンダＣ
の頂部から上方にのびる該パネルｅの外周のシールドｆ
とを備える式のものは知られるが、か＼るものではその
上側の真空装置ｇ内のスパッタリング用その他のガス或
は更に水蒸気がこれに導かれるとき、その一部が仝図に
矢示のように該シールドｆの外周の空間内を介してその
下側の空間内に導かれて該空間内の前記した１段シリン
ダＣの周面に凝縮されるが、これは該シリンダＣの温度
上昇によれば再蒸発し、かくて圧力上昇や圧力不安定を
生じ勝ちである不都合を伴う。更に説明すれば、前記し
た真空装置ｇ内にｆｉ、 ＯＶＤ ％ ドライエツチン
グ、スパッタリング等の処理に備えて各種のガスが供給
されるが、これらのガスは蒸気圧が１００°にで５Ｘ１
０−トール以下のものが多く、一方、前記した１段シリ
ンダＣは下端の常温（例えば２０°Ｃ）から上端の３５
〜４０°にの広い温度範囲に亘る温度勾配を有し、かく
て該ガスは該シリンダミＫ導かれるとさ、その蒸気圧に
対応する低温部に凝ん・Ｊし、上記した不都合を生ずる
ものである。Conventionally, as shown in the first diagram, a device of this kind is provided with a lower first-stage cylinder C extending upwardly from the refrigerator body and a second-stage upper cylinder d in a bomb cooler a, and the second-stage cylinder A cryopanel e on the outer periphery of the cylinder d extending downward from the top of the cylinder d, and the first stage cylinder C.
A shield f around the outer periphery of the panel e extending upward from the top of the panel e.
However, in such a type, when other gases for sputtering or water vapor in the vacuum device g above the device are introduced thereto, a part of the gas flows as shown by the arrow in the figure. As shown in FIG. According to , re-evaporation occurs and thus has the disadvantage of being prone to pressure build-up and pressure instability. To explain further, various gases are supplied into the vacuum device g in preparation for processes such as fi, OVD% dry etching, and sputtering.
Many of them are below 0-Torr, while the above-mentioned one-stage cylinder C has temperatures ranging from room temperature (e.g. 20°C) at the lower end to 35°C at the upper end.
It has a temperature gradient over a wide temperature range of ~40°, so that when the gas is guided into the cylinder, it condenses in the low temperature part corresponding to its vapor pressure, causing the above-mentioned disadvantages. It is.
本発明はかｋる不都合のない装置を（６ることをその目
的としたもので、ポンプう″−ス内に、冷凍機本体から
上方にのびる下側の１段シリンダと、上側の２段シリン
ダとを備えると共に＼該２段シリンダの頂部から下方に
のびる該シリンダの外周のクライオパネルと、該１段シ
リンダの頂部から上方にのびる該クライオパネルの外周
のシールドとを備える式のものにおいて、該ケース内に
その底面壁から上方にのびる該１段シリンダの外周の室
温セ、たを備えることを特徴とする。It is an object of the present invention to provide a device (6) which does not have such inconveniences, and includes a lower one-stage cylinder extending upward from the refrigerator body and an upper two-stage cylinder in the pump case. A cryopanel on the outer periphery of the cylinder extending downward from the top of the second-stage cylinder, and a shield on the outer periphery of the cryopanel extending upward from the top of the first-stage cylinder, The case is characterized by being provided with a room temperature sensor around the outer periphery of the first-stage cylinder extending upward from the bottom wall of the case.
本発明装置の１例を別紙図面に（ｑ説明する。An example of the device of the present invention is explained in the attached drawings (q).
第２図はその１例を示すもので、（１）はポンプケース
、（２）はその下側の冷凍機本体を示し、該ナースｍ内
には該本体（２）から上方にのびる下側の１段シリンダ
（３）と上側の２段シリンダ（４）とを備えると共に、
該２段シリンダ（４）の頂部から下方にのびる該シリン
ダ（４）の外周のクライオノぐネル（５）と該１段シリ
ンダ（３）の頂部から上方にのびる該パネル（５）の外
周のシールド（６）とを備えて全体としてクライオポン
プに構成烙れるようにした。Fig. 2 shows one example, where (1) shows the pump case, (2) shows the refrigerator main body on the lower side, and inside the nurse m there is a lower part extending upward from the main body (2). It comprises a first-stage cylinder (3) and an upper second-stage cylinder (4),
A cryonnel (5) on the outer periphery of the cylinder (4) extending downward from the top of the second stage cylinder (4) and a shield on the outer periphery of the panel (5) extending upward from the top of the first stage cylinder (3). (6), so that the entire structure can be made into a cryopump.
図面で（３ａ） （４’ａＪは該１段シリンダ（３）及
び該２段シリンダ（４）の頂部の各膨大する１ 段スｆ
−シ及び２段ステージ、（７）はその上側のバッフル
、（８）はその上側のこれに連る真空装置を示す。尚該
真空装置（８）内にはＯＶＤ 、ドライエツチング、ス
パッタリング等の真空処理に備えて各種のガスが供給さ
れるものとし、更にこれらのガスは前記したようにその
蒸気圧が１０００にで５Ｘ１０ ”トール以下のものか
多く、更に該１段シリンダ（３）はその下端の常温、例
えば２０’Ｃからその上端の３５〜４０°にの広い温度
範囲に亘る温度勾配を有するものとする。In the drawing (3a) (4'aJ is each expanding 1st stage space f at the top of the 1st stage cylinder (3) and the 2nd stage cylinder (4).
- and two-stage stage, (7) shows the baffle on the upper side thereof, and (8) shows the vacuum device connected to this on the upper side. It is assumed that various gases are supplied into the vacuum device (8) in preparation for vacuum processing such as OVD, dry etching, and sputtering. In addition, the first stage cylinder (3) has a temperature gradient over a wide temperature range from normal temperature, for example, 20'C at its lower end to 35 to 40°C at its upper end.
以上は従来のものと特に異らないが、本発明によれば、
該ケース（１）内にその底面壁（１ａ）から上方にのび
て該１段シリンダ（３）を囲繞するその外周の室温壁（
９）を備えるようにした。該室温壁（９１Ｆｉ、例えば
該１段シリンダ（３）の１５０°に以下の部分を完全に
握う長さと、該シリンダ（３）の頂部（３りより多少と
も大きな直径とを有するものとする。該室温壁（９）は
例えば第３図示のように上下にフランジ（９ａ） （９
りを備える型式とすることも可能である。Although the above is not particularly different from the conventional one, according to the present invention,
Inside the case (1) is a room temperature wall (at the outer periphery) extending upward from the bottom wall (1a) and surrounding the first stage cylinder (3).
9). The room temperature wall (91Fi, for example, shall have a length that completely holds the following part of the first stage cylinder (3) at 150°, and a diameter somewhat larger than the top of the cylinder (3). The room temperature wall (9) has flanges (9a) (9
It is also possible to use a type with additional functions.
その作ｕＪを説明するに、前記したように真空装置（８
）内のガス或は更に水蒸気がポンプケース（１１内に導
かれたとき、その一部は該シールド（６）の外周の空間
を介してその下側の空間に導かれ、該空間内の１段シリ
ンダ（３）に凝縮される傾向を」二するが、この場合該
シリンダ（３）はその外周に室温壁（９）全有し、かく
て腺凝ａを生じない。これを換言すれば、該凝縮に伴う
再蒸発が防止される。To explain how to make the uJ, we will use the vacuum device (8
) When gas or even water vapor in the pump case (11) is introduced into the pump case (11), a part of it is introduced into the space below the shield (6) through the space around the outer periphery of the shield (6), In this case, the cylinder (3) has a room temperature wall (9) all around its outer periphery, thus preventing condensation from occurring. , re-evaporation accompanying the condensation is prevented.
このように本発明によるときは１段シリンダの外周にこ
れを囲繞する室温壁を備えるもので、該シリンダの外周
に導かれるガスがこれに一旦凝縮し・次で再蒸発するこ
とによる圧力上昇或は圧力不安定等の発生がなく、その
構成は簡単で廉価に得られる等の効果を有する。In this way, according to the present invention, a room-temperature wall is provided around the outer periphery of the first-stage cylinder, and the gas introduced to the outer periphery of the cylinder is once condensed thereon and then re-evaporated, resulting in a pressure increase or This has the advantage that it does not cause pressure instability, has a simple structure, and can be obtained at a low cost.
第１図は従来例の截断正ｒ１１１図、第２図は本発明装
置の１例の裁断正面図、第３図はその変形例の仝断面図
である。
（月・・・ポンプケース ｆ２１・・・冷凍機本体（３
）・・・１段シリンダ （４）・・・２段シリンダ（５
）・・・クライオパネル （６）・・・シールド（８）
・・・真？ノシ装ｆｉｔ （９ン・・・聾つ夏 名ｔｉ
ｆｔ Ｆｋぐ外２名FIG. 1 is a cut-away front view of a conventional example, FIG. 2 is a cut-away front view of an example of the device of the present invention, and FIG. 3 is a cross-sectional view of a modification thereof. (Monday...Pump case f21...Freezer body (3)
)...1st stage cylinder (4)...2nd stage cylinder (5
)...Cryopanel (6)...Shield (8)
···true? Noshiso fit (9n...deaf summer name ti)
ft Fk 2 people
Claims (1)
１段シリンダと、上側の２段シリンダと全備えると共に
、該２段シリンダの頂部から下方にのびる該シリンダの
外周のクライオパネルと、該１段シリンダの頂部から上
方にのびる該クライオパネルの外周のシールドとをｋえ
る式のものにおいて、該′ｒ−ス内にそのＪ角面壁から
上方にのびて該１段シリンダの外周の室搗櫓を備えるこ
とを特徴とするクライオポンプ装置。The pump nurse is fully equipped with a lower first-stage cylinder extending upward from the refrigerator main body and an upper second-stage cylinder, and a cryopanel on the outer periphery of the cylinder extending downward from the top of the second-stage cylinder; In a type that includes a shield on the outer periphery of the cryopanel extending upward from the top of the first stage cylinder, there is a chamber shield on the outer periphery of the first stage cylinder extending upward from the J-angle wall in the space. A cryopump device characterized by being equipped with a turret.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11184783A JPS606086A (en) | 1983-06-23 | 1983-06-23 | Cryopump device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11184783A JPS606086A (en) | 1983-06-23 | 1983-06-23 | Cryopump device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS606086A true JPS606086A (en) | 1985-01-12 |
| JPH0380992B2 JPH0380992B2 (en) | 1991-12-26 |
Family
ID=14571654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11184783A Granted JPS606086A (en) | 1983-06-23 | 1983-06-23 | Cryopump device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS606086A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62147056A (en) * | 1985-12-20 | 1987-07-01 | Anelva Corp | Cryopump |
| US5156007A (en) * | 1991-01-30 | 1992-10-20 | Helix Technology Corporation | Cryopump with improved second stage passageway |
| GB2337207A (en) * | 1997-03-13 | 1999-11-17 | Acushnet Co | Golf balls comprising blends of polyamides and ionomers |
| JP2011153629A (en) * | 2011-05-17 | 2011-08-11 | Sumitomo Heavy Ind Ltd | Cryopump |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59180083A (en) * | 1983-03-21 | 1984-10-12 | エア・プロダクツ・アンド・ケミカルズ・インコ−ポレイテツド | Cryopump which can be baked out |
-
1983
- 1983-06-23 JP JP11184783A patent/JPS606086A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59180083A (en) * | 1983-03-21 | 1984-10-12 | エア・プロダクツ・アンド・ケミカルズ・インコ−ポレイテツド | Cryopump which can be baked out |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62147056A (en) * | 1985-12-20 | 1987-07-01 | Anelva Corp | Cryopump |
| US5156007A (en) * | 1991-01-30 | 1992-10-20 | Helix Technology Corporation | Cryopump with improved second stage passageway |
| GB2337207A (en) * | 1997-03-13 | 1999-11-17 | Acushnet Co | Golf balls comprising blends of polyamides and ionomers |
| JP2011153629A (en) * | 2011-05-17 | 2011-08-11 | Sumitomo Heavy Ind Ltd | Cryopump |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0380992B2 (en) | 1991-12-26 |
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